GB9116038D0 - Sample analysis apparatus and method - Google Patents
Sample analysis apparatus and methodInfo
- Publication number
- GB9116038D0 GB9116038D0 GB919116038A GB9116038A GB9116038D0 GB 9116038 D0 GB9116038 D0 GB 9116038D0 GB 919116038 A GB919116038 A GB 919116038A GB 9116038 A GB9116038 A GB 9116038A GB 9116038 D0 GB9116038 D0 GB 9116038D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- analysis apparatus
- sample analysis
- sample
- analysis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3005—Observing the objects or the point of impact on the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/25—Tubes for localised analysis using electron or ion beams
- H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
- H01J2237/2516—Secondary particles mass or energy spectrometry
- H01J2237/2527—Ions [SIMS]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30405—Details
- H01J2237/30411—Details using digital signal processors [DSP]
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9116038A GB2258083A (en) | 1991-07-25 | 1991-07-25 | Sample analysis apparatus and method. |
JP4198275A JPH05209849A (en) | 1991-07-25 | 1992-07-24 | Sample analysis apparatus and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9116038A GB2258083A (en) | 1991-07-25 | 1991-07-25 | Sample analysis apparatus and method. |
Publications (2)
Publication Number | Publication Date |
---|---|
GB9116038D0 true GB9116038D0 (en) | 1991-09-11 |
GB2258083A GB2258083A (en) | 1993-01-27 |
Family
ID=10698940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9116038A Withdrawn GB2258083A (en) | 1991-07-25 | 1991-07-25 | Sample analysis apparatus and method. |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH05209849A (en) |
GB (1) | GB2258083A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4439971A1 (en) * | 1993-11-09 | 1995-05-24 | Advantest Corp | Fault analysis system for integrated circuits |
KR100217325B1 (en) * | 1996-07-02 | 1999-10-01 | 윤종용 | Fabricating process analyzing method for semiconductor device |
CA2835713C (en) | 2011-05-13 | 2023-04-04 | Fibics Incorporated | Microscopy imaging method and system |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2081003B (en) * | 1980-07-28 | 1984-03-07 | Smith Kenneth C A | Microcircuit fabrication |
WO1986002581A1 (en) * | 1984-10-26 | 1986-05-09 | Ion Beam Systems, Inc. | Focused substrate alteration |
DE3538857A1 (en) * | 1985-11-02 | 1987-05-07 | Leybold Heraeus Gmbh & Co Kg | DEVICE FOR ENTERING A SET POINT FOR THE HIT POINT OF AN ELECTRON BEAM ON A MEDIUM |
JPS62195662A (en) * | 1986-02-24 | 1987-08-28 | Seiko Instr & Electronics Ltd | Method and device for repairing mask |
NL8602176A (en) * | 1986-08-27 | 1988-03-16 | Philips Nv | ION BUNDLE DEVICE FOR PATTERN FINISHING. |
NL8820330A (en) * | 1987-05-11 | 1989-04-03 | Microbeam Inc | MASK REPAIR USING AN OPTIMIZED FOCUSED ION BUNDLE SYSTEM. |
US4874947A (en) * | 1988-02-26 | 1989-10-17 | Micrion Corporation | Focused ion beam imaging and process control |
JP2842879B2 (en) * | 1989-01-06 | 1999-01-06 | 株式会社日立製作所 | Surface analysis method and device |
-
1991
- 1991-07-25 GB GB9116038A patent/GB2258083A/en not_active Withdrawn
-
1992
- 1992-07-24 JP JP4198275A patent/JPH05209849A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH05209849A (en) | 1993-08-20 |
GB2258083A (en) | 1993-01-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |