IT8420726A0 - Procedimento per produrre dispositivi semiconduttori. - Google Patents

Procedimento per produrre dispositivi semiconduttori.

Info

Publication number
IT8420726A0
IT8420726A0 IT8420726A IT2072684A IT8420726A0 IT 8420726 A0 IT8420726 A0 IT 8420726A0 IT 8420726 A IT8420726 A IT 8420726A IT 2072684 A IT2072684 A IT 2072684A IT 8420726 A0 IT8420726 A0 IT 8420726A0
Authority
IT
Italy
Prior art keywords
procedure
semiconductor devices
producing semiconductor
producing
devices
Prior art date
Application number
IT8420726A
Other languages
English (en)
Other versions
IT1206143B (it
Inventor
Edwin Arthur Chandross
Elsa Reichmanis
Cletus Walter Wilkins Jr
Original Assignee
American Telephone & Telegraph
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone & Telegraph filed Critical American Telephone & Telegraph
Publication of IT8420726A0 publication Critical patent/IT8420726A0/it
Application granted granted Critical
Publication of IT1206143B publication Critical patent/IT1206143B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07J—STEROIDS
    • C07J51/00—Normal steroids with unmodified cyclopenta(a)hydrophenanthrene skeleton not provided for in groups C07J1/00 - C07J43/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
IT8420726A 1983-04-29 1984-04-27 Procedimento per produrre dispositivi semiconduttori. IT1206143B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/489,796 US4551416A (en) 1981-05-22 1983-04-29 Process for preparing semiconductors using photosensitive bodies

Publications (2)

Publication Number Publication Date
IT8420726A0 true IT8420726A0 (it) 1984-04-27
IT1206143B IT1206143B (it) 1989-04-14

Family

ID=23945301

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8420726A IT1206143B (it) 1983-04-29 1984-04-27 Procedimento per produrre dispositivi semiconduttori.

Country Status (8)

Country Link
US (1) US4551416A (it)
JP (2) JPS6017445A (it)
CA (1) CA1219686A (it)
DE (1) DE3415791A1 (it)
FR (1) FR2545232A1 (it)
GB (1) GB2140929B (it)
IT (1) IT1206143B (it)
NL (1) NL8401365A (it)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4666820A (en) * 1983-04-29 1987-05-19 American Telephone And Telegraph Company, At&T Laboratories Photosensitive element comprising a substrate and an alkaline soluble mixture
DE3642184A1 (de) * 1986-12-10 1988-06-23 Basf Ag Copolymerisate mit o-nitrocarbinolestergruppierungen und deren verwendung
DE3701569A1 (de) * 1987-01-21 1988-08-04 Basf Ag Copolymerisate mit o-nitrocarbinolestergruppierungen, deren verwendung sowie verfahren zur herstellung von halbleiterbauelementen
DE3702035A1 (de) * 1987-01-24 1988-08-04 Basf Ag Copolymerisate mit o-nitrocarbinolestergruppierungen und verfahren zur herstellung von zweilagenresisten sowie von halbleiterbauelementen
JP2540199B2 (ja) * 1988-02-25 1996-10-02 アメリカン テレフォン アンド テレグラフ カムパニー デバイスの製造方法
GB8812235D0 (en) * 1988-05-24 1988-06-29 Jones B L Manufacturing electronic devices
DE69029104T2 (de) * 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5397665A (en) * 1990-04-27 1995-03-14 Dai Nippon Printing Co., Ltd. Photomask with pellicle and method of treating and storing the same
JP2904948B2 (ja) * 1991-03-28 1999-06-14 コニカ株式会社 ハロゲン化銀カラー写真感光材料の処理方法及び安定液
US5449834A (en) * 1994-07-13 1995-09-12 Ppg Industries, Inc. Method of synthesizing 2,6-dinitro benzyl compounds
US5600035A (en) * 1994-07-13 1997-02-04 Ppg Industries, Inc. Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups
KR970011972A (ko) * 1995-08-11 1997-03-29 쯔지 하루오 투과형 액정 표시 장치 및 그 제조 방법
KR20010009339A (ko) * 1999-07-09 2001-02-05 박찬구 카르복시산 유도체 및 그 제조방법
CN104471483A (zh) * 2012-03-22 2015-03-25 科罗拉多大学董事会 液体沉积光刻

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1158843A (en) * 1966-05-27 1969-07-23 Agfa Gevaert Nv Light-Sensitive Copying Material
DE2150691C2 (de) * 1971-10-12 1982-09-09 Basf Ag, 6700 Ludwigshafen Lichtempfindliches Gemisch und Verwendung eines lichtempfindlichen Gemisches zur Herstellung einer Flachdruckplatte
GB1418169A (en) * 1972-02-25 1975-12-17 Hitachi Chemical Co Ltd Resist image formation process and resin compositions and materials for use in said process
DE2242394A1 (de) * 1972-08-29 1974-03-14 Basf Ag Unter lichteinwirkung haertbare stoffgemische
US3949143A (en) * 1973-02-09 1976-04-06 American Can Company Epoxy resin coatings cured with phototropic aromatic nitro compounds
US4086210A (en) * 1976-05-10 1978-04-25 Eastman Kodak Company Radiation sensitive polymeric o-nitrophenyl acetals
US4108839A (en) * 1977-01-21 1978-08-22 E. I. Du Pont De Nemours And Company Photosensitive polyaldehydes and use in photoimaging
DE2922746A1 (de) * 1979-06-05 1980-12-11 Basf Ag Positiv arbeitendes schichtuebertragungsmaterial
US4400461A (en) * 1981-05-22 1983-08-23 Bell Telephone Laboratories, Incorporated Process of making semiconductor devices using photosensitive bodies
FR2510275A1 (fr) * 1981-07-27 1983-01-28 Toyo Boseki Composition de resine photosensible

Also Published As

Publication number Publication date
GB8410200D0 (en) 1984-05-31
US4551416A (en) 1985-11-05
JPS59208547A (ja) 1984-11-26
DE3415791A1 (de) 1984-10-31
GB2140929B (en) 1986-02-19
FR2545232A1 (fr) 1984-11-02
IT1206143B (it) 1989-04-14
NL8401365A (nl) 1984-11-16
CA1219686A (en) 1987-03-24
JPS6017445A (ja) 1985-01-29
GB2140929A (en) 1984-12-05

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