IT1261227B - Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi. - Google Patents
Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi.Info
- Publication number
- IT1261227B IT1261227B ITRM930216A ITRM930216A IT1261227B IT 1261227 B IT1261227 B IT 1261227B IT RM930216 A ITRM930216 A IT RM930216A IT RM930216 A ITRM930216 A IT RM930216A IT 1261227 B IT1261227 B IT 1261227B
- Authority
- IT
- Italy
- Prior art keywords
- pecvd
- sputtering
- techniques
- thin film
- film deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITRM930216A IT1261227B (it) | 1993-04-06 | 1993-04-06 | Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi. |
EP94830145A EP0619380A1 (en) | 1993-04-06 | 1994-03-28 | Thin film deposition apparatus and process utilizing PECVD and sputtering |
US08/222,690 US5466296A (en) | 1993-04-06 | 1994-04-04 | Thin film deposition apparatus, mainly dedicated to PECVD and sputtering techniques and respective processes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITRM930216A IT1261227B (it) | 1993-04-06 | 1993-04-06 | Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi. |
Publications (3)
Publication Number | Publication Date |
---|---|
ITRM930216A0 ITRM930216A0 (it) | 1993-04-06 |
ITRM930216A1 ITRM930216A1 (it) | 1993-07-06 |
IT1261227B true IT1261227B (it) | 1996-05-09 |
Family
ID=11401691
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITRM930216A IT1261227B (it) | 1993-04-06 | 1993-04-06 | Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi. |
Country Status (3)
Country | Link |
---|---|
US (1) | US5466296A (it) |
EP (1) | EP0619380A1 (it) |
IT (1) | IT1261227B (it) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ATE219528T1 (de) * | 1995-03-14 | 2002-07-15 | Empa | Abscheiden von diffusionssperrschichten in einer niederdruckplasmakammer |
WO1997032672A1 (en) * | 1996-03-04 | 1997-09-12 | Polar Materials, Inc. | Method for bulk coating using a plasma process |
US5753092A (en) * | 1996-08-26 | 1998-05-19 | Velocidata, Inc. | Cylindrical carriage sputtering system |
WO1998052075A1 (fr) * | 1997-05-16 | 1998-11-19 | Hoya Kabushiki Kaisha | Mecanisme servant a rendre hydrophobes deux cotes simultanement |
JP2000017457A (ja) * | 1998-07-03 | 2000-01-18 | Shincron:Kk | 薄膜形成装置および薄膜形成方法 |
DE19834314A1 (de) * | 1998-07-30 | 2000-02-03 | Leybold Systems Gmbh | Verfahren zum Aufbringen einer Kratzschutzschicht und eines Entspiegelungsschichtsystems und Vorrichtung zu seiner Durchführung |
ES2186530B1 (es) * | 2001-04-19 | 2005-05-01 | Consejo Superior De Investigaciones Cientificas | Procedimiento para la preparacion de capas finas porosas de oxidos inorganicos. |
JP6496898B2 (ja) * | 2014-07-02 | 2019-04-10 | アドバンストマテリアルテクノロジーズ株式会社 | 電子部品の製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2848480C2 (de) * | 1978-11-08 | 1984-11-08 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zum Aufbringen von Schichten auf Träger unter Vakuum |
JPS55145172A (en) * | 1979-04-26 | 1980-11-12 | Hitachi Ltd | Forming apparatus for film |
JPS6395983A (ja) * | 1986-10-14 | 1988-04-26 | Mitsubishi Kasei Corp | 光学的記録用媒体の製造方法 |
EP0409451A1 (en) * | 1989-07-18 | 1991-01-23 | Optical Coating Laboratory, Inc. | Process for depositing optical thin films on both planar and non-planar substrates |
DE4030900A1 (de) * | 1990-09-29 | 1992-04-02 | Bosch Gmbh Robert | Verfahren und einrichtung zum beschichten von teilen |
AU2003903405A0 (en) | 2003-07-02 | 2003-07-17 | Kouts, Caroline | Combination carry bag |
-
1993
- 1993-04-06 IT ITRM930216A patent/IT1261227B/it active IP Right Grant
-
1994
- 1994-03-28 EP EP94830145A patent/EP0619380A1/en not_active Withdrawn
- 1994-04-04 US US08/222,690 patent/US5466296A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0619380A1 (en) | 1994-10-12 |
ITRM930216A1 (it) | 1993-07-06 |
ITRM930216A0 (it) | 1993-04-06 |
US5466296A (en) | 1995-11-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted | ||
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970404 |