GB2501823B8 - Dielectric Capacitor - Google Patents

Dielectric Capacitor Download PDF

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Publication number
GB2501823B8
GB2501823B8 GB1307443.0A GB201307443A GB2501823B8 GB 2501823 B8 GB2501823 B8 GB 2501823B8 GB 201307443 A GB201307443 A GB 201307443A GB 2501823 B8 GB2501823 B8 GB 2501823B8
Authority
GB
United Kingdom
Prior art keywords
dielectric capacitor
dielectric
capacitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB1307443.0A
Other versions
GB2501823B (en
GB2501823A8 (en
GB2501823A (en
GB2501823C (en
GB201307443D0 (en
Inventor
Anjil Joseph Amaratunga Gehan
Choi Youngjin
Giridhar Shivareddy Sai
Charles Brown Nathan
Anthony Neild Collis Charles
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dyson Technology Ltd
Original Assignee
Dyson Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dyson Technology Ltd filed Critical Dyson Technology Ltd
Publication of GB201307443D0 publication Critical patent/GB201307443D0/en
Publication of GB2501823A publication Critical patent/GB2501823A/en
Publication of GB2501823B publication Critical patent/GB2501823B/en
Publication of GB2501823C publication Critical patent/GB2501823C/en
Application granted granted Critical
Publication of GB2501823A8 publication Critical patent/GB2501823A8/en
Publication of GB2501823B8 publication Critical patent/GB2501823B8/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • H01G4/008Selection of materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/08Inorganic dielectrics
    • H01G4/10Metal-oxide dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/08Inorganic dielectrics
    • H01G4/12Ceramic dielectrics
    • H01G4/1209Ceramic dielectrics characterised by the ceramic dielectric material
    • H01G4/1218Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates
    • H01G4/1227Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates based on alkaline earth titanates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40Capacitors
    • H01L28/60Electrodes
    • H01L28/82Electrodes with an enlarged surface, e.g. formed by texturisation
    • H01L28/90Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
    • H01L28/91Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions made by depositing layers, e.g. by depositing alternating conductive and insulating layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • H01L29/0665Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
    • H01L29/0669Nanowires or nanotubes
    • H01L29/0673Nanowires or nanotubes oriented parallel to a substrate
GB1307443.0A 2012-05-03 2013-04-25 Dielectric Capacitor Active GB2501823B8 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB1207766.5A GB201207766D0 (en) 2012-05-03 2012-05-03 Dielectric capacitor

Publications (6)

Publication Number Publication Date
GB201307443D0 GB201307443D0 (en) 2013-06-05
GB2501823A GB2501823A (en) 2013-11-06
GB2501823B GB2501823B (en) 2016-04-20
GB2501823C GB2501823C (en) 2016-08-10
GB2501823A8 GB2501823A8 (en) 2022-08-03
GB2501823B8 true GB2501823B8 (en) 2022-08-03

Family

ID=46330749

Family Applications (2)

Application Number Title Priority Date Filing Date
GBGB1207766.5A Ceased GB201207766D0 (en) 2012-05-03 2012-05-03 Dielectric capacitor
GB1307443.0A Active GB2501823B8 (en) 2012-05-03 2013-04-25 Dielectric Capacitor

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GBGB1207766.5A Ceased GB201207766D0 (en) 2012-05-03 2012-05-03 Dielectric capacitor

Country Status (2)

Country Link
GB (2) GB201207766D0 (en)
WO (1) WO2013164576A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9349789B1 (en) 2014-12-09 2016-05-24 International Business Machines Corporation Coaxial carbon nanotube capacitor for eDRAM

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6911373B2 (en) * 2002-09-20 2005-06-28 Intel Corporation Ultra-high capacitance device based on nanostructures
US20050167655A1 (en) * 2004-01-29 2005-08-04 International Business Machines Corporation Vertical nanotube semiconductor device structures and methods of forming the same
US7057881B2 (en) * 2004-03-18 2006-06-06 Nanosys, Inc Nanofiber surface based capacitors
EP2074641B1 (en) * 2006-10-04 2012-02-01 Nxp B.V. Mim capacitor and method of manufacturing a mim capacitor
US8424177B2 (en) * 2006-10-04 2013-04-23 Stmicroelectronics (Crolles 2) Sas MIM capacitor with enhanced capacitance
KR20100110853A (en) * 2007-12-31 2010-10-13 아토메이트 코포레이션 Edge-contacted vertical carbon nanotube transistor
US8603195B2 (en) * 2009-08-24 2013-12-10 Applied Materials, Inc. 3D approach on battery and supercapitor fabrication by initiation chemical vapor deposition techniques
US8405189B1 (en) * 2010-02-08 2013-03-26 Lockheed Martin Corporation Carbon nanotube (CNT) capacitors and devices integrated with CNT capacitors
CA2712051A1 (en) * 2010-08-12 2012-02-12 The Governors Of The University Of Alberta Method of fabricating a carbon nanotube array

Also Published As

Publication number Publication date
GB2501823B (en) 2016-04-20
GB2501823A8 (en) 2022-08-03
WO2013164576A1 (en) 2013-11-07
GB2501823A (en) 2013-11-06
GB2501823C (en) 2016-08-10
GB201307443D0 (en) 2013-06-05
GB201207766D0 (en) 2012-06-13

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Legal Events

Date Code Title Description
S117 Correction of errors in patents and applications (sect. 117/patents act 1977)

Free format text: REQUEST FILED; REQUEST FOR CORRECTION UNDER SECTION 117 FILED ON 28 JUNE 2016.

S117 Correction of errors in patents and applications (sect. 117/patents act 1977)

Free format text: CORRECTIONS ALLOWED; REQUEST FOR CORRECTION UNDER SECTION 117 FILED ON 28 JUNE 2016, ALLOWED ON 03 AUGUST 2016.