JP2000077182A - Manufacture of organic el element, organic el transfer substrate and its manufacture - Google Patents
Manufacture of organic el element, organic el transfer substrate and its manufactureInfo
- Publication number
- JP2000077182A JP2000077182A JP11170208A JP17020899A JP2000077182A JP 2000077182 A JP2000077182 A JP 2000077182A JP 11170208 A JP11170208 A JP 11170208A JP 17020899 A JP17020899 A JP 17020899A JP 2000077182 A JP2000077182 A JP 2000077182A
- Authority
- JP
- Japan
- Prior art keywords
- organic
- transfer substrate
- substrate
- heat
- organic compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 112
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 55
- 238000010438 heat treatment Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims description 35
- 238000001771 vacuum deposition Methods 0.000 claims description 8
- 239000010408 film Substances 0.000 description 45
- 239000010410 layer Substances 0.000 description 33
- 239000002585 base Substances 0.000 description 32
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- 239000010949 copper Substances 0.000 description 12
- 239000011521 glass Substances 0.000 description 11
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 229940125833 compound 23 Drugs 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 230000005525 hole transport Effects 0.000 description 5
- 229910052749 magnesium Inorganic materials 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- 238000000859 sublimation Methods 0.000 description 5
- 230000008022 sublimation Effects 0.000 description 5
- 239000003086 colorant Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000007738 vacuum evaporation Methods 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- MRUWJENAYHTDQG-UHFFFAOYSA-N 4H-pyran Chemical compound C1C=COC=C1 MRUWJENAYHTDQG-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229940125773 compound 10 Drugs 0.000 description 1
- 229940125961 compound 24 Drugs 0.000 description 1
- 229940127204 compound 29 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- -1 p-dimethylaminostyryl Chemical group 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、有機ＥＬ素子の製
造方法及び有機ＥＬ転写基板とその製造方法に関するも
のである。The present invention relates to a method for manufacturing an organic EL device, an organic EL transfer substrate, and a method for manufacturing the same.
【０００２】[0002]
【従来の技術】有機ＥＬ素子（有機エレクトロルミネセ
ント素子）は、有機発光性化合物を含む有機ＥＬ層がア
ノードとカソードの間に挟まれた構造をしている。有機
ＥＬ素子は、アノードとカソードの間に電圧を印加する
と、アノードから正孔が、カソードから電子がそれぞれ
注入されて再結合し、その際に生ずるエネルギーにより
有機分子が励起され、その励起分子が基底状態に失活す
る過程で発光する現象を利用した発光素子である。2. Description of the Related Art An organic EL device (organic electroluminescent device) has a structure in which an organic EL layer containing an organic light emitting compound is sandwiched between an anode and a cathode. In an organic EL device, when a voltage is applied between an anode and a cathode, holes are injected from the anode and electrons are injected from the cathode to recombine, and the energy generated at that time excites organic molecules, and the excited molecules are excited. A light-emitting element utilizing a phenomenon of emitting light in the process of deactivation to a ground state.
【０００３】有機ＥＬ層は、正孔と電子が再結合して発
光する発光層と呼ばれる有機層と、正孔が注入されやす
く電子を移動させにくい正孔輸送層と呼ばれる有機層
と、電子が注入されやすくかつ正孔を移動させにくい電
子輸送層と呼ばれる有機層のうち少なくともそのひとつ
を含んでいる。有機ＥＬ素子の薄膜は、真空蒸着法で形
成されるが、水分や酸、アルカリの溶液が存在すると、
有機ＥＬ層、有機ＥＬ層とカソードとの界面及びカソー
ドに浸潤していく為に、有機ＥＬ素子の発光性能及び寿
命特性を著しく劣化させてしまう。[0003] The organic EL layer includes an organic layer called a light emitting layer which emits light by recombination of holes and electrons, an organic layer called a hole transport layer in which holes are easily injected and electrons are hard to move, It contains at least one of organic layers called electron transport layers that are easily injected and hard to move holes. The thin film of the organic EL element is formed by a vacuum evaporation method, but when a solution of moisture, acid, or alkali is present,
Since the organic EL layer, the interface between the organic EL layer and the cathode and the cathode are infiltrated, the light emitting performance and the life characteristics of the organic EL element are significantly deteriorated.
【０００４】[0004]
【発明が解決しようとする課題】このような有機ＥＬ素
子を使ってカラーディスプレイを製作する方式として、
大きく分けて次の３種の方式が提案されている。第１
は、白色発光の有機ＥＬ素子を使いＲ、Ｇ、Ｂ３原色に
塗り分けられたカラーフィルターを通してカラー化する
方式である。透過型カラー液晶などで広く採用されてい
る方式と原理的に同様な方式である。この方式は、フォ
トリソグラフィー技術を用いることでカラーフィルター
の高精細化が容易であり、有機ＥＬ素子は、白色発光一
種類で良いため、有機層のパターニングが不要となり製
造が簡単であるという利点がある。しかし、原理的に
は、カラーフィルターで不要な波長成分をカットしてし
まうため、有機ＥＬの発光の多くを無駄にすることにな
り、効率的に利用出来ていない欠点がある。もちろん、
効率の高い白色発光有機材料の開発も必要であるという
問題もある。As a method for producing a color display using such an organic EL element,
Broadly speaking, the following three methods have been proposed. First
Is a method in which a white light-emitting organic EL element is used to form a color through a color filter that is painted in three primary colors of R, G, and B. This is a method similar in principle to a method widely used in transmission type color liquid crystals. This method has an advantage that the color filter can be easily made high-definition by using photolithography technology, and the organic EL element needs only one kind of white light emission. is there. However, in principle, unnecessary wavelength components are cut off by a color filter, so that much of the light emitted from the organic EL is wasted and there is a drawback that it cannot be used efficiently. of course,
There is also a problem that it is necessary to develop a highly efficient white light emitting organic material.
【０００５】第２は、青色発光有機ＥＬ素子と色変換層
を使う色変換と呼ばれる方式である。例えば、特開平３
−１５２８９７号公報において、この色変換方式による
有機ＥＬのカラー化技術が開示されている。この方式
は、波長の短い青色を有機ＥＬ素子で発光させ、それよ
り長い波長の緑色と赤色は、それぞれ色変換層を使って
変換して作り出す方式である。この方式も有機ＥＬ素子
の微細化は必要なく、フォトリソ技術を使って色変換層
の高精細化が可能であるため、高精細カラー化が比較的
容易であるという利点がある。しかし、現実には、色変
換層の変換効率を高くする事が困難であり、有機ＥＬ素
子の発光の利用が低率になるという欠点がある。また、
色変換層のパターニングでは、その表面の平坦性を確保
することが難しく、平坦化層を設けてもその上に透明電
極を断線せずにパターニングする事が困難であるという
問題もあった。The second is a system called color conversion using a blue light emitting organic EL device and a color conversion layer. For example, Japanese Unexamined Patent Publication
Japanese Patent Application Laid-Open No. -152897 discloses a technique for colorizing an organic EL using this color conversion method. In this method, blue light having a short wavelength is emitted by an organic EL element, and green light and red light having a longer wavelength are converted and produced using a color conversion layer. This method also does not require miniaturization of the organic EL element, and the color conversion layer can be made high-definition using the photolithography technique. However, in reality, it is difficult to increase the conversion efficiency of the color conversion layer, and there is a disadvantage that the utilization of light emission of the organic EL element is reduced. Also,
In the patterning of the color conversion layer, there is a problem that it is difficult to secure the flatness of the surface, and even if a flattening layer is provided, it is difficult to pattern the transparent electrode without breaking the transparent electrode.
【０００６】以上のような欠点を有する有機ＥＬのカラ
ー化方式に対し、有機ＥＬ素子の発光を効率よく利用出
来る第３のカラー化方式として、それぞれＲ、Ｇ、Ｂ３
原色を発光する有機ＥＬ素子をそれぞれ独立に形成して
配置する方式が提案されている。方法としては、従来か
らよく知られているように、メタルマスクなどのシャド
ウマスクを基板と蒸着源の間に置いて、シャドウマスク
の開口部を通して蒸着物を基板に堆積させてパターニン
グする方法がある。この方式によれば、有機ＥＬ素子の
発光は、フィルターや色変換層などを通過してロスとな
る部分は無くなり、有機ＥＬの高い変換効率を生かした
カラー化が可能になる。In contrast to the organic EL color schemes having the above-mentioned disadvantages, R, G, and B3 are the third color schemes that can efficiently use the light emission of the organic EL element.
A method has been proposed in which organic EL elements that emit primary colors are independently formed and arranged. As a well-known method, there is a method in which a shadow mask such as a metal mask is placed between a substrate and an evaporation source, and an evaporation material is deposited on the substrate through an opening of the shadow mask and patterned. . According to this method, the light emitted from the organic EL element passes through a filter, a color conversion layer, or the like, and no loss occurs, and colorization can be achieved by utilizing the high conversion efficiency of the organic EL element.
【０００７】しかしながら、この方式には大きな欠点が
あった。それは、３原色の有機ＥＬ素子を独立に配置す
る方法として、前述したようにウェットエッチングプロ
セスが使えないため、メタルマスクなどのシャドウマス
クを使ってパターニングをしなければならず、高精細な
パターニングや大面積のパターニングが出来なかった。
上記の点に鑑み、本発明は有機ＥＬ素子の高精細及び大
画面カラー化のために、こうした不具合を解決する手段
を提供するものである。[0007] However, this method has a major drawback. This is because the wet etching process cannot be used as described above as a method for independently arranging the three primary color organic EL elements, so patterning must be performed using a shadow mask such as a metal mask. Large area patterning could not be performed.
In view of the above points, the present invention provides a means for solving such problems in order to achieve high definition and large screen color of the organic EL element.
【０００８】[0008]
【課題を解決するための手段】本発明は、３原色独立発
光方式の有機ＥＬ素子を高精細かつ大画面で実現するも
のであり、発光性有機層を高精細に塗り分ける為に、予
め昇華性の発光性有機化合物をベースフィルムに蒸着し
て薄膜を形成した有機ＥＬ転写基板を作成しておき、こ
の転写基板と、ＩＴＯなどの透明電極をパターニングし
たアノード電極を有する透明基板とを間隔をおいて配置
し、ヒートバーなどの加熱手段にて発光性有機化合物を
透明基板に転写するものである。SUMMARY OF THE INVENTION The present invention is to realize an organic EL device of three primary color independent light emitting systems with high definition and a large screen. An organic EL transfer substrate in which a thin film is formed by vapor-depositing a transparent luminescent organic compound on a base film is prepared, and the distance between this transfer substrate and a transparent substrate having an anode electrode patterned with a transparent electrode such as ITO is set. The light emitting organic compound is transferred to the transparent substrate by a heating means such as a heat bar.
【０００９】本発明の有機ＥＬ転写基板は、低熱伝導部
材と高熱伝導部材とから構成された耐熱性ベースフィル
ムの少なくとも一方の面に、発光性有機化合物を成膜し
たことを特徴とする。また、上記の有機ＥＬ転写基板に
おいては、前記耐熱性ベースフィルムは、格子状に成形
された低熱伝導部材と格子内部に配設された高熱伝導部
材とから構成されていることが望ましい。また、前記耐
熱性ベースフィルムは、帯状に成形された低熱伝導部材
と高熱伝導部材が交互に配設されて構成されていること
を特徴とするものとしてもよい。The organic EL transfer substrate of the present invention is characterized in that a light-emitting organic compound is formed on at least one surface of a heat-resistant base film composed of a low heat conductive member and a high heat conductive member. In the above-described organic EL transfer substrate, it is preferable that the heat-resistant base film is composed of a low heat conductive member formed in a lattice shape and a high heat conductive member disposed inside the lattice. Further, the heat-resistant base film may be formed by alternately arranging low heat conductive members and high heat conductive members formed in a belt shape.
【００１０】本発明の有機ＥＬ転写基板の製造方法は、
低熱伝導部材と高熱伝導部材とから構成されている耐熱
性ベースフィルムの少なくとも一方の面に、発光性有機
化合物を真空蒸着法により付着させることを特徴とす
る。The method for producing an organic EL transfer substrate of the present invention comprises:
A luminescent organic compound is attached to at least one surface of a heat-resistant base film composed of a low heat conductive member and a high heat conductive member by a vacuum evaporation method.
【００１１】また、本発明の有機ＥＬ素子の製造方法
は、上記のいずれかに記載の有機ＥＬ転写基板と、少な
くとも透明電極を有する透明基板とを間隔をあけて配置
し、前記有機ＥＬ転写基板を加熱して、前記発光性有機
化合物を前記透明基板に転写することを特徴とする。Further, according to a method of manufacturing an organic EL device of the present invention, the organic EL transfer substrate described in any one of the above and a transparent substrate having at least a transparent electrode are arranged at an interval. Is heated to transfer the luminescent organic compound to the transparent substrate.
【００１２】上記の有機ＥＬ転写基板のベースフィルム
は、耐熱性を持ち、かつ、カラー有機ＥＬ素子のサブピ
クセルに対応する区画毎に周囲を低熱伝導性の部材で囲
われた高熱伝導性の部材で構成されており、この構造に
よりベースフィルムへの加熱手段から伝わる熱により所
定の画素に対応する部分、すなわち、有機ＥＬ転写基板
の高熱伝導性の部材で構成されている部分に対応する部
分の発光性有機化合物のみが加熱され、隣接した画素に
不要な発光性有機化合物を転写することがない。したが
って、本発明の有機ＥＬ素子の製造方法によれば、透明
基板に高精細に発光性有機化合物を塗り分けることが可
能である。画面が大型になっても、昇華による転写を部
分ごとに分けて行えるし、真空装置も必ずしも必要とし
ないので、大画面化も可能である。The above-mentioned base film of the organic EL transfer substrate has a heat resistance and a high thermal conductivity member whose periphery is surrounded by a low thermal conductivity member for each of the sections corresponding to the sub-pixels of the color organic EL element. The structure corresponds to a portion corresponding to a predetermined pixel due to heat transmitted from the heating means to the base film, that is, a portion corresponding to a portion formed of a high heat conductive member of the organic EL transfer substrate. Only the light emitting organic compound is heated, and unnecessary light emitting organic compounds are not transferred to adjacent pixels. Therefore, according to the method for manufacturing an organic EL device of the present invention, it is possible to separately apply a luminescent organic compound to a transparent substrate with high definition. Even if the screen becomes large, the transfer by sublimation can be performed for each part, and a vacuum device is not necessarily required, so that the screen can be enlarged.
【００１３】また、本発明の有機ＥＬ素子の製造方法
は、耐熱性ベースフィルムの少なくとも一方の面に発光
性有機化合物を成膜した有機ＥＬ転写基板と、少なくと
も透明電極を有する透明基板とを間隔をあけて配置し、
前記有機ＥＬ転写基板の前記発光性有機化合物のうち前
記透明基板に転写したい領域のみを加熱して、前記発光
性有機化合物を前記透明基板に転写することを特徴とす
る。この有機ＥＬ素子の製造方法は、前記発光性有機化
合物のうち前記透明基板に転写したい領域のみを加熱し
て、前記発光性有機化合物を前記透明基板に転写する方
法であるので、透明基板に高精細に発光性有機化合物を
塗り分けることが可能である。また、画面が大型になっ
ても、昇華による転写を部分ごとに分けて行えるし、真
空装置を必ずしも必要としないので、大画面化も可能で
ある。Further, in the method for manufacturing an organic EL device according to the present invention, an organic EL transfer substrate having a light-emitting organic compound formed on at least one surface of a heat-resistant base film and a transparent substrate having at least a transparent electrode are spaced apart. And place it,
The method is characterized in that only the region of the luminescent organic compound of the organic EL transfer substrate that is desired to be transferred to the transparent substrate is heated to transfer the luminescent organic compound to the transparent substrate. This method of manufacturing an organic EL device is a method of transferring only the region of the luminescent organic compound that is desired to be transferred to the transparent substrate and transferring the luminescent organic compound to the transparent substrate. The light-emitting organic compound can be separately applied with high precision. Further, even if the screen becomes large, the transfer by sublimation can be performed for each part, and a vacuum device is not necessarily required, so that the screen can be enlarged.
【００１４】[0014]
【発明の実施の形態】以下、図面により本発明について
詳細に説明するが、本発明はこれらの実施形態例のみに
限定されるものではない。図１は、有機ＥＬ転写基板の
一例を示す断面図であり、板厚５０μｍの銅板からなる
耐熱性ベースフィルム２に、発光性有機化合物３とし
て、例えば、トリス（８−キノリノラト）アルミニウム
錯体（以下、Ａｌｑ３と略記する）を厚み約５０ｎｍで
真空蒸着して製作したものである。図５に示すように、
真空蒸着装置１１に銅板製のベースフィルム２をセット
し、抵抗加熱ボート１２に蒸着源１３としてＡｌｑ３を
入れて、装置内を１０-4Ｐａ以下に減圧した後、抵抗加
熱ボート１２に電流を流してＡｌｑ３を銅板２に蒸着し
て成膜する。この有機ＥＬ転写基板１は、緑色発光の転
写基板として使用される。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings, but the present invention is not limited to only these embodiments. FIG. 1 is a cross-sectional view showing an example of an organic EL transfer substrate. A tris (8-quinolinolato) aluminum complex (hereinafter, referred to as a luminescent organic compound 3) is formed on a heat-resistant base film 2 made of a copper plate having a thickness of 50 μm. , Alq3) in a vacuum of about 50 nm in thickness. As shown in FIG.
The base film 2 made of a copper plate is set in the vacuum evaporation apparatus 11, Alq 3 is put as the evaporation source 13 in the resistance heating boat 12, and the pressure inside the apparatus is reduced to 10 −4 Pa or less. Then, Alq3 is deposited on the copper plate 2 to form a film. The organic EL transfer substrate 1 is used as a transfer substrate for emitting green light.
【００１５】同様にして別の板厚５０μｍの銅板を用意
し、Ａｌｑ３にドーパントとして４−ジシアノメチレン
−２−メチル−６−（ｐ−ジメチルアミノスチリル）−
４Ｈ−ピラン（以下、ＤＣＭと略記する）を用い、Ａｌ
ｑ３とＤＣＭとを別々の抵抗加熱ボートに入れて、ＤＣ
Ｍが５ｗｔ％になるように銅板に共蒸着する。膜厚は、
約５０ｎｍとなるまで成膜する。この転写基板は、赤色
発光の転写基板として使用される。更に同様にして銅板
を交換して、ペリレンを膜厚約５０ｎｍになるまで真空
蒸着して青色発光の転写基板を製作する。Similarly, another copper plate having a thickness of 50 μm was prepared, and 4-dicyanomethylene-2-methyl-6- (p-dimethylaminostyryl)-was added to Alq3 as a dopant.
Using 4H-pyran (hereinafter abbreviated as DCM), Al
q3 and DCM in separate resistance heating boats
Co-deposit on a copper plate so that M becomes 5 wt%. The film thickness is
The film is formed until the thickness becomes about 50 nm. This transfer substrate is used as a transfer substrate for emitting red light. Further, similarly, the copper plate is replaced, and perylene is vacuum-deposited until the film thickness becomes about 50 nm, thereby producing a transfer substrate for emitting blue light.
【００１６】次に、他の有機ＥＬ転写基板について説明
する。ステンレス板上に厚さ約５０μｍの銅板を置き、
その上からネガ型感光性ドライフィルムを被覆する。図
２に示すような高熱伝導部材である高熱伝導部６が遮光
されるパターンのフォトマスクを用いて露光して現像す
る。しかる後、銅のエッチング液により、図２に示す低
熱伝導部材である低熱伝導部７に相当する格子状の部分
を除去する。銅板上に残るドライフィルムを剥離除去し
た後、銅板をエッチングした部分にガラスペーストをド
クターブレード法で充填する。これを乾燥させた後、還
元雰囲気中で６００℃前後に加熱してガラスを溶融させ
る。徐冷したのちステンレス板を剥離して耐熱性ベース
フィルム５を作成する。Next, another organic EL transfer substrate will be described. Place a copper plate about 50μm thick on a stainless steel plate,
A negative photosensitive dry film is coated thereon. The high heat conducting portion 6 as a high heat conducting member as shown in FIG. 2 is exposed and developed using a photomask having a light-shielded pattern. Thereafter, a grid-like portion corresponding to the low heat conductive portion 7 which is a low heat conductive member shown in FIG. 2 is removed with a copper etchant. After the dry film remaining on the copper plate is peeled off and removed, a portion where the copper plate is etched is filled with a glass paste by a doctor blade method. After drying, the glass is heated to about 600 ° C. in a reducing atmosphere to melt the glass. After slow cooling, the stainless steel plate is peeled off to form a heat-resistant base film 5.
【００１７】この時、すだれ状パターンのフォトマスク
を用いて同様の工程で処理すると、図３に示す如く帯状
の銅板の両側にガラス部が挟む構造の耐熱性ベースフィ
ルム８が製作出来る。このようにして製作した耐熱性ベ
ースフィルムを真空蒸着装置に入れ、そのひとつの面に
発光性有機化合物９を真空蒸着し、有機ＥＬ転写基板１
０を製作する。図４にその断面図を示す。発光性有機化
合物は、前述した様にＡｌｑ３、ＤＣＭをドープしたＡ
ｌｑ３、ペリレンなどを使用できる。At this time, if a similar process is performed using a photomask having an interdigitated pattern, a heat-resistant base film 8 having a structure in which glass portions are sandwiched on both sides of a strip-shaped copper plate as shown in FIG. 3 can be manufactured. The heat-resistant base film manufactured in this manner is put into a vacuum deposition apparatus, and a luminescent organic compound 9 is vacuum-deposited on one surface of the heat-resistant base film.
Make 0. FIG. 4 shows a cross-sectional view thereof. The luminescent organic compound is Alq3 and DCM-doped A as described above.
lq3, perylene and the like can be used.
【００１８】次に、上述したようにして作成した有機Ｅ
Ｌ転写基板を用いて有機ＥＬ素子を製造する方法を説明
する。図６に示すように、厚み１．１ｍｍのガラス基板
を透明基板２１として用い、透明基板２１の上にＩＴＯ
膜２２をスパッタ法で１００ｎｍの厚みに成膜する。ガ
ラス基板は、水分の吸着が少ない無アルカリガラス板が
望ましいが、基板乾燥を充分行うなど工程に気を付けれ
ば、酸化珪素のコーティングを施した安価な低アルカリ
ガラス板あるいはソーダライムガラス板でもよい。この
透明基板２１に成膜されたＩＴＯ膜２２をフォトリソ法
で縦方向に間隔をあけてストライプ状にパターニングし
たものをアノードとする。ＩＴＯ膜２２は、アノードと
して機能すると共に、有機ＥＬ層で発生した発光を、こ
のＩＴＯ膜２２を通過して外部へ取り出して表示装置と
して機能させるものであるから、より低抵抗かつ、より
光透過率が高いことが望ましい。ＩＴＯ膜２２のパター
ンは、ラインピッチ０．１ｍｍ、ライン幅は８０μｍ、
長さ２５ｍｍで３８４本とする。Next, the organic E prepared as described above is used.
A method for manufacturing an organic EL device using an L transfer substrate will be described. As shown in FIG. 6, a glass substrate having a thickness of 1.1 mm is used as the transparent substrate 21 and an ITO
The film 22 is formed to a thickness of 100 nm by a sputtering method. The glass substrate is desirably an alkali-free glass plate that absorbs a small amount of moisture. However, if care is taken in steps such as sufficiently drying the substrate, an inexpensive low-alkali glass plate or a soda lime glass plate coated with silicon oxide may be used. . The ITO film 22 formed on the transparent substrate 21 is patterned in the form of stripes at intervals in the vertical direction by a photolithography method to form an anode. The ITO film 22 functions as an anode and emits light generated in the organic EL layer through the ITO film 22 to the outside to function as a display device. Therefore, the ITO film 22 has lower resistance and more light transmission. A high rate is desirable. The pattern of the ITO film 22 has a line pitch of 0.1 mm, a line width of 80 μm,
The length is 25 mm and the number is 384.
【００１９】ＩＴＯ膜面を下側にして、この透明基板２
１を真空蒸着装置の基板ホルダーに固定し、抵抗加熱ボ
ートにＮ，Ｎ’−ジフェニル−Ｎ，Ｎ’−ビス（α−ナ
フチル）−１，１’−ビフェニル−４，４’−ジアミン
（以下α−ＮＰＤと略記する）を入れる。真空ポンプで
真空蒸着装置内を１×１０-4Ｐａ以下程度に排気する。
しかる後、有機ＥＬ層を蒸着する範囲を四角形にくり抜
いた金属製のマスクを基板に対して設置し、真空蒸着装
置内にこの基板とマスクの下部に配置されているα−Ｎ
ＰＤの抵抗加熱ボートに電流を流して加熱する。α−Ｎ
ＰＤは、膜厚５０ｎｍに蒸着する。With the ITO film surface facing down, this transparent substrate 2
1 was fixed to a substrate holder of a vacuum deposition apparatus, and N, N′-diphenyl-N, N′-bis (α-naphthyl) -1,1′-biphenyl-4,4′-diamine (hereinafter referred to as “diamine”) was placed on a resistance heating boat. α-NPD). The inside of the vacuum evaporation apparatus is evacuated to about 1 × 10 −4 Pa or less with a vacuum pump.
Thereafter, a metal mask in which the area where the organic EL layer is to be vapor-deposited is hollowed out is set on the substrate, and the α-N disposed below the substrate and the mask is placed in a vacuum vapor deposition apparatus.
A current is passed through the resistance heating boat of the PD to heat it. α-N
PD is deposited to a thickness of 50 nm.
【００２０】この基板を真空蒸着装置から取り出し、透
明基板２１を下側にして乾燥窒素雰囲気の装置内に設置
する。次に、Ａｌｑ３にＤＣＭをドープした発光性有機
化合物２３が耐熱性ベースフィルム２４に蒸着された有
機ＥＬ転写基板２５を、発光性有機化合物２３の面がα
−ＮＰＤ層（正孔輸送層）２６に対面するように、そし
て両面の間隔が約０．５ｍｍ程度となるように設置す
る。この時、透明基板２１上のパターニングされたＩＴ
Ｏストライプと有機ＥＬ転写基板２５の高熱伝導部とが
お互いに向かい合う様に位置合わせしておく。The substrate is taken out of the vacuum deposition apparatus and placed in a dry nitrogen atmosphere apparatus with the transparent substrate 21 facing downward. Next, the organic EL transfer substrate 25 on which the light-emitting organic compound 23 obtained by doping DCM with Alq3 was deposited on the heat-resistant base film 24 was placed on the surface of the light-emitting organic compound 23 by α.
-It is installed so as to face the NPD layer (hole transport layer) 26 and to have a gap between both sides of about 0.5 mm. At this time, the patterned IT on the transparent substrate 21
The O stripe and the high thermal conductive portion of the organic EL transfer substrate 25 are aligned so as to face each other.
【００２１】複数のヒートバー２７を耐熱性ベースフィ
ルム２４の側から有機ＥＬ転写基板２５に当てて、発光
性有機化合物２３の面とα−ＮＰＤ２６の面との距離が
０．２ｍｍ程度になるまで近づける。ヒートバー２７
は、発光性有機化合物２３のうち透明基板２１に転写し
たい領域のみを加熱できるものであり、例えば、抵抗加
熱型のヒーターが使用できる。ヒートバー２７に電流を
流して約５００℃に加熱する。有機ＥＬ転写基板２５の
発光性有機化合物２３は、昇華してα−ＮＰＤ層２６の
面上に転写形成される。透明基板２１と有機ＥＬ転写基
板２５とを、ＩＴＯ２２のパターンが延びる方向と直交
する方向にスライドさせ、ＩＴＯパターンと有機ＥＬ転
写基板の高熱伝導部とを再び位置合わせする。ヒートバ
ー２７を加熱して発光性有機化合物２３を昇華転写す
る。順次、透明基板２１上のＩＴＯ２２のストライプの
２本おきに、対応するα−ＮＰＤ層２６上に発光性有機
化合物２３が転写されるまで同様の作業を繰り返す。A plurality of heat bars 27 are applied to the organic EL transfer substrate 25 from the side of the heat-resistant base film 24 and are brought close to each other until the distance between the surface of the luminescent organic compound 23 and the surface of the α-NPD 26 becomes about 0.2 mm. . Heat bar 27
Is capable of heating only the region of the luminescent organic compound 23 which is desired to be transferred to the transparent substrate 21. For example, a resistance heating type heater can be used. An electric current is applied to the heat bar 27 to heat it to about 500 ° C. The luminescent organic compound 23 of the organic EL transfer substrate 25 is sublimated and transferred and formed on the surface of the α-NPD layer 26. The transparent substrate 21 and the organic EL transfer substrate 25 are slid in a direction perpendicular to the direction in which the pattern of the ITO 22 extends, and the ITO pattern and the high heat conducting portion of the organic EL transfer substrate are again positioned. The light emitting organic compound 23 is sublimated and transferred by heating the heat bar 27. The same operation is sequentially repeated until the luminescent organic compound 23 is transferred onto the corresponding α-NPD layer 26 every two stripes of the ITO 22 on the transparent substrate 21.
【００２２】次に、有機ＥＬ転写基板をＡｌｑ３が蒸着
されたものに交換する。上述した作業により、発光性有
機化合物を転写形成した部分のＩＴＯの隣のＩＴＯと位
置合わせを行い、上述した作業と同様にＡｌｑ３を転写
形成していく。続いて、ペリレンを蒸着した有機ＥＬ転
写基板に取り替えて、同様の作業を繰り返す。これによ
り、３色の発光性有機化合物がＩＴＯ上に順に転写され
た透明基板２１が得られる。次に、発光性有機化合物ま
で形成した透明基板２１を、真空蒸着装置にガラス基板
側を上にして設置する。同装置内の抵抗加熱ボートにＡ
ｌｑ３を入れ、真空ポンプで真空蒸着装置内を１×１０
-4Ｐａ以下程度に排気する。しかる後、有機ＥＬ層を蒸
着する範囲を四角形にくり抜いた金属製のマスクを基板
に対して固定するように設置し、真空蒸着装置内にこの
基板とマスクの下部に配置されているＡｌｑ３の抵抗加
熱ボートに電流を流して加熱し、電子輸送層２９となる
Ａｌｑ３を膜厚２５ｎｍになるよう蒸着する。Next, the organic EL transfer substrate is replaced with a substrate on which Alq3 is deposited. By the above-described operation, the position where the luminescent organic compound is transferred and formed is aligned with the ITO next to the ITO, and Alq3 is transferred and formed in the same manner as the above-described operation. Subsequently, the same operation is repeated with replacement of the organic EL transfer substrate on which perylene is deposited. Thereby, the transparent substrate 21 on which the three color light emitting organic compounds are sequentially transferred onto the ITO is obtained. Next, the transparent substrate 21 formed with the luminescent organic compound is placed in a vacuum deposition apparatus with the glass substrate side facing up. A for the resistance heating boat in the same equipment
lq3, put 1 × 10
Exhaust to about -4 Pa or less. Thereafter, a metal mask in which the organic EL layer is vapor-deposited is cut out in a rectangular shape so as to be fixed to the substrate, and the resistance of Alq3 disposed below the substrate and the mask in the vacuum vapor deposition apparatus is set. A current is applied to the heating boat to heat the boat, and Alq3 to be the electron transport layer 29 is deposited to a thickness of 25 nm.
【００２３】次に、ＳＵＳ４３０製のシャドウマスクを
真空蒸着装置内に配置し、シャドウマスクを介して蒸着
出来る位置に固定したひとつの抵抗加熱ボートにマグネ
シウムを入れ、また別の抵抗加熱ボートに銀を入れ、マ
グネシウムと銀の比率を１０：１となる蒸着速度で、膜
厚２００ｎｍになるまで蒸着する。シャドウマスクに
は、ピッチ０．３ｍｍ、幅０．２５ｍｍ、長さ４５ｍｍ
のスリットが６４本開けられている。このようにしてマ
グネシウムと銀の混合金属から成るカソード３０を６４
本、有機ＥＬ層の上に形成することで、図７に示すよう
な有機ＥＬ素子が得られる。Next, a shadow mask made of SUS430 is placed in a vacuum evaporation apparatus, magnesium is put in one resistance heating boat fixed at a position where evaporation can be performed through the shadow mask, and silver is put in another resistance heating boat. Then, deposition is performed at a deposition rate of 10: 1 with a ratio of magnesium to silver to a thickness of 200 nm. Pitch 0.3mm, width 0.25mm, length 45mm for shadow mask
64 slits are opened. In this way, the cathode 30 made of a mixed metal of magnesium and silver is connected to 64
By forming the present invention on the organic EL layer, an organic EL device as shown in FIG. 7 is obtained.
【００２４】このような有機ＥＬ素子の製造方法は、発
光性有機化合物のうち透明基板２１に転写したい領域の
みを加熱して、発光性有機化合物を透明基板２１に転写
する方法であるので、透明基板２１に高精細に発光性有
機化合物を塗り分けることが可能である。また、画面が
大型になっても、昇華による転写を部分ごとに分けて行
えるし、真空装置を必ずしも必要としないので、大画面
化も可能である。In the method of manufacturing such an organic EL device, only the region of the luminescent organic compound which is desired to be transferred to the transparent substrate 21 is heated to transfer the luminescent organic compound to the transparent substrate 21. The light-emitting organic compound can be separately applied to the substrate 21 with high definition. Further, even if the screen becomes large, the transfer by sublimation can be performed for each part, and a vacuum device is not necessarily required, so that the screen can be enlarged.
【００２５】有機ＥＬ転写基板を構成する耐熱性ベース
フィルムの低熱伝導性部の領域を、適度に広くした図８
に示すような有機ＥＬ転写基板を使用する場合、加熱手
段は、平面熱源やライン状熱源であってもよい。ランプ
４１から放射された熱線４２は、レンズ４３で収束され
て有機ＥＬ転写基板４４に照射される。有機ＥＬ転写基
板４４の耐熱性ベースフィルムは、高熱伝導部６と低熱
伝導部７を有するものであるので、照射された熱線４２
が、有機ＥＬ転写基板４４の発光性有機化合物９の透明
基板に転写したい領域よりも広がっても、低熱伝導部７
から外側の領域には熱が伝わりにくく、熱によって転写
される部分４５は、所望の画素に対応した部分だけにな
る。FIG. 8 shows that the region of the low heat conductive portion of the heat resistant base film constituting the organic EL transfer substrate is appropriately widened.
When an organic EL transfer substrate as shown in (1) is used, the heating means may be a planar heat source or a linear heat source. The heat ray 42 radiated from the lamp 41 is converged by the lens 43 and is irradiated on the organic EL transfer substrate 44. Since the heat-resistant base film of the organic EL transfer substrate 44 has the high heat conduction part 6 and the low heat conduction part 7, the irradiated heat rays 42
However, even if the area of the light-emitting organic compound 9 of the organic EL transfer substrate 44 is wider than the area of the organic EL transfer substrate 44 to be transferred to the transparent substrate, the low heat conduction portion 7
It is difficult for heat to be transmitted to a region outside the area, and the portion 45 transferred by the heat is only a portion corresponding to a desired pixel.
【００２６】また、有機ＥＬ転写基板を加熱する手段と
しては、レーザーなどのエネルギー線を光学系で帯状に
広げたものも使用できる。図９に示すように、レーザー
光源５１から放射されたレーザー光５２は、レンズ５３
や光学系装置５４により帯状のエネルギー線５５に広が
って有機ＥＬ転写基板５６に照射される。この場合にお
いても、エネルギー線５５が、有機ＥＬ転写基板５６の
発光性有機化合物９の透明基板に転写したい領域よりも
広がっても、低熱伝導部７が外側に熱が広がるのを抑制
するので、熱によって転写される部分５７は、所望の画
素に対応した部分だけになる。As a means for heating the organic EL transfer substrate, a device in which energy beams such as a laser beam are spread in a band by an optical system can be used. As shown in FIG. 9, a laser beam 52 emitted from a laser
The light is spread to a band-like energy beam 55 by an optical system device 54 and irradiated to an organic EL transfer substrate 56. Also in this case, even if the energy ray 55 is wider than the area of the organic EL transfer substrate 56 that is desired to be transferred to the transparent substrate of the luminescent organic compound 9, the low thermal conductive portion 7 suppresses the heat from spreading outside. The portion 57 transferred by heat is only a portion corresponding to a desired pixel.
【００２７】ここで、有機ＥＬ転写基板を加熱する方法
としては、ヒートバー、ランプ、レーザーの他、電磁誘
導加熱、超音波摩擦加熱などが可能である。耐熱性ベー
スフィルムの低熱伝導部の材質には、低融点ガラス、ア
ルミナの他、ガラス繊維やポリイミドなどの耐熱性プラ
スチックを使用することができる。Here, as a method of heating the organic EL transfer substrate, a heat bar, a lamp, a laser, an electromagnetic induction heating, an ultrasonic friction heating, or the like can be used. As a material of the low heat conductive portion of the heat resistant base film, a heat resistant plastic such as glass fiber or polyimide can be used in addition to low melting point glass and alumina.
【００２８】次に、第１の実施形態例の有機ＥＬ素子の
動作について、図７を参照して説明する。透明基板２１
上にパターニングされたＩＴＯ２２を陽極とし、マグネ
シウムと銀の混合金属３０を陰極となるように外部電気
回路から電圧を印加すると、陽極からα−ＮＰＤなどの
正孔輸送層２６、発光性有機化合物２８へ正孔が注入さ
れ、陰極からＡｌｑ３などの電子輸送層２９、発光性有
機化合物２８へ電子が注入される。そして、発光性有機
化合物２８中において正孔と電子の再結合が起こり発光
する。正孔輸送層２６と電子輸送層２９は、３原色共通
の材料を選択する事により特別なパターニングを必要と
しない。本発明により、３原色の発光性有機化合物を予
め耐熱性ベースフィルムに蒸着しておき、ヒートバーな
どの加熱手段により昇華転写法で有機発光層を微細に分
離して形成する事ができる。Next, the operation of the organic EL device according to the first embodiment will be described with reference to FIG. Transparent substrate 21
When a voltage is applied from an external electric circuit so that the ITO 22 patterned thereon serves as an anode and the mixed metal 30 of magnesium and silver serves as a cathode, a hole transport layer 26 such as α-NPD and a luminescent organic compound 28 are applied from the anode. Holes are injected, and electrons are injected from the cathode into the electron transport layer 29 such as Alq3 and the luminescent organic compound 28. Then, recombination of holes and electrons occurs in the luminescent organic compound 28 to emit light. The hole transport layer 26 and the electron transport layer 29 do not require special patterning by selecting a material common to the three primary colors. According to the present invention, the luminescent organic compounds of the three primary colors can be vapor-deposited on a heat-resistant base film in advance, and the organic luminescent layer can be finely separated and formed by a sublimation transfer method using a heating means such as a heat bar.
【００２９】また、有機ＥＬ素子に形成しようとする画
素サイズと同等の区画を、高熱伝導性の材料、例えば、
銅や銀で形成し、その周囲または両側を低熱伝導性の材
料、例えば、ガラスやアルミナで形成した耐熱性ベース
フィルムに、発光性有機化合物を蒸着すると、画素に対
応したサイズの加熱手段、例えば、ヒートバーでベース
フィルム側から加熱すると、加えた熱は、高熱伝導部の
ベースフィルムを伝導して有機化合物を昇華させ、所望
の画素以外の部分には低熱伝導部で熱の伝導が遅くなり
有機化合物が昇華しない。Further, a section equivalent to the pixel size to be formed in the organic EL element is formed of a material having high thermal conductivity, for example,
Formed of copper or silver, a material having low thermal conductivity around or on both sides, for example, a heat-resistant base film formed of glass or alumina, when a luminescent organic compound is deposited, heating means of a size corresponding to the pixel, for example, When heated from the base film side with a heat bar, the applied heat conducts through the base film of the high heat conduction part to sublimate the organic compound, and the heat conduction is slowed down by the low heat conduction part to the portion other than the desired pixel, and the organic Compound does not sublime.
【００３０】次に、有機ＥＬ転写基板を用いた有機ＥＬ
素子の第２の実施形態例を説明する。図１０は、有機Ｅ
Ｌの各画素をアクティブ駆動するためのスイッチングト
ランジスタを備えた透明基板の回路図である。ゲートラ
イン６０を電気的に走査しながらデータライン６１から
駆動信号を入力するとトランジスタ６２がオンになり、
コンデンサ６３が充電される。コンデンサ６３の充電量
に応じて、トランジスタ６４を流れ得る電流が決まり、
有機ＥＬ６５に流れる電流も決まる。６７、６８は、そ
れぞれグランドライン、電源ラインである。この実施形
態例では、有機ＥＬ６５の陰極６６は、第１の実施形態
例のようにストライプ状にパターニングする必要がな
く、各有機ＥＬ画素の陰極は、共通電極にできる。従っ
て、この例では、ＩＴＯ以外、有機ＥＬ素子のどの層も
特別なパターニングが要らない。また、発光層は、本発
明により有機ＥＬ転写基板を用いて昇華転写法で塗り分
けられる。なお、本発明の技術範囲は、上記実施の形態
に限定されるものではなく、本発明の趣旨を逸脱しない
範囲において種々の変更を加えることが可能である。Next, an organic EL using an organic EL transfer substrate
A second embodiment of the device will be described. FIG. 10 shows organic E
FIG. 4 is a circuit diagram of a transparent substrate provided with a switching transistor for actively driving each pixel of L. When a drive signal is input from the data line 61 while electrically scanning the gate line 60, the transistor 62 is turned on,
The capacitor 63 is charged. The current that can flow through the transistor 64 is determined according to the charge amount of the capacitor 63,
The current flowing through the organic EL 65 is also determined. 67 and 68 are a ground line and a power supply line, respectively. In this embodiment, the cathode 66 of the organic EL 65 does not need to be patterned in a stripe shape as in the first embodiment, and the cathode of each organic EL pixel can be a common electrode. Therefore, in this example, no special patterning is required for any layer of the organic EL element other than ITO. Further, the light emitting layer is separately coated by the sublimation transfer method using the organic EL transfer substrate according to the present invention. Note that the technical scope of the present invention is not limited to the above embodiment, and various changes can be made without departing from the spirit of the present invention.
【００３１】[0031]
【発明の効果】以上詳細に説明した通り、本発明の有機
ＥＬ素子の製造方法を用いれば、予め昇華性の発光性有
機化合物をベースフィルムに蒸着して薄膜を形成した有
機ＥＬ転写基板を作成し、この転写基板から、ＩＴＯな
どの透明電極をパターニングしたアノード電極を有する
透明基板に発光性有機化合物を転写することができ、有
機ＥＬ素子の高精細及び大画面カラー化に寄与すること
ができる。As described in detail above, by using the method for manufacturing an organic EL device of the present invention, an organic EL transfer substrate having a thin film formed by depositing a sublimable luminescent organic compound on a base film in advance. Then, the luminescent organic compound can be transferred from the transfer substrate to a transparent substrate having an anode electrode on which a transparent electrode such as ITO is patterned, which contributes to high definition and large screen color of the organic EL device. .
【００３２】有機ＥＬ転写基板のベースフィルムは、耐
熱性を持ち、かつカラー有機ＥＬ素子のサブピクセルに
対応する区画毎に周囲を低熱伝導性の部材で囲われた高
熱伝導性の部材で構成されており、この構造によりベー
スフィルムへの加熱手段から伝わる熱により所定の画素
に対応する部分、すなわち、有機ＥＬ転写基板の高熱伝
導性の部材で構成されている部分に対応する部分の発光
性有機化合物のみが加熱され、隣接した画素に不要な発
光性有機化合物を転写することがない。The base film of the organic EL transfer substrate is made of a heat-resistant member having high heat conductivity surrounded by a member having low heat conductivity for each section corresponding to the sub-pixel of the color organic EL element. Due to this structure, a portion corresponding to a predetermined pixel due to heat transmitted from a heating means to the base film, that is, a portion corresponding to a portion composed of a high heat conductive member of the organic EL transfer substrate has a light emitting organic material. Only the compound is heated, and unnecessary luminescent organic compounds are not transferred to adjacent pixels.
【図１】 有機ＥＬ転写基板の一例を示す断面図であ
る。FIG. 1 is a cross-sectional view illustrating an example of an organic EL transfer substrate.
【図２】 耐熱性ベースフィルムの一例を示す平面図で
ある。FIG. 2 is a plan view showing an example of a heat-resistant base film.
【図３】 耐熱性ベースフィルムの他の一例を示す平面
図である。FIG. 3 is a plan view showing another example of the heat-resistant base film.
【図４】 有機ＥＬ転写基板の他の一例を示す断面図で
ある。FIG. 4 is a sectional view showing another example of the organic EL transfer substrate.
【図５】 真空蒸着装置の概略図である。FIG. 5 is a schematic view of a vacuum deposition apparatus.
【図６】 有機ＥＬ転写基板の転写方法の一例を示す断
面図である。FIG. 6 is a cross-sectional view illustrating an example of a method for transferring an organic EL transfer substrate.
【図７】 有機ＥＬ素子の一例を示す断面図である。FIG. 7 is a cross-sectional view illustrating an example of an organic EL element.
【図８】 有機ＥＬ転写基板の転写方法の他の例を示す
断面図である。FIG. 8 is a cross-sectional view showing another example of a method for transferring an organic EL transfer substrate.
【図９】 有機ＥＬ転写基板の転写方法の他の例を示す
斜視図である。FIG. 9 is a perspective view showing another example of a method for transferring an organic EL transfer substrate.
【図１０】 有機ＥＬの各画素をアクティブ駆動するた
めのスイッチングトランジスタを備えた透明基板の一例
を示す平面図である。FIG. 10 is a plan view showing an example of a transparent substrate provided with a switching transistor for actively driving each pixel of the organic EL.
１ 有機ＥＬ転写基板 ２ 耐熱性ベースフィルム ３ 発光性有機化合物 ５ 耐熱性ベースフィルム ６ 高熱伝導部 ７ 低熱伝導部 ８ 耐熱性ベースフィルム ９ 発光性有機化合物 １０ 有機ＥＬ転写基板 １１ 真空蒸着装置 １２ 抵抗加熱ボート １３ 蒸着源 ２１ 透明基板 ２２ ＩＴＯ ２３ 発光性有機化合物 ２４ 耐熱性ベースフィルム ２５ 有機ＥＬ転写基板 ２６ 正孔輸送層（αーＮＰＤ層） ２７ ヒートバー ２８ 発光性有機化合物 ２９ 電子輸送層 ３０ マグネシウムと銀の混合金属 ６０ ゲートライン ６１ データライン ６２ トランジスタ ６３ コンデンサ ６４ トランジスタ ６５ 有機ＥＬ ６６ 陰極 ６７ グランドライン ６８ 電源ライン REFERENCE SIGNS LIST 1 organic EL transfer substrate 2 heat-resistant base film 3 light-emitting organic compound 5 heat-resistant base film 6 high heat conductive part 7 low heat conductive part 8 heat-resistant base film 9 light-emitting organic compound 10 organic EL transfer substrate 11 vacuum evaporation device 12 resistance heating Boat 13 evaporation source 21 transparent substrate 22 ITO 23 luminescent organic compound 24 heat-resistant base film 25 organic EL transfer substrate 26 hole transport layer (α-NPD layer) 27 heat bar 28 luminescent organic compound 29 electron transport layer 30 magnesium and silver Mixed metal 60 Gate line 61 Data line 62 Transistor 63 Capacitor 64 Transistor 65 Organic EL 66 Cathode 67 Ground line 68 Power supply line
Claims (6)
された耐熱性ベースフィルムの少なくとも一方の面に、
発光性有機化合物を成膜したことを特徴とする有機ＥＬ
転写基板。At least one surface of a heat-resistant base film composed of a low heat conductive member and a high heat conductive member,
Organic EL characterized by forming a luminescent organic compound into a film
Transfer substrate.
成形された低熱伝導部材と格子内部に配設された高熱伝
導部材とから構成されていることを特徴とする請求項１
記載の有機ＥＬ転写基板。2. The heat-resistant base film comprises a low heat conductive member formed in a lattice shape and a high heat conductive member disposed inside the lattice.
The organic EL transfer substrate as described in the above.
形された低熱伝導部材と高熱伝導部材が交互に配設され
て構成されていることを特徴とする請求項１記載の有機
ＥＬ転写基板。3. The organic EL transfer substrate according to claim 1, wherein the heat-resistant base film is formed by alternately arranging low heat conductive members and high heat conductive members formed in a belt shape.
されている耐熱性ベースフィルムの少なくとも一方の面
に、発光性有機化合物を真空蒸着法により付着させるこ
とを特徴とする有機ＥＬ転写基板の製造方法。4. An organic EL transfer substrate comprising a light-emitting organic compound adhered to at least one surface of a heat-resistant base film composed of a low heat conductive member and a high heat conductive member by a vacuum deposition method. Production method.
載の有機ＥＬ転写基板と、少なくとも透明電極を有する
透明基板とを間隔をあけて配置し、前記有機ＥＬ転写基
板を加熱して、前記発光性有機化合物を前記透明基板に
転写することを特徴とする有機ＥＬ素子の製造方法。5. The organic EL transfer substrate according to claim 1, and a transparent substrate having at least a transparent electrode are arranged at an interval, and the organic EL transfer substrate is heated. A method for producing an organic EL device, comprising transferring the luminescent organic compound to the transparent substrate.
の面に発光性有機化合物を成膜した有機ＥＬ転写基板
と、少なくとも透明電極を有する透明基板とを間隔をあ
けて配置し、 前記有機ＥＬ転写基板の前記発光性有機化合物のうち前
記透明基板に転写したい領域のみを加熱して、前記発光
性有機化合物を前記透明基板に転写することを特徴とす
る有機ＥＬ素子の製造方法。6. An organic EL transfer substrate having a light-emitting organic compound formed on at least one surface of a heat-resistant base film and a transparent substrate having at least a transparent electrode are arranged at intervals. And heating only the region of the luminescent organic compound to be transferred to the transparent substrate to transfer the luminescent organic compound to the transparent substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17020899A JP3175733B2 (en) | 1998-06-17 | 1999-06-16 | Manufacturing method of organic EL device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17035198 | 1998-06-17 | ||
| JP10-170351 | 1998-06-17 | ||
| JP17020899A JP3175733B2 (en) | 1998-06-17 | 1999-06-16 | Manufacturing method of organic EL device |
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| Publication Number | Publication Date |
|---|---|
| JP2000077182A true JP2000077182A (en) | 2000-03-14 |
| JP3175733B2 JP3175733B2 (en) | 2001-06-11 |
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| JP17020899A Expired - Fee Related JP3175733B2 (en) | 1998-06-17 | 1999-06-16 | Manufacturing method of organic EL device |
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