JP2000111702A - Antireflection film - Google Patents
Antireflection filmInfo
- Publication number
- JP2000111702A JP2000111702A JP10281494A JP28149498A JP2000111702A JP 2000111702 A JP2000111702 A JP 2000111702A JP 10281494 A JP10281494 A JP 10281494A JP 28149498 A JP28149498 A JP 28149498A JP 2000111702 A JP2000111702 A JP 2000111702A
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- less
- optical
- antireflection film
- refractive index
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光学部品の表面
に、屈折率の異なる２種類以上の物質を積層してなる反
射防止膜に係わり、詳しくは近紫外光領域から近赤外光
領域にまたがる広帯域の反射防止膜に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film formed by laminating two or more substances having different refractive indices on the surface of an optical component, and more particularly, to a near-ultraviolet light region to a near-infrared light region. The present invention relates to an antireflection film having a wide band.
【０００２】[0002]
【従来の技術】レンズ、プリズム、フィルターなどに代
表される光学素子では、光の利用効率を向上させたり、
光学素子表面の反射光による迷光によって機能が損なわ
れるのを防ぐ目的で、光学素子表面に反射防止膜を設け
ることが一般的に行われている。特に、近年光学機器の
電子化が進むにつれて、ＣＣＤなどの撮像デバイスを使
用する光学系に、このような反射防止膜を設けた光学素
子が使用される頻度が高くなってきた。そして、ＣＣＤ
では、可視光領域よりもむしろ１μｍ前後の近赤外光領
域の感度がよいことから、４００〜７００ｎｍの可視光
領域だけでなく、近赤外光領域でも良好な透過率特性を
有する光学素子のニーズが高まってきた。この近赤外光
領域に感度が高いのは、ＣＣＤに限らず、他のＳｉを使
用した撮像素子や、同様にＳｉを基板に使用している太
陽電池パネルなどでも同様である。これらの光学素子に
従来用いられていた反射防止膜では、反射防止帯域が狭
いため、使用する波長域全域で良好な分光反射率特性を
得ることはできなかった。2. Description of the Related Art An optical element represented by a lens, a prism, a filter, or the like can improve light use efficiency,
It is common practice to provide an antireflection film on the surface of an optical element for the purpose of preventing the function from being impaired by stray light due to the reflected light on the surface of the optical element. In particular, in recent years, with the progress of computerization of optical equipment, the frequency of using an optical element provided with such an antireflection film in an optical system using an imaging device such as a CCD has increased. And CCD
Since the sensitivity of the near-infrared light region of about 1 μm rather than the visible light region is good, the optical element having good transmittance characteristics not only in the visible light region of 400 to 700 nm but also in the near-infrared light region. Needs are growing. The high sensitivity in the near-infrared light region is not limited to CCDs, but also applies to other imaging devices using Si, and solar cell panels similarly using Si for the substrate. The antireflection films conventionally used for these optical elements have a narrow antireflection band, so that it was not possible to obtain good spectral reflectance characteristics over the entire wavelength range used.
【０００３】そこで、上記不具合を解決するための反射
防止膜として、例えば、特開平９−９６７０１号公報所
載の技術が開示されている。この技術は、図８に示すよ
うに、石英（屈折率１、４８）からなる透明基板１１１
上に、フッ化マグネシウム（屈折率１．３８）からなる
第１の層１１３と、屈折率１．２５以下という非常に低
い屈折率をもつ特殊なフッ素樹脂（デュポン社製のＡＦ
２４００（商品名））からなる第２の層１１５とを積層
して、広帯域の反射防止膜を得るものである。この反射
防止膜は、波長域３００〜１０００ｎｍの範囲で反射率
が１％以下の分光反射率特性を有している。Therefore, as an anti-reflection film for solving the above-mentioned problem, for example, a technique disclosed in Japanese Patent Application Laid-Open No. 9-96901 is disclosed. This technique uses a transparent substrate 111 made of quartz (refractive index 1, 48) as shown in FIG.
A first layer 113 made of magnesium fluoride (refractive index: 1.38) and a special fluororesin having a very low refractive index of 1.25 or less (AF manufactured by DuPont) are formed thereon.
2400 (trade name)) to obtain a broadband antireflection film. This antireflection film has a spectral reflectance characteristic of a reflectance of 1% or less in a wavelength range of 300 to 1000 nm.
【０００４】[0004]
【発明が解決しようとする課題】しかるに、上記従来技
術にはつぎのような問題点があった。すなわち、上記従
来技術の反射防止膜に用いられているフッ素樹脂は、成
膜条件により屈折率や吸収係数などの光学特性が著しく
変化し、生産工程の管理が煩雑になるため、生産性が非
常に低かった。また、価格が非常に高く、コストアップ
を招くという問題点を有していた。However, the above prior art has the following problems. That is, the fluororesin used in the antireflection film of the above-described conventional technology significantly changes optical characteristics such as a refractive index and an absorption coefficient depending on film forming conditions, and complicates management of a production process. Was low. In addition, there is a problem that the price is very high and the cost is increased.
【０００５】本発明は、上記従来の問題点に鑑みてなさ
れたもので、請求項１または２に係る発明の課題は、特
殊な樹脂材料のみではなく、従来から使用されてきた誘
電体材料を用いて、近紫外光領域から近赤外光領域まで
の広帯域において、良好な分光反射率特性を有する反射
防止膜を提供することである。[0005] The present invention has been made in view of the above-mentioned conventional problems, and an object of the invention according to claim 1 or 2 is to use not only a special resin material but also a dielectric material which has been used conventionally. An object of the present invention is to provide an antireflection film having good spectral reflectance characteristics in a wide band from the near ultraviolet region to the near infrared region.
【０００６】[0006]
【課題を解決するための手段】上記課題を解決するため
に、請求項１に係る発明は、光学部品の表面に、屈折率
の異なる２種類以上の物質を積層してなる反射防止膜に
おいて、屈折率が１．６以上の高屈折率物質をＨ、屈折
率が１．５以下の低屈折率物質をＬとして、前記光学部
品の表面側から空気側へ、奇数層をＨとし偶数層をＬと
して、順に１４層を積層した。請求項２に係る発明は、
光学部品の表面に、屈折率の異なる２種類以上の物質を
積層してなる反射防止膜において、高屈折率物質をＨ、
低屈折率物質をＬとし、設計波長をλとして、前記光学
部品の表面側から空気側へ順に、 第１層（Ｈ）光学的膜厚０．３×λ／４以下 第２層（Ｌ）光学的膜厚０．７５×λ／４以下 第３層（Ｈ）光学的膜厚０．２５×λ／４以上、０．７
５×λ／４以下 第４層（Ｌ）光学的膜厚０．３×λ／４以下 第５層（Ｈ）光学的膜厚０．２５×λ／４以上、１．２
５×λ／４以下 第６層（Ｌ）光学的膜厚０．１×λ／４以上、０．５×
λ／４以下 第７層（Ｈ）光学的膜厚０．１×λ／４以上、０．５×
λ／４以下 第８層（Ｌ）光学的膜厚１×λ／４以上、２×λ／４以
下 第９層（Ｈ）光学的膜厚０．１×λ／４以上、０．５×
λ／４以下 第１０層（Ｌ）光学的膜厚０．１×λ／４以上、０．５
×λ／４以下 第１１層（Ｈ）光学的膜厚０．５×λ／４以上、１．２
５×λ／４以下 第１２層（Ｌ）光学的膜厚０．３×λ／４以下 第１３層（Ｈ）光学的膜厚０．２５×λ／４以上、１×
λ／４以下 第１４層（Ｌ）光学的膜厚０．５×λ／４以上、１．２
５×λ／４以下である膜厚で１４層に積層されている。Means for Solving the Problems In order to solve the above problems, the invention according to claim 1 is directed to an antireflection film formed by laminating two or more kinds of substances having different refractive indexes on the surface of an optical component. A high-refractive-index substance having a refractive index of 1.6 or more is H, a low-refractive-index substance having a refractive index of 1.5 or less is L, and the odd-numbered layer is H and the even-numbered layer is H from the surface side of the optical component to the air side. As L, 14 layers were sequentially laminated. The invention according to claim 2 is
In an antireflection film formed by laminating two or more types of substances having different refractive indexes on the surface of an optical component, a high refractive index substance is H,
When the low refractive index material is L and the design wavelength is λ, the first layer (H) has an optical thickness of 0.3 × λ / 4 or less and the second layer (L) in order from the surface side of the optical component to the air side. Optical film thickness 0.75 × λ / 4 or less Third layer (H) Optical film thickness 0.25 × λ / 4 or more, 0.7
5 × λ / 4 or less Fourth layer (L) optical thickness 0.3 × λ / 4 or less Fifth layer (H) optical thickness 0.25 × λ / 4 or more, 1.2
5 × λ / 4 or less Sixth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Seventh layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Eighth layer (L) Optical film thickness 1 × λ / 4 or more, 2 × λ / 4 or less Ninth layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Tenth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5
× λ / 4 or less Eleventh layer (H) Optical film thickness 0.5 × λ / 4 or more, 1.2
5 × λ / 4 or less 12th layer (L) optical thickness 0.3 × λ / 4 or less 13th layer (H) optical thickness 0.25 × λ / 4 or more 1 ×
λ / 4 or less Fourteenth layer (L) Optical film thickness 0.5 × λ / 4 or more, 1.2
The layers are stacked in 14 layers with a film thickness of 5 × λ / 4 or less.
【０００７】請求項１に係る発明の反射防止膜では、屈
折率が１．６以上の高屈折率物質をＨ、屈折率が１．５
以下の低屈折率物質をＬとして、前記光学部品の表面側
から空気側へ、奇数層をＨとし偶数層をＬとして、順に
１４層を積層し、さらにその各層の膜厚を最適化するこ
とによって、少なくとも近紫外光領域および可視光領
域、または可視光領域および近赤外光領域という広帯域
で、反射率１％以下の高い反射防止機能を発揮させる。
請求項２に係る発明の反射防止膜では、反射防止膜とし
て機能する層数を１４層にし、さらにその各層の膜厚を
最適化することによって、少なくとも近紫外光領域およ
び可視光領域、または可視光領域および近赤外光領域と
いう広帯域で、反射率１％以下の高い反射防止機能を発
揮させる。In the antireflection film according to the first aspect of the present invention, a high refractive index material having a refractive index of 1.6 or more is H and a refractive index is 1.5.
The following low-refractive-index materials are L, and from the surface side of the optical component to the air side, the odd-numbered layers are H and the even-numbered layers are L, and 14 layers are sequentially laminated, and the thickness of each layer is further optimized. Thereby, a high antireflection function with a reflectance of 1% or less is exhibited in at least a wide band of near-ultraviolet light region and visible light region or visible light region and near-infrared light region.
In the antireflection film according to the second aspect of the present invention, the number of layers functioning as an antireflection film is set to 14 and the thickness of each layer is optimized, so that at least the near-ultraviolet region and the visible region, or the visible region. It exhibits a high antireflection function with a reflectance of 1% or less in a wide band of light region and near-infrared light region.
【０００８】[0008]
【発明の実施の形態】以下、具体的な実施の形態につい
て説明する。ここで、高屈折率物質Ｈ、低屈折率物質Ｌ
は、それぞれ１種類の物質である必要はなく、例えば第
１２層目の低屈折率物質Ｌと第１４層目の低屈折率物質
Ｌとは別の物質であってもよい。また、高屈折率物質
Ｈ、低屈折率物質Ｌは、それぞれ屈折率が１．６以上の
ＴｉＯ2，Ｔａ2 Ｏ5 ，Ｎｂ2 Ｏ5 ，ＺｒＯ2 ，ＨｆＯ
2 ，Ｙ2 Ｏ3 ，Ａｌ2 Ｏ3 ，ＷＯ 3 ，ＭｏＯ3 や、屈折
率が１．５以下のＳｉＯ2 ，ＭｇＦ2 などの酸化物、フ
ッ化物を使用するのが、生産性などを考慮すると最適で
ある。ただし、広帯域の反射防止効果を得る目的から
は、物質はこれらに限定されるものではなく、低屈折率
物質Ｌとして屈折率が１．５以下のフッ素樹脂（例え
ば、デュポン社製のＡＦ２４００（商品名））などの樹
脂材料などを用いても問題はない。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, specific embodiments will be described.
Will be explained. Here, the high refractive index substance H and the low refractive index substance L
Need not be one type of substance each, for example,
Low refractive index material L of 12th layer and low refractive index material of 14th layer
It may be a substance different from L. Also, high refractive index material
H and the low refractive index substance L each have a refractive index of 1.6 or more.
TiOTwo, TaTwoOFive, NbTwoOFive, ZrOTwo, HfO
Two, YTwoOThree, AlTwoOThree, WO Three, MoOThreeOr refraction
SiO with a ratio of 1.5 or lessTwo, MgFTwoOxides such as
It is best to use nitrides in consideration of productivity, etc.
is there. However, for the purpose of obtaining a broadband anti-reflection effect
Means that the material is not limited to these
Fluororesin having a refractive index of 1.5 or less as the substance L (for example,
For example, a tree such as AF2400 (trade name) manufactured by DuPont
There is no problem even if a fat material or the like is used.
【０００９】また、成膜方法においても、真空蒸着法や
スパッタリング法に代表されるドライプロセスが適用で
きるのは勿論、それ以外にディッピング法などを用いて
も、膜厚さえ制御できれば全く問題はない。また、本発
明の反射防止膜は１４層よりなるが、この１４層に、光
学特性には大きく寄与しないが、光学部品の表面との密
着度を高めたり、反射防止膜を施した光学部品の表面
（最表層）の撥水性や防曇性を高めるためなどの目的
で、光学部品と第１層との間、または第１４層のさらに
上に別の層を付与したり、あるいは１４層の内のいずれ
かの層の密着強度を高めたり、撥水性や防曇性を高める
効果を与えたりしても全く問題はない。なお、１４層以
外の膜構成の場合については、実験の結果、１２層以下
では分光反射率特性が悪くなり、１６層以上では分光反
射率特性と生産性とが悪くなって、採用することはでき
なかった。また、本実施の形態では、光学部品としてレ
ンズを例にしているが、プリズムやフィルターであって
も本実施の形態を適用することができる。In the film forming method, not only a dry process typified by a vacuum evaporation method or a sputtering method can be applied, but also a dipping method or the like can be used, as long as the film thickness can be controlled. . The antireflection film of the present invention is composed of 14 layers, and does not significantly contribute to the optical characteristics of the 14 layers. Another layer may be provided between the optical component and the first layer, or further above the fourteenth layer, or for the purpose of enhancing the water repellency and antifogging property of the surface (the outermost layer). There is no problem at all even if the adhesion strength of any of the layers is increased or the effect of increasing the water repellency or antifogging property is given. In the case of a film configuration other than 14 layers, as a result of an experiment, the spectral reflectance characteristics deteriorated when the number of layers was 12 or less, and the spectral reflectance characteristics and productivity deteriorated when the number of layers was 16 or more. could not. In this embodiment, a lens is used as an example of an optical component. However, the present embodiment can be applied to a prism or a filter.
【００１０】（実施の形態１）図１は実施の形態１〜６
を示し、光学部品とその表面上に積層された反射防止膜
の模式図、図２は実施の形態１を示し、反射防止膜の分
光反射率特性を示す図表である。(Embodiment 1) FIG. 1 shows Embodiments 1 to 6.
FIG. 2 is a schematic view of an optical component and an antireflection film laminated on the surface of the optical component. FIG. 2 is a table showing the first embodiment and showing a spectral reflectance characteristic of the antireflection film.
【００１１】図１において、光学部品としてのガラスレ
ンズ１０は、屈折率１．５２の硝材からなり、この表面
上に１４層の反射防止膜が形成され、第１層１１〜第１
４層２４を成膜した光学素子を模式的に図示している。In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, and 14 antireflection films are formed on the surface thereof.
An optical element on which four layers 24 are formed is schematically illustrated.
【００１２】反射防止膜の製造方法を説明する。ガラス
レンズ１０を真空槽に入れ、１×１０-4Ｐａまで排気し
た後、ガラスレンズ１０上に電子ビーム蒸着法によって
ガラスレンズ基板側から高屈折率物質ＨとしてのＺｒＯ
2 と低屈折率物質ＬとしてのＭｇＦ2 とを順に７層ず
つ、合計１４層成膜した。A method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating it to 1 × 10 −4 Pa, ZrO as a high-refractive-index substance H is deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
2 and MgF 2 as the low-refractive-index substance L were sequentially formed into seven layers each, for a total of 14 layers.
【００１３】各層の光学的膜厚は、λ＝６００ｎｍとし
て以下の通りである。 第１層１１ ＺｒＯ2 ０．２２４×λ／４ 第２層１２ ＭｇＦ2 ０．３３２×λ／４ 第３層１３ ＺｒＯ2 ０．６６０×λ／４ 第４層１４ ＭｇＦ2 ０．１１１×λ／４ 第５層１５ ＺｒＯ2 ０．９９２×λ／４ 第６層１６ ＭｇＦ2 ０．２７７×λ／４ 第７層１７ ＺｒＯ2 ０．２７７×λ／４ 第８層１８ ＭｇＦ2 １．５９７×λ／４ 第９層１９ ＺｒＯ2 ０．２１２×λ／４ 第１０層２０ ＭｇＦ2 ０．２８８×λ／４ 第１１層２１ ＺｒＯ2 ０．９７２×λ／４ 第１２層２２ ＭｇＦ2 ０．１１１×λ／４ 第１３層２３ ＺｒＯ2 ０．５３８×λ／４ 第１４層２２ ＭｇＦ2 ０．９３８×λ／４The optical thickness of each layer is as follows, assuming that λ = 600 nm. First layer 11 ZrO 2 0.224 × λ / 4 Second layer 12 MgF 2 0.332 × λ / 4 Third layer 13 ZrO 2 0.660 × λ / 4 Fourth layer 14 MgF 2 0.111 × λ / 4 Fifth layer 15 ZrO 2 0.992 × λ / 4 Sixth layer 16 MgF 2 0.277 × λ / 4 Seventh layer 17 ZrO 2 0.277 × λ / 4 Eighth layer 18 MgF 2 1.597 × λ / 4 9th layer 19 ZrO 2 0.212 × λ / 4 10th layer 20 MgF 2 0.288 × λ / 4 11th layer 21 ZrO 2 0.972 × λ / 4 12th layer 22 MgF 20 .111 × λ / 4 13th layer 23 ZrO 2 0.538 × λ / 4 14th layer 22 MgF 2 0.938 × λ / 4
【００１４】このようにして作製された反射防止膜の垂
直入射光の波長が３００〜１０００ｎｍの範囲での分光
反射率特性を測定したところ、図２に示すように、３９
０〜８７０ｎｍという広い波長域の全域、即ち近紫外光
領域〜近赤外光領域で、反射率０．５％以下という良好
な分光反射率特性を得ることができた。The spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of normal incident light of 300 to 1000 nm were measured. As shown in FIG.
A good spectral reflectance characteristic of a reflectance of 0.5% or less was obtained in the entire wavelength range of 0 to 870 nm, that is, in the near ultraviolet region to the near infrared region.
【００１５】また、この光学素子を９５％の相対湿度の
条件下で−４０℃に１時間放置し、３０分の時間をかけ
て８０℃とした後１時間放置、その後さらに３０分の時
間をかけて−４０℃とした後１時間放置というサイクル
を繰り返すヒートサイクル試験を３日間連続して行っ
た。この試験を行った後、本実施の形態の反射防止膜の
外観を光学顕微鏡（倍率５０倍）で観察したところ、ク
ラックの発生などの変化はみられず、また試験後にも同
様に分光反射率特性を測定したところ、試験の前後でそ
の特性に変化は見られず、３９０〜８７０ｎｍという広
い波長域の全域で反射率０．５％という良好な分光反射
率特性を保っていた。Further, this optical element is left at -40 ° C. for 1 hour under the condition of 95% relative humidity, left at 80 ° C. for 30 minutes, left for 1 hour, and then for another 30 minutes. A heat cycle test was repeated for 3 days, in which a cycle in which the temperature was lowered to −40 ° C. and then left for 1 hour was repeated. After performing this test, the appearance of the antireflection film of the present embodiment was observed with an optical microscope (magnification: 50 times). As a result, no change such as crack generation was observed, and the spectral reflectance was similarly measured after the test. When the characteristics were measured, there was no change in the characteristics before and after the test, and a favorable spectral reflectance characteristic of a reflectance of 0.5% was maintained over the entire wavelength range of 390 to 870 nm.
【００１６】本実施の形態によれば、従来から使用され
てきた誘電体材料を用いて、近赤外光領域から近紫外光
領域までの広帯域において、良好な分光反射率特性を有
する反射防止膜を得ることができる。According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from near-infrared light region to near-ultraviolet light region by using a conventionally used dielectric material. Can be obtained.
【００１７】（実施の形態２）図３は実施の形態２を示
し、反射防止膜の分光反射率特性を示す図表である。本
実施の形態の光学部品とその表面上に積層された１４層
の反射防止膜の基本構成は実施の形態１と同一のため図
１を参照して説明する。(Embodiment 2) FIG. 3 is a table showing Embodiment 2 and showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.
【００１８】図１において、光学部品としてのガラスレ
ンズ１０は、屈折率１．５２の硝材からなり、この表面
上に１４層の反射防止膜が形成され、第１層１１〜第１
４層２４を成膜した光学素子を模式的に図示している。In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, and 14 antireflection films are formed on the surface thereof to form a first layer 11 to a first layer 11.
An optical element on which four layers 24 are formed is schematically illustrated.
【００１９】反射防止膜の製造方法を説明する。ガラス
レンズ１０を真空槽に入れ、１×１０-4Ｐａまで排気し
た後、ガラスレンズ１０上に電子ビーム蒸着法によって
ガラスレンズ基板側から高屈折率物質ＨとしてのＴａ2
Ｏ5 と低屈折率物質ＬとしてのＳｉＯ2 とを順に６層ず
つ成膜し、さらにＴａＯ5 と低屈折率物質ＬとしてのＭ
ｇＦ2 とを１層ずつ、合計１４層成膜した。A method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 −4 Pa, Ta 2 as a high-refractive-index substance H was deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
O 5 and SiO 2 as the low-refractive-index substance L are sequentially formed into six layers, and TaO 5 and M as the low-refractive-index substance L are further formed.
gF 2 was deposited one by one to form a total of 14 layers.
【００２０】各層の光学的膜厚は、λ＝５００ｎｍとし
て以下の通りである。 第１層１１ Ｔａ2 Ｏ5 ０．１９５×λ／４ 第２層１２ ＳｉＯ2 ０．４０７×λ／４ 第３層１３ Ｔａ2 Ｏ5 ０．６１０×λ／４ 第４層１４ ＳｉＯ2 ０．１７４×λ／４ 第５層１５ Ｔａ2 Ｏ5 ０．８５７×λ／４ 第６層１６ ＳｉＯ2 ０．３３６×λ／４ 第７層１７ Ｔａ2 Ｏ5 ０．２６３×λ／４ 第８層１８ ＳｉＯ2 １．３８６×λ／４ 第９層１９ Ｔａ2 Ｏ5 ０．２０２×λ／４ 第１０層２０ ＳｉＯ2 ０．３３６×λ／４ 第１１層２１ Ｔａ2 Ｏ5 １．１２３×λ／４ 第１２層２２ ＳｉＯ2 ０．１０６×λ／４ 第１３層２３ Ｔａ2 Ｏ5 ０．５０４×λ／４ 第１４層２４ ＭｇＦ2 ０．９３８×λ／４The optical thickness of each layer is as follows, assuming that λ = 500 nm. First layer 11 Ta 2 O 5 0.195 × λ / 4 Second layer 12 SiO 2 0.407 × λ / 4 Third layer 13 Ta 2 O 5 0.610 × λ / 4 Fourth layer 14 SiO 20 .174 × λ / 4 Fifth layer 15 Ta 2 O 5 0.857 × λ / 4 Sixth layer 16 SiO 2 0.336 × λ / 4 Seventh layer 17 Ta 2 O 5 0.263 × λ / 4 8 layer 18 SiO 2 1.386 × λ / 4 ninth layer 19 Ta 2 O 5 0.202 × λ / 4 10th layer 20 SiO 2 0.336 × λ / 4 11th layer 21 Ta 2 O 5 1. 123 × λ / 4 12th layer 22 SiO 2 0.106 × λ / 4 13th layer 23 Ta 2 O 5 0.504 × λ / 4 14th layer 24 MgF 2 0.938 × λ / 4
【００２１】このようにして作製された反射防止膜の垂
直入射光の波長が３００〜８００ｎｍの範囲での分光反
射率特性を測定したところ、図３に示すように、３３０
〜７１０ｎｍという広い波長域の全域、即ち近紫外光領
域〜可視光領域で、反射率０．４％以下という良好な分
光反射率特性を得ることができた。When the spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of normal incident light of 300 to 800 nm were measured, as shown in FIG.
Good spectral reflectance characteristics of a reflectance of 0.4% or less could be obtained in the entire wavelength range of ７710 nm, that is, in the near ultraviolet region to the visible region.
【００２２】また、この光学素子を実施の形態１と同様
に、−４０℃〜８０℃の温度、９５％の相対湿度の条件
下で、ヒートサイクル試験を３日間連続して行ったが、
反射防止膜の外観および特性に変化は見られなかった。Further, a heat cycle test was continuously performed on this optical element for 3 days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95%, as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.
【００２３】本実施の形態によれば、従来から使用され
てきた誘電体材料を用いて、近紫外光領域から可視光領
域までの広帯域において、良好な分光反射率特性を有す
る反射防止膜を得ることができる。According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from the near ultraviolet region to the visible region is obtained by using a conventionally used dielectric material. be able to.
【００２４】（実施の形態３）図４は実施の形態３を示
し、反射防止膜の分光反射率特性を示す図表である。本
実施の形態の光学部品とその表面上に積層された１４層
の反射防止膜の基本構成は実施の形態１と同一のため図
１を参照して説明する。(Embodiment 3) FIG. 4 is a table showing Embodiment 3 and showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.
【００２５】図１において、光学部品としてのプラスチ
ックレンズ１０は、屈折率１．４９のポリメチルメタク
リレート（ＰＭＭＡ）からなり、この表面上に１４層の
反射防止膜が形成され、第１層１１〜第１４層２４を成
膜した光学素子を模式的に図示している。In FIG. 1, a plastic lens 10 as an optical component is made of polymethyl methacrylate (PMMA) having a refractive index of 1.49. On this surface, 14 antireflection films are formed. The optical element on which the fourteenth layer 24 is formed is schematically illustrated.
【００２６】反射防止膜の製造方法を説明する。プラス
チックレンズ１０を真空槽に入れ、１×１０-4Ｐａまで
排気した後、プラスチックレンズ１０上に電子ビーム蒸
着法によってプラスチックレンズ基板側から高屈折率物
質ＨとしてのＴａ2 Ｏ5 と低屈折率物質ＬとしてのＳｉ
Ｏ2 とを順に７層ずつ、合計１４層成膜した。A method for manufacturing an antireflection film will be described. After putting the plastic lens 10 in a vacuum chamber and evacuating it to 1 × 10 −4 Pa, Ta 2 O 5 as a high refractive index substance H and a low refractive index are deposited on the plastic lens 10 from the plastic lens substrate side by electron beam evaporation. Si as substance L
A total of 14 layers of O 2 and 7 layers each were formed.
【００２７】各層の光学的膜厚は、λ＝５００ｎｍとし
て以下の通りである。 第１層１１ Ｔａ2 Ｏ5 ０．１６３×λ／４ 第２層１２ ＳｉＯ2 ０．４２７×λ／４ 第３層１３ Ｔａ2 Ｏ5 ０．５１７×λ／４ 第４層１４ ＳｉＯ2 ０．１５５×λ／４ 第５層１５ Ｔａ2 Ｏ5 １．１３８×λ／４ 第６層１６ ＳｉＯ2 ０．２４９×λ／４ 第７層１７ Ｔａ2 Ｏ5 ０．３３０×λ／４ 第８層１８ ＳｉＯ2 １．３９１×λ／４ 第９層１９ Ｔａ2 Ｏ5 ０．１２９×λ／４ 第１０層２０ ＳｉＯ2 ０．４１７×λ／４ 第１１層２１ Ｔａ2 Ｏ5 ０．７７５×λ／４ 第１２層２２ ＳｉＯ2 ０．１１７×λ／４ 第１３層２３ Ｔａ2 Ｏ5 ０．７０３×λ／４ 第１４層２４ ＳｉＯ2 ０．９４３×λ／４The optical thickness of each layer is as follows, with λ = 500 nm. First layer 11 Ta 2 O 5 0.163 × λ / 4 Second layer 12 SiO 2 0.427 × λ / 4 Third layer 13 Ta 2 O 5 0.517 × λ / 4 Fourth layer 14 SiO 20 .155 × λ / 4 Fifth layer 15 Ta 2 O 5 1.138 × λ / 4 Sixth layer 16 SiO 2 0.249 × λ / 4 Seventh layer 17 Ta 2 O 5 0.330 × λ / 4 8 layer 18 SiO 2 1.391 × λ / 4 ninth layer 19 Ta 2 O 5 0.129 × λ / 4 10th layer 20 SiO 2 0.417 × λ / 4 11th layer 21 Ta 2 O 5 0. 775 × λ / 4 12th layer 22 SiO 2 0.117 × λ / 4 13th layer 23 Ta 2 O 5 0.703 × λ / 4 14th layer 24 SiO 2 0.943 × λ / 4
【００２８】このようにして作製された反射防止膜の垂
直入射光の波長が３００〜８００ｎｍの範囲での分光反
射率特性を測定したところ、図４に示すように、３３０
〜７１０ｎｍという広い波長域の全域、即ち近紫外光領
域〜可視光領域で、反射率０．６％以下という良好な分
光反射率特性を得ることができた。When the spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of the vertically incident light of 300 to 800 nm were measured, as shown in FIG.
A good spectral reflectance characteristic of a reflectance of 0.6% or less was obtained in the entire wavelength range of ７710 nm, that is, in the near ultraviolet region to the visible region.
【００２９】また、この光学素子を実施の形態１と同様
に、−４０℃〜８０℃の温度、９５％の相対湿度の条件
下で、ヒートサイクル試験を３日間連続して行ったが、
反射防止膜の外観および特性に変化は見られなかった。Further, this optical element was subjected to a heat cycle test for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95%, as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.
【００３０】本実施の形態によれば、従来から使用され
てきた誘電体材料を用いて、近紫外光領域から可視光領
域までの広帯域において、良好な分光反射率特性を有す
る反射防止膜を得ることができる。According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from the near ultraviolet region to the visible region is obtained by using a conventionally used dielectric material. be able to.
【００３１】（実施の形態４）図５は実施の形態４を示
し、反射防止膜の分光反射率特性を示す図表である。本
実施の形態の光学部品とその表面上に積層された１４層
の反射防止膜の基本構成は実施の形態１と同一のため図
１を参照して説明する。(Embodiment 4) FIG. 5 shows Embodiment 4 and is a table showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.
【００３２】図１において、光学部品としてのガラスレ
ンズ１０は、屈折率１．５２の硝材からなり、この表面
に１４層の反射防止膜が形成され、第１層１１〜第１４
層２４を成膜した光学素子を模式的に図示している。In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, and on its surface, 14 antireflection films are formed.
An optical element on which a layer 24 is formed is schematically illustrated.
【００３３】反射防止膜の製造方法を説明する。ガラス
レンズ１０を真空槽に入れ、１×１０-4Ｐａまで排気し
た後、ガラスレンズ１０上に電子ビーム蒸着法によって
ガラスレンズ基板側から高屈折率物質ＨとしてのＴａ2
Ｏ5 と低屈折率物質ＬとしてのＳｉＯ2 とを順に６層ず
つ成膜し、さらにＴａＯ5 と低屈折率物質ＬとしてのＭ
ｇＦ2 とを１層ずつ、合計１４層成膜した。The method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 −4 Pa, Ta 2 as a high-refractive-index substance H was deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
O 5 and SiO 2 as the low-refractive-index substance L are sequentially formed into six layers, and TaO 5 and M as the low-refractive-index substance L are further formed.
gF 2 was deposited one by one to form a total of 14 layers.
【００３４】各層の光学的膜厚は、λ＝５００ｎｍとし
て以下の通りである。 第１層１１ Ｔａ2 Ｏ5 ０．１７２×λ／４ 第２層１２ ＳｉＯ2 ０．４２９×λ／４ 第３層１３ Ｔａ2 Ｏ5 ０．５３６×λ／４ 第４層１４ ＳｉＯ2 ０．１５８×λ／４ 第５層１５ Ｔａ2 Ｏ5 １．０４５×λ／４ 第６層１６ ＳｉＯ2 ０．２７１×λ／４ 第７層１７ Ｔａ2 Ｏ5 ０．３０７×λ／４ 第８層１８ ＳｉＯ2 １．３７６×λ／４ 第９層１９ Ｔａ2 Ｏ5 ０．１６９×λ／４ 第１０層２０ ＳｉＯ2 ０．３４１×λ／４ 第１１層２１ Ｔａ2 Ｏ5 １．１０２×λ／４ 第１２層２２ ＳｉＯ2 ０．０７７×λ／４ 第１３層２３ Ｔａ2 Ｏ5 ０．５３８×λ／４ 第１４層２４ ＭｇＦ2 ０．９３８×λ／４The optical thickness of each layer is as follows, assuming that λ = 500 nm. First layer 11 Ta 2 O 5 0.172 × λ / 4 Second layer 12 SiO 2 0.429 × λ / 4 Third layer 13 Ta 2 O 5 0.536 × λ / 4 Fourth layer 14 SiO 20 .158 × λ / 4 Fifth layer 15 Ta 2 O 5 1.045 × λ / 4 Sixth layer 16 SiO 2 0.271 × λ / 4 Seventh layer 17 Ta 2 O 5 0.307 × λ / 4 8 layer 18 SiO 2 1.376 × λ / 4 ninth layer 19 Ta 2 O 5 0.169 × λ / 4 10th layer 20 SiO 2 0.341 × λ / 4 11th layer 21 Ta 2 O 5 1. 102 × λ / 4 12th layer 22 SiO 2 0.077 × λ / 4 13th layer 23 Ta 2 O 5 0.538 × λ / 4 14th layer 24 MgF 2 0.938 × λ / 4
【００３５】このようにして作製された反射防止膜の垂
直入射光の波長が３００〜８００ｎｍの範囲での分光反
射率特性を測定したところ、図５に示すように、３３０
〜７１０ｎｍという広い波長域の全域、即ち近紫外光領
域〜可視光領域で、反射率１％以下、特に４００〜６８
０ｎｍの可視光領域では反射率０．２５％以下という良
好な分光反射率特性を得ることができた。The spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of normal incident light of 300 to 800 nm were measured, and as shown in FIG.
The reflectance is 1% or less, particularly 400 to 68, in the entire wavelength range of from about 710 nm to about 710 nm, that is, in the near ultraviolet range to the visible range.
In the visible light region of 0 nm, favorable spectral reflectance characteristics of a reflectance of 0.25% or less could be obtained.
【００３６】また、この光学素子を実施の形態１と同様
に、−４０℃〜８０℃の温度、９５％の相対湿度の条件
下で、ヒートサイクル試験を３日間連続して行ったが、
反射防止膜の外観および特性に変化は見られなかった。A heat cycle test was performed on the optical element for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95%, as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.
【００３７】本実施の形態によれば、従来から使用され
てきた誘電体材料を用いて、近紫外光領域から可視光領
域までの広帯域において反射率１％以下、特に４００〜
６８０ｎｍの可視光領域では反射率０．２５％以下とい
う良好な分光反射率特性を有する反射防止膜を得ること
ができる。According to the present embodiment, the reflectance is 1% or less, particularly 400 to 400, in a wide band from the near ultraviolet region to the visible region by using a conventionally used dielectric material.
In the visible light region of 680 nm, it is possible to obtain an antireflection film having excellent spectral reflectance characteristics of a reflectance of 0.25% or less.
【００３８】（実施の形態５）図６は実施の形態５を示
し、反射防止膜の分光反射率特性を示す図表である。本
実施の形態の光学部品とその表面上に積層された１４層
の反射防止膜の基本構成は実施の形態１と同一のため図
１を参照して説明する。(Embodiment 5) FIG. 6 is a table showing Embodiment 5 and showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.
【００３９】図１において、光学部品としてのガラスレ
ンズ１０は、屈折率１．８の硝材からなり、この表面に
１４層の反射防止膜が形成され、第１層１１〜第１４層
２４を成膜した光学素子を模式的に図示している。In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.8, and 14 antireflection films are formed on the surface thereof to form first to eleventh layers 24. 1 schematically illustrates a coated optical element.
【００４０】反射防止膜の製造方法を説明する。ガラス
レンズ１０を真空槽に入れ、１×１０-4Ｐａまで排気し
た後、ガラスレンズ１０上に電子ビーム蒸着法によって
ガラスレンズ基板側から高屈折率物質ＨとしてのＴａ2
Ｏ5 と低屈折率物質ＬとしてのＭｇＦ2 とを順に７層ず
つ、合計１４層成膜した。The method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 −4 Pa, Ta 2 as a high-refractive-index substance H was deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
O 5 and MgF 2 as the low-refractive-index substance L were sequentially formed into seven layers each, and a total of 14 layers were formed.
【００４１】各層の光学的膜厚は、λ＝７００ｎｍとし
て以下の通りである。 第１層１１ Ｔａ2 Ｏ5 ０．２１９×λ／４ 第２層１２ ＭｇＦ2 ０．１４６×λ／４ 第３層１３ Ｔａ2 Ｏ5 ０．４７１×λ／４ 第４層１４ ＭｇＦ2 ０．１８３×λ／４ 第５層１５ Ｔａ2 Ｏ5 ０．４７１×λ／４ 第６層１６ ＭｇＦ2 ０．３４４×λ／４ 第７層１７ Ｔａ2 Ｏ5 ０．２４１×λ／４ 第８層１８ ＭｇＦ2 １．８６８×λ／４ 第９層１９ Ｔａ2 Ｏ5 ０．２７７×λ／４ 第１０層２０ ＭｇＦ2 ０．２７７×λ／４ 第１１層２１ Ｔａ2 Ｏ5 １．１６８×λ／４ 第１２層２２ ＭｇＦ2 ０．１０７×λ／４ 第１３層２３ Ｔａ2 Ｏ5 ０．３８２×λ／４ 第１４層２４ ＭｇＦ2 ０．８４５×λ／４The optical thickness of each layer is as follows, with λ = 700 nm. First layer 11 Ta 2 O 5 0.219 × λ / 4 Second layer 12 MgF 2 0.146 × λ / 4 Third layer 13 Ta 2 O 5 0.471 × λ / 4 Fourth layer 14 MgF 20 .183 × λ / 4 Fifth layer 15 Ta 2 O 5 0.471 × λ / 4 Sixth layer 16 MgF 2 0.344 × λ / 4 Seventh layer 17 Ta 2 O 5 0.241 × λ / 4 Eighth layer 18 MgF 2 1.868 × λ / 4 Ninth layer 19 Ta 2 O 5 0.277 × λ / 4 Tenth layer 20 MgF 2 0.277 × λ / 4 Eleventh layer 21 Ta 2 O 5 168 × λ / 4 12th layer 22 MgF 2 0.107 × λ / 4 13th layer 23 Ta 2 O 5 0.382 × λ / 4 14th layer 24 MgF 2 0.845 × λ / 4
【００４２】このようにして作製された反射防止膜の垂
直入射光の波長が３００〜１２００ｎｍの範囲での分光
反射率特性を測定したところ、図６に示すように、４０
０〜９８０ｎｍという広い波長域の全域、即ち可視光領
域〜近赤外光領域で、反射率０．５％以下という良好な
分光反射率特性を得ることができた。The spectral reflectance characteristics of the thus-prepared antireflection film when the wavelength of the vertically incident light was in the range of 300 to 1200 nm were measured. As shown in FIG.
Good spectral reflectance characteristics of a reflectance of 0.5% or less were obtained in the entire wavelength range of 0 to 980 nm, that is, in the visible light region to the near infrared light region.
【００４３】また、この光学素子を実施の形態１と同様
に、−４０℃〜８０℃の温度、９５％の相対湿度の条件
下で、ヒートサイクル試験を３日間連続して行ったが、
反射防止膜の外観および特性に変化は見られなかった。Further, a heat cycle test was performed on the optical element for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95% as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.
【００４４】本実施の形態によれば、従来から使用され
てきた誘電体材料を用いて、可視光領域から近赤外光領
域までの広帯域において、良好な分光反射率特性を有す
る反射防止膜を得ることができる。According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from the visible light region to the near infrared light region is formed by using a conventionally used dielectric material. Obtainable.
【００４５】（実施の形態６）図７は実施の形態６を示
し、反射防止膜の分光反射率特性を示す図表である。本
実施の形態の光学部品とその表面上に積層された１４層
の反射防止膜の基本構成は実施の形態１と同一のため図
１を参照して説明する。(Embodiment 6) FIG. 7 shows Embodiment 6 and is a table showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.
【００４６】図１において、光学部品としてのガラスレ
ンズ１０は、屈折率１．５２の硝材からなり、この表面
に１４層の反射防止膜が形成され、第１層１１〜第１４
層２４を成膜した光学素子を模式的に図示している。In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, on which a 14-layer anti-reflection film is formed.
An optical element on which a layer 24 is formed is schematically illustrated.
【００４７】反射防止膜の製造方法を説明する。ガラス
レンズ１０を真空槽に入れ、１×１０-4Ｐａまで排気し
た後、ガラスレンズ１０上に電子ビーム蒸着法によって
ガラスレンズ基板側から高屈折率物質ＨとしてのＴｉＯ
2 と低屈折率物質ＬとしてのＳｉＯ2 とを順に６層ずつ
成膜し、さらにＴｉＯ2 と低屈折率物質ＬとしてのＭｇ
Ｆ2 とを１層ずつ、合計１４層成膜した。The method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 −4 Pa, TiO as a high-refractive-index substance H is deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
2 and SiO 2 as the low-refractive-index substance L are sequentially formed into six layers, and TiO 2 and Mg as the low-refractive-index substance L are further formed.
And F 2 layer by layer, and a total of 14 layer deposition.
【００４８】各層の光学的膜厚は、λ＝５００ｎｍとし
て以下の通りである。 第１層１１ ＴｉＯ2 ０．１７０×λ／４ 第２層１２ ＳｉＯ2 ０．３３５×λ／４ 第３層１３ ＴｉＯ2 ０．４６６×λ／４ 第４層１４ ＳｉＯ2 ０．１００×λ／４ 第５層１５ ＴｉＯ2 １．１１２×λ／４ 第６層１６ ＳｉＯ2 ０．１９４×λ／４ 第７層１７ ＴｉＯ2 ０．３０６×λ／４ 第８層１８ ＳｉＯ2 １．７５７×λ／４ 第９層１９ ＴｉＯ2 ０．３１１×λ／４ 第１０層２０ ＳｉＯ2 ０．１９５×λ／４ 第１１層２１ ＴｉＯ2 １．００８×λ／４ 第１２層２２ ＳｉＯ2 ０．１５８×λ／４ 第１３層２３ ＴｉＯ2 ０．３５０×λ／４ 第１４層２４ ＭｇＦ2 ０．８５１×λ／４The optical thickness of each layer is as follows, assuming that λ = 500 nm. First layer 11 TiO 2 0.170 × λ / 4 Second layer 12 SiO 2 0.335 × λ / 4 Third layer 13 TiO 2 0.466 × λ / 4 Fourth layer 14 SiO 2 0.100 × λ / 4 Fifth layer 15 TiO 2 1.112 × λ / 4 Sixth layer 16 SiO 2 0.194 × λ / 4 Seventh layer 17 TiO 2 0.306 × λ / 4 Eighth layer 18 SiO 2 1.757 × λ / 4 9th layer 19 TiO 2 0.311 × λ / 4 10th layer 20 SiO 2 0.195 × λ / 4 11th layer 21 TiO 2 1.008 × λ / 4 12th layer 22 SiO 2 0 .158 × λ / 4 13th layer 23 TiO 2 0.350 × λ / 4 14th layer 24 MgF 2 0.851 × λ / 4
【００４９】このようにして作製された反射防止膜の垂
直入射光の波長が３００〜８００ｎｍの範囲での分光反
射率特性を測定したところ、図７に示すように、３２０
〜７００ｎｍという広い波長域の全域、即ち近紫外光領
域〜可視光領域で、反射率１％以下、特に３２５〜５０
０ｎｍの領域では反射率０．５％以下という良好な分光
反射率特性を得ることができた。The spectral reflectance characteristics of the thus-prepared antireflection film when the wavelength of the normal incident light was in the range of 300 to 800 nm were measured. As shown in FIG.
The reflectance is 1% or less, particularly 325 to 50, in the entire wavelength range of from 700 nm to 700 nm, that is, in the near ultraviolet region to the visible region.
In the region of 0 nm, a favorable spectral reflectance characteristic of a reflectance of 0.5% or less could be obtained.
【００５０】また、この光学素子を実施の形態１と同様
に、−４０℃〜８０℃の温度、９５％の相対湿度の条件
下で、ヒートサイクル試験を３日間連続して行ったが、
反射防止膜の外観および特性に変化は見られなかった。Further, this optical element was subjected to a heat cycle test for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95% as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.
【００５１】本実施の形態によれば、従来から使用され
てきた誘電体材料を用いて、近紫外光領域から可視光領
域までの広帯域において反射率１％以下、特に３２５〜
５００ｎｍの可視光領域では反射率０．５％以下という
良好な分光反射率特性を有する反射防止膜を得ることが
できる。According to the present embodiment, the reflectance is 1% or less, particularly 325 to 280, in a wide band from the near ultraviolet region to the visible region by using a conventionally used dielectric material.
In the visible light region of 500 nm, it is possible to obtain an antireflection film having a favorable spectral reflectance characteristic of a reflectance of 0.5% or less.
【００５２】[0052]
【発明の効果】請求項１に係る発明によれば、各層の膜
厚を最適化することによって、少なくとも近紫外光領域
および可視光領域、または可視光領域および近赤外光領
域という広帯域で、反射率１％以下の高い反射防止機能
を発揮させるので、特殊な樹脂材料のみではなく、従来
から使用されてきた誘電体材料を用いて、近赤外光領域
から近紫外光領域までの広帯域において、良好な分光反
射率特性を有する反射防止膜を得ることができる。請求
項２に係る発明によれば、各層の膜厚を最適化すること
によって、少なくとも近紫外光領域および可視光領域、
または可視光領域および近赤外光領域という広帯域で、
反射率１％以下の高い反射防止機能を発揮させるので、
特殊な樹脂材料のみではなく、従来から使用されてきた
誘電体材料を用いて、近赤外光領域から近紫外光領域ま
での広帯域において、良好な分光反射率特性を有する反
射防止膜を得ることができる。According to the first aspect of the present invention, by optimizing the film thickness of each layer, at least in a wide band of near-ultraviolet light region and visible light region or visible light region and near-infrared light region, Since it exhibits a high antireflection function with a reflectance of 1% or less, it uses not only special resin materials but also dielectric materials that have been used in the past to cover a wide band from near-infrared light region to near-ultraviolet light region. An antireflection film having good spectral reflectance characteristics can be obtained. According to the invention according to claim 2, by optimizing the thickness of each layer, at least near-ultraviolet light region and visible light region,
Or in a wide band of visible light region and near infrared light region,
Since it exhibits a high anti-reflection function with a reflectance of 1% or less,
To obtain an antireflection film with good spectral reflectance characteristics in a wide band from near-infrared light region to near-ultraviolet light region using not only special resin materials but also dielectric materials that have been used in the past. Can be.
【図１】実施の形態１〜６の光学部品とその表面上に積
層された反射防止膜の模式図である。FIG. 1 is a schematic diagram of an optical component according to Embodiments 1 to 6 and an antireflection film laminated on the surface thereof.
【図２】実施の形態１の反射防止膜の分光反射率特性を
示す図表である。FIG. 2 is a table showing spectral reflectance characteristics of the antireflection film according to the first embodiment.
【図３】実施の形態２の反射防止膜の分光反射率特性を
示す図表である。FIG. 3 is a table showing spectral reflectance characteristics of an antireflection film according to a second embodiment.
【図４】実施の形態３の反射防止膜の分光反射率特性を
示す図表である。FIG. 4 is a table showing spectral reflectance characteristics of an antireflection film according to a third embodiment.
【図５】実施の形態４の反射防止膜の分光反射率特性を
示す図表である。FIG. 5 is a table showing spectral reflectance characteristics of an antireflection film according to a fourth embodiment.
【図６】実施の形態５の反射防止膜の分光反射率特性を
示す図表である。FIG. 6 is a table showing spectral reflectance characteristics of an antireflection film according to a fifth embodiment.
【図７】実施の形態６の反射防止膜の分光反射率特性を
示す図表である。FIG. 7 is a table showing spectral reflectance characteristics of an antireflection film according to a sixth embodiment.
【図８】従来技術の反射防止膜の積層関係を示す断面図
である。FIG. 8 is a cross-sectional view showing the stacking relationship of a conventional antireflection film.
１０ 光学部品 １１ 第１層 １２ 第２層 １３ 第３層 １４ 第４層 １５ 第５層 １６ 第６層 １７ 第７層 １８ 第８層 １９ 第９層 ２０ 第１０層 ２１ 第１１層 ２２ 第１２層 ２３ 第１３層 ２４ 第１４層 DESCRIPTION OF SYMBOLS 10 Optical component 11 1st layer 12 2nd layer 13 3rd layer 14 4th layer 15 5th layer 16 6th layer 17 7th layer 18 8th layer 19 9th layer 20 10th layer 21 11th layer 22 12th Layer 23 13th layer 24 14th layer
Claims (2)
類以上の物質を積層してなる反射防止膜において、 屈折率が１．６以上の高屈折率物質をＨ、屈折率が１．
５以下の低屈折率物質をＬとして、前記光学部品の表面
側から空気側へ、奇数層をＨとし偶数層をＬとして、順
に１４層を積層したことを特徴とする反射防止膜。1. An anti-reflection film comprising two or more substances having different refractive indexes laminated on the surface of an optical component, wherein a high refractive index substance having a refractive index of 1.6 or more is H, and a refractive index is 1.
An antireflection film comprising 14 layers, in which 5 or less low-refractive-index substances are L, and odd-numbered layers are H and even-numbered layers are L from the surface side of the optical component to the air side.
類以上の物質を積層してなる反射防止膜において、 高屈折率物質をＨ、低屈折率物質をＬとし、設計波長を
λとして、前記光学部品の表面側から空気側へ順に、 第１層（Ｈ）光学的膜厚０．３×λ／４以下 第２層（Ｌ）光学的膜厚０．７５×λ／４以下 第３層（Ｈ）光学的膜厚０．２５×λ／４以上、０．７
５×λ／４以下 第４層（Ｌ）光学的膜厚０．３×λ／４以下 第５層（Ｈ）光学的膜厚０．２５×λ／４以上、１．２
５×λ／４以下 第６層（Ｌ）光学的膜厚０．１×λ／４以上、０．５×
λ／４以下 第７層（Ｈ）光学的膜厚０．１×λ／４以上、０．５×
λ／４以下 第８層（Ｌ）光学的膜厚１×λ／４以上、２×λ／４以
下 第９層（Ｈ）光学的膜厚０．１×λ／４以上、０．５×
λ／４以下 第１０層（Ｌ）光学的膜厚０．１×λ／４以上、０．５
×λ／４以下 第１１層（Ｈ）光学的膜厚０．５×λ／４以上、１．２
５×λ／４以下 第１２層（Ｌ）光学的膜厚０．３×λ／４以下 第１３層（Ｈ）光学的膜厚０．２５×λ／４以上、１×
λ／４以下 第１４層（Ｌ）光学的膜厚０．５×λ／４以上、１．２
５×λ／４以下である膜厚で１４層に積層されているこ
とを特徴とする反射防止膜。2. An antireflection film comprising two or more substances having different refractive indexes laminated on the surface of an optical component, wherein H is a high refractive index substance, L is a low refractive index substance, and λ is a design wavelength. The first layer (H) has an optical thickness of 0.3 × λ / 4 or less, and the second layer (L) has an optical thickness of 0.75 × λ / 4 or less. 3 layers (H) Optical film thickness 0.25 × λ / 4 or more, 0.7
5 × λ / 4 or less Fourth layer (L) optical thickness 0.3 × λ / 4 or less Fifth layer (H) optical thickness 0.25 × λ / 4 or more, 1.2
5 × λ / 4 or less Sixth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Seventh layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Eighth layer (L) Optical film thickness 1 × λ / 4 or more, 2 × λ / 4 or less Ninth layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Tenth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5
× λ / 4 or less Eleventh layer (H) Optical film thickness 0.5 × λ / 4 or more, 1.2
5 × λ / 4 or less 12th layer (L) optical thickness 0.3 × λ / 4 or less 13th layer (H) optical thickness 0.25 × λ / 4 or more 1 ×
λ / 4 or less Fourteenth layer (L) Optical film thickness 0.5 × λ / 4 or more, 1.2
An antireflection film, wherein the antireflection film is laminated in 14 layers with a thickness of 5 × λ / 4 or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10281494A JP2000111702A (en) | 1998-10-02 | 1998-10-02 | Antireflection film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10281494A JP2000111702A (en) | 1998-10-02 | 1998-10-02 | Antireflection film |
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| Publication Number | Publication Date |
|---|---|
| JP2000111702A true JP2000111702A (en) | 2000-04-21 |
Family
ID=17639976
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|---|---|---|---|
| JP10281494A Withdrawn JP2000111702A (en) | 1998-10-02 | 1998-10-02 | Antireflection film |
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| Country | Link |
|---|---|
| JP (1) | JP2000111702A (en) |
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| WO2002077704A1 (en) * | 2001-03-22 | 2002-10-03 | Sony Corporation | Reflective display device, light guide plate, and method of manufacturing light guide plate |
| JP2006171332A (en) * | 2004-12-15 | 2006-06-29 | Nippon Electric Glass Co Ltd | Antireflection film |
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| JP4524877B2 (en) * | 2000-07-17 | 2010-08-18 | コニカミノルタホールディングス株式会社 | Eyeglass lenses |
| JP2002031701A (en) * | 2000-07-17 | 2002-01-31 | Konica Corp | Optical element and ophthalmic lens |
| WO2002077704A1 (en) * | 2001-03-22 | 2002-10-03 | Sony Corporation | Reflective display device, light guide plate, and method of manufacturing light guide plate |
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| US9201172B2 (en) | 2012-09-14 | 2015-12-01 | Ricoh Imaging Company, Ltd. | Anti-reflection coating, optical member having it, and optical equipment comprising such optical member |
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