IT8422846A1 - Dispositivo a semiconduttore e procedimento per la sua fabbricazione - Google Patents

Dispositivo a semiconduttore e procedimento per la sua fabbricazione

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Publication number
IT8422846A1
IT8422846A1 IT1984A22846A IT2284684A IT8422846A1 IT 8422846 A1 IT8422846 A1 IT 8422846A1 IT 1984A22846 A IT1984A22846 A IT 1984A22846A IT 2284684 A IT2284684 A IT 2284684A IT 8422846 A1 IT8422846 A1 IT 8422846A1
Authority
IT
Italy
Prior art keywords
procedure
manufacturing
semiconductor device
semiconductor
Prior art date
Application number
IT1984A22846A
Other languages
English (en)
Other versions
IT1176815B (it
IT8422846A0 (it
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP58177945A external-priority patent/JPS6070751A/ja
Priority claimed from JP58177944A external-priority patent/JPS6070750A/ja
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of IT8422846A0 publication Critical patent/IT8422846A0/it
Publication of IT8422846A1 publication Critical patent/IT8422846A1/it
Application granted granted Critical
Publication of IT1176815B publication Critical patent/IT1176815B/it

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    • H01L23/00Details of semiconductor or other solid state devices
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    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/002Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
    • B23K20/004Wire welding
    • B23K20/005Capillary welding
    • B23K20/007Ball bonding
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
IT22846/84A 1983-09-28 1984-09-26 Dispositivo a semiconduttore e procedimento per la sua fabbricazione IT1176815B (it)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58177945A JPS6070751A (ja) 1983-09-28 1983-09-28 半導体装置
JP58177944A JPS6070750A (ja) 1983-09-28 1983-09-28 半導体装置

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IT8422846A0 IT8422846A0 (it) 1984-09-26
IT8422846A1 true IT8422846A1 (it) 1986-03-26
IT1176815B IT1176815B (it) 1987-08-18

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DE (1) DE3435489A1 (it)
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IT1183375B (it) * 1984-02-24 1987-10-22 Hitachi Ltd Dispositivo a semiconduttori comprendente una pallina, fili conduttori e porzioni conduttrici esterneche sono collegate alla pallina mediante tali fili conduttori
JPS60223149A (ja) * 1984-04-19 1985-11-07 Hitachi Ltd 半導体装置
US4705204A (en) * 1985-03-01 1987-11-10 Mitsubishi Denki Kabushiki Kaisha Method of ball forming for wire bonding
US4976393A (en) * 1986-12-26 1990-12-11 Hitachi, Ltd. Semiconductor device and production process thereof, as well as wire bonding device used therefor
DE69004452T2 (de) * 1989-02-13 1994-03-10 Bayer Agrochem Kk Nitroverbindungen als Insektizide.
US5437405A (en) * 1994-08-22 1995-08-01 National Semiconductor Corporation Method and apparatus for stitch bonding of wires to integrated circuit bonding pads
DE102007025658B4 (de) * 2007-06-01 2009-04-09 Infineon Technologies Ag Bonddrahtanordnung und Verfahren zur Herstellung einer Bonddrahtanordnung
US11172915B2 (en) 2019-04-24 2021-11-16 Covidien Lp Specimen retrieval devices with selective bag release

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NL113327C (it) * 1956-10-31 1900-01-01
AT201117B (de) * 1956-10-31 1958-12-10 Western Electric Co Verfahren zur Verbindung eines metallischen Leiters mit einem Halbleiterkörper
GB1106163A (en) * 1964-03-02 1968-03-13 Post Office Improvements in or relating to the bonding of metals to semiconductor, metallic or non-metallic surfaces
NL7406783A (nl) * 1974-05-21 1975-11-25 Philips Nv Werkwijze voor het aanbrengen van een draad- verbinding aan een halfgeleiderinrichting.
GB1536872A (en) * 1975-05-15 1978-12-20 Welding Inst Electrical inter-connection method and apparatus
DE2929623C2 (de) * 1979-07-21 1981-11-26 W.C. Heraeus Gmbh, 6450 Hanau Feinstdraht aus einer Aluminiumlegierung
DE3023528C2 (de) * 1980-06-24 1984-11-29 W.C. Heraeus Gmbh, 6450 Hanau Aluminium enthaltender Feinstdraht
JPS5712531A (en) * 1980-06-26 1982-01-22 Fujitsu Ltd Wire bonding method
NL8005922A (nl) * 1980-10-29 1982-05-17 Philips Nv Werkwijze voor het vormen van een draadverbinding.
NL184184C (nl) * 1981-03-20 1989-05-01 Philips Nv Werkwijze voor het aanbrengen van kontaktverhogingen op kontaktplaatsen van een electronische microketen.
US4390771A (en) * 1981-05-11 1983-06-28 Fairchild Camera & Instrument Corp. Bonding wire ball forming method and apparatus
US4387283A (en) * 1981-08-03 1983-06-07 Texas Instruments Incorporated Apparatus and method of forming aluminum balls for ball bonding
DD200954A1 (de) * 1981-10-20 1983-06-22 Wolfgang Werner Mikrodraht aus aluminium fuer das drahtbonden
JPS58154241A (ja) * 1982-03-10 1983-09-13 Hitachi Ltd 半導体装置及びその製法

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IT1176815B (it) 1987-08-18
GB8424394D0 (en) 1984-10-31
FR2555813A1 (fr) 1985-05-31
GB2146937A (en) 1985-05-01
IT8422846A0 (it) 1984-09-26
FR2555813B1 (fr) 1986-06-20
KR850002668A (ko) 1985-05-15
SG77288G (en) 1989-03-23
KR920008252B1 (ko) 1992-09-25
DE3435489A1 (de) 1985-05-02
GB2146937B (en) 1987-04-23

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