GB2148680A - X-ray collimator - Google Patents
X-ray collimator Download PDFInfo
- Publication number
- GB2148680A GB2148680A GB08419439A GB8419439A GB2148680A GB 2148680 A GB2148680 A GB 2148680A GB 08419439 A GB08419439 A GB 08419439A GB 8419439 A GB8419439 A GB 8419439A GB 2148680 A GB2148680 A GB 2148680A
- Authority
- GB
- United Kingdom
- Prior art keywords
- ray
- collimator
- accompanying drawings
- holes
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005540 biological transmission Effects 0.000 abstract description 6
- 239000011521 glass Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Theoretical Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Mathematical Physics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
An X-ray collimator 7 minimizing the attenuation of an X-ray to improve an X-ray transmission factor includes an X-ray transmitting portion having a plurality of through-holes 9, 9' and a frame member 8 for supporting the X-ray transmitting portion so that the attenuation of the X-ray is suppressed and the X-ray transmission factor is improved. The collimator is applied to apparatus in which an integrated circuit pattern is transferred to a wafer by exposure to soft X-rays through a photomask (Figure 5). <IMAGE>
Description
SPECIFICATION
An X-ray collimator and an X-ray exposure apparatus having the X-ray collimator
This invention relates to a collimatorfor collimating
X-rays, particularly soft X-rays, and to an X-ray exposure apparatus having such collimator.
X-ray collimators have been used inthefield of
X-ray analyzers, and recently are used in X-ray exposure apparatuses wherein X-rays are used to transfer an integrated circuit pattern formed on a mask or reticle to a radiation-sensitive layer on a wafer. In the X-ray exposure apparatus, the mask or reticle (which will hereinafter be referred to simply as "mask") having a pattern formed thereon is irradiated by diverging soft X-rays so that the image transfer onto the sensitive layer on the wafer tends to be affected by the angles of incidence ofthe X-rays. In view ofthis, an X-ray collimator is employed to collimatethesoftX-rays irradiating the maskto improve the accuracy oftransfer ofthe circuit pattern ofthe mask onto the sensitive layer.
Figure 1 shows an example of a basic X-ray collimator. The collimator comprises two blocks each of which includes a plurality of thin metal slit plates 1 connected to each other with spacers 2 intervening therebetween. The slit plates 1 and spacers 2 are secured to a support frame (not shown) to provide each block. As is shown in the drawing, one ofthethus formed blocks rests on the other in the manner that the lengthwise direction ofthe slit of one block extends perpendicular to that of the other block. Among the diverging X-rays 3 emerging from an unshown source, onlythecomponents substantially orthogonal tothecollimatingsystemaretaken upsothatan approximately parallel X-rayflux 6 is obtainable.For the purpose of description, the wide dand the length I of each slit in one block are equal respectively to those in the other block in the illustrated arrangement.
Therefore, the angle of divergence is2tan-1(dll) degrees and the X-ray transmission factor is 11(1 +t/d)2 where tis the thickness ofthe slit plate. The intensity of
X-ray decreases in inverse proportion to the square of the distance from the X-ray source. It is understood from the above mathematical conditions that, in order to assure good parallelism (small angle of divergence), a high transmission factorand a high intensity ofX-rayflux, the width dot the slit and the thickness t ofthe slit plate should desirably be decreased to prevent increase in the length Jofthe slit. Moreover, in orderto facilitate industrial manufacture, the structure should be simple and the increase in the cost should be suppressed.
In usual, however, the thickness tofthe slit plate can not be less than ofthe order of 0.03 mm even if the slit plate is made of metal having a high rigidity. If a lesser thickness is employed, it becomes necessary to incorporate additionat means for removing flexure of the slit plate, which disadvantageously leads to a complicated structure and an increased cost of manufacture of the device.
It is accordingly a primary object ofthe present invention to provide an X-raycollimatorwhich ensures improved parallelism and an increased transmission factor ofthe X-rayflux.
Another object of the present invention is to provide an X-ray exposure apparatus including an improved
X-ray collimator as above.
These and other objects, features and advantages of the present invention will become more apparatus upon a consideration ofthefollowing description of the preferred embodiments ofthe present invention taken in conjunction with the accompanying drawings.
Figure lisa perspective view showing an example of a basic X-ray collimator.
Figure 2 is a perspective view showing an X-ray collimator according to one aspect ofthe present invention.
Figure 3 is an enlarged view showing the major part oftheX-raycollimatorshown in Figure 3.
Figures 4A, 4B and 4C illustrate, respectively, modified forms of X-ray collimators according to the present invention.
Figure5 is a schematic view showing an X-ray exposure apparatus according to a further aspect of the present invention.
Referring now to Figure 2 - 5, embodiments of the present invention wil be described.
Figure2 generally shows a softX-raycollimator according to one aspect ofthe present invention, while Figure 3 shows, in an enlarged scale, the major partofthe structure shown in Figure 2. The collimator includes a soft X-ray collimating portion 7 made of a glass. As is best shown in Figure 3, the collimating portion 7 includes a multiplicity of unit fine throughbores or holes 9, 9' each ofwhich has an interior diameter dofthe orderof 10 microns and a length lof the order of millimeters. The collimating portion 7 is supported bya support frame 8 made of a glass or other suitable material.
With this arrangement, diverging soft X-rays denoted at3 in Figure 3 and emitted from an X-ray generator 22 are collirr.ated bythe collimating portion 7sothatan approximatelyparallelX-rayflux6' is obtained. More specifically, only those ofthe soft
X-rays having angles of divergence notgreaterthan 2tan-l(d/l) are taken up by the provision offine through-bores 9, 9' each ofwhich has an interior diameterdanda length!. Considering nowthe collimation at one one the fine through-bores 9, 9', a part of the diverging softX-raysenteringthefine through-bore impinges against the glass wall of the through-bore so that it is restrained thereby, while the remaining part passesthrough thefinethrough-bore without impringing againstthe glass wall.The latter, emerging X-ray flux, has a divergence angle of 2tan1(d/l) as has been described in the foregoing. If, for example, a divergence angle of 1 degree isto be obtained, and wherethe interiordiameterdofthe through-bore is 30 microns, the length lof the through-bore may about3.44 mm.
Thefinethrough-borescan be manufactured buy a known method, e.g. a glass-plate fine mesh manufacturing method forthe manufacture of micro-channel plate (such as disclosed in "Optical Fiber", pages 191 193, published by Kyoritsu Shuppan Kabushiki
Kaisha).Thistechnique has beenwidely used, and the plate with fine bores can be considered as being equivalent to the fine mesh plate before the formation of electrodes or the like. Accordingly,the fine throughbores ofthe present invention can be conveniently manufactured.
Referring nowto Figures4A-4C, modified forms of the collimator according to the present invention will be described. The collimator shown in Figure 4A comprises a glass frame 10 and a multiplicity offine tubular element 11 supportedly arranged within the frame 10. Sincethe diameter of each tubular element is so small thatthe handling thereof is notso easy,the tubular elements are first disposed in a multi-array fashion and then are subjected to a high-temperature and a high pressure within an oven sothattheyare welded to each other.
As an alternative,thetubular element 1 may be replaced by optical fibers each of which has a meltable core. In this case, the core is removed by a suitable acid treatment afterthe welding.
The thus formed weld plate is then sliced up to provide collimators of desired thickness. In the collimatorshown in Figure 4A,thewall thickness of each tubular element is of the order of 2.5 microns whilethe interior diameter is ofthe order of 25 micron.
Figures 4B and 4C showfurther modified forms wherein each fine through-bore shown in Figure 4B has a rectangular cross-section while each fine through-bore shown in Figure 4C has a hexagonal cross-section. The embodiments ofcircularcross- section and hexagonal cross-section are particularly advantageous, since the fine through-bores of these embodiments are easy to manufacture and, in addition thereto, the cross-sectional area to be occupied bythe partition walls is small so thatthe X-ray transmission factor can be improved further.
The collimator according to the present invention can be used in all the fields wherein collimated soft
X-rays are to be used, such as typically X-ray analyzers and X-ray exposure apparatuses.
Referring now to Figure 5, an X-ray exposure apparatus according to another aspect ofthe present invention will be described. The X-ray exposure apparatus comprises a vacuum chamber 12, electron guns 13, a soft X-ray generating target 14 and a window for passing therethrough the soft X-rays generated bythetarget 14. The electron guns 13 are arrayed in the direction perpendicularto the sheet of the drawing and the target 14 extends perpendicularly to the sheet of the drawing so that a linear soft X-ray flux is provided.
The X-ray exposure apparatusfurther comprises an
X-ray collimator including a collimating portion 7 and aframe member8forthecollimating portion. The collimator shown in this drawing has substantially the same arrangement as of Figure 2 embodiment. The apparatusfurthercomprisesa photomaskchuckl7 for holding a photomask 16 having formed thereof an integrated circuit pattern, and a wafer chuck 19 for holding a wafer 18 having thereon a sensitive layer.
The photomaskchuck 17 andthewaferchuckl9are arranged so thatthey are moved as a unit at a constant speed along a guide member 20 by an unshown driving mechanismwhilethey hold the photomask 16 and wafer 18 with a proximity relation being main tained therebetween.
With this arrangement, the electron beams emitted from the electron guns 13 irradiate the target 14so that soft X-rays are generated. The thus generated soft X-raysdiverginglypassthroughthewindowand are incident on the collimating portion 7. Bythiscollimat- ing portion 7,the non-parallel components are restrained while the parallel components pass throughthecollimating portion 7 to linearly irradiate the photomask 16. Since the photomask 16 and wafer 18 are scanningly moved as a unit as described before, the whole surface of each of the photomask 16 and wafer 18 is uniformly irradiated with the soft X-rays.
It is known that the soft X-ray steeply attenuates in the air as compared with the hard X-ray used in the medical field. Whilethe collimatorshown in Figure 1 requires a distance of not less than 12cm from the X-ray generating point to the surface of the sensitive layer on the wafer 16 in orderto obtain a satisfactory parallelism,the collimator according to the present invention effectively reduces the necessary distance between the X-ray generating point and the surface of the sensitive layerto a degree offew millimeters.
Therefore, the exposure time is advanageously decreased to a degree of 1110 - 1120 or less, as compared with that in the case of Figure 1 collimator.
Moreover, the X-ray collimator according to the present invention is itself of simple structure and can be manufactured at a decreased cost. Further, the thickness of the collimator is sufficiently thin so that the attenuation of the X-rays is minimized to ensure a higherX-raytransmission factor.
As has been in the foregoing, the X-ray collimator and the X-ray exposure apparatus, in accordance with the present invention provide various advantageous effects.
Whilethe invention has been described with reference to the structures disclosed herein, it is not confined to the details setforth and this application is intended to cover such modifications or changes as may come within the purposes ofthe improvements orthe scope of the following claims.
Claims (10)
1. An X-ray collimator comprising:
an X-raytransmitting portion having a plurality of through-holes; and
a frame memberforsupporting said X-ray transmitting portion.
2. An X-ray collimator according to claim 1, wherein each of said through-holes has a circular cross-section.
3. An X-ray collimator according to claim 1, wherein each of said through-holes has a polygonal cross-section.
4. An X-ray exposure apparatus for exposing a sensitive layer on a wafer to a circuit pattern formed on a maskwith the use of an X-ray, comprising:
means for generating the X-ray;
means for holding the mask; means for holding the wafer; and
X-ray collimating means disposed between said mask holding means and said X-ray generating means to collimate the X-ray, said X-ray collimating means including an X-ray transmitting portion having a
plurality ofthrough-holes and a frame memberfor supporting said X-raytransmitting portion so that the
X-ray generated by said X-ray generating portion is collimator to irradiate the mask.
5. An X-ray collimator comprising a member having an arrayofX-raytransmissive portions, each ofwhich isso shaped asto inhibitthe spreading of X-rays passing thereth rough in all directions trans- verse to the principal direction ofthe rays.
6. An X-ray collimator substantially as herein described with reference to Figs. 2 and 3 of the accompanying drawings.
7. An X-raycollimatorsubstantially as herein described with reference to Fig. 4a of the accompanying drawings.
8. An X-ray collimator substantially as herein described with reference to Fig. 4b of the accompanying drawings.
9. An X-ray collimator substantially as herein described with reference to Fig. 4c of the accompanying drawings.
10. Exposure apparatus substantially as herein described with reference to Fig. 5 ofthe accompanying drawings.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58144126A JPS6034018A (en) | 1983-08-06 | 1983-08-06 | X-ray collimator and exposing apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
GB8419439D0 GB8419439D0 (en) | 1984-09-05 |
GB2148680A true GB2148680A (en) | 1985-05-30 |
Family
ID=15354800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08419439A Withdrawn GB2148680A (en) | 1983-08-06 | 1984-07-31 | X-ray collimator |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS6034018A (en) |
DE (1) | DE3428717A1 (en) |
GB (1) | GB2148680A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5016267A (en) * | 1986-08-15 | 1991-05-14 | Commonwealth Scientific And Industrial Research | Instrumentation for conditioning X-ray or neutron beams |
EP1045398A3 (en) * | 1999-04-12 | 2003-12-17 | General Electric Company | Radiation imager collimator |
WO2005027143A2 (en) * | 2003-09-12 | 2005-03-24 | Philips Intellectual Property & Standards Gmbh | Arrangement for collimating electromagnetic radiation |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3711164A1 (en) * | 1987-04-02 | 1988-10-20 | Zeiss Carl Fa | PLUG-ELEMENT DEVICE FOR HOLDING COMPONENTS IN STACKS |
US5528659A (en) * | 1994-04-25 | 1996-06-18 | Gray*Star, Inc. | Radiation flux polarizer or distributor |
DE19947537A1 (en) * | 1999-10-02 | 2001-04-05 | Philips Corp Intellectual Pty | X-ray absorption grating |
DE102008030893A1 (en) * | 2008-06-30 | 2009-12-24 | Siemens Aktiengesellschaft | Stray radiation collimator for use in radiation detector, has group of absorber elements arranged in collimation direction and another group of another absorber elements arranged in another collimation direction |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1160609A (en) * | 1966-11-14 | 1969-08-06 | Picker Corp | Multi-Passage Collimators |
GB1218096A (en) * | 1967-05-09 | 1971-01-06 | Tokyo Shibaura Electric Co | Honeycomb block used for collimation of radiations and method of manufacturing the same |
GB1236163A (en) * | 1968-04-01 | 1971-06-23 | Nuclear Chicago Corp | Radiation detector devices |
GB1274213A (en) * | 1968-06-05 | 1972-05-17 | Coal Industry Patents Ltd | Improvements in and relating to density-measuring apparatus |
GB1343339A (en) * | 1970-07-07 | 1974-01-10 | Nuclear Chicago Corp | Radiation collimators |
GB1363246A (en) * | 1970-10-12 | 1974-08-14 | Nuclear Chicago Corp | Scintillation cameras |
GB1387895A (en) * | 1971-11-23 | 1975-03-19 | Larsson G A B | Scintillation camera with improved resolution |
GB1436871A (en) * | 1972-05-08 | 1976-05-26 | Albert R D | Spectrometry |
GB1478573A (en) * | 1974-06-11 | 1977-07-06 | Medical Data Systems Corp | Tomographic gamma ray imaging devices |
GB1489652A (en) * | 1974-01-10 | 1977-10-26 | Radiologie Cie Gle | Hybrid scintillation scanning apparatus |
GB1536497A (en) * | 1975-03-17 | 1978-12-20 | Galileo Electro Optics Corp | X and gamma radiation collimator and method of manufacturing such collimator |
GB1578883A (en) * | 1976-02-09 | 1980-11-12 | Univ Ohio State | Gamma camera |
WO1982000897A1 (en) * | 1980-09-10 | 1982-03-18 | A Larsson | Multitube collimator for instance scintillation cameras |
-
1983
- 1983-08-06 JP JP58144126A patent/JPS6034018A/en active Pending
-
1984
- 1984-07-31 GB GB08419439A patent/GB2148680A/en not_active Withdrawn
- 1984-08-03 DE DE19843428717 patent/DE3428717A1/en not_active Withdrawn
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1160609A (en) * | 1966-11-14 | 1969-08-06 | Picker Corp | Multi-Passage Collimators |
GB1218096A (en) * | 1967-05-09 | 1971-01-06 | Tokyo Shibaura Electric Co | Honeycomb block used for collimation of radiations and method of manufacturing the same |
GB1236163A (en) * | 1968-04-01 | 1971-06-23 | Nuclear Chicago Corp | Radiation detector devices |
GB1274213A (en) * | 1968-06-05 | 1972-05-17 | Coal Industry Patents Ltd | Improvements in and relating to density-measuring apparatus |
GB1343339A (en) * | 1970-07-07 | 1974-01-10 | Nuclear Chicago Corp | Radiation collimators |
GB1363246A (en) * | 1970-10-12 | 1974-08-14 | Nuclear Chicago Corp | Scintillation cameras |
GB1387895A (en) * | 1971-11-23 | 1975-03-19 | Larsson G A B | Scintillation camera with improved resolution |
GB1436871A (en) * | 1972-05-08 | 1976-05-26 | Albert R D | Spectrometry |
GB1489652A (en) * | 1974-01-10 | 1977-10-26 | Radiologie Cie Gle | Hybrid scintillation scanning apparatus |
GB1478573A (en) * | 1974-06-11 | 1977-07-06 | Medical Data Systems Corp | Tomographic gamma ray imaging devices |
GB1536497A (en) * | 1975-03-17 | 1978-12-20 | Galileo Electro Optics Corp | X and gamma radiation collimator and method of manufacturing such collimator |
GB1578883A (en) * | 1976-02-09 | 1980-11-12 | Univ Ohio State | Gamma camera |
WO1982000897A1 (en) * | 1980-09-10 | 1982-03-18 | A Larsson | Multitube collimator for instance scintillation cameras |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5016267A (en) * | 1986-08-15 | 1991-05-14 | Commonwealth Scientific And Industrial Research | Instrumentation for conditioning X-ray or neutron beams |
EP1045398A3 (en) * | 1999-04-12 | 2003-12-17 | General Electric Company | Radiation imager collimator |
WO2005027143A2 (en) * | 2003-09-12 | 2005-03-24 | Philips Intellectual Property & Standards Gmbh | Arrangement for collimating electromagnetic radiation |
WO2005027143A3 (en) * | 2003-09-12 | 2005-05-26 | Philips Intellectual Property | Arrangement for collimating electromagnetic radiation |
US7356125B2 (en) | 2003-09-12 | 2008-04-08 | Koninklijke Philips Electronics N.V. | Arrangement for collimating electromagnetic radiation |
Also Published As
Publication number | Publication date |
---|---|
GB8419439D0 (en) | 1984-09-05 |
JPS6034018A (en) | 1985-02-21 |
DE3428717A1 (en) | 1985-02-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |