GB2183363A - Optical interference film - Google Patents
Optical interference film Download PDFInfo
- Publication number
- GB2183363A GB2183363A GB08625947A GB8625947A GB2183363A GB 2183363 A GB2183363 A GB 2183363A GB 08625947 A GB08625947 A GB 08625947A GB 8625947 A GB8625947 A GB 8625947A GB 2183363 A GB2183363 A GB 2183363A
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- GB
- United Kingdom
- Prior art keywords
- refractive index
- index layer
- optical interference
- interference film
- phosphorus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000011521 glass Substances 0.000 claims abstract description 21
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 20
- 239000011574 phosphorus Substances 0.000 claims abstract description 20
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 18
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052796 boron Inorganic materials 0.000 claims abstract description 18
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 18
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 16
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 12
- 239000011135 tin Substances 0.000 claims abstract description 11
- 230000001476 alcoholic effect Effects 0.000 claims abstract description 10
- 239000010941 cobalt Substances 0.000 claims abstract description 10
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 10
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 10
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- 239000011133 lead Substances 0.000 claims abstract description 9
- 239000002904 solvent Substances 0.000 claims abstract description 9
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 8
- 229910052718 tin Inorganic materials 0.000 claims abstract description 8
- 229910052785 arsenic Inorganic materials 0.000 claims abstract description 7
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 7
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 7
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 7
- 239000011591 potassium Substances 0.000 claims abstract description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 6
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000001035 drying Methods 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
- 239000010936 titanium Substances 0.000 claims abstract description 6
- 239000011701 zinc Substances 0.000 claims abstract description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 5
- 229910001936 tantalum oxide Inorganic materials 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims abstract description 3
- 238000000576 coating method Methods 0.000 claims abstract description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 4
- 238000009833 condensation Methods 0.000 claims description 4
- 230000005494 condensation Effects 0.000 claims description 4
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 4
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims description 4
- 239000002210 silicon-based material Substances 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910000428 cobalt oxide Inorganic materials 0.000 claims description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 238000002156 mixing Methods 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 150000003377 silicon compounds Chemical class 0.000 abstract 1
- 239000000654 additive Substances 0.000 description 12
- 230000000996 additive effect Effects 0.000 description 10
- 238000005336 cracking Methods 0.000 description 10
- -1 titanium alkoxide Chemical class 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RQFRTWTXFAXGQQ-UHFFFAOYSA-N [Pb].[Mo] Chemical compound [Pb].[Mo] RQFRTWTXFAXGQQ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 239000012636 effector Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01K—ELECTRIC INCANDESCENT LAMPS
- H01K1/00—Details
- H01K1/28—Envelopes; Vessels
- H01K1/32—Envelopes; Vessels provided with coatings on the walls; Vessels or coatings thereon characterised by the material thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The film (2), particularly suitable for a lamp provided with a glass bulb (1) and a sealed in filament (6), includes a high and a low refractive index layer stacked on each other. The high refractive index layer contains a metal oxide and includes at least one element selected from phosphorus, boron, arsenic, antimony, tin, zinc, lead, potassium, nickel and cobalt. The low refractive index layer contains silicon oxide and includes at least one of phosphorus and boron. Preferred metal oxides are titanium, tantalum and zirconium oxides. The layers may be prepared from solutions of organometallic or silicon compounds in an alcoholic solvent together with a compound of the appropriate element followed by coating, then drying and heating the layer formed. <IMAGE>
Description
SPECIFICATION
Optical interference film
This invention relates to an optical interference film for selectively emitting and reflecting light of different wavelengths. This film is conveniently incorporated in an electric lamp.
A lamp is known in which a visible lighttransmittinglinfrared light reflecting film is formed on a surface of the lamp. The film selectivelytransmitsvisible light emitted from afilament in the lamp through thefilm, but the film selectively reflects infrared rays emitted from the filament. The reflected infrared light returns to the filamentandfurther heatsthefilament, so that the light emitting efficiency ofthe lamp is improved. In addition, the amount of infrared lighttransmitted outside the lamp is reduced by thefilm.
Such a visible light transmitting infrared light reflecting film typically is formed of low refractive index layers consisting of silicon oxide (SiO2) orthe like and high refractive index layers consisting oftitanium oxide (TiO2) or the like. The two kinds of layers are stacked alternately on each other to form five to seven layers in total. Generally, such a film can selectively transmit or reflect light of a given wavelength range according to the optical interference between the layers. The optical interference ofthe film can be controlled by varying the thicknesses of the layers. This type of film is referred to as an optical interference film hereafter.
The conventional lamp described above has a drawback in that the optical interference film is generally weakforwithstanding mechanical stress and thermal expansion stress. Therefore,thefilm is aptto crackor drop out from the glass bulb orto peel from the glass bulb when the lamp has been used for a long period of time. These phenomena occur most frequently in halogen lamps having a high operating temperature, incandescent lamps which are turned on and off frequently at short intervals, and lamps having an optical interference film with an increased number of high and low refractive index layers which increases the rateof infrared ray reflection.
The problems described above may be reduced by using a structure described in Japanese Patent Disclosure No. 57-124301.This application discloses an optical interference film formed by low refractive index layers of silicon oxide (SiO2) orthe like and high refractive index layers of at least one compound selected from the group consisting of alumina (Al203), zirconium oxide (ZrO2) and titanium oxide (TiO2). An additive, such as tin (Sn) and/orzirconium (Zr), is included in the low refractive index layers. The additive in the low refractive index layers improves the stability ofthe film by bringing the thermal expansion coefficient ofthe low refractive index layer closerto that of the high refractive index layer.
However, the prior art optical interference film described in the above-mentioned patent disclosure is still insufficient to eliminate the problems of cracking or peeling when itis used on a halogen lamp having a hard glass bulb, such as quartz glass or borosilicate glass.
The present invention seeks to provide an optical interference film, particuarlysuitablefora lamp which is not subject to cracking and which does not peel easily. The present invention also seeks to provide a lamp having an optical interference film which is stable upon repeated and frequent lighting of the lamp for long periods oftime.
According to a first aspect of the present invention, an optical interference film for selectivelytransmitting light comprises a high refractive index layer and a low refractive index layer disposed on the high refractive index layer, the high refractive index layer including a metal oxide and at least one element selected from the group consisting of phosphorus, boron, arsenic, antimony, tin, zinc, lead, potassium, nickel and cobalt; and the low refractive index layer including silicon oxide and at least one of phosphorous and boron.
The metal oxide is preferably titanium oxide (TiO2), tantalum oxide (TaO2) or zirconium oxide (ZrO2).
According to a second aspect of the present invention, a method of making an optical interference film comprises the steps ofdissolving an organometalliccompound in an alcoholic solvent to form a solution; dissolving a compound containing one of phosphorus, boron, arsenic, antimony,tin,zinc, lead, potassium, nickel and cobalt in the solution; forming a thin layerofthe solution on a substrate; drying the layeronthe substrate; heating the solution in airtoform a high refractive index layer; dissolving a silicon containing compound in an alcoholic solventto form a condensation polymer solution; dissolving acompoundcontaining one of phosphorus and boron in the polymersolution; coating a thin layerofthe polymer solution on the high refractive index layer; drying the layer of the polymer solution on the high refractive index layer to form a composite; and heating the composite in airto form a low refractive index layer.
In orderthatthe present invention may be more readily understood, itwill now be described, by way of example only, with reference to the accompanying drawings, in which:
Figure lisa cross-sectional view showing a lamp according to the present invention; and
Figure2is a cross-sectional view showing the optical interference film formed on the glass bulb ofthe lamp.
Figure 1 shows a lamp, such as a halogen lamp, according to the present invention. The halogen lamp has a tubulartransparentglass bulb 1 made of hard glass, such as quartz glass and borosilicate glass. The glass bulb 1 is sealed hermetically at its base end 3. The base end 3 has molybdenum lead foils4 buried therein which are connected to internal leads 5. The internal leads 5 have a tungsten coil filament6suspended between them so thatthetungsten coil filament 6 is positioned in the centre of the tubular glass bulb 1 .The molybdenum lead foils 4 are also connected to a cap 7 mounted outsidethe sealed end 3 ofthe glass bulb 1.
The glass bulb 1 is filled with a mixture including an inertgas, such as an argon gas, and a halogen gas.
An optical interference film 2 which transmits visible light and reflects infrared rays is coated on the outer surface of the glass bulb 1. The optical interference film 2 is comprised of layers 21 and 22 which are alternately stacked on each other to form at least five layers in total. Each alternating layer has a different refractive index from the adjacent layers. The first layer, i.e., the lowermost layer adjacenttothe glass bulb 1 and other odd numbered layers 21 are high refractive index layers. The second layer and other even numbered layers 22 are low refractive index layers.The high refractive index layers 21 include at least one metal oxide subst- ance, such as titanium oxide (TiO2), tantalum oxide (Ta2O5), orzirconium oxide (ZrO2) and at least one com poundselectedfrom a first additive group including phosphorus (P), boron (B), arsenic (As), antimonyor stibium (Sb), tin or stannum (Sn), zinc (Zn), lead or plumbum (Pb), potassium or kalium (K), nickel (Ni) and cobalt (Co). The low refractive index layers 22 include silicon oxide (SiO2) with at least one memberselected from a second additive group of phosphorus (P) and boron (B).
The high and the low refractive index layers 21 and 22 are stacked alternately on each other preferablyto form nine to eleven layers. In addition, the thicknesses of the high and the low refractive index layers 21 and 22 are controlled, so that the optical interference film 2 has the desired optical interference effect oftransmitting sufficient amount of visible lighttherethrough, and reflecting a desired amount of infrared light therefrom. For example, the high and the low refractive layers 21,22 normally have an optical thickness of 0.2 Wm to 0.4 Fm, respectively.
A method offorming the optical interference film 2 will be described in detail hereafter. First, one or more organometalliccompounds oftitanium (Ti), tantalum (Ta) or zirconium (Zr) is dissolved in an alcoholicsol- vent, e.g., ethanol to form a first intermediate solution. For example, titanium alkoxide, e.g.,tetraisopropoxy titanium ortetramethoxytitanium may be used as the organometalliccompound oftitanium (Ti).Next, at leastone compound which is soluble in the alcoholic solvent, selected from the first additive group of phosphorus (P), boron (B), arsenic (As), antimony orstibium (Sb),tin orstannum (Sn), zine (Zn), lead or plumbum (Pb), potassium or kalium (K), nickel (Ni) and cobalt (Co) is added to the first intermediate solution to form a first resultant solution. Glass bulb 1 is immersed in thefirst resultantsolution. Afterimmersion, the glass bulb 1 is removed from the first resultant solution at a constant speed, e.g., 20 cm/min. to 30 cm/min..The first solution coated on the glass bulb 1 then is dried and baked at about 5000C to 600"C i n airfor about 10 minutes. During backing, the titanium alkoxide decomposes into titania to form the high refractive index layer 21.
Next, tetraalkoxy si[ane such as tetraethoxy silane or tetramethoxy silane is dissolved in an alcoholic solvent, e.g., ethanol. This solution is allowed to react so asto form a second intermediate solution oftetraalkoxy silane condensation polymer having a silicon concentration of, e.g.,5.0 by weight. Further, a phosph oruscompound and/ora boron compound soluble in the alcoholic solvent are added to the second intermediate solution so that a second resultant solution is prepared. Specifically, phosphorus pentoxide preferably is used as the phosphorus compound. The glass bulb 1 coated with the high refractive index layer 21 is immersed in the second resultant solution.After immersion, the glass bulb 1 is removed from the second resultant solution at a constant speed, e.g., 30 cm/min. to 40 cm/min.. The second resultant solution coated on the high refractive index layer 21 is also dried and baked at about 500 Cto 600"C in airfor aboutl0 minutes. During baking, the tetraalkoxy silane decomposes into silica to form the low refractive index layer 22, including a second additive such as phosphorus (P) and/or boron (B) originating from the phosphorus compound and /or boron compound.
In a halogen lamp manufactured by the above process, the optical interference film 2 selectivelytransmits visible light outside the lamp, but reflects the infrared rays inward to heat the filament so that the lighting efficiency ofthe lamp is increased.
In the halogen lamp ofthe above embodiment, the glass bulb 1 is heated to a relatively high temperature.
The low refractive index layers 22, however, have a thermal expansion coefficient close to that of the high refractive index layers 21 due to the second additive. Thus the optical interference film 2 is very stable against the thermal stress. Further, the high refractive index layers 21 and the low refractive index layers 22 accord- ing to the present invention are difficultto separatefrom each other. The first and second additives in the high and the low refractive index layers 21 and 22 are believed to be attracted mechamically or chemicallyto each other. Thus the lamp according to the present invention can endure long term use and frequent light- ingswithout cracking or peeling, even when the optical interference film 2 includes as many asten or more layers 21 and 22. TheTables below show the results of experiments with varying numbers of layers 21 and 22, and varying additives.
The experiments shown in Table 1 showthe effect of the present invention with phosphorus (P) added to the high and low refractive index layers. In Table 1, the amount of the additive, i.e., phosphorus (P), is 3 % by weight calculated on the basis of phosphorus pentoxide (P205).
TABLE 1 Sample I Sample Il Sample Ill Sample IV Present Prior Prior
Invention Art Art
High refractive TiO2 + P TiO2 + P TiO2 TiO2 layer
Low refractive SiO2 + P SlO2 SiO2 + P SiO2 layer
No cracking Cracking Cracking Peeling
Film observed observed observed observed strength in samples in samples in samples in samples
with upto with over with over with over
15 layers 8 layers 8 layers 4 layers
Next, the experiments shown in Table2were conducted to examine the effector a cobalt (Co) addition in the high refractive index layer and a boron (B) addition in the low refractive index layer.In Table 2,the amount of the first additive, i.e., cobalt (Co) was 3 % by weight calculated on the basis of cobalt oxide CoO.
The amountofthe second additive, i.e., boron (B), was 3% by weight calculated on the basis ofborontrioxide (B203).
TABLE 2
Samplel Sample!! Sample IIl Sample Present Prior Prior
Invention Art Art
High refractive ZrO2 + Co ZrO2 + Co ZrO2 ZrO2 layer
Low refractive SiO2 + B SiO2 SiO2 + B SiO2 layer
No cracking Cracking Cracking Peeling
Film observed observed observed observed
Strength in samples in samples in samples in samples withupto with over with over with over
13 layers 7layers 7layers 4layers
As seen from the Tables 1 and 2, each of the optical interference films 2 of the present invention is more resistant to cracking and peeling.
Various modification and variations may be made in the invention, without departing from the scope or spirit of the invention. For example, the present invention is able to apply to a reflection lamp having an interference film which transmits infrared rays and reflects visible light, a discharge lamp such as a metal halide lamp and the like.
Claims (20)
1. An optical interference film for selectively transmitting light comprising a high refractive index layer and a low refractive index layer disposed on the high refractive index layer, wherein the high refractive index layer includes a metal oxide and at least one elementselected from the group consisting of phosphorus, boron, arsenic, antimony, tin, zinc, lead, potassium, nickel and cobalt; and the low refractive index layer includes silicon oxide and at least one of phosphorus and boron.
2. The film of claim 1,wherein the metal oxide includes at least one compound selected from the group consisting oftitanium oxide, tantalum oxide and zirconium oxide.
3. The film of claim 1 or2, wherein there area plurality of both the high and low refractive index layers,the layers being arranged in alternating relation.
4. The film of claim 1,2 or 3, wherein the high refractive index layer includes titanium oxide and phosphorus, and the low refractive index layer includes silicon oxide and phosphorus.
5. An optical interference film as claimed in claim 4, wherein the amount of phosphorus present in both the high and low refractive index layers is 3% by weight calculated on the basis of phosphorus pentoxide.
6. The film of claim 1,2 or3, wherein the high refractive index layer includes zirconium oxide and cobalt, and the low refractive index layer includes silicon oxide and boron.
7. An optical interference film as claimed in claim 6,whereinthe amountofcobalt present in the high refractive index layer is 2% by weight calculated on the basis of cobalt oxide and the amount of boron present in the low refractive index layer is 3% by weight calculated on the basis of borontrioxide.
8. The film of any one of the preceding claims, wherein each of the high and low refractive index layers has a thickness of about 0.2 m to about 0.4 Wm.
9. An optical interference film as claimed in any preceding claim, wherein the high refractive index layer is on a surface of a translucent member.
10. An optical interference film as claimed in claim 9, wherein the translucent member is the hollow glass bulb of an electric lamp.
11. An optical interference film as claimed in claim 10, wherein the glass bulb is ofquartzorborosilicate glass and the bulb contains a quantity of inert gas or halogen gas.
12. A method of making an optical interference film comprising the steps of dissolving an organometallic compound in an alcoholic solventto form a solution; forming athin layerofthesolution on asubstrate; drying the layer on the substrate; heating the solution in air to form a high refractive index layer; dissolving a silicon containing compound in an alcoholic solvent to form a condensation polymer solution on the high refractive index layer; drying the layer of the polymer solution; coating a thin layer of the polymer solution on the high refractive index layer; drying the layer of the polymer solution on the high refractive inded layerto form a composite; and heating the composite in airto form a low refractive index layer; the method further comprising the steps of dissolving a compound containing one of phosphorus, boron, arsenic, antimony,tin, zinc, lead, potassium, nickel and cobalt in the solution, following the step of dissolving the organometallic compound in the alcoholic solvent; and dissolving a compound containing one of phosphorus and boron in the condensation polymer solution, following the step of dissolving the silicon containing compound in the alcoholic solvent.
13. The method of claim 12, wherein the step of dissolving an organometallic compound includesthe steps of adding a compound containing one of titanium, tantalum and zirconium to the alcohol solvent.
14. The method of claim 12 or 13, wherein the step of adding the compound includes the step of mixing the organometallic compound with ethanol.
15. The method of claim 12, 13 or 14, wherein the step of heating the substrate includes the step of exposing the substrate to a temperature of about 500into about 600 Cfor about 10 minutes.
16. The method of any one of claims 12 to 15, wherein the step of dissolving the silicon containing compound includes the step of reacting tetraalkoxy silane with ethanol.
17. An optical interference film in accordance with claim 1 substantially as described herein.
18. Amethod of making an optical interference film according to claim 12 substantially as described herein.
19. An optical interference film when produced bythe method of anyone of claims 12to 16 or 18.
20. A lamp comprising an optical interference film according to anyone of claims 1 to 11,17 or 19.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24299685A JPH07109758B2 (en) | 1985-10-31 | 1985-10-31 | Bulb |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB8625947D0 GB8625947D0 (en) | 1986-12-03 |
| GB2183363A true GB2183363A (en) | 1987-06-03 |
| GB2183363B GB2183363B (en) | 1989-09-27 |
Family
ID=17097338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB8625947A Expired GB2183363B (en) | 1985-10-31 | 1986-10-30 | Optical interference film |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPH07109758B2 (en) |
| DE (1) | DE3636676A1 (en) |
| GB (1) | GB2183363B (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0339130A2 (en) | 1988-04-29 | 1989-11-02 | Heraeus Med GmbH | Lighting fixture with halogen lamp |
| US5113109A (en) * | 1989-11-24 | 1992-05-12 | Toshiba Lighting & Technology Corporation | Optical interference film and lamp having the same |
| US5216542A (en) * | 1989-12-19 | 1993-06-01 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for the manufacturing of the coating |
| FR2713825A1 (en) * | 1993-12-10 | 1995-06-16 | Gen Electric | Light source with an optical interference filter, method for forming such a filter and lighting system provided with such a light source. |
| WO1996006453A1 (en) * | 1994-08-22 | 1996-02-29 | Philips Electronics N.V. | Electric lamp coated with an interference film |
| GB2311593A (en) * | 1996-03-29 | 1997-10-01 | Samsung Display Devices Co Ltd | Vehicle headlamp with dichroic filter |
| EP1003203A1 (en) * | 1998-11-18 | 2000-05-24 | Ushiodenki Kabushiki Kaisha | Filament lamp for emission of yellow light and process for the manufacture thereof |
| US6703131B1 (en) | 1999-06-24 | 2004-03-09 | Nippon Arc Co., Ltd. | Coated article |
| WO2005029536A2 (en) * | 2003-09-23 | 2005-03-31 | Koninklijke Philips Electronics N.V. | Electric lamp with an optical interference film |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2790468B2 (en) * | 1988-11-18 | 1998-08-27 | 松下電子工業株式会社 | Manufacturing method of halogen bulb |
| JPH02161403A (en) * | 1988-12-15 | 1990-06-21 | Toshiba Glass Co Ltd | Multilayered interference film |
| US5170291A (en) * | 1989-12-19 | 1992-12-08 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating |
| DE3941796A1 (en) * | 1989-12-19 | 1991-06-20 | Leybold Ag | Optical multilayer coating - with high anti-reflection, useful for glass and plastics substrates |
| JP2545727B2 (en) * | 1993-04-19 | 1996-10-23 | 工業技術院長 | Deodorant lamp and its manufacturing method |
| WO2001071246A1 (en) * | 2000-03-20 | 2001-09-27 | Bartenbach, Christian | Device for guiding light for an elongated light source |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4346131A (en) * | 1979-08-10 | 1982-08-24 | Westinghouse Electric Corp. | Polymerized solutions for depositing optical oxide coatings |
| JPH06100687B2 (en) * | 1983-08-22 | 1994-12-12 | 東芝ライテック株式会社 | Bulb |
-
1985
- 1985-10-31 JP JP24299685A patent/JPH07109758B2/en not_active Expired - Lifetime
-
1986
- 1986-10-28 DE DE19863636676 patent/DE3636676A1/en not_active Ceased
- 1986-10-30 GB GB8625947A patent/GB2183363B/en not_active Expired
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0339130A2 (en) | 1988-04-29 | 1989-11-02 | Heraeus Med GmbH | Lighting fixture with halogen lamp |
| EP0339130A3 (en) * | 1988-04-29 | 1990-05-16 | W.C. Heraeus Gmbh | Lighting fixture with halogen lamp |
| US5113109A (en) * | 1989-11-24 | 1992-05-12 | Toshiba Lighting & Technology Corporation | Optical interference film and lamp having the same |
| US5216542A (en) * | 1989-12-19 | 1993-06-01 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for the manufacturing of the coating |
| FR2713825A1 (en) * | 1993-12-10 | 1995-06-16 | Gen Electric | Light source with an optical interference filter, method for forming such a filter and lighting system provided with such a light source. |
| WO1996006453A1 (en) * | 1994-08-22 | 1996-02-29 | Philips Electronics N.V. | Electric lamp coated with an interference film |
| GB2311593A (en) * | 1996-03-29 | 1997-10-01 | Samsung Display Devices Co Ltd | Vehicle headlamp with dichroic filter |
| EP1003203A1 (en) * | 1998-11-18 | 2000-05-24 | Ushiodenki Kabushiki Kaisha | Filament lamp for emission of yellow light and process for the manufacture thereof |
| US6300710B1 (en) | 1998-11-18 | 2001-10-09 | Ushiodenki Kabushiki Kaisha | Filament lamp for emission of yellow light |
| US6703131B1 (en) | 1999-06-24 | 2004-03-09 | Nippon Arc Co., Ltd. | Coated article |
| WO2005029536A2 (en) * | 2003-09-23 | 2005-03-31 | Koninklijke Philips Electronics N.V. | Electric lamp with an optical interference film |
| WO2005029536A3 (en) * | 2003-09-23 | 2006-11-16 | Koninkl Philips Electronics Nv | Electric lamp with an optical interference film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07109758B2 (en) | 1995-11-22 |
| GB2183363B (en) | 1989-09-27 |
| DE3636676A1 (en) | 1987-05-07 |
| JPS62105357A (en) | 1987-05-15 |
| GB8625947D0 (en) | 1986-12-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19981030 |