IT1119125B - Apparecchiatura interferometrica - Google Patents

Apparecchiatura interferometrica

Info

Publication number
IT1119125B
IT1119125B IT68625/79A IT6862579A IT1119125B IT 1119125 B IT1119125 B IT 1119125B IT 68625/79 A IT68625/79 A IT 68625/79A IT 6862579 A IT6862579 A IT 6862579A IT 1119125 B IT1119125 B IT 1119125B
Authority
IT
Italy
Prior art keywords
interferometric
equipment
interferometric equipment
Prior art date
Application number
IT68625/79A
Other languages
English (en)
Other versions
IT7968625A0 (it
Original Assignee
Farrand Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Farrand Ind Inc filed Critical Farrand Ind Inc
Publication of IT7968625A0 publication Critical patent/IT7968625A0/it
Application granted granted Critical
Publication of IT1119125B publication Critical patent/IT1119125B/it

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/15—Cat eye, i.e. reflection always parallel to incoming beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • External Artificial Organs (AREA)
  • Materials For Medical Uses (AREA)
  • Paper (AREA)
IT68625/79A 1978-09-28 1979-08-07 Apparecchiatura interferometrica IT1119125B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/946,465 US4215938A (en) 1978-09-28 1978-09-28 Method and apparatus for correcting the error of a position measuring interferometer

Publications (2)

Publication Number Publication Date
IT7968625A0 IT7968625A0 (it) 1979-08-07
IT1119125B true IT1119125B (it) 1986-03-03

Family

ID=25484502

Family Applications (1)

Application Number Title Priority Date Filing Date
IT68625/79A IT1119125B (it) 1978-09-28 1979-08-07 Apparecchiatura interferometrica

Country Status (13)

Country Link
US (1) US4215938A (it)
JP (1) JPS5546190A (it)
AU (1) AU4927179A (it)
BR (1) BR7904550A (it)
CA (1) CA1147950A (it)
DE (1) DE2929945A1 (it)
ES (1) ES482034A1 (it)
FR (1) FR2437609A1 (it)
GB (1) GB2032098B (it)
IL (1) IL57686A (it)
IT (1) IT1119125B (it)
NO (1) NO793115L (it)
SE (1) SE7903801L (it)

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DE3378140D1 (en) * 1982-07-14 1988-11-03 Fujitsu Ltd Polarizing elements
US4536088A (en) * 1982-09-17 1985-08-20 Rashleigh Scott C Polarimetric Fabry-Perot sensor
US4558952A (en) * 1983-02-22 1985-12-17 Kules Vladimir P Method for measuring an optical length of light path and a laser interferometer for carrying same into effect
US4655587A (en) * 1983-03-07 1987-04-07 Beckman Instruments, Inc. Mirror scan velocity control
JPS60500734A (ja) * 1983-03-07 1985-05-16 ベツクマン・インストルメンツ・インコ−ポレ−テツド 鏡走査速度制御装置
US4643577A (en) * 1983-07-15 1987-02-17 Wero Ohg Roth & Co. Length measuring apparatus based on the dual laser beam interferometer principle
JPS60225005A (ja) * 1984-04-24 1985-11-09 Tokyo Erekutoron Kk レ−ザ−光を利用した位置決め装置の補正方式
GB2182433B (en) * 1985-11-02 1989-10-25 Stc Plc Remote sensor
US4752133A (en) * 1985-12-19 1988-06-21 Zygo Corporation Differential plane mirror interferometer
JPS62233704A (ja) * 1986-03-28 1987-10-14 ジゴ−　コ−ポレ−シヨン 差動平面鏡干渉計システム
US4890921A (en) * 1986-08-11 1990-01-02 The Boeing Company Scanning interferometer
US4974961A (en) * 1986-09-12 1990-12-04 Jackson David A Optical fibre measuring system
US4765741A (en) * 1987-03-20 1988-08-23 Hewlett-Packard Company Wavelength tracking compensator for an interferometer
US4784489A (en) * 1987-04-29 1988-11-15 Hewlett-Packard Company Fiber-optic based remote receiver for laser interferometer systems
JPH0198902A (ja) * 1987-10-12 1989-04-17 Res Dev Corp Of Japan 光波干渉測長装置
US4884889A (en) * 1987-11-19 1989-12-05 Brown & Sharpe Manufacturing Company Calibration system for coordinate measuring machine
US4939678A (en) * 1987-11-19 1990-07-03 Brown & Sharpe Manufacturing Company Method for calibration of coordinate measuring machine
JPH0674963B2 (ja) * 1988-02-08 1994-09-21 株式会社日立製作所 レーザ干渉測長器及びそれを用いた位置決め方法
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess
DE69222219T2 (de) * 1991-03-08 1998-01-15 Renishaw Transducer Syst Absolutwert-Gasrefraktometer
US5801833A (en) * 1991-03-08 1998-09-01 Dai Nippon Printing Co., Ltd. Method of producing master and working pattern plates for etching and photolithographic apparatus therefor
JPH04331333A (ja) * 1991-05-02 1992-11-19 Canon Inc 波長変化測定装置
JPH0634318A (ja) * 1992-07-14 1994-02-08 Nikon Corp 干渉計測装置
US5585922A (en) * 1992-12-24 1996-12-17 Nikon Corporation Dual interferometer apparatus compensating for environmental turbulence or fluctuation and for quantization error
US5404222A (en) * 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation
US5991033A (en) * 1996-09-20 1999-11-23 Sparta, Inc. Interferometer with air turbulence compensation
US6330065B1 (en) * 1997-10-02 2001-12-11 Zygo Corporation Gas insensitive interferometric apparatus and methods
US6219144B1 (en) 1997-10-02 2001-04-17 Zygo Corporation Apparatus and method for measuring the refractive index and optical path length effects of air using multiple-pass interferometry
US6124931A (en) * 1997-10-02 2000-09-26 Zygo Corporation Apparatus and methods for measuring intrinsic optical properties of a gas
US6509971B2 (en) 2001-05-09 2003-01-21 Nikon Corporation Interferometer system
US6674512B2 (en) 2001-08-07 2004-01-06 Nikon Corporation Interferometer system for a semiconductor exposure system
US6785005B2 (en) 2001-09-21 2004-08-31 Nikon Corporation Switching type dual wafer stage
US6665054B2 (en) 2001-10-22 2003-12-16 Nikon Corporation Two stage method
US7256871B2 (en) * 2004-07-27 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and method for calibrating the same
SG10201507251TA (en) 2006-08-31 2015-10-29 Nikon Corp Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
TWI602032B (zh) 2006-08-31 2017-10-11 Nippon Kogaku Kk Exposure apparatus, exposure method, and device manufacturing method
CN104375390B (zh) * 2006-08-31 2017-10-13 株式会社尼康 移动体驱动***及方法、图案形成装置及方法、曝光装置及方法、组件制造方法
EP2993524B1 (en) 2006-09-01 2017-10-25 Nikon Corporation Exposure method and apparatus and device manufacturing method
KR101764094B1 (ko) 2006-09-01 2017-08-14 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
CN102003935B (zh) * 2010-11-03 2012-10-31 中国科学院光电技术研究所 一种激光跟踪仪测量中环境补偿的方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3656853A (en) * 1966-11-07 1972-04-18 Hewlett Packard Co Interferometric system
US3458259A (en) * 1966-11-07 1969-07-29 Hewlett Packard Co Interferometric system
DE1909728B2 (de) * 1969-02-26 1971-02-18 Interferometrische einrichtung
US3647302A (en) * 1970-05-18 1972-03-07 Bendix Corp Apparatus for and method of obtaining precision dimensional measurements
DE2027983A1 (de) * 1970-06-06 1971-12-16 Ibm Deutschland Verfahren zur Fehlerkompensation

Also Published As

Publication number Publication date
IL57686A (en) 1982-04-30
GB2032098A (en) 1980-04-30
JPS5546190A (en) 1980-03-31
IT7968625A0 (it) 1979-08-07
GB2032098B (en) 1983-05-25
CA1147950A (en) 1983-06-14
ES482034A1 (es) 1980-08-16
FR2437609A1 (fr) 1980-04-25
BR7904550A (pt) 1980-04-15
DE2929945A1 (de) 1980-04-17
IL57686A0 (en) 1979-10-31
US4215938A (en) 1980-08-05
SE7903801L (sv) 1980-03-29
NO793115L (no) 1980-03-31
AU4927179A (en) 1980-04-03
JPH0137682B2 (it) 1989-08-09

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