IT1240811B - Metodo per la deposizione di strati sottili con assistenza di ioni da plasma rf. - Google Patents
Metodo per la deposizione di strati sottili con assistenza di ioni da plasma rf.Info
- Publication number
- IT1240811B IT1240811B IT47800A IT4780090A IT1240811B IT 1240811 B IT1240811 B IT 1240811B IT 47800 A IT47800 A IT 47800A IT 4780090 A IT4780090 A IT 4780090A IT 1240811 B IT1240811 B IT 1240811B
- Authority
- IT
- Italy
- Prior art keywords
- assistance
- ions
- deposition
- plasma
- thin layers
- Prior art date
Links
- 230000008021 deposition Effects 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT47800A IT1240811B (it) | 1990-03-28 | 1990-03-28 | Metodo per la deposizione di strati sottili con assistenza di ioni da plasma rf. |
EP91104613A EP0451587A3 (en) | 1990-03-28 | 1991-03-24 | Method for depositing a thin film on a substrate employing radio frequency excited gaseous plasma |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT47800A IT1240811B (it) | 1990-03-28 | 1990-03-28 | Metodo per la deposizione di strati sottili con assistenza di ioni da plasma rf. |
Publications (3)
Publication Number | Publication Date |
---|---|
IT9047800A0 IT9047800A0 (it) | 1990-03-28 |
IT9047800A1 IT9047800A1 (it) | 1991-09-28 |
IT1240811B true IT1240811B (it) | 1993-12-17 |
Family
ID=11262590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT47800A IT1240811B (it) | 1990-03-28 | 1990-03-28 | Metodo per la deposizione di strati sottili con assistenza di ioni da plasma rf. |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0451587A3 (it) |
IT (1) | IT1240811B (it) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITRM20010060A1 (it) * | 2001-02-06 | 2001-05-07 | Carlo Misiano | Perfezionamento di un metodo e apparato per la deposizione di film sottili, soprattutto in condizioni reattive. |
WO2023156117A1 (en) * | 2022-02-18 | 2023-08-24 | Evatec Ag | Vacuum layer deposition apparatus and method of depositing a layer on a substrate, especially on a substrate comprising indentations in the surface to be coated |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3329601A (en) * | 1964-09-15 | 1967-07-04 | Donald M Mattox | Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial |
US3772174A (en) * | 1971-04-21 | 1973-11-13 | Nasa | Deposition of alloy films |
US3750623A (en) * | 1972-02-11 | 1973-08-07 | Mc Donnell Douglas Corp | Glow discharge coating apparatus |
US4170662A (en) * | 1974-11-05 | 1979-10-09 | Eastman Kodak Company | Plasma plating |
IL71530A (en) * | 1984-04-12 | 1987-09-16 | Univ Ramot | Method and apparatus for surface-treating workpieces |
US4667620A (en) * | 1985-10-29 | 1987-05-26 | Cosden Technology, Inc. | Method and apparatus for making plastic containers having decreased gas permeability |
DE3700633C2 (de) * | 1987-01-12 | 1997-02-20 | Reinar Dr Gruen | Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma |
ATE98303T1 (de) * | 1989-03-03 | 1993-12-15 | Balzers Hochvakuum | Verfahren zur beschichtung von hartmetallgrundkoerpern und hartmetallwerkzeug hergestellt nach dem verfahren. |
-
1990
- 1990-03-28 IT IT47800A patent/IT1240811B/it active IP Right Grant
-
1991
- 1991-03-24 EP EP91104613A patent/EP0451587A3/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
IT9047800A0 (it) | 1990-03-28 |
EP0451587A3 (en) | 1994-12-21 |
EP0451587A2 (en) | 1991-10-16 |
IT9047800A1 (it) | 1991-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69205494D1 (de) | Beschichtungssystem zur plasmachemischen Gasphasenabscheidung. | |
DE59206344D1 (de) | Magnetron-Zerstäubungskathode für Vakuumbeschichtungsanlagen | |
DE3581295D1 (de) | Plasma-aetzverfahren. | |
AU6820294A (en) | Method for the improved microwave deposition of thin films | |
DE3885706D1 (de) | Magnetron-Bedampfungssystem zum Ätzen oder Niederschlagen. | |
DE3761406D1 (de) | Magnetron-zerstaeubungskatode fuer vakuum-beschichtungsanlagen. | |
AU5613194A (en) | Anticoagulant plasma polymer-modified substrate | |
DE69940082D1 (de) | Plasmaabscheidungsprozesse bei dielektrischen Filmen mit geringer Dielektrizitätskonstante | |
DE69929771D1 (de) | Plasmaabscheidungsprozess von dielektrischen filmen mit geringer dielektrizitätskonstante | |
NO905116D0 (no) | Framgangsmaate for fjerning av belegg, paafoert ved plasmaspraying eller sintring, ved hjelp av hoeytrykksspyling. | |
DE69611952D1 (de) | Vorrichtung zur Gasphasenabscheidung dünner Schichten | |
DE69322058D1 (de) | Plasma-Ätzverfahren | |
EP0630989A3 (en) | Process for plasma-chemical vapor deposition of strains with an improved interface. | |
DE3850941D1 (de) | Vakuumbeschichtungsanlage. | |
GB2267291B (en) | Plasma deposition process | |
IT1240811B (it) | Metodo per la deposizione di strati sottili con assistenza di ioni da plasma rf. | |
DE59406727D1 (de) | Vakuumbeschichtungsanlage | |
DE69402139D1 (de) | Plasma Reaktor für Abscheidung- oder Ätz-Prozess | |
DE69836146D1 (de) | Plasma-abscheidung von filmen | |
ITRM930758A1 (it) | Procedimento per la produzione di policarbonati. | |
EP0301604A3 (en) | Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus | |
DE59202676D1 (de) | Reihenverdampfer für Vakuumbedampfungsanlagen. | |
FI943184A0 (fi) | Plasmareaktori pinnoitus- tai etsausprosessia varten | |
DE69314770D1 (de) | Reaktives Abscheidungsverfahren mittels ionisiertem Cluster-Strahl | |
DE59003159D1 (de) | Reihenverdampfer für Vakuumbedampfungsanlagen. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted | ||
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970128 |