HK1247996A1 - Pattern drawing apparatus - Google Patents

Pattern drawing apparatus

Info

Publication number
HK1247996A1
HK1247996A1 HK18107244.9A HK18107244A HK1247996A1 HK 1247996 A1 HK1247996 A1 HK 1247996A1 HK 18107244 A HK18107244 A HK 18107244A HK 1247996 A1 HK1247996 A1 HK 1247996A1
Authority
HK
Hong Kong
Prior art keywords
drawing apparatus
pattern drawing
pattern
Prior art date
Application number
HK18107244.9A
Other languages
Chinese (zh)
Inventor
加藤正紀
奈良圭
鈴木智也
渡邊智行
鬼頭義昭
堀正和
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1247996A1 publication Critical patent/HK1247996A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
HK18107244.9A 2014-04-01 2017-04-06 Pattern drawing apparatus HK1247996A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014075841 2014-04-01
HK18104840.4A HK1245417B (en) 2014-04-01 2017-04-06 Substrate processing method and substrate-processing apparatus

Publications (1)

Publication Number Publication Date
HK1247996A1 true HK1247996A1 (en) 2018-10-05

Family

ID=54240539

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18104840.4A HK1245417B (en) 2014-04-01 2017-04-06 Substrate processing method and substrate-processing apparatus
HK18104876.1A HK1245420A1 (en) 2014-04-01 2017-04-06 Substrate-processing method
HK18107244.9A HK1247996A1 (en) 2014-04-01 2017-04-06 Pattern drawing apparatus

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK18104840.4A HK1245417B (en) 2014-04-01 2017-04-06 Substrate processing method and substrate-processing apparatus
HK18104876.1A HK1245420A1 (en) 2014-04-01 2017-04-06 Substrate-processing method

Country Status (6)

Country Link
JP (3) JP6597602B2 (en)
KR (2) KR102430139B1 (en)
CN (4) CN107957660B (en)
HK (3) HK1245417B (en)
TW (6) TWI639064B (en)
WO (1) WO2015152218A1 (en)

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Also Published As

Publication number Publication date
CN107272353B (en) 2019-06-14
TW202004368A (en) 2020-01-16
TW201932996A (en) 2019-08-16
CN107957660B (en) 2020-10-23
CN106133610A (en) 2016-11-16
TWI639064B (en) 2018-10-21
TW201842420A (en) 2018-12-01
CN107272353A (en) 2017-10-20
CN106133610B (en) 2017-12-29
TWI695235B (en) 2020-06-01
JP2019023764A (en) 2019-02-14
TWI661280B (en) 2019-06-01
TWI684836B (en) 2020-02-11
CN107255913A (en) 2017-10-17
WO2015152218A1 (en) 2015-10-08
JP2019215588A (en) 2019-12-19
JP6597602B2 (en) 2019-10-30
KR20170002375A (en) 2017-01-06
HK1245417B (en) 2020-03-27
TW201600941A (en) 2016-01-01
CN107957660A (en) 2018-04-24
KR102430139B1 (en) 2022-08-08
CN107255913B (en) 2019-10-11
TW201842419A (en) 2018-12-01
TW202018436A (en) 2020-05-16
HK1245420A1 (en) 2018-08-24
KR20220038545A (en) 2022-03-28
TWI709006B (en) 2020-11-01
KR102377752B1 (en) 2022-03-24
TWI674484B (en) 2019-10-11
JPWO2015152218A1 (en) 2017-04-13

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