GB995609A - Improvements in or relating to the vaporization of metals - Google Patents
Improvements in or relating to the vaporization of metalsInfo
- Publication number
- GB995609A GB995609A GB3141560A GB3141560A GB995609A GB 995609 A GB995609 A GB 995609A GB 3141560 A GB3141560 A GB 3141560A GB 3141560 A GB3141560 A GB 3141560A GB 995609 A GB995609 A GB 995609A
- Authority
- GB
- United Kingdom
- Prior art keywords
- wire
- metal
- al2o3
- hearth
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
<PICT:0995609/C6-C7/1> In vapour deposition apparatus for depositing metals of Group VIII of the Periodic Table, or their alloys, the support for the source metal is a sintered cermet consisting of a metal or metal carbide compounded with a refractory metal oxide. A preferred composition of the cermet is 80% Mo with 20% Al2O3 although Al2O3 and Cr may be used. As shown in Fig. 1, a Ni/Cr wire 1 is continuously fed in a vacuum chamber to a sintered cermet disc 14. The tip of the wire is heated by electron bombardment generated from a cathode filament 16 and anode hearth 13, and the Ni/Cr wire is continuously vaporized. The wire may alternatively be fed to the hearth through a water cooled copper tube, Fig. 4 (not shown). The electrons may also be supplied from an electron gun placed at an angle to and a short distance away from the source material, which may also be in the form of a pellet rather than a wire. Heating may also take the form of resistance or H.F. heating. Specifications 770,753 and 821,518 are referred to.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3141560A GB995609A (en) | 1960-09-12 | 1960-09-12 | Improvements in or relating to the vaporization of metals |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3141560A GB995609A (en) | 1960-09-12 | 1960-09-12 | Improvements in or relating to the vaporization of metals |
Publications (1)
Publication Number | Publication Date |
---|---|
GB995609A true GB995609A (en) | 1965-06-23 |
Family
ID=10322776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3141560A Expired GB995609A (en) | 1960-09-12 | 1960-09-12 | Improvements in or relating to the vaporization of metals |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB995609A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3136465A1 (en) * | 1981-09-15 | 1983-03-31 | Siemens AG, 1000 Berlin und 8000 München | Appliance and method for coating substrates by vapour deposition |
WO2009010468A1 (en) * | 2007-07-19 | 2009-01-22 | Applied Materials, Inc. | Vacuum evaporation apparatus for solid materials |
-
1960
- 1960-09-12 GB GB3141560A patent/GB995609A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3136465A1 (en) * | 1981-09-15 | 1983-03-31 | Siemens AG, 1000 Berlin und 8000 München | Appliance and method for coating substrates by vapour deposition |
WO2009010468A1 (en) * | 2007-07-19 | 2009-01-22 | Applied Materials, Inc. | Vacuum evaporation apparatus for solid materials |
EP2025773A1 (en) * | 2007-07-19 | 2009-02-18 | Applied Materials, Inc. | Vacuum evaporation apparatus for solid materials |
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