GB8510576D0 - Producing thin film - Google Patents

Producing thin film

Info

Publication number
GB8510576D0
GB8510576D0 GB858510576A GB8510576A GB8510576D0 GB 8510576 D0 GB8510576 D0 GB 8510576D0 GB 858510576 A GB858510576 A GB 858510576A GB 8510576 A GB8510576 A GB 8510576A GB 8510576 D0 GB8510576 D0 GB 8510576D0
Authority
GB
United Kingdom
Prior art keywords
thin film
producing thin
producing
film
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB858510576A
Other versions
GB2158104A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bosch Corp
Original Assignee
Diesel Kiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Diesel Kiki Co Ltd filed Critical Diesel Kiki Co Ltd
Publication of GB8510576D0 publication Critical patent/GB8510576D0/en
Publication of GB2158104A publication Critical patent/GB2158104A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Fuel-Injection Apparatus (AREA)
GB08510576A 1984-05-04 1985-04-25 Method for producing a thin film Withdrawn GB2158104A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59088474A JPS60234965A (en) 1984-05-04 1984-05-04 Manufacture of thin film

Publications (2)

Publication Number Publication Date
GB8510576D0 true GB8510576D0 (en) 1985-05-30
GB2158104A GB2158104A (en) 1985-11-06

Family

ID=13943770

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08510576A Withdrawn GB2158104A (en) 1984-05-04 1985-04-25 Method for producing a thin film

Country Status (4)

Country Link
JP (1) JPS60234965A (en)
KR (1) KR900009101B1 (en)
DE (1) DE3515807A1 (en)
GB (1) GB2158104A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8508338D0 (en) * 1985-03-29 1985-05-09 British Aerospace Application of stop-off coating
JPS6222314A (en) * 1985-07-22 1987-01-30 株式会社ボッシュオートモーティブ　システム Manufacture of thin film
SE453369C (en) * 1986-05-28 1989-08-08 Vni Instrument Inst Durable Coating for Cutting Tools and Procedure for Coating
US5021365A (en) * 1986-06-16 1991-06-04 International Business Machines Corporation Compound semiconductor interface control using cationic ingredient oxide to prevent fermi level pinning
EP0264654B1 (en) * 1986-09-25 1990-05-23 Union Carbide Corporation Zircomium nitride coated article and method for making same
JP2524179B2 (en) * 1987-12-22 1996-08-14 セイコーエプソン株式会社 Sputtering method
US4859253A (en) * 1988-07-20 1989-08-22 International Business Machines Corporation Method for passivating a compound semiconductor surface and device having improved semiconductor-insulator interface
US4904542A (en) * 1988-10-11 1990-02-27 Midwest Research Technologies, Inc. Multi-layer wear resistant coatings
USRE34173E (en) * 1988-10-11 1993-02-02 Midwest Research Technologies, Inc. Multi-layer wear resistant coatings
GB9005321D0 (en) * 1990-03-09 1990-05-02 Matthews Allan Modulated structure composites produced by vapour disposition
JPH04368A (en) * 1990-04-17 1992-01-06 Riken Corp Wear resistant coating film and production thereof
DE59309018D1 (en) * 1992-07-02 1998-11-05 Balzers Hochvakuum Process for producing a metal oxide layer, vacuum treatment plant therefor and part coated with at least one metal oxide layer
US5587227A (en) * 1994-10-27 1996-12-24 Kabushiki Kaisha Riken Coating of chromium and nitrogen having good wear resistance properties
US5672386A (en) * 1994-10-27 1997-09-30 Kabushiki Kaisha Riken Process for forming a coating of chromium and nitrogen having good wear resistance properties
JP5090251B2 (en) * 2008-05-21 2012-12-05 オーエスジー株式会社 Hard coating and hard coating tool
JP5441822B2 (en) * 2010-06-08 2014-03-12 シチズンホールディングス株式会社 Hard decorative member

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1335065A (en) * 1970-06-22 1973-10-24 Optical Coating Laboratory Inc Coated plastics articles and methods of manufacture thereof
US3823995A (en) * 1972-03-30 1974-07-16 Corning Glass Works Method of forming light focusing fiber waveguide
US3791852A (en) * 1972-06-16 1974-02-12 Univ California High rate deposition of carbides by activated reactive evaporation
US3900592A (en) * 1973-07-25 1975-08-19 Airco Inc Method for coating a substrate to provide a titanium or zirconium nitride or carbide deposit having a hardness gradient which increases outwardly from the substrate
JPS5621068B2 (en) * 1974-12-25 1981-05-16
DE2605174B2 (en) * 1976-02-10 1978-07-27 Resista Fabrik Elektrischer Widerstaende Gmbh, 8300 Landshut Process for the production of thin-film resistance elements
DE2705225C2 (en) * 1976-06-07 1983-03-24 Nobuo Tokyo Nishida Ornamental part for clocks etc.
JPS5625960A (en) * 1979-08-09 1981-03-12 Mitsubishi Metal Corp Surface-coated high speed steel material for cutting tool
JPS5779169A (en) * 1980-11-06 1982-05-18 Sumitomo Electric Ind Ltd Physical vapor deposition method
DE3507927A1 (en) * 1985-03-06 1986-09-11 Dr.Ing.H.C. F. Porsche Ag, 7000 Stuttgart METHOD AND HAND DEVICE FOR SEMI-MECHANICAL GALVANIZING OF SHEET SURFACES

Also Published As

Publication number Publication date
KR900009101B1 (en) 1990-12-22
GB2158104A (en) 1985-11-06
KR850007987A (en) 1985-12-11
DE3515807A1 (en) 1985-11-07
JPH0237426B2 (en) 1990-08-24
JPS60234965A (en) 1985-11-21

Similar Documents

Publication Publication Date Title
GB8607278D0 (en) Thin film forming
GB2169442B (en) Forming thin semiconductor films
GB8518833D0 (en) Forming moncrystalline thin film
HK12291A (en) Light-polarizing film
GB8601878D0 (en) Film
GB2153589B (en) Thin film transistor
GB8601877D0 (en) Film
GB2169746B (en) Thin film transistor
EP0159027A3 (en) Magnetic thin film
GB8510576D0 (en) Producing thin film
GB8518834D0 (en) Forming moncrystalline thin film
EP0159028A3 (en) Magnetic thin film
GB8524761D0 (en) Manufacturing laminate film
GB8526542D0 (en) Obtaining transparencies
AU4211385A (en) Shutter arrangements
GB8415782D0 (en) Masking films
GB8612139D0 (en) Window film
GB8527737D0 (en) Manufacturing thin film transistors
GB8506730D0 (en) Forming silicon film
GB8617904D0 (en) Thin film
GB8630778D0 (en) Producing copolymer film
GB8523877D0 (en) Thin crystal/film
AU572345B2 (en) Thin film forming device
GB8423924D0 (en) Composite film
GB8507385D0 (en) Films

Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)