ITMI992081A0 - Dispositivo di vaporizzazione - Google Patents

Dispositivo di vaporizzazione

Info

Publication number
ITMI992081A0
ITMI992081A0 IT99MI002081A ITMI992081A ITMI992081A0 IT MI992081 A0 ITMI992081 A0 IT MI992081A0 IT 99MI002081 A IT99MI002081 A IT 99MI002081A IT MI992081 A ITMI992081 A IT MI992081A IT MI992081 A0 ITMI992081 A0 IT MI992081A0
Authority
IT
Italy
Prior art keywords
vaporization device
vaporization
Prior art date
Application number
IT99MI002081A
Other languages
English (en)
Inventor
Gunter Klemm
Klaus Oberle
Jurgen Krischer
Thomas Vogt
Original Assignee
Leybold Systems Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Systems Gmbh filed Critical Leybold Systems Gmbh
Publication of ITMI992081A0 publication Critical patent/ITMI992081A0/it
Publication of ITMI992081A1 publication Critical patent/ITMI992081A1/it
Application granted granted Critical
Publication of IT1313766B1 publication Critical patent/IT1313766B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
IT1999MI002081A 1998-10-20 1999-10-06 Dispositivo di vaporizzazione. IT1313766B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19848177A DE19848177A1 (de) 1998-10-20 1998-10-20 Bedampfungsvorrichtung

Publications (3)

Publication Number Publication Date
ITMI992081A0 true ITMI992081A0 (it) 1999-10-06
ITMI992081A1 ITMI992081A1 (it) 2001-04-06
IT1313766B1 IT1313766B1 (it) 2002-09-17

Family

ID=7884969

Family Applications (1)

Application Number Title Priority Date Filing Date
IT1999MI002081A IT1313766B1 (it) 1998-10-20 1999-10-06 Dispositivo di vaporizzazione.

Country Status (6)

Country Link
JP (1) JP4230068B2 (it)
KR (1) KR100614131B1 (it)
CN (1) CN1240872C (it)
DE (1) DE19848177A1 (it)
GB (1) GB2342929B (it)
IT (1) IT1313766B1 (it)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10128091C1 (de) * 2001-06-11 2002-10-02 Applied Films Gmbh & Co Kg Vorrichtung für die Beschichtung eines flächigen Substrats
DE10330401B3 (de) * 2003-07-04 2005-02-24 Applied Films Gmbh & Co. Kg Verfahren und Vorrichtung zum bereichsweisen Auftragen von Trennmitteln
CN100412226C (zh) * 2004-10-18 2008-08-20 中华映管股份有限公司 等离子体显示器之前基板的制造方法、蒸镀工艺与蒸镀装置
CN100491584C (zh) * 2005-09-22 2009-05-27 中国科学院半导体研究所 不同折射率膜层的制备方法
ATE520799T1 (de) * 2005-10-26 2011-09-15 Applied Materials Gmbh & Co Kg Vorrichtung zum bedampfen von substraten
EP1788113B1 (de) * 2005-10-26 2011-05-11 Applied Materials GmbH & Co. KG Verdampfervorrichtung mit einem Behälter für die Aufnahme von zu verdampfendem Material
DE102008026001B4 (de) * 2007-09-04 2012-02-16 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Erzeugung und Bearbeitung von Schichten auf Substraten unter definierter Prozessatmosphäre und Heizelement
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
CN102712993A (zh) * 2009-11-30 2012-10-03 维易科精密仪器国际贸易(上海)有限公司 直线淀积源
FR2956412B1 (fr) * 2010-02-16 2012-04-06 Astron Fiamm Safety Vanne d'obturation a volume constant d'une source de depot en phase vapeur
TWI600470B (zh) * 2016-05-19 2017-10-01 康廷 熊 鍍膜裝置及方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3922187A1 (de) * 1989-07-06 1991-01-17 Leybold Ag Vorrichtung zum herstellen von metallfreien streifen bei im vakuum beschichteten folienbahnen, insbesondere fuer kondensatoren
DE4309717C2 (de) * 1993-03-25 2002-03-28 Unaxis Deutschland Holding Verfahren zum Aufdampfen einer Schicht
US5863336A (en) * 1996-04-08 1999-01-26 General Electric Company Apparatus for fabrication of superconductor

Also Published As

Publication number Publication date
CN1240872C (zh) 2006-02-08
DE19848177A1 (de) 2000-04-27
IT1313766B1 (it) 2002-09-17
CN1251866A (zh) 2000-05-03
JP4230068B2 (ja) 2009-02-25
GB2342929A (en) 2000-04-26
KR100614131B1 (ko) 2006-08-22
JP2000129429A (ja) 2000-05-09
GB2342929B (en) 2003-05-21
GB9924608D0 (en) 1999-12-22
KR20000028990A (ko) 2000-05-25
ITMI992081A1 (it) 2001-04-06

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