IT8948599A0 - Procedimento per eliminare composti gassosi contaminanti, in particolare di droganti da gas vettori contenenti composti di alogenosilano - Google Patents

Procedimento per eliminare composti gassosi contaminanti, in particolare di droganti da gas vettori contenenti composti di alogenosilano

Info

Publication number
IT8948599A0
IT8948599A0 IT48599A IT4859989A IT8948599A0 IT 8948599 A0 IT8948599 A0 IT 8948599A0 IT 48599 A IT48599 A IT 48599A IT 4859989 A IT4859989 A IT 4859989A IT 8948599 A0 IT8948599 A0 IT 8948599A0
Authority
IT
Italy
Prior art keywords
compounds
halogenosilan
elimination
procedure
carrier gas
Prior art date
Application number
IT48599A
Other languages
English (en)
Other versions
IT1238349B (it
IT8948599A1 (it
Inventor
Helene Prigge
Robert Rurlander
Harald Hoffmann
Hans-Peter Bortner
Original Assignee
Wacker Chemitronic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Chemitronic filed Critical Wacker Chemitronic
Publication of IT8948599A0 publication Critical patent/IT8948599A0/it
Publication of IT8948599A1 publication Critical patent/IT8948599A1/it
Application granted granted Critical
Publication of IT1238349B publication Critical patent/IT1238349B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S95/00—Gas separation: processes
    • Y10S95/90—Solid sorbent
    • Y10S95/902—Molecular sieve

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Hydrogen, Water And Hydrids (AREA)
  • Treating Waste Gases (AREA)
IT04859989A 1988-12-22 1989-11-24 Procedimento per eliminare composti gassosi contaminanti, in particolare di droganti da gas vettori contenenti composti di alogenosilano. IT1238349B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3843313A DE3843313A1 (de) 1988-12-22 1988-12-22 Verfahren zur entfernung von gasfoermigen kontaminierenden, insbesondere dotierstoffverbindungen aus halogensilanverbindungen enthaltenden traegergasen

Publications (3)

Publication Number Publication Date
IT8948599A0 true IT8948599A0 (it) 1989-11-24
IT8948599A1 IT8948599A1 (it) 1991-05-24
IT1238349B IT1238349B (it) 1993-07-13

Family

ID=6369903

Family Applications (1)

Application Number Title Priority Date Filing Date
IT04859989A IT1238349B (it) 1988-12-22 1989-11-24 Procedimento per eliminare composti gassosi contaminanti, in particolare di droganti da gas vettori contenenti composti di alogenosilano.

Country Status (4)

Country Link
US (1) US5051117A (it)
JP (1) JPH02184501A (it)
DE (1) DE3843313A1 (it)
IT (1) IT1238349B (it)

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CA2046325A1 (en) * 1989-12-16 1991-06-17 Hiroyuki Itoh Concentration process of gaseous chlorine
DE4113597C2 (de) * 1990-04-28 1996-10-17 Babcock Anlagen Gmbh Verfahren zur Reinigung von Abgasen
US5290342A (en) * 1990-12-05 1994-03-01 Ethyl Corporation Silane compositions and process
US5211931A (en) * 1992-03-27 1993-05-18 Ethyl Corporation Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve
US5453113A (en) * 1994-04-11 1995-09-26 Uop Process for separation and recovery of methyl chloride from vent streams containing isobutane
US5445742A (en) * 1994-05-23 1995-08-29 Dow Corning Corporation Process for purifying halosilanes
US5518528A (en) * 1994-10-13 1996-05-21 Advanced Technology Materials, Inc. Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds
US6132492A (en) * 1994-10-13 2000-10-17 Advanced Technology Materials, Inc. Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same
US5707424A (en) * 1994-10-13 1998-01-13 Advanced Technology Materials, Inc. Process system with integrated gas storage and delivery unit
US6083298A (en) * 1994-10-13 2000-07-04 Advanced Technology Materials, Inc. Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment
US5704967A (en) * 1995-10-13 1998-01-06 Advanced Technology Materials, Inc. Fluid storage and delivery system comprising high work capacity physical sorbent
US6204180B1 (en) 1997-05-16 2001-03-20 Advanced Technology Materials, Inc. Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing system for reagent delivery
US5693306A (en) 1994-11-28 1997-12-02 Mitsui Toatsu Chemicals, Inc. Production process for refined hydrogen iodide
US6168652B1 (en) * 1995-10-23 2001-01-02 Dow Corning Corporation Process for purifying halosilanes
DE69718137T2 (de) * 1996-05-20 2003-10-09 Advanced Tech Materials Flüssigkeitsbehälter und -abgabesystem mit physikalischem sorptionsmittel mit hoher kapazität
US5916245A (en) * 1996-05-20 1999-06-29 Advanced Technology Materials, Inc. High capacity gas storage and dispensing system
US6027547A (en) * 1997-05-16 2000-02-22 Advanced Technology Materials, Inc. Fluid storage and dispensing vessel with modified high surface area solid as fluid storage medium
US6019823A (en) * 1997-05-16 2000-02-01 Advanced Technology Materials, Inc. Sorbent-based fluid storage and dispensing vessel with replaceable sorbent cartridge members
US5851270A (en) * 1997-05-20 1998-12-22 Advanced Technology Materials, Inc. Low pressure gas source and dispensing apparatus with enhanced diffusive/extractive means
US5985008A (en) * 1997-05-20 1999-11-16 Advanced Technology Materials, Inc. Sorbent-based fluid storage and dispensing system with high efficiency sorbent medium
US5910292A (en) * 1997-08-19 1999-06-08 Aeronex, Inc. Method for water removal from corrosive gas streams
US5980608A (en) * 1998-01-07 1999-11-09 Advanced Technology Materials, Inc. Throughflow gas storage and dispensing system
US6406519B1 (en) * 1998-03-27 2002-06-18 Advanced Technology Materials, Inc. Gas cabinet assembly comprising sorbent-based gas storage and delivery system
US6660063B2 (en) 1998-03-27 2003-12-09 Advanced Technology Materials, Inc Sorbent-based gas storage and delivery system
US6070576A (en) * 1998-06-02 2000-06-06 Advanced Technology Materials, Inc. Adsorbent-based storage and dispensing system
US6444013B1 (en) * 2000-09-19 2002-09-03 The Boc Group, Inc. Purification of methylsilanes
US7105037B2 (en) * 2002-10-31 2006-09-12 Advanced Technology Materials, Inc. Semiconductor manufacturing facility utilizing exhaust recirculation
JP2004149393A (ja) * 2002-11-01 2004-05-27 Japan Pionics Co Ltd 不活性ガスの精製方法
US6991671B2 (en) * 2002-12-09 2006-01-31 Advanced Technology Materials, Inc. Rectangular parallelepiped fluid storage and dispensing vessel
US6743278B1 (en) 2002-12-10 2004-06-01 Advanced Technology Materials, Inc. Gas storage and dispensing system with monolithic carbon adsorbent
US8002880B2 (en) 2002-12-10 2011-08-23 Advanced Technology Materials, Inc. Gas storage and dispensing system with monolithic carbon adsorbent
US7494530B2 (en) * 2002-12-10 2009-02-24 Advanced Technology Materials, Inc. Gas storage and dispensing system with monolithic carbon adsorbent
US8679231B2 (en) 2011-01-19 2014-03-25 Advanced Technology Materials, Inc. PVDF pyrolyzate adsorbent and gas storage and dispensing system utilizing same
US9126139B2 (en) 2012-05-29 2015-09-08 Entegris, Inc. Carbon adsorbent for hydrogen sulfide removal from gases containing same, and regeneration of adsorbent
JP6433867B2 (ja) * 2015-08-28 2018-12-05 信越化学工業株式会社 水素ガス回収システムおよび水素ガスの分離回収方法

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DE3139705C2 (de) * 1981-10-06 1983-11-10 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Aufarbeitung der bei der Siliciumabscheidung und der Siliciumtetrachlorid-Konvertierung anfallenden Restgase
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Also Published As

Publication number Publication date
IT1238349B (it) 1993-07-13
DE3843313A1 (de) 1990-06-28
US5051117A (en) 1991-09-24
IT8948599A1 (it) 1991-05-24
JPH02184501A (ja) 1990-07-19

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