ITMI20020306A0 - Suscettore dotato di rientranze e reattore epitassiale che utilizza lo stesso - Google Patents
Suscettore dotato di rientranze e reattore epitassiale che utilizza lo stessoInfo
- Publication number
- ITMI20020306A0 ITMI20020306A0 IT2002MI000306A ITMI20020306A ITMI20020306A0 IT MI20020306 A0 ITMI20020306 A0 IT MI20020306A0 IT 2002MI000306 A IT2002MI000306 A IT 2002MI000306A IT MI20020306 A ITMI20020306 A IT MI20020306A IT MI20020306 A0 ITMI20020306 A0 IT MI20020306A0
- Authority
- IT
- Italy
- Prior art keywords
- retentations
- same
- epitaxial reactor
- susceptor
- susceptor equipped
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2002MI000306A ITMI20020306A1 (it) | 2002-02-15 | 2002-02-15 | Suscettore dotato di rientranze e reattore epitassiale che utilizza lo stesso |
AU2003208826A AU2003208826A1 (en) | 2002-02-15 | 2003-02-10 | A susceptor provided with indentations and an epitaxial reactor which uses the same |
PCT/EP2003/001305 WO2003069029A1 (en) | 2002-02-15 | 2003-02-10 | A susceptor provided with indentations and an epitaxial reactor which uses the same |
EP03706472A EP1476591A2 (en) | 2002-02-15 | 2003-02-10 | A susceptor provided with indentations and an epitaxial reactor which uses the same |
US10/916,780 US20050051099A1 (en) | 2002-02-15 | 2004-08-12 | Susceptor provided with indentations and an epitaxial reactor which uses the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2002MI000306A ITMI20020306A1 (it) | 2002-02-15 | 2002-02-15 | Suscettore dotato di rientranze e reattore epitassiale che utilizza lo stesso |
Publications (2)
Publication Number | Publication Date |
---|---|
ITMI20020306A0 true ITMI20020306A0 (it) | 2002-02-15 |
ITMI20020306A1 ITMI20020306A1 (it) | 2003-08-18 |
Family
ID=11449263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT2002MI000306A ITMI20020306A1 (it) | 2002-02-15 | 2002-02-15 | Suscettore dotato di rientranze e reattore epitassiale che utilizza lo stesso |
Country Status (5)
Country | Link |
---|---|
US (1) | US20050051099A1 (it) |
EP (1) | EP1476591A2 (it) |
AU (1) | AU2003208826A1 (it) |
IT (1) | ITMI20020306A1 (it) |
WO (1) | WO2003069029A1 (it) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1570108B1 (en) | 2002-12-10 | 2009-02-18 | E.T.C. Epitaxial Technology Center SRL | Susceptor system |
CN100507073C (zh) | 2002-12-10 | 2009-07-01 | Etc外延技术中心有限公司 | 感受器*** |
DE10261362B8 (de) * | 2002-12-30 | 2008-08-28 | Osram Opto Semiconductors Gmbh | Substrat-Halter |
DE602004031741D1 (de) * | 2004-06-09 | 2011-04-21 | E T C Epitaxial Technology Ct Srl | Halterungssystem für behandlungsapparaturen |
US20060073276A1 (en) * | 2004-10-04 | 2006-04-06 | Eric Antonissen | Multi-zone atomic layer deposition apparatus and method |
US20100055318A1 (en) * | 2008-08-29 | 2010-03-04 | Veeco Instruments Inc. | Wafer carrier with varying thermal resistance |
WO2011044412A1 (en) * | 2009-10-09 | 2011-04-14 | Cree, Inc. | Multi-rotation epitaxial growth apparatus and reactors incorporating same |
US9570328B2 (en) | 2010-06-30 | 2017-02-14 | Applied Materials, Inc. | Substrate support for use with multi-zonal heating sources |
NL2006146C2 (en) * | 2011-02-04 | 2012-08-07 | Xycarb Ceramics B V | A method of processing substrate holder material as well as a substrate holder processed by such a method. |
JP5477314B2 (ja) * | 2011-03-04 | 2014-04-23 | 信越半導体株式会社 | サセプタ及びこれを用いたエピタキシャルウェーハの製造方法 |
DE102011088147A1 (de) | 2011-12-09 | 2013-06-13 | Evonik Industries Ag | Verbundkörper, umfassend ein Verbundmaterial |
US10316412B2 (en) | 2012-04-18 | 2019-06-11 | Veeco Instruments Inc. | Wafter carrier for chemical vapor deposition systems |
US10167571B2 (en) | 2013-03-15 | 2019-01-01 | Veeco Instruments Inc. | Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems |
JP6189164B2 (ja) * | 2013-09-30 | 2017-08-30 | 住友電工デバイス・イノベーション株式会社 | 成長装置 |
TWI650832B (zh) | 2013-12-26 | 2019-02-11 | 維克儀器公司 | 用於化學氣相沉積系統之具有隔熱蓋的晶圓載具 |
DE102014109327A1 (de) * | 2014-07-03 | 2016-01-07 | Aixtron Se | Beschichtetes flaches scheibenförmiges Bauteil in einem CVD-Reaktor |
JP6735549B2 (ja) * | 2015-11-04 | 2020-08-05 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及びリング状部材 |
CN110520553A (zh) * | 2017-02-28 | 2019-11-29 | 西格里碳素欧洲公司 | 基板-载体结构 |
DE102017105947A1 (de) | 2017-03-20 | 2018-09-20 | Aixtron Se | Suszeptor für einen CVD-Reaktor |
JP7018744B2 (ja) * | 2017-11-24 | 2022-02-14 | 昭和電工株式会社 | SiCエピタキシャル成長装置 |
USD860146S1 (en) | 2017-11-30 | 2019-09-17 | Veeco Instruments Inc. | Wafer carrier with a 33-pocket configuration |
USD866491S1 (en) | 2018-03-26 | 2019-11-12 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD854506S1 (en) | 2018-03-26 | 2019-07-23 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD863239S1 (en) | 2018-03-26 | 2019-10-15 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD858469S1 (en) | 2018-03-26 | 2019-09-03 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD860147S1 (en) | 2018-03-26 | 2019-09-17 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
DE102020120449A1 (de) * | 2020-08-03 | 2022-02-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Wafer-carrier und system für eine epitaxievorrichtung |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1924997A1 (de) * | 1969-05-16 | 1970-11-19 | Siemens Ag | Vorrichtung zum epitaktischen Abscheiden von Halbleitermaterial |
US4579080A (en) * | 1983-12-09 | 1986-04-01 | Applied Materials, Inc. | Induction heated reactor system for chemical vapor deposition |
IT1215444B (it) * | 1987-04-24 | 1990-02-14 | L P E S P A | Perfezionamenti ad induttori e suscettori impiegabili in reattori epitassiali. |
US4858557A (en) * | 1984-07-19 | 1989-08-22 | L.P.E. Spa | Epitaxial reactors |
JPH0677140A (ja) * | 1992-05-14 | 1994-03-18 | Mitsubishi Electric Corp | 気相結晶成長装置 |
IT1271233B (it) * | 1994-09-30 | 1997-05-27 | Lpe | Reattore epitassiale munito di suscettore discoidale piano ed avente flusso di gas parallelo ai substrati |
US6001183A (en) * | 1996-06-10 | 1999-12-14 | Emcore Corporation | Wafer carriers for epitaxial growth processes |
US6217662B1 (en) * | 1997-03-24 | 2001-04-17 | Cree, Inc. | Susceptor designs for silicon carbide thin films |
JP2001010894A (ja) * | 1999-06-24 | 2001-01-16 | Mitsubishi Materials Silicon Corp | 結晶成長用サセプタとこれを用いた結晶成長装置、およびエピタキシャル・ウェーハとその製造方法 |
-
2002
- 2002-02-15 IT IT2002MI000306A patent/ITMI20020306A1/it unknown
-
2003
- 2003-02-10 EP EP03706472A patent/EP1476591A2/en not_active Ceased
- 2003-02-10 AU AU2003208826A patent/AU2003208826A1/en not_active Abandoned
- 2003-02-10 WO PCT/EP2003/001305 patent/WO2003069029A1/en not_active Application Discontinuation
-
2004
- 2004-08-12 US US10/916,780 patent/US20050051099A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
ITMI20020306A1 (it) | 2003-08-18 |
US20050051099A1 (en) | 2005-03-10 |
WO2003069029A8 (en) | 2004-08-26 |
AU2003208826A1 (en) | 2003-09-04 |
WO2003069029A1 (en) | 2003-08-21 |
EP1476591A2 (en) | 2004-11-17 |
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