IT1316312B1 - Dispositivo di vaporizzazione - Google Patents

Dispositivo di vaporizzazione

Info

Publication number
IT1316312B1
IT1316312B1 IT2000MI000119A ITMI20000119A IT1316312B1 IT 1316312 B1 IT1316312 B1 IT 1316312B1 IT 2000MI000119 A IT2000MI000119 A IT 2000MI000119A IT MI20000119 A ITMI20000119 A IT MI20000119A IT 1316312 B1 IT1316312 B1 IT 1316312B1
Authority
IT
Italy
Prior art keywords
vaporization device
vaporization
Prior art date
Application number
IT2000MI000119A
Other languages
English (en)
Inventor
Gunter Klemm
Hans Neudert
Original Assignee
Leybold Systems Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Publication of ITMI20000119A0 publication Critical patent/ITMI20000119A0/it
Application filed by Leybold Systems Gmbh filed Critical Leybold Systems Gmbh
Publication of ITMI20000119A1 publication Critical patent/ITMI20000119A1/it
Application granted granted Critical
Publication of IT1316312B1 publication Critical patent/IT1316312B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Chemical Vapour Deposition (AREA)
  • Sampling And Sample Adjustment (AREA)
IT2000MI000119A 1999-02-18 2000-03-02 Dispositivo di vaporizzazione IT1316312B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19906676A DE19906676A1 (de) 1999-02-18 1999-02-18 Bedampfungsvorrichtung

Publications (3)

Publication Number Publication Date
ITMI20000119A0 ITMI20000119A0 (it) 2000-01-28
ITMI20000119A1 ITMI20000119A1 (it) 2001-07-28
IT1316312B1 true IT1316312B1 (it) 2003-04-10

Family

ID=7897824

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000MI000119A IT1316312B1 (it) 1999-02-18 2000-03-02 Dispositivo di vaporizzazione

Country Status (7)

Country Link
US (1) US6309466B1 (it)
JP (1) JP2000243672A (it)
KR (1) KR20000057777A (it)
CN (1) CN1265431A (it)
DE (1) DE19906676A1 (it)
GB (1) GB2346897A (it)
IT (1) IT1316312B1 (it)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070137568A1 (en) * 2005-12-16 2007-06-21 Schreiber Brian E Reciprocating aperture mask system and method
US7763114B2 (en) 2005-12-28 2010-07-27 3M Innovative Properties Company Rotatable aperture mask assembly and deposition system
US20080011225A1 (en) * 2006-07-11 2008-01-17 Mcclure Donald J Apparatus and methods for continuously depositing a pattern of material onto a substrate
DE102011107894A1 (de) * 2011-07-18 2013-01-24 Creaphys Gmbh Beschichtungseinrichtung, insbesondere für die Innenbeschichtung von Hohlkörpern, und Beschichtungsverfahren
CN106801215B (zh) * 2017-02-09 2020-06-16 张家港康得新光电材料有限公司 掩膜组件

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4681780A (en) 1983-12-01 1987-07-21 Polaroid Corporation Continuously cleaned rotary coating mask
DE3484793D1 (de) * 1983-12-19 1991-08-14 Spectrum Control Inc Miniaturisierter monolithischer mehrschichtkondensator sowie geraet und verfahren zur herstellung.
DE69030140T2 (de) * 1989-06-28 1997-09-04 Canon Kk Verfahren und Anordnung zur kontinuierlichen Bildung einer durch Mikrowellen-Plasma-CVD niedergeschlagenen grossflächigen Dünnschicht
EP0488535A3 (en) 1990-11-08 1992-09-23 Bmc Technology Corporation Method and apparatus for manufacturing electrodes for multilayer ceramic capacitors
DE4311581A1 (de) 1993-03-27 1994-12-08 Leybold Ag Verfahren und Vorrichtung zur Erzeugung von Muster auf Substraten
DE4310085A1 (de) 1993-03-27 1994-09-29 Leybold Ag Verfahren und Vorrichtung zur Erzeugung von Mustern auf Substraten
GB9323034D0 (en) 1993-11-09 1994-01-05 Gen Vacuum Equip Ltd Vacuum web coating
DE19527604A1 (de) * 1995-07-28 1997-01-30 Leybold Ag Verfahren und Vorrichtung zur Herstellung von metallfreien Streifen bei der Metallbedampfung
DE19734477B4 (de) * 1996-08-09 2005-11-03 Matsushita Electric Industrial Co., Ltd., Kadoma Metallisierter Filmkondensator und Vorrichtung und Verfahren für die Herstellung eines metallisierten Films für den metallisierten Filmkondensator
US6210487B1 (en) * 1999-08-26 2001-04-03 Lucent Technologies Inc. Disposable seal system with integral buffer

Also Published As

Publication number Publication date
CN1265431A (zh) 2000-09-06
JP2000243672A (ja) 2000-09-08
GB0003899D0 (en) 2000-04-05
ITMI20000119A0 (it) 2000-01-28
ITMI20000119A1 (it) 2001-07-28
DE19906676A1 (de) 2000-08-24
US6309466B1 (en) 2001-10-30
GB2346897A (en) 2000-08-23
KR20000057777A (ko) 2000-09-25

Similar Documents

Publication Publication Date Title
DE60024818D1 (de) Strammvorrichtung
DE60031034D1 (de) Zielgerät
DE60045761D1 (de) Elektronenstrahlgerät
DE60036810D1 (de) Kälteeinrichtung
IT1318784B1 (it) Dispositivo di avviamento
DE60042024D1 (de) Haltevorrichtung
DE69943203D1 (de) Elektronenstrahlvorrichtung
DE60044188D1 (de) Symmetriereinrichtung
DE69930865D1 (de) Navigationsvorrichtung
DE60030106D1 (de) Kältevorrichtung
DE60003425D1 (de) Bohrlochvorrichtung
ITMI992081A0 (it) Dispositivo di vaporizzazione
DE50002096D1 (de) Rücknahmevorrichtung
DE60025250D1 (de) Kältevorrichtung
DE60032992D1 (de) Schwingende Einrichtung
DE50011399D1 (de) Stützvorrichtung
DE60032748D1 (de) Kältevorrichtung
DE50011302D1 (de) Stützvorrichtung
ATE244992T1 (de) Sprühvorrichtung
IT1316312B1 (it) Dispositivo di vaporizzazione
DE50012319D1 (de) Navigationsgerät
DK1181604T3 (da) Fordelerindretning
DE19924209B4 (de) Steckvorrichtung
DE60000538D1 (de) Stauchvorrichtung
ATA662000A (de) Montagevorrichtung