IT1080399B - COMPOSITION FOR CHEMICAL ATTACK AND METHOD FOR ITS USE - Google Patents

COMPOSITION FOR CHEMICAL ATTACK AND METHOD FOR ITS USE

Info

Publication number
IT1080399B
IT1080399B IT24771/77A IT2477177A IT1080399B IT 1080399 B IT1080399 B IT 1080399B IT 24771/77 A IT24771/77 A IT 24771/77A IT 2477177 A IT2477177 A IT 2477177A IT 1080399 B IT1080399 B IT 1080399B
Authority
IT
Italy
Prior art keywords
composition
chemical attack
attack
chemical
Prior art date
Application number
IT24771/77A
Other languages
Italian (it)
Original Assignee
Gaf Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gaf Corp filed Critical Gaf Corp
Application granted granted Critical
Publication of IT1080399B publication Critical patent/IT1080399B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/20—Acidic compositions for etching aluminium or alloys thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Printing Plates And Materials Therefor (AREA)
IT24771/77A 1976-06-29 1977-06-16 COMPOSITION FOR CHEMICAL ATTACK AND METHOD FOR ITS USE IT1080399B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/700,906 US4080246A (en) 1976-06-29 1976-06-29 Novel etching composition and method for using same

Publications (1)

Publication Number Publication Date
IT1080399B true IT1080399B (en) 1985-05-16

Family

ID=24815317

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24771/77A IT1080399B (en) 1976-06-29 1977-06-16 COMPOSITION FOR CHEMICAL ATTACK AND METHOD FOR ITS USE

Country Status (8)

Country Link
US (1) US4080246A (en)
JP (1) JPS538334A (en)
CA (1) CA1079614A (en)
DE (1) DE2728886A1 (en)
FR (1) FR2356710A1 (en)
GB (1) GB1543884A (en)
IT (1) IT1080399B (en)
NL (1) NL7707192A (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4374041A (en) * 1974-03-01 1983-02-15 Environmental Sciences Associates, Inc. Testing reagent
US4230522A (en) * 1978-12-26 1980-10-28 Rockwell International Corporation PNAF Etchant for aluminum and silicon
JPS56501226A (en) * 1979-08-30 1981-08-27
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
US4661436A (en) * 1983-06-17 1987-04-28 Petrarch System, Inc. Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant
US4474864A (en) * 1983-07-08 1984-10-02 International Business Machines Corporation Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist
DE3586263D1 (en) * 1984-03-07 1992-08-06 Ciba Geigy Ag METHOD FOR PRODUCING IMAGES.
DE3577919D1 (en) * 1984-08-15 1990-06-28 Kawasaki Steel Co TESTING MEDIUM AND METHOD FOR DETECTING PHOSPHORUS-SPECIFIC SPECIFICATIONS IN METALLIC MATERIAL.
US4942108A (en) * 1985-12-05 1990-07-17 International Business Machines Corporation Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
EP0224680B1 (en) * 1985-12-05 1992-01-15 International Business Machines Corporation Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
US4781788A (en) * 1986-12-29 1988-11-01 Delco Electronics Corporation Process for preparing printed circuit boards
GB8813891D0 (en) * 1988-06-11 1988-07-13 Micro Image Technology Ltd Solutions of perhalogenated compounds
CA2065724A1 (en) * 1991-05-01 1992-11-02 Thomas R. Anthony Method of producing articles by chemical vapor deposition and the support mandrels used therein
JP2734839B2 (en) * 1991-10-09 1998-04-02 シャープ株式会社 Etching solution for aluminum, etching method and aluminum etching product
US5242542A (en) * 1992-08-17 1993-09-07 Alain Masse Solution and method for removing zinc from the surface of a galvanized metal
US5279707A (en) * 1992-10-23 1994-01-18 Time Savers Die discoloration remover solution and method
US6270688B1 (en) * 1994-04-07 2001-08-07 Raytheon Company Chemical polishing of barium strontium titanate
AT410043B (en) * 1997-09-30 2003-01-27 Sez Ag METHOD FOR PLANARIZING SEMICONDUCTOR SUBSTRATES
JP4510979B2 (en) 2000-02-23 2010-07-28 ルネサスエレクトロニクス株式会社 Method for using ruthenium or ruthenium oxide removing liquid and method for removing ruthenium or ruthenium oxide
US7255782B2 (en) * 2004-04-30 2007-08-14 Kenneth Crouse Selective catalytic activation of non-conductive substrates
JP5173642B2 (en) * 2008-07-18 2013-04-03 東京応化工業株式会社 Positive resist composition and resist pattern forming method
JP5520515B2 (en) * 2009-04-15 2014-06-11 東京応化工業株式会社 Positive resist composition and resist pattern forming method
EP2477247A1 (en) * 2009-09-07 2012-07-18 NGK Insulators, Ltd. Method for manufacturing piezoelectric/electrostrictive film type element

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE695182C (en) * 1939-01-25 1940-08-19 Mahle Kg Process for creating pores on tread machines
US3202612A (en) * 1960-12-05 1965-08-24 Monsanto Co Composition for bright polishing aluminum
DE1196933B (en) * 1961-03-30 1965-07-15 Telefunken Patent Process for etching silicon semiconductor bodies
US3715250A (en) * 1971-03-29 1973-02-06 Gen Instrument Corp Aluminum etching solution
JPS526853B2 (en) * 1972-12-22 1977-02-25
US3833434A (en) * 1973-02-20 1974-09-03 Hitachi Ltd Method of forming multi-layer interconnections
US3953263A (en) * 1973-11-26 1976-04-27 Hitachi, Ltd. Process for preventing the formation of nitrogen monoxide in treatment of metals with nitric acid or mixed acid
US3962108A (en) * 1975-11-03 1976-06-08 Kti Chemical, Inc. Chemical stripping solution

Also Published As

Publication number Publication date
GB1543884A (en) 1979-04-11
CA1079614A (en) 1980-06-17
US4080246A (en) 1978-03-21
DE2728886A1 (en) 1978-01-05
NL7707192A (en) 1978-01-02
JPS538334A (en) 1978-01-25
FR2356710A1 (en) 1978-01-27

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