IT1007425B - SUPPORT FOR PHOTOSENSITIVE LIQUID RESIN - Google Patents

SUPPORT FOR PHOTOSENSITIVE LIQUID RESIN

Info

Publication number
IT1007425B
IT1007425B IT2061074A IT2061074A IT1007425B IT 1007425 B IT1007425 B IT 1007425B IT 2061074 A IT2061074 A IT 2061074A IT 2061074 A IT2061074 A IT 2061074A IT 1007425 B IT1007425 B IT 1007425B
Authority
IT
Italy
Prior art keywords
support
liquid resin
photosensitive liquid
photosensitive
resin
Prior art date
Application number
IT2061074A
Other languages
Italian (it)
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Application granted granted Critical
Publication of IT1007425B publication Critical patent/IT1007425B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G03C1/93—Macromolecular substances therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
IT2061074A 1973-04-02 1974-04-08 SUPPORT FOR PHOTOSENSITIVE LIQUID RESIN IT1007425B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3754673A JPS5837532B2 (en) 1973-04-02 1973-04-02 Kankoseijiyushuyoushijiban

Publications (1)

Publication Number Publication Date
IT1007425B true IT1007425B (en) 1976-10-30

Family

ID=12500512

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2061074A IT1007425B (en) 1973-04-02 1974-04-08 SUPPORT FOR PHOTOSENSITIVE LIQUID RESIN

Country Status (10)

Country Link
JP (1) JPS5837532B2 (en)
BE (1) BE813020A (en)
CA (1) CA1045880A (en)
CH (1) CH597623A5 (en)
DD (1) DD110705A5 (en)
DE (1) DE2414596C3 (en)
FR (1) FR2223197B1 (en)
GB (1) GB1463616A (en)
IT (1) IT1007425B (en)
NL (1) NL161711C (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
EP1129390A1 (en) * 1998-11-12 2001-09-05 Andrew Michael Thompson Priming composition for bonding photoresists on substrates
DE10040929A1 (en) 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Process for the production of organically developable, photopolymerizable flexographic printing elements on flexible metallic supports
JP5548494B2 (en) * 2010-03-19 2014-07-16 東京応化工業株式会社 Surface modifying material, resist pattern forming method, and pattern forming method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623613A (en) * 1961-10-16

Also Published As

Publication number Publication date
NL7404486A (en) 1974-10-04
AU6715274A (en) 1975-10-02
DE2414596C3 (en) 1981-07-23
NL161711C (en) 1980-03-17
DD110705A5 (en) 1975-01-05
FR2223197A1 (en) 1974-10-25
GB1463616A (en) 1977-02-02
DE2414596B2 (en) 1980-11-13
CH597623A5 (en) 1978-04-14
JPS5837532B2 (en) 1983-08-17
NL161711B (en) 1979-10-15
FR2223197B1 (en) 1979-07-06
BE813020A (en) 1974-07-15
CA1045880A (en) 1979-01-09
JPS49132167A (en) 1974-12-18
DE2414596A1 (en) 1974-10-03

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