JP2000035671A - Polyester film for photoresist - Google Patents
Polyester film for photoresistInfo
- Publication number
- JP2000035671A JP2000035671A JP10203228A JP20322898A JP2000035671A JP 2000035671 A JP2000035671 A JP 2000035671A JP 10203228 A JP10203228 A JP 10203228A JP 20322898 A JP20322898 A JP 20322898A JP 2000035671 A JP2000035671 A JP 2000035671A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- polyester film
- photoresist
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
- B29K2995/0037—Other properties
- B29K2995/0072—Roughness, e.g. anti-slip
Landscapes
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、フォトレジスト用
ポリエステルフイルムに関し、とくに、片面に感光性樹
脂組成物を積層してフォトレジスト用に供される際に基
材フイルムとして用いられる積層ポリエステルフイルム
に関する。The present invention relates to a polyester film for a photoresist, and more particularly to a laminated polyester film used as a base film when a photosensitive resin composition is laminated on one side and used for a photoresist. .
【０００２】[0002]
【従来の技術】フォトレジスト、とくにドライフイルム
フォトレジストにおいては、光透過性の基材フイルムの
片面に感光性樹脂組成物を積層し、その上にポリエチレ
ン等からなるカバーフイルムを設けたものが用いられ
る。フォトレジストに際しては、先ずカバーフイルムが
除去され、露出された感光性樹脂組成物面が、プリント
配線板作製用基体等の対象物上に貼着される。この状態
で、基材フイルム上にネガフイルムを密着させ、該ネガ
フイルム側から基材フイルムを透過させるように紫外線
等の活性光線を照射し、感光性樹脂組成物を所定のパタ
ーンに露光させる。露光後に、ネガフイルムを除去する
とともに、基材フイルムを剥離除去し、感光性樹脂組成
物の硬化していない未露光部分を溶剤等によって除去す
ることにより、基体上に目標とするパターンが形成され
る。2. Description of the Related Art Photoresists, especially dry film photoresists, are used in which a photosensitive resin composition is laminated on one side of a light-transmitting base film and a cover film made of polyethylene or the like is provided thereon. Can be At the time of photoresist, first, the cover film is removed, and the exposed surface of the photosensitive resin composition is adhered to an object such as a substrate for producing a printed wiring board. In this state, the negative film is brought into close contact with the substrate film, and the photosensitive resin composition is exposed to a predetermined pattern by irradiating an actinic ray such as ultraviolet light from the negative film side so as to transmit the substrate film. After exposure, the negative film is removed, the base film is peeled off, and the unexposed portions of the photosensitive resin composition that have not been cured are removed with a solvent or the like, whereby a target pattern is formed on the base. You.
【０００３】このようなドライフォトレジストにおいて
は、近年、プリント配線板の回路の微細化等により、益
々高解像度化が求められている。また、光透過性の基材
フイルムには、露光の際の上記高解像度化を達成するた
めに、必要な自己形態保持性をもたせつつ、極力薄膜化
することが求められている。しかし薄膜化すると、基材
フイルムを剥離する際に、フイルム破れを生じやすくな
るという問題がある。フイルムの強度を上げるために
は、通常、延伸フイルムの配向度を高めることが有効で
あるが、この用途の場合には、上記剥離の際に厚さ方向
に力が作用するので、配向度を高めすぎると、とくに厚
さ方向の配向度を低くしすぎると劈開しやすくなる。逆
に配向度、とくに厚さ方向の配向度を高くしすぎると、
フイルム自身が伸びやすくなり、フイルムの伸びにより
フイルム剥離の際にフイルムがきれいに剥がれないとい
う不都合を招く。In recent years, such a dry photoresist has been required to have higher and higher resolution due to miniaturization of a circuit of a printed wiring board. Further, in order to achieve the above-mentioned high resolution upon exposure, it is required that the light-transmitting substrate film be as thin as possible while having the necessary self-retaining property. However, when the film is made thin, there is a problem that the film is easily broken when the base film is peeled off. In order to increase the strength of the film, it is usually effective to increase the degree of orientation of the stretched film. However, in the case of this application, a force acts in the thickness direction at the time of peeling, and thus the degree of orientation is reduced. If it is too high, cleavage becomes easy especially if the degree of orientation in the thickness direction is too low. Conversely, if the degree of orientation, especially in the thickness direction, is too high,
The film itself is easily stretched, and the stretching of the film causes a disadvantage that the film is not peeled off cleanly when the film is peeled.
【０００４】一方、基材フイルム製造面からみると、製
膜性はもちろんのこと、フイルム製造メーカーから出荷
される際の形態である巻取ロールに巻き取る際の巻き性
が重要になる。巻き性に劣ると、フイルムにしわが発生
したりし、フォトレジスト用基材フイルムとしては致命
的な欠陥となる。[0004] On the other hand, from the viewpoint of the production of the base film, not only the film forming property but also the winding property when winding the film on a winding roll, which is a form when shipped from a film manufacturer, is important. Inferior curl properties may cause wrinkles in the film, which is a fatal defect for a photoresist base film.
【０００５】[0005]
【発明が解決しようとする課題】そこで本発明の課題
は、上記のようなフォトレジスト用基材フイルムに関す
る問題点に着目し、フォトレジストに必要な透光性を確
保しつつ、フォトレジストにおける解像度に優れ、基材
フイルム剥離の際の伸びや劈開等のトラブルを防止で
き、しかも基材フイルム自身の巻き性の良好なフォトレ
ジスト用ポリエステルフイルムを提供することにある。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to focus on the above-mentioned problems relating to the photoresist base film and to improve the resolution in the photoresist while ensuring the necessary light transmittance of the photoresist. It is an object of the present invention to provide a polyester film for a photoresist which can prevent troubles such as elongation and cleavage at the time of peeling the base film and has good winding property of the base film itself.
【０００６】[0006]
【課題を解決するための手段】上記課題を解決するため
に、本発明のフォトレジスト用ポリエステルフイルム
は、ポリエステルからなるＡ層、Ｂ層、Ｃ層を有する共
押出法により複合製膜された積層ポリエステルフイルム
からなり、積層ポリエステルフイルムのヘイズが０．０
５％以上１０％以下であり、Ａ層の表面粗さをＡＲａ、
Ｃ層の表面粗さをＣＲａとするとき、 ０．００５μｍ≦ＡＲａ≦０．０５μｍ ０．００５μｍ≦ＣＲａ≦０．０５μｍ を満足し、かつ、該積層ポリエステルフイルムの厚さ方
向の屈折率が１．４９０以上１．５０５以下であること
を特徴とするものからなる。In order to solve the above-mentioned problems, a polyester film for a photoresist according to the present invention comprises a composite film formed by a coextrusion method having an A layer, a B layer and a C layer made of polyester. Made of polyester film, the haze of the laminated polyester film is 0.0
5% or more and 10% or less, and the surface roughness of the A layer is ARa,
When the surface roughness of the C layer is defined as CRa, 0.005 μm ≦ ARa ≦ 0.05 μm 0.005 μm ≦ CRa ≦ 0.05 μm, and the refractive index in the thickness direction of the laminated polyester film is 1. 490 or more and 1.505 or less.
【０００７】このフォトレジスト用ポリエステルフイル
ムにおいては、さらに、ＡＲａ≦ＣＲａを満足すること
が好ましい。In the polyester film for a photoresist, it is preferable that ARa ≦ CRa is further satisfied.
【０００８】[0008]
【発明の実施の形態】以下に、本発明について、望まし
い実施の形態とともに詳細に説明する。本発明に係るフ
ォトレジスト用ポリエステルフイルムは、ポリエステル
からなるＡ層、Ｂ層、Ｃ層を有する、少なくとも３層
の、共押出法により複合製膜された積層ポリエステルフ
イルムからなる。このように３層構成とすることによ
り、Ａ層表面（Ａ面）とＣ層表面（Ｃ面）とをそれぞれ
最適な表面粗さに制御しつつ、内層のＢ層は透明性の高
い層として、積層フイルム全体としての透光性を容易に
確保できる。したがって、Ｂ層に対しＡ層、Ｃ層は薄い
層でよく、たとえば、Ａ層とＣ層の厚みの合計がＢ層の
厚みよりも小さく構成することが好ましい。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail with preferred embodiments. The polyester film for a photoresist according to the present invention comprises a laminated polyester film having at least three layers having a layer A, a layer B, and a layer C made of polyester and formed into a composite film by a coextrusion method. With the three-layer structure, the surface of layer A (surface A) and the surface of layer C (surface C) are each controlled to an optimum surface roughness, and the inner layer B is formed as a highly transparent layer. Thus, the light transmittance of the entire laminated film can be easily ensured. Therefore, the layers A and C may be thinner than the layer B. For example, it is preferable that the total thickness of the layers A and C is smaller than the thickness of the layer B.
【０００９】Ａ層、Ｂ層、Ｃ層を構成するポリエステル
は、同一のものであってもよく、異種のポリエステルで
あってもよい。本発明に使用される二軸配向ポリエステ
ルフイルムを構成するポリエステルには、酸成分とし
て、テレフタル酸、イソフタル酸、フタル酸、ナフタレ
ンジカルボン酸等の芳香族ジカルボン酸、アジピン酸、
アゼライン酸、セバシン酸、デカンジカルボン酸等の脂
肪族ジカルボン酸、シクロヘキサンジカルボン酸等の脂
環族ジカルボン酸を用いることができ、アルコール成分
として、エチレングリコール、ジエチレングリコール、
ブタンジオール、ヘキサンジオール等の脂肪族ジオー
ル、シクロヘキサンジメタノール等の脂環族ジオールを
用いることができる。The polyester constituting the layers A, B and C may be the same or different. Polyester constituting the biaxially oriented polyester film used in the present invention, as an acid component, terephthalic acid, isophthalic acid, phthalic acid, aromatic dicarboxylic acids such as naphthalenedicarboxylic acid, adipic acid,
Azelaic acid, sebacic acid, aliphatic dicarboxylic acids such as decanedicarboxylic acid, and alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid can be used.As the alcohol component, ethylene glycol, diethylene glycol,
Aliphatic diols such as butanediol and hexanediol and alicyclic diols such as cyclohexanedimethanol can be used.
【００１０】また、このポリエステルの中に公知の添加
剤、たとえば、耐熱安定剤、耐酸化安定剤、耐候安定
剤、紫外線吸収剤、有機の易滑剤、顔料、染料、充填
剤、帯電防止剤、核剤等を配合してもよい。上述したよ
うなポリエステルの極限粘度（２５℃オルソクロロフェ
ノール中で測定）は、０．４０〜１．２０が好ましく、
より好ましくは０．５０〜０．８０、さらに好ましくは
０．５５〜０．７５ｄｌ／ｇの範囲である。In the polyester, known additives such as a heat stabilizer, an oxidation stabilizer, a weather stabilizer, an ultraviolet absorber, an organic lubricant, a pigment, a dye, a filler, an antistatic agent, A nucleating agent may be blended. The limiting viscosity (measured in orthochlorophenol at 25 ° C.) of the polyester as described above is preferably 0.40 to 1.20,
The range is more preferably 0.50 to 0.80, and even more preferably 0.55 to 0.75 dl / g.
【００１１】本発明に使用される二軸配向ポリエステル
フイルムに含有される粒子としては、各種核剤により重
合時に生成した粒子、凝集体、二酸化珪素粒子、炭酸カ
ルシウム粒子、アルミナ粒子、酸化チタン粒子、硫酸バ
リウム粒子などの無機粒子を、また、架橋ポリスチレン
粒子、アクリル粒子、イミド粒子のような有機粒子を、
あるいは、それらの混合体をその代表例として挙げるこ
とができる。The particles contained in the biaxially oriented polyester film used in the present invention include particles, aggregates, silicon dioxide particles, calcium carbonate particles, alumina particles, titanium oxide particles, particles formed during polymerization by various nucleating agents. Inorganic particles such as barium sulfate particles, and organic particles such as cross-linked polystyrene particles, acrylic particles, and imide particles,
Alternatively, a mixture thereof can be mentioned as a typical example.
【００１２】使用される粒子の径はとくに限定されない
が、通常は、沈降法あるいは光散乱法により測定した平
均粒径が０．０５〜８．０μｍ、好ましくは０．１〜
４．０μｍのものをその代表として挙げることができ
る。The diameter of the particles used is not particularly limited, but usually, the average particle diameter measured by the sedimentation method or the light scattering method is 0.05 to 8.0 μm, preferably 0.1 to 8.0 μm.
One having a thickness of 4.0 μm can be mentioned as a typical example.
【００１３】本発明に係る積層ポリエステルフイルムに
おけるＡ層、Ｂ層、Ｃ層の積層は、ラミネート法等でも
可能ではあるが、フォトレジスト用途での劈開等を防止
するためには、シート状に溶融押出する前に、つまり共
押出によって積層することが必要である。The layer A, the layer B and the layer C in the laminated polyester film according to the present invention can be laminated by a lamination method or the like. However, in order to prevent cleavage or the like in a photoresist application, the laminated polyester film is melted into a sheet. It is necessary to laminate before extrusion, ie by coextrusion.
【００１４】また、本発明に係る積層ポリエステルフイ
ルムのヘイズは、フォトレジスト用に必要な透光性を確
保する点から、０．０５％以上１０％以下である必要が
ある。０．０５％未満のヘイズのフイルムは実用上製膜
が非常に困難になり、また、後述の粒子の含有を考える
と、ヘイズ０．０５％未満の達成は困難である。また、
ヘイズが１０％を越えると、フォトレジスト用としての
透光性が不足し、露光が不完全となって高い解像度が得
られない。Further, the haze of the laminated polyester film according to the present invention needs to be 0.05% or more and 10% or less from the viewpoint of securing the light transmittance required for a photoresist. Films with a haze of less than 0.05% make practically very difficult to form a film, and considering the content of particles described below, it is difficult to achieve a haze of less than 0.05%. Also,
If the haze exceeds 10%, the light transmittance for photoresist is insufficient, and the exposure is incomplete, so that high resolution cannot be obtained.
【００１５】また、本発明に係る積層ポリエステルフイ
ルムにおいては、Ａ層の表面粗さをＡＲａ、Ｃ層の表面
粗さをＣＲａとするとき、 ０．００５μｍ≦ＡＲａ≦０．０５μｍ ０．００５μｍ≦ＣＲａ≦０．０５μｍ を満足する必要がある。この範囲を下回ると、フイルム
自身としての良好な巻き性が得られなくなり、しわ等の
発生するおそれがある。また、この範囲を上回ると、所
望のヘイズを得にくくなる。つまり、表面粗さを大きく
するには、一般に表層に含有する粒子の量を多くする
が、そうするとヘイズが１０％を越え、結果的に前述の
ヘイズ１０％以下の達成が困難となる。In the laminated polyester film according to the present invention, when the surface roughness of the A layer is ARa and the surface roughness of the C layer is CRa, 0.005 μm ≦ ARa ≦ 0.05 μm 0.005 μm ≦ CRa It is necessary to satisfy ≦ 0.05 μm. Below this range, good winding properties of the film itself cannot be obtained, and wrinkles and the like may occur. On the other hand, if it exceeds this range, it becomes difficult to obtain a desired haze. In other words, in order to increase the surface roughness, the amount of particles contained in the surface layer is generally increased. However, in this case, the haze exceeds 10%, and as a result, it is difficult to achieve the haze of 10% or less.
【００１６】この表面粗さに関して、Ａ面側を感光性樹
脂組成物積層側とすると、さらに、 ＡＲａ≦ＣＲａ を満足することが好ましい。これは、Ａ面側において
は、感光性樹脂組成物との密着性を向上するとともに、
Ｃ面側においては滑り性を向上して良好な巻き性を確保
するためである。With respect to the surface roughness, when the surface A is defined as the photosensitive resin composition laminated side, it is preferable that ARa ≦ CRa is further satisfied. This improves the adhesion to the photosensitive resin composition on the A side,
This is for improving the slipperiness on the C-plane side and ensuring good winding properties.
【００１７】上記のように、Ａ面、Ｃ面ともに望ましい
表面粗さとするためには、Ａ層およびＣ層にそれぞれ粒
子を含有させることが好ましい。粒子の粒径や含有量を
適切に制御することにより各面の表面粗さを所望の値に
制御することが可能になる。As described above, in order to obtain a desired surface roughness on both the A and C surfaces, it is preferable that the A layer and the C layer contain particles, respectively. By appropriately controlling the particle size and content of the particles, the surface roughness of each surface can be controlled to a desired value.
【００１８】さらに本発明に係る積層ポリエステルフイ
ルムにおいては、厚さ方向の屈折率が１．４９０以上
１．５０５以下である必要がある。この屈折率は、ドラ
イフイルムフォトレジストフイルムの露光後の基材フイ
ルムの剥離性の指標になるものであり、屈折率が１．４
９０未満であると、フォトレジスト用基材フイルムとし
てそれを剥離する際に劈開しやすくなる。一方屈折率が
１．５０５を越えると、剥離の際にフイルムが伸びを生
じ剥離不良になりやすくなる。Further, in the laminated polyester film according to the present invention, the refractive index in the thickness direction must be 1.490 or more and 1.505 or less. This refractive index is an index of the releasability of the base film after exposure of the dry film photoresist film, and the refractive index is 1.4.
If it is less than 90, it becomes easy to cleave when peeling it as a photoresist base film. On the other hand, when the refractive index exceeds 1.505, the film is elongated at the time of peeling, and the peeling is likely to be defective.
【００１９】[0019]
【実施例】以下に、本発明の具体的な実施例について説
明する。まず、本発明の規定や説明に用いた各特性の測
定方法について説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific embodiments of the present invention will be described below. First, a description will be given of a method of measuring each characteristic used for defining and explaining the present invention.
【００２０】（１）表面粗さ ＪＩＳ−Ｂ−０６０１に準じて中心線平均粗さＲａを測
定した。(1) Surface roughness The center line average roughness Ra was measured according to JIS-B-0601.
【００２１】（２）ヘイズ ＪＩＳ−Ｋ−７１０５に準じてフイルムのヘイズを測定
した。(2) Haze The haze of the film was measured according to JIS-K-7105.
【００２２】（３）屈折率 ＪＩＳ−Ｋ−７１０５に準じてフイルムの厚さ方向の屈
折率を測定した。(3) Refractive index The refractive index in the thickness direction of the film was measured according to JIS-K-7105.
【００２３】（４）巻き性 幅１０００ｍｍ、長さ４０００ｍにフイルムをスリット
し、長さ１２００ｍｍ、内径６インチ、肉厚１２ｍｍの
紙コアに巻き取り、巻き状態を観察し、次の基準で判定
した。 しわ等の欠点の無い巻き姿のもの ： ○ しわ等の欠点のあるもの ： ×(4) Winding property The film was slit to a width of 1,000 mm and a length of 4000 m, wound on a paper core having a length of 1200 mm, an inner diameter of 6 inches and a thickness of 12 mm, and the winding state was observed. . Rolls without defects such as wrinkles: ○ Those with defects such as wrinkles: ×
【００２４】（５）伸び 公知の感光性樹脂を厚さ４５μｍに塗布したフイルムを
銅貼り積層板にラミネート後、露光しフイルムを剥がす
際の伸びによる剥離不良を確認し、次の基準で判定し
た。 伸び無し ： ○ 伸び有り ： ×(5) Elongation After laminating a film coated with a known photosensitive resin to a thickness of 45 μm on a copper-clad laminate, the film was exposed to light, and peeling failure due to elongation when the film was peeled was confirmed. . Without growth: ○ With growth: ×
【００２５】（６）劈開 公知の感光性樹脂を厚さ４５μｍに塗布したフイルムを
銅貼り積層板にラミネート後、露光しフイルムを剥がす
際の劈開を確認し、次の基準で判定した。 劈開無し ： ○ 劈開有り ： ×(6) Cleavage After laminating a film coated with a known photosensitive resin to a thickness of 45 μm on a copper-clad laminate, the cleavage at the time of exposing and exfoliating the film was confirmed, and the judgment was made according to the following criteria. Without cleavage: ○ With cleavage: ×
【００２６】（７）解像度 公知の感光性樹脂を厚さ４５μｍに塗布したフイルムを
銅貼り積層板にラミネート後、解像度評価用のネガフイ
ルム（ＳＴＯＵＦＦＥＲ ＧＲＡＰＨＩＣ ＡＲＴＳ
ＥＱＵＩＰＭＥＮＴ社，２１ＳＴＥＰ，ＳＥＮＳＩＴＩ
ＶＩＴＹ ＧＵＩＤＥ，＃Ｔ２１１５）を設けて露光し
フイルムを除去した。次いで３０℃、１．０重量％炭酸
ナトリウム水溶液を用いてスプレー圧１．０ｋｇ／ｃｍ
2 で６０秒間スプレーして未露光部分を除去し、銅貼り
積層板上の光硬化膜のステップタブレットの段数を測定
し、次の基準で判定した。段数が大きい程解像度に優れ
ている。 段数８．０以上 ： 解像度 ○ 段数８．０未満 ： 解像度 ×(7) Resolution A film coated with a known photosensitive resin to a thickness of 45 μm is laminated on a copper-clad laminate, and then a negative film for evaluating resolution (STOUFFER GRAPHIC ARTS) is laminated.
EQUIPMENT, 21 STEP, SENSITI
VITY GUIDE, # T2115) and exposed to remove the film. Then, using a 1.0% by weight aqueous sodium carbonate solution at 30 ° C., a spray pressure of 1.0 kg / cm.
Unexposed portions were removed by spraying for 60 seconds at 2 , and the number of steps of the step tablet of the photocured film on the copper-clad laminate was measured and judged according to the following criteria. The higher the number of steps, the better the resolution. Steps 8.0 or more: resolution ○ Steps less than 8.0: resolution ×
【００２７】実施例１ Ａ層樹脂、Ｃ層樹脂として、固有粘度０．６０のポリエ
チレンテレフタレート（ＰＥＴ）を用い、Ｂ層樹脂とし
て固有粘度０．５８のＰＥＴを用いた。表１に示すよう
に平均粒径１．１μｍの凝集シリカを重合時にＡ層用原
料、Ｃ層用原料に、平均粒径１．０μｍの凝集シリカを
重合時にＢ層用原料のそれぞれ添加し、各原料を水分率
２００ｐｐｍに乾燥した後、２９０℃でＡ層、Ｂ層、Ｃ
層からなる３層積層シート状に押し出し、表面温度が３
０℃にコントロールされた冷却ロール上で急冷、固化さ
せた。この未延伸積層シートを、延伸温度１１５℃、延
伸倍率３．８倍で長手方向に延伸し、続いて延伸温度１
２０℃、延伸倍率３．７倍で幅方向に延伸し、しかる後
に２１５℃で弛緩率５．０％で熱処理して、Ａ層、Ｂ
層、Ｃ層の厚み比Ａ／Ｂ／Ｃが１／１８／１（μｍ）の
総厚さ２０μｍの二軸配向積層ポリエステルフイルムを
得た。Example 1 Polyethylene terephthalate (PET) having an intrinsic viscosity of 0.60 was used as the A-layer resin and the C-layer resin, and PET having an intrinsic viscosity of 0.58 was used as the B-layer resin. As shown in Table 1, the aggregated silica having an average particle size of 1.1 μm was added to the raw material for the A layer and the raw material for the C layer during polymerization, and the aggregated silica having an average particle size of 1.0 μm was added to the raw material for the B layer during polymerization. After drying each raw material to a moisture content of 200 ppm, the layer A, layer B, and C at 290 ° C.
Extruded into a three-layer laminated sheet consisting of
The mixture was quenched and solidified on a cooling roll controlled at 0 ° C. This unstretched laminated sheet is stretched in the longitudinal direction at a stretching temperature of 115 ° C. and a stretching ratio of 3.8 times, and then stretched at a stretching temperature of 1
Stretched in the width direction at 20 ° C. and a draw ratio of 3.7 times, and then heat-treated at 215 ° C. at a relaxation rate of 5.0% to form layer A and layer B.
A biaxially oriented laminated polyester film having a total thickness of 20 μm and a thickness ratio A / B / C of the layer and the C layer of 1/18/1 (μm) was obtained.
【００２８】このフイルムのＡ層、Ｃ層の表面粗さ、ヘ
イズ、厚さ方向の屈折率を測定した。また、上記のフイ
ルムのＡ面に公知の感光性樹脂溶液を塗布し１００℃、
８分間乾燥させ、乾燥後の感光性樹脂の膜厚さを４５μ
ｍとした。このフイルムを９０℃に加熱し、６０℃に加
熱したガラスエポキシ板に銅板を貼ったプリント用基板
にラミネートした。そして、このフイルムに解像度評価
用ネガフイルム（ＳＴＯＵＦＦＥＲ ＧＲＡＰＨＩＣ
ＡＲＴＳ ＥＱＵＩＰＭＥＮＴ社，２１ＳＴＥＰ，ＳＥ
ＮＳＩＴＩＶＩＴＹ ＧＵＩＤＥ，＃Ｔ２１１５）を設
けて高圧水銀灯で１１０ｍＪ／ｃｍ2 の露光を行った。
露光後、基板上のポリエステルフイルムを剥がし、劈
開、伸びの評価を行った。更に、ポリエステルフイルム
を剥離した基板を３０℃１重量％炭酸ナトリウム水溶液
を用いてスプレー圧１．０ｋｇ／ｃｍ2 で６０秒間スプ
レーして未露光部分を除去し、銅貼り積層板上の光硬化
膜のステップタブレットの段数から解像度を測定した。
結果を表１に示す。The surface roughness, haze and refractive index in the thickness direction of the layers A and C of this film were measured. Further, a known photosensitive resin solution is applied to the surface A of the film,
After drying for 8 minutes, the thickness of the photosensitive resin after drying is 45 μm.
m. This film was heated to 90 ° C., and was laminated on a printing substrate in which a copper plate was attached to a glass epoxy plate heated to 60 ° C. Then, a negative evaluation film (STOUFFER GRAPHIC) is added to this film.
ARTS EQUIPMENT, 21 STEP, SE
NSITIVITY GUIDE, # T2115) and exposed at 110 mJ / cm 2 with a high pressure mercury lamp.
After the exposure, the polyester film on the substrate was peeled off, and cleavage and elongation were evaluated. Further, the substrate from which the polyester film was peeled off was sprayed at a spray pressure of 1.0 kg / cm 2 for 60 seconds using a 1% by weight aqueous solution of sodium carbonate at 30 ° C. to remove unexposed portions, and the photocured film on the copper-clad laminate was removed. The resolution was measured from the number of steps of the step tablet.
Table 1 shows the results.
【００２９】実施例２ Ａ層用原料として、実施例１に比べ、粒子の添加量を変
更し、実施例１同様に製膜して各特性を評価した。結果
を表１に示す。Example 2 As a raw material for layer A, a film was formed in the same manner as in Example 1 except that the amount of added particles was changed as compared with Example 1, and each characteristic was evaluated. Table 1 shows the results.
【００３０】実施例３ Ｂ層用原料として、実施例１に比べ、粒子の添加量を変
更し、実施例１同様に製膜して各特性を評価した。結果
を表１に示す。Example 3 As a raw material for layer B, a film was formed in the same manner as in Example 1 except that the amount of added particles was changed as compared with Example 1, and each characteristic was evaluated. Table 1 shows the results.
【００３１】実施例４ Ａ層用原料、Ｂ層用原料として、実施例１に比べ、粒子
の添加量を変更し、実施例１同様に製膜して各特性を評
価した。結果を表１に示す。Example 4 As a raw material for layer A and a raw material for layer B, a film was formed in the same manner as in Example 1 except that the amount of added particles was changed. Table 1 shows the results.
【００３２】実施例５、６ 実施例１に比べ、Ａ層用原料、Ｃ層用原料として、粒子
径、粒子の添加量を、Ｂ層用原料として、粒子の添加量
を変更し、更に厚み比を変更し、実施例１同様に製膜し
て各特性を評価した。結果を表１に示す。Examples 5 and 6 Compared to Example 1, the particle size and the amount of added particles were changed as the raw material for layer A and the raw material for layer C, and the added amount of particles was changed as the raw material for layer B. The ratio was changed, and a film was formed in the same manner as in Example 1 to evaluate each characteristic. Table 1 shows the results.
【００３３】比較例１ 実施例１に比べ、Ａ層用原料、Ｃ層用原料として、粒子
径、粒子の添加量を、Ｂ層用原料として、粒子の添加量
を変更し、更に厚み比を変更し、実施例１同様に製膜し
て各特性を評価した。結果を表２に示す。Comparative Example 1 Compared with Example 1, the particle diameter and the amount of added particles were changed as the raw material for the layer A and the raw material for the layer C, and the added amount of the particles was changed as the raw material for the layer B. The film was formed in the same manner as in Example 1, and each characteristic was evaluated. Table 2 shows the results.
【００３４】比較例２、３ Ａ層用原料、Ｂ層用原料、Ｃ層用原料として、実施例１
に比べ、粒子の添加量を変更し、実施例１同様に製膜し
て各特性を評価した。結果を表２に示す。Comparative Examples 2 and 3 Example 1 was used as a raw material for the A layer, a raw material for the B layer, and a raw material for the C layer.
The film formation was performed in the same manner as in Example 1 except that the amount of added particles was changed, and each characteristic was evaluated. Table 2 shows the results.
【００３５】比較例４ Ａ層用原料、Ｂ層用原料として、実施例１に比べ、粒子
の添加量を変更し、更に延伸倍率を変更して、実施例１
同様に製膜して各特性を評価した。結果を表２に示す。Comparative Example 4 As a raw material for layer A and a raw material for layer B, the amount of added particles was changed and the stretching ratio was further changed as compared with Example 1.
Each film was formed in the same manner, and each characteristic was evaluated. Table 2 shows the results.
【００３６】比較例５ 実施例１に比べ、Ａ層用原料、Ｂ層用原料、Ｃ層用原料
として固有粘度を、Ｂ層用原料として粒子の添加量を変
更し、更に延伸倍率を変更して、実施例１同様に製膜し
て各特性を評価した。結果を表２に示す。Comparative Example 5 Compared with Example 1, the intrinsic viscosity was changed as the raw material for the A layer, the raw material for the B layer, and the raw material for the C layer, the added amount of the particles was changed as the raw material for the B layer, and the stretching ratio was further changed. Then, a film was formed in the same manner as in Example 1, and each characteristic was evaluated. Table 2 shows the results.
【００３７】[0037]
【表１】 [Table 1]
【００３８】[0038]
【表２】 [Table 2]
【００３９】[0039]
【発明の効果】以上説明したように、本発明のフォトレ
ジスト用ポリエステルフイルムによれば、フォトレジス
トの際に基材フイルムといて使用される積層ポリエステ
ルフイルムのヘイズ、両面の表面粗さ、厚さ方向の屈折
率をそれぞれ特定の範囲に規定したので、フォトレジス
トにおける解像度、基材フイルム剥離の際の劈開や伸
び、基材フイルム自身の巻き性の全てに優れたフォトレ
ジスト用ポリエステルフイルムを得ることができる。As described above, according to the polyester film for photoresist of the present invention, the haze, the surface roughness and the thickness of both surfaces of the laminated polyester film used as the base film in the photoresist are used. Since the refractive index in each direction is specified in a specific range, it is necessary to obtain a polyester film for photoresist excellent in all of the resolution in the photoresist, the cleavage and elongation when peeling the base film, and the winding property of the base film itself. Can be.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 松永 篤 岐阜県安八郡神戸町大字安次900番地の１ 東レ株式会社岐阜工場内 Ｆターム(参考） 2H025 AA02 AB11 DA18 DA19 DA21 4F100 AA20A AA20B AA20C AK41A AK41B AK41C AK42A AK42B AK42C BA03 BA07 BA10A BA10C BA16 DE01A DE01C EJ38 GB90 JA20A JA20B JA20C JK08 JK15A JK15C JK16 JL00 JN18 YY00A YY00C ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Atsushi Matsunaga 1-900, Aji, Kobe-cho, Anpachi-gun, Gifu Prefecture F-term (reference) 2F025 AA02 AB11 DA18 DA19 DA21 4F100 AA20A AA20B AA20C AK41A AK41B AK41C AK42A AK42B AK42C BA03 BA07 BA10A BA10C BA16 DE01A DE01C EJ38 GB90 JA20A JA20B JA20C JK08 JK15A JK15C JK16 JL00 JN18 YY00A YY00C
Claims (4)
を有する共押出法により複合製膜された積層ポリエステ
ルフイルムからなり、積層ポリエステルフイルムのヘイ
ズが０．０５％以上１０％以下であり、Ａ層の表面粗さ
をＡＲａ、Ｃ層の表面粗さをＣＲａとするとき、 ０．００５μｍ≦ＡＲａ≦０．０５μｍ ０．００５μｍ≦ＣＲａ≦０．０５μｍ を満足し、かつ、該積層ポリエステルフイルムの厚さ方
向の屈折率が１．４９０以上１．５０５以下であること
を特徴とするフォトレジスト用ポリエステルフイルム。1. A laminated polyester film having a composite film formed by a co-extrusion method having an A layer, a B layer, and a C layer made of polyester, wherein the haze of the laminated polyester film is 0.05% or more and 10% or less, When the surface roughness of the A layer is ARa and the surface roughness of the C layer is CRa, the following conditions are satisfied: 0.005 μm ≦ ARa ≦ 0.05 μm 0.005 μm ≦ CRa ≦ 0.05 μm A polyester film for a photoresist, wherein a refractive index in a thickness direction is from 1.490 to 1.505.
フイルム。2. The polyester film for a photoresist according to claim 1, which further satisfies ARa ≦ CRa.
いる、請求項１または２のフォトレジスト用ポリエステ
ルフイルム。3. The polyester film for a photoresist according to claim 1, wherein at least the layer A and the layer C contain particles.
りも小さい、請求項１ないし３のいずれかに記載のフォ
トレジスト用ポリエステルフイルム。4. The polyester film for a photoresist according to claim 1, wherein the total thickness of the layer A and the layer C is smaller than the thickness of the layer B.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20322898A JP3932074B2 (en) | 1998-07-17 | 1998-07-17 | Polyester film for photoresist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20322898A JP3932074B2 (en) | 1998-07-17 | 1998-07-17 | Polyester film for photoresist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000035671A true JP2000035671A (en) | 2000-02-02 |
| JP3932074B2 JP3932074B2 (en) | 2007-06-20 |
Family
ID=16470581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20322898A Expired - Lifetime JP3932074B2 (en) | 1998-07-17 | 1998-07-17 | Polyester film for photoresist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3932074B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008529080A (en) * | 2005-02-02 | 2008-07-31 | コーロン インダストリーズ，インコーポレイテッド | Positive dry film photoresist and composition for producing the same |
| JP2008255236A (en) * | 2007-04-05 | 2008-10-23 | Mitsubishi Plastics Ind Ltd | Polyester film for optical use |
| KR100870411B1 (en) | 2006-07-19 | 2008-11-26 | 주식회사 코오롱 | Dry-film photoresist |
-
1998
- 1998-07-17 JP JP20322898A patent/JP3932074B2/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008529080A (en) * | 2005-02-02 | 2008-07-31 | コーロン インダストリーズ，インコーポレイテッド | Positive dry film photoresist and composition for producing the same |
| JP4699482B2 (en) * | 2005-02-02 | 2011-06-08 | コーロン インダストリーズ インク | Method for producing positive-type dry film photoresist |
| KR100870411B1 (en) | 2006-07-19 | 2008-11-26 | 주식회사 코오롱 | Dry-film photoresist |
| JP2008255236A (en) * | 2007-04-05 | 2008-10-23 | Mitsubishi Plastics Ind Ltd | Polyester film for optical use |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3932074B2 (en) | 2007-06-20 |
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