IT8048862A0 - Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazio - Google Patents
Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazioInfo
- Publication number
- IT8048862A0 IT8048862A0 IT8048862A IT4886280A IT8048862A0 IT 8048862 A0 IT8048862 A0 IT 8048862A0 IT 8048862 A IT8048862 A IT 8048862A IT 4886280 A IT4886280 A IT 4886280A IT 8048862 A0 IT8048862 A0 IT 8048862A0
- Authority
- IT
- Italy
- Prior art keywords
- gap width
- width control
- galvanization
- procedure
- galvanization procedure
- Prior art date
Links
- 238000000034 method Methods 0.000 title 1
- 238000003079 width control Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54067483A JPS6056238B2 (ja) | 1979-06-01 | 1979-06-01 | 電気メツキ方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8048862A0 true IT8048862A0 (it) | 1980-06-02 |
IT1127490B IT1127490B (it) | 1986-05-21 |
Family
ID=13346261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT48862/80A IT1127490B (it) | 1979-06-01 | 1980-06-02 | Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazio |
Country Status (6)
Country | Link |
---|---|
US (1) | US4269672A (it) |
JP (1) | JPS6056238B2 (it) |
DE (1) | DE3020824C2 (it) |
FR (1) | FR2457912B1 (it) |
GB (1) | GB2052562B (it) |
IT (1) | IT1127490B (it) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL64705A0 (en) * | 1981-01-13 | 1982-03-31 | Metafuse Ltd | Process and apparatus for treating electrically conductive matrices and products produced by the process |
US4364802A (en) * | 1981-03-05 | 1982-12-21 | Inoue-Japax Research Incorporated | Scanning electrode vibration electrodeposition method |
DE3109755C2 (de) * | 1981-03-13 | 1986-08-07 | Inoue-Japax Research Inc., Yokohama, Kanagawa | Verfahren und Vorrichtung zur galvanischen Abscheidung |
GB2104917B (en) * | 1981-08-07 | 1985-02-13 | Inoue Japax Res | Electrodepositing a metal in a recess |
US4425197A (en) * | 1981-08-19 | 1984-01-10 | Inoue-Japax Research Incorporated | Method of and apparatus for electrodepositing a metal on a conductive surface |
JPS5931882A (ja) * | 1982-08-12 | 1984-02-21 | Sonitsukusu:Kk | 浴中表面処理方法及びその装置 |
US20100044079A1 (en) * | 1999-08-27 | 2010-02-25 | Lex Kosowsky | Metal Deposition |
US20100038121A1 (en) * | 1999-08-27 | 2010-02-18 | Lex Kosowsky | Metal Deposition |
WO2001017320A1 (en) * | 1999-08-27 | 2001-03-08 | Lex Kosowsky | Current carrying structure using voltage switchable dielectric material |
US20100038119A1 (en) * | 1999-08-27 | 2010-02-18 | Lex Kosowsky | Metal Deposition |
US20100044080A1 (en) * | 1999-08-27 | 2010-02-25 | Lex Kosowsky | Metal Deposition |
US6746589B2 (en) * | 2000-09-20 | 2004-06-08 | Ebara Corporation | Plating method and plating apparatus |
US7586097B2 (en) | 2006-01-05 | 2009-09-08 | Virgin Islands Microsystems, Inc. | Switching micro-resonant structures using at least one director |
US7626179B2 (en) * | 2005-09-30 | 2009-12-01 | Virgin Island Microsystems, Inc. | Electron beam induced resonance |
US7791290B2 (en) | 2005-09-30 | 2010-09-07 | Virgin Islands Microsystems, Inc. | Ultra-small resonating charged particle beam modulator |
WO2007062122A2 (en) | 2005-11-22 | 2007-05-31 | Shocking Technologies, Inc. | Semiconductor devices including voltage switchable materials for over-voltage protection |
US20070200646A1 (en) * | 2006-02-28 | 2007-08-30 | Virgin Island Microsystems, Inc. | Method for coupling out of a magnetic device |
DE102006010808B4 (de) * | 2006-03-07 | 2009-08-13 | BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG | Vorrichtung, System, Verfahren, Computerprogramm und Datenträger zur elektrophoretischen Abscheidung mit einer beweglichen Elektrode |
US7876793B2 (en) * | 2006-04-26 | 2011-01-25 | Virgin Islands Microsystems, Inc. | Micro free electron laser (FEL) |
US20070258720A1 (en) * | 2006-05-05 | 2007-11-08 | Virgin Islands Microsystems, Inc. | Inter-chip optical communication |
US7986113B2 (en) | 2006-05-05 | 2011-07-26 | Virgin Islands Microsystems, Inc. | Selectable frequency light emitter |
US7728702B2 (en) | 2006-05-05 | 2010-06-01 | Virgin Islands Microsystems, Inc. | Shielding of integrated circuit package with high-permeability magnetic material |
US8188431B2 (en) | 2006-05-05 | 2012-05-29 | Jonathan Gorrell | Integration of vacuum microelectronic device with integrated circuit |
US7732786B2 (en) | 2006-05-05 | 2010-06-08 | Virgin Islands Microsystems, Inc. | Coupling energy in a plasmon wave to an electron beam |
US7728397B2 (en) * | 2006-05-05 | 2010-06-01 | Virgin Islands Microsystems, Inc. | Coupled nano-resonating energy emitting structures |
US20070257273A1 (en) * | 2006-05-05 | 2007-11-08 | Virgin Island Microsystems, Inc. | Novel optical cover for optical chip |
MY145875A (en) | 2006-09-24 | 2012-05-15 | Shocking Technologies Inc | Formulations for voltage switchable dielectric material having a stepped voltage response and methods for making the same |
US7990336B2 (en) | 2007-06-19 | 2011-08-02 | Virgin Islands Microsystems, Inc. | Microwave coupled excitation of solid state resonant arrays |
ES2342518B1 (es) * | 2007-10-27 | 2011-01-17 | Universidad De Las Palmas De Gran Canaria | Sistema robotico de orientacion y soporte catodico en maquina de electroconformado. |
US9226391B2 (en) | 2009-01-27 | 2015-12-29 | Littelfuse, Inc. | Substrates having voltage switchable dielectric materials |
US8272123B2 (en) | 2009-01-27 | 2012-09-25 | Shocking Technologies, Inc. | Substrates having voltage switchable dielectric materials |
US8399773B2 (en) | 2009-01-27 | 2013-03-19 | Shocking Technologies, Inc. | Substrates having voltage switchable dielectric materials |
WO2010110909A1 (en) | 2009-03-26 | 2010-09-30 | Shocking Technologies, Inc. | Components having voltage switchable dielectric materials |
US20110198544A1 (en) * | 2010-02-18 | 2011-08-18 | Lex Kosowsky | EMI Voltage Switchable Dielectric Materials Having Nanophase Materials |
US9082622B2 (en) | 2010-02-26 | 2015-07-14 | Littelfuse, Inc. | Circuit elements comprising ferroic materials |
US9224728B2 (en) | 2010-02-26 | 2015-12-29 | Littelfuse, Inc. | Embedded protection against spurious electrical events |
US9320135B2 (en) * | 2010-02-26 | 2016-04-19 | Littelfuse, Inc. | Electric discharge protection for surface mounted and embedded components |
CA2905575C (en) | 2013-03-15 | 2022-07-12 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
AR102068A1 (es) | 2014-09-18 | 2017-02-01 | Modumetal Inc | Métodos de preparación de artículos por electrodeposición y procesos de fabricación aditiva |
EA201790643A1 (ru) | 2014-09-18 | 2017-08-31 | Модьюметал, Инк. | Способ и устройство для непрерывного нанесения нанослоистых металлических покрытий |
CA3060619A1 (en) * | 2017-04-21 | 2018-10-25 | Modumetal, Inc. | Tubular articles with electrodeposited coatings, and systems and methods for producing the same |
WO2019210264A1 (en) | 2018-04-27 | 2019-10-31 | Modumetal, Inc. | Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB259900A (en) * | 1925-10-17 | 1927-02-03 | Siemens Ag | Improved method of and means for producing galvanic chromium coatings on hollow bodies, especially on narrow tubes |
US1733404A (en) * | 1926-03-15 | 1929-10-29 | Frank A Fahrenwald | Process and apparatus for electroplating tubes |
US2206908A (en) * | 1938-11-05 | 1940-07-09 | Raymond L Lunt | Method for electroplating molds for rubber articles |
US3810829A (en) * | 1972-06-28 | 1974-05-14 | Nasa | Scanning nozzle plating system |
-
1979
- 1979-06-01 JP JP54067483A patent/JPS6056238B2/ja not_active Expired
-
1980
- 1980-05-30 US US06/154,953 patent/US4269672A/en not_active Expired - Lifetime
- 1980-05-30 GB GB8017691A patent/GB2052562B/en not_active Expired
- 1980-05-30 FR FR8012123A patent/FR2457912B1/fr not_active Expired
- 1980-06-02 DE DE3020824A patent/DE3020824C2/de not_active Expired
- 1980-06-02 IT IT48862/80A patent/IT1127490B/it active
Also Published As
Publication number | Publication date |
---|---|
DE3020824C2 (de) | 1984-11-29 |
GB2052562B (en) | 1983-01-06 |
FR2457912B1 (fr) | 1985-08-23 |
JPS55161092A (en) | 1980-12-15 |
GB2052562A (en) | 1981-01-28 |
JPS6056238B2 (ja) | 1985-12-09 |
IT1127490B (it) | 1986-05-21 |
FR2457912A1 (fr) | 1980-12-26 |
US4269672A (en) | 1981-05-26 |
DE3020824A1 (de) | 1980-12-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19960625 |