GB2109390A - Light-crosslinkable polysiloxanes - Google Patents
Light-crosslinkable polysiloxanes Download PDFInfo
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- GB2109390A GB2109390A GB08227636A GB8227636A GB2109390A GB 2109390 A GB2109390 A GB 2109390A GB 08227636 A GB08227636 A GB 08227636A GB 8227636 A GB8227636 A GB 8227636A GB 2109390 A GB2109390 A GB 2109390A
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- United Kingdom
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- -1 polysiloxanes Polymers 0.000 title claims abstract description 47
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 37
- 150000001875 compounds Chemical class 0.000 claims abstract description 38
- 238000000576 coating method Methods 0.000 claims abstract description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- 150000008064 anhydrides Chemical class 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 238000004132 cross linking Methods 0.000 claims description 5
- 238000002360 preparation method Methods 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims description 4
- DDJSWKLBKSLAAZ-UHFFFAOYSA-N cyclotetrasiloxane Chemical compound O1[SiH2]O[SiH2]O[SiH2]O[SiH2]1 DDJSWKLBKSLAAZ-UHFFFAOYSA-N 0.000 claims description 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 claims description 3
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 229920002554 vinyl polymer Chemical group 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 230000003301 hydrolyzing effect Effects 0.000 claims description 2
- 150000002431 hydrogen Chemical group 0.000 claims 4
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims 2
- 239000011810 insulating material Substances 0.000 abstract description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 150000003254 radicals Chemical class 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 238000011067 equilibration Methods 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910002621 H2PtCl6 Inorganic materials 0.000 description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 235000011152 sodium sulphate Nutrition 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 238000000214 vapour pressure osmometry Methods 0.000 description 3
- TXAHKWVISPGERG-UHFFFAOYSA-N 1-(3-dichlorosilylbutyl)-3,4-dimethylpyrrole-2,5-dione Chemical compound CC(CCN1C(C(=C(C1=O)C)C)=O)[SiH](Cl)Cl TXAHKWVISPGERG-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- SUOBASCJDFUKLT-UHFFFAOYSA-N 1-[3-[[3-(3,4-dimethyl-2,5-dioxopyrrol-1-yl)propyl-dimethylsilyl]oxy-dimethylsilyl]propyl]-3,4-dimethylpyrrole-2,5-dione Chemical compound O=C1C(C)=C(C)C(=O)N1CCC[Si](C)(C)O[Si](C)(C)CCCN1C(=O)C(C)=C(C)C1=O SUOBASCJDFUKLT-UHFFFAOYSA-N 0.000 description 1
- GKFUOUFVGNXLDK-UHFFFAOYSA-N 1-ethenyl-3,4-dimethylpyrrole-2,5-dione Chemical compound CC1=C(C)C(=O)N(C=C)C1=O GKFUOUFVGNXLDK-UHFFFAOYSA-N 0.000 description 1
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical group O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 150000001983 dialkylethers Chemical class 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- ZJULYDCRWUEPTK-UHFFFAOYSA-N dichloromethyl Chemical compound Cl[CH]Cl ZJULYDCRWUEPTK-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical group COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- ZHNUHDYFZUAESO-UHFFFAOYSA-N formamide Substances NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 229940073561 hexamethyldisiloxane Drugs 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 231100000489 sensitizer Toxicity 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Novel light-crosslinkable polysiloxanes having an average molecular weight of 750 to 1.500.000 and consisting of 10 to 100 mole % of recurring structural units of the formula I <IMAGE> and of 0 to 90 mole % of recurring structural units of the formula <IMAGE> such that each molecule contains on average at least three structural units of the formula I, and A, R1, R2, R3 and R4 are as defined in claim 1, are suitable e.g. for making moulded articles, photosensitive resists, electrical insulating materials, films, finishes and coatings, if desired in admixture with compounds of the formula X <IMAGE>
Description
SPECIFICATION
Light-crosslinkable polysiloxanes
The present invention relates to novel lightcrosslinkabie polysiloxanes, to the preparation thereof, and to the crosslinked polysiloxanes so obtained.
Polysiloxaneswhich contain phenylmaleimide groups and the use thereof for the production of photohardened films and coatings are described in German Auslegeschrift 25 57 940. Similar polysiloxanes which contain maleimide groups and are substituted in the 2- or 3-position by aromatic or heterocyclic groups, and the use thereof for the production of printing plates, are described in Japanese published patent specifications 77-106864 and 77-105002.
The present invention provides novel lightcrosslinkable polysiloxanes of high light sensitivity, which polysiloxanes have an average molecular weight of 750 to 1,500,000 and consist of 10 to 100 mole % of recurring structural units of the formula I
and of 0 to 90 mole % of recurring structural units of the formula II
such that each molecule contains on average at least three structural units of the formula 1, in which formulae A is a -CpH2p- radical, in which p is 2 to 10, the main chain of which radical may be interrupted by -O-, -NH- or -NH-C,-C,al kyl, Rr is hydrogen, methyl, phenyl or vinyl,
R2 is methyl or phenyl, and each of
R3 and R4 independently of the other is C,-C4alkyl or together they are trimethylene or tetramethylene, each unsubstituted or substituted by a methyl group.
In the different structural units of the formulae I
and Il, each of the symbols A, A1, R2, R3 and R4 may
denote identical or different radicals as defined
herein. Preferably they each denote identical radi
cals.
A-CpH2p- radical represented by A may be straight
chain or branched. The radical A may be e.g.: -(CH2)p-, in which p = 2-10,-CH2CH2OCH2CH2-, -CH2CH#NHCH2CH2-, -CH2CH2NHCH2CH2NHCH2CH2-, -CH2CH2NH(CH263, -CH2CH2N(CH3)CH2CHr, #H2CH(CH3)-, -CH2CH2CH(CH3)-, -CH2CH2CH (CH3)CH2CH2- and -CH2CH (CH3)CH (CH3)CH2-. Preferably A is #CK2)p#, in which p is 2 to 10 and, most preferably, -(CH2)2 or -(CH2)3.
R1 is preferably hydrogen or methyl. R2 is preferably methyl. Alkyl groups R3 and R4 may be straight chain or branched, but are preferably straight chain.
It is preferred that each of R3 and R4 is methyl.
The average molecular weights may be determined in a manner known per se., e.g. by light scattering or by vapour pressure osmometry (weight or number average).
The light-crosslinkable polysiloxanes of this invention may be prepared in a manner which is known per se, e.g. either by
a) cohydrolysing a compound of the formula Ill
with 10 to 100 mole % of a compound of the formula
IV
and subsequently equilibrating the reaction product, or
b) reacting a poly - H siloxane of the formula V
with 10 to 100 mole % of a compound of the formula
VI
Certain of the Chemical formula(e) appearing in the printed specification were
submitted after the date of filing, the formula(e) originally submitted
being incapable of being satisfactorily reproduced.
in which formulae above A, R2, R3 and R4 are as
defined for formulae I and Il, At is a -CpH2p~,- radical,
in which p is 2 to 10, the main chain of which radical may be interrupted by -0,-NH-or -NH-C1-C4aIkyI, and R', is hydrogen, methyl or phenyl, but must be
hydrogen in at least 10 mole % of the structural units
of the formula V.
Polysiloxanes of this invention may also be
obtained by equilibrating a cyclotetrasiloxane of the formula Vlla
wherein at least one X is a group
and the others are a group
or R, if desired together with suitable amounts of a cyclotetrasiloxane of the formula Vllb
in which formulae above A, R" R2 R3 and R4 have the meanings previously assigned to them.
In a further process, polysiloxanes of the present invention may also be obtained by reacting a polysiloxane consisting of 10 to 100 mole % of recurring structural units of the formula VIlla
and 0 to 90 mole % of recurring structural units of the formula Vlilb
with 10 to 100 mole % of an anhydride of the formula
in which formulae (Vlla), (Vllb), (Villa) and (Vlllb) above A, Rt, R2, R3 and R4 have the meanings previously assigned to them.
Oligomeric or polymeric linear or cyclic polysiloxanes are formed in the cohydrolysis of the compounds of the formula III with the compounds of the formula IV in accordance with process variant a). The cohydrolysis is conveniently carried out in aqueous medium or preferably in aqueous-organic medium.
Examples of suitable solvents are aliphatic ethers, preferably dialkyl ethers such as diethyl ether, methyl ethyl ether and diisopropyl ether, as well as 1,2-dimethoxyethane. In the subsequent equilibration, the mixtures of linear and cyclic siloxanes of different molecular weight are converted by redistribution of the Si# bonds into mixtures of linear siloxanes of higher and more uniform average
molecular weights. These equilibration reactions
may be catalysed by heat or by acids or bases. It is
preferred to carry out the equilibration in the pres
ence of an acid catalyst, preferably concentrated sul furicacid or an acid earth, and, if desired, in the
presence of an inert organic solvent.
The addition of the maleimide of the formula Vitro the poly-H-siloxane of the formula V is conveniently
carried out in the presence of an inert organic sol
vent and of a catalyst. Examples of suitable solvents
are: aromatic hydrocarbons such as benzene, toluene and xylenes, 1,2-dimethoxyethane and
diethylene glycol dimethyl and diethyl ether.
The catalysts employed are normally noble metal
catalysts, preferably platinum, palladium and
rhodium catalysts, e.g. platinum on carbon, H2PtCl6, palladium acetate and rhodium phosphine com plexes. The preferred catalyst is H2PtCl6. The reaction is advantageously carried out at elevated temperature.
The reaction of the polysiloxanes which contain amino groups with the anhydrides of the formula IX is conveniently carried out in the presence of an inert organic solvent such as toluene, a xylene, N,Ndimethyl-formamide or N,N-dimethylacetamide, at elevated temperature and /or with the addition of a dehydrating agent, e.g. acetic anhydride.
The invention also relates to novel crosslinked polysiloxanes which may be obtained by crosslinking a light-crosslinkable polysiloxane as defined herein in the presence of O to 30 mole %, preferably 0 to 15 mole %, of a compound of the formula X
wherein A, Rt, R, R3 and R4 are as defined for formulae II and Ill and z is an integer from 1 to 20,000, by the action of light.
The compounds of the formula X are novel and likewise constitute an object of the invention. The symbols R1 and R2 in the recurring units may denote identical or different radicals. Preferably R1 and R2 in each structural unit have the same meaning. The preferred meanings of A, R1, Rg, R3 and R4 are the same as those given above. Preferred compounds of the formula X are those in which A is-(CH2)p- (p = 2-10) and z is an integer from 1 to 20.Particularly preferred compounds of the formula X are those in which A is -(CH2)T Or or-(CH2)3-, R1 is hydrogen or methyl, each of R, R3 and R4 is methyl and z is an integerfrom 1 to 20.
The compounds of the formula X may be obtained in a manner which is known per se, e.g. by
A) equilibrating a compound of the formula X, in which x is at least 1, with a cyclotetrasiloxane of the formula Vllb
B) reacting a compound of the formula Xl
with a compound of the formula VI
in the molar ratio of 1:2, C) hydrolysing a compound of the formula XII
to the corresponding disiloxane and, if appropriate, equilibrating the reaction product with a suitable cyclosiloxane, or reacting said compound of the formula (XII) with a compound of the formula XIII
in the molar ratio of 2:1, or D) reacting a compound of the formula XIV
with an anhydride of the formula IX, in the molar ratio of 1:2.In the formulae (Vllb), (XI), (VI), (Xll), (Xlil) and (XIV) above, z, A, R1, R2, R3 and R4 have the meanings previously assigned to them, A1 is a -CpH2p~,- radical, in which p is 2 to 10, the main chain of which radical may be interrupted by -O-, -NH- or-NH-C1-C4-aIkyI, and R'1 is methyl or phenyl.
The equilibration of the compounds of the formula (Vllb) is carried out under the same conditions as previously described above. The addition of the compounds of the formula Vl to the compounds of the formula Xl may be carried out under reaction conditions similar to those described above for the addition to the poly-Hsiloxanes of the formula V.
The condensation of the siloxane diol of the formula (XIII) with the chlorosilyl compound of the formula (XII) is advantageously carried out in the presence of a a base, e.g. triethylamine or pyridine. The reaction of the diamine of the formula (XIV) with the anhydride of the formula (IX) is carried out as described above for the reaction of the polysiloxanes which contain amino groups with the anhydrides of the formula (IX).
The starting compounds of the formulae (III) to (IX) and (Xl) to (XIV) are known or they may be prepared by methods which are known per se. As regards the preparation of the silanes and siloxanes to be used, attention is drawn e.g. to Noll, Chemie und Technologie der Silicone, Verlag Chemie GmbH,
Weinheim, 1968.
In principle, any light sources may be used for crosslinking the polysiloxanes of the invention, if desired in admixture with a crosslinking agent of the formula X. Examples of such light sources are: sunlight, carbon arc lamps, xenon lamps, metal halide vapour lamps and, in particular, mercury high pressure lamps. If desired, exposure may be made with the addition of a photosensitiser, e.g. benzophenone or a thioxanthone derivative.
The crosslinked products obtainable with the polysiloxanes of this invention have a high corona resistance and good permeability to oxygen. The light-crosslinkable polysiloxanes of the present invention are suitable e.g. for the preparation of photosensitive resists or high temperature resistant insulating materials and, in particular, for making moulded articles such as contact lenses, sealings, films, coatings and finishes on different materials such as glass, ceramics, plastics, e.g. polyesters and polyimides, cellulosics, and especially metals such as aluminium and copper. Depending on the degree of crosslinking, they give soft, elastic to tough firm layers which have in particular good adhesion to metals such as aluminium and copper.
The invention is illustrated by the following nonlimitative Examples.
Example 1:
With efficient stirring, a mixture of 11.2 g (0.04 mole) of N - (3 - methyl - dichlorosilylpropyl) - 2,3 dimethylmaleimide, 16.5 g (0.128 mole) of dimethyl dichlorosilane and 100 ml of diethyl ether is added dropwise to 250 ml of ice-water. When the hydrolysis is complete, the ethereal phase is separated and washed with distilled water until neutral, dried over sodium sulfate, and concentrated to a volume of about 20 ml. To this solution are added 3.5 ml of conc. H2SO4 and the mixture is shaken for 24 hours at room temperature. After dilution with 30 ml of diethyl etherthe organic phase is washed until neutral, dried over sodium sulfate and then freed from solvent in a high vacuum. Yield: 14.5 g (77% of theory). Viscosity [ a ] :4,6 ml g-I (measured in toluene at 25 C). Nitrogen content: 3.25%.
The starting N - (3 - methyl - dichlorosilylpropyl) 2,3 - dimethylmaleimide may be obtained as described in German Offenlegungsschrift 29 34 550.
Equilibration of 1 part of 1,2,3,4 - tetramethylcyc lotetrasiloxanewith 3 parts of 1,1,2,2,3,3,4,4 octamethylcyclotetrasiloxane using hexamethyl disiloxane as chain terminator gives a poly - H - siloxane having the following properties: intrinsic viscosity: 0.887 Pa s/250C [ rl ] = 16.7 ml/g, content of H-Si groups = 3.4 m-equiv./g.
A mixture of 11.6 g (0.07 mole) of N - allyl - 2,3 dimethylmaleimide, 0.3 ml of a solution of H2PtC16 (0.05 m in 2-propanol) and 50 ml of toluene is added dropwise at 90 C, under nitrogen, to a solution of 20 g (corresponding to 0.068 equiv. Si-H) of the above prepared polysiloxane in 100 ml of toluene. When the addition is complete, the reaction mixture is heated for 60 minutes to reflux and then filtered with the aid of 1 g of activated carbon and 2 g of fuller's earth. All volatile constituents are removed (finally in a high vacuum) to give 28.6 g (91 % of theory) of a viscous oil; [ 77 ] = 26.3 ml/g in toluene at 250C; nitrogen content = 2.76%; average molecular weight (determined by light scattering) = 70,000.
Example 3:
In accordance with the procedure of Example 2, 6.66 g (corresponding to 0.0225 equiv. Si-H) are reacted with 2 g (0.014 mole) of N - vinyl - 2,3 dimethylmaleimide. Working up is as described in
Example 2. Yield: 7.7 g (89% of theory). Nitrogen content: 1-95%; average molecular weight: 70,000 (determined by lightscattering); H-Si content: 1.6 m-equiv./g.
Example 4:
In accordance with the procedure described in
Example 2, 9 (corresponding to 0.156 equivalent
Si-H) of a commercial polymethyl hydrogensiloxane (Silgel W# available from Wacker-Chemie, Burghausen West Germany) are reacted with 25.7 g (0.156 mole) of N - allyl - 2,3 - dimethylmaleimide.
After the exothermic reaction has subsided, the reaction mixture is heated for a further 5 hours to reflux.
Example 5:
The catalyst is removed and the resultant polysiloxane is isolated by precipitating the reaction solution in 1 litre of hexane. The viscous product is dried for 24 hours at 800C10.0133 Pa. Yield: 32 g (92% of theory). Molecular weight (determined by vapour pressure osmometry in CHCl2): 10,300; nitrogen content 6% l calculated degree of silicon content 13.8% I substitution 96%.
20.15 g (0.15 mole) of tetramethyl disiloxane are added dropwise at 60 C, under nitrogen, to a mixture of 50 g (0.3 mole) of N - allyl - 2,3 - dimethylmaleimide and 0.8 ml of a 0.05 m solution of H2PtCl6 in 2-propanol. The temperature of the reaction mixture rises for a time to 1400C and is then kept for 1 hour at 1 100C. The resultant oil crystallises after dis
Example 6: tillation in a high vacuum, affording 53.2 g (0.11 mole = 76% of theory) of 1,3 - bis - [3 - (2,3 dimethylmaleimidyl)prnpyl ] - 1,1,3,3 -tetramethyl disiloxane with a boiling point of 2200-2220C/0.2 mbar and melting point 55 -57 C; nitrogen content: 6.03%.
A mixture of 4.65 g (0.01 mole) of 1,3 - bis - [ 3 - (2,3 - dimethylmaleimidyl)propyl ] -1,1,3,3- tetramethyl disiloxane, 14.83 g (0.05 mole) of octamethylcyclotetrasiloxane, 30 ml of dimethoxyethane and 3 ml of conc. H2SO4 is shaken for 24 hours at room temperature. The resultant oil is diluted with 100 ml of diethyl ether and the organic phase is washed with water until neutral, dried over sodium sulfate and freed from solvent. After filtration through a G3 glass frit, the product is dried to constant weight at 100 C/0.2 mbar. Yield: 17.7 g. Intrinsic viscosity: 0.0363 Pa s. [ TI ] = 2.2 ml/g~' (at 250C in toluene).M (average molecular weight, determined by vapour pressure osmometry in CHCI3): 1874-2096; z = 19-21; nitrogen content: 1.5%.
Example 7:
Photochemical crosslinking of a polydimethylsiloxane containing 3 - (2,3 - dimethylmaleimidyl)propyl groups. A 20% solution of the polysiloxane obtained in Example 2 in toluene is applied to roughened aluminium sheeting from a centrifugal applicator on a rotating disc. The coated sheet is subsequently dried for 15 minutes at 90 C.
Curing of the liquid layer is effected by exposure with a mercury high pressure lamp (700 W) for 5 minutes. A clear, firm coating is obtained. At nonexposed areas the still fluid polysiloxane may be removed with an organic solvent such as trichloroethylene, acetone, tetrahydrofuran or cyclohexane, and the metal etched with CHI/H20JH20 without destroying the coating.
Examples 8-10: In accordance with the procedure described in
Example 7, the polysiloxanes obtained in Examples 2 and 3 are photochemically crosslinked with and without the concurrent use of benzophenone as sensitiser. Irradiation is effected with a metal halide vauour lamp (5000 W). The results are reported in the table.
Polysiloxane Benzophenone Exposure time Coating Example 2 5% by weight 2 minutes firm, good adhesion Example 3 0 3.5 minutes firm, good adhesion Example 3 5% by weight 2 minutes firm, good adhesion Example ii: In accordance with the procedure described in
Example 7, a mixture of 10 g of the polysiloxane obtained in Example 4 and 0.2 g of n-octyl 3chlorothioxanthone - 1 - carboxylate is applied to copper sheeting and exposed. A hard, mechanically
resistant coating is obtained.
Example 12:
In accordance with the procedure described in
Example 7, a mixture of 10 g of the polysiloxane obtained in Example 2 and 2 g of the polysiloxane obtained in Example 6 is applied to copper sheeting and exposed. A firm, very elastic coating is obtained.
The copper can be etched at the non-exposed areas with FeCI3 solution after development with trichloroethylene.
Claims (15)
1. A light-crosslinkable polysiloxane having an average molecular weight of 750 to 1,500,000 and consisting of 10 to 100 mole % of recurring structural units of the formula I
and of 0 to 90 mole % of recurring structural units of the formula II
such that each molecule contains on average at least three structural units of the formula I, in which for
mulae
A is a -CpH2p- radical, in which p is 2 to 10, the
main chain of which radical may be interrupted by -0,-NH- or-NH-C1-C4aIkyl, R1 is hydrogen, methyl, phenyl or vinyl, R2 is methyl or phenyl, and each of R3 and R4 independently of the other is C1-C4 alkyl
or together they are trimethylene or tetramethylene,
each unsubstituted or substituted by a methyl group.
2. A polysiloxane according to claim 1 having an
average molecular weight of 750 to 120,000 and con
sisting of 15 to 100 mole % of recurring structural
units of the formula I and 0 to 85 mole % of recurring
structural units of the formula II, and wherein A is -(CH2)p--
3. A polysiloxane according to claim 1 having an
average molecular weight of 750 to 100,000 and con
sisting of 25 to 96 mole % of recurring structural
units of the formula I and 4 to 75 mole % of recurring
structural units of the formula II, wherein A is -(CH2)2-or-(CH2)2-, R1 is hydrogen or methyl and each of R2, R3 and R4 is methyl.
4. A polysiloxane according to claim 1 substantially as described with reference to any of Examples 1 to 4.
5. A process for the preparation of a lightcrosslinkable polysiloxane according to claim 1, which process comprises
a) cohydrolysing a compound of the formula III
with 10 to 100 mole % of a compound of the formula
IV
and subsequently equilibrating the reaction product, or
b) reacting a poly-H-siloxane of the formula V
with 10 to 100 mole % of a compound of the formula Vl
in which formulae above A, R2, R3 and R4 are as defined in claim 1,A1 is a -CpH2p~1- radical, in which p is 2 to 10, the main chain of which radical may be interrupted by -0,-NH-or -NHC1C4 alkyl, and R', is hydrogen, methyl or phenyl, but must be hydrogen in at least 10 mole % of the structural units of the formula V.
6. A process according to claim 5 substantially as described with reference to any of Examples 1 to 4.
7. A crosslinkable polysiloxane which is obtainable by crosslinking a light-crosslinkable polysilox ane as claimed in claim 1, in the presence of O to 30 mole % of a compound of the formula X
wherein A, Fl1, Fl2, R3 and R4 are as defined in claim 1 and n is an integerfrom 1 to 20,000, by the action of light
8.A compound of the formula X
wherein A is a -CpH2p- radical, in which p is 2 to 10, the main chain of which radical may be interrupted by +, -NH- or -NH-C1-C4-alkyl, R1 is hydrogen, methyl, phenyl or vinyl, R2 is methyl or phenyl, each of R3 and R4 independently of the other is C1-C4 alkyl or together are trimethylene or tetramethylene, each of which is substituted by a methyl group, and z is an integer from 1 to 20,000.
9. A compound of the formula X according to claim 8, wherein A is -(CH2)p-, in which p is 2 to 10, and z is an integer from 1 to 20.
10. A compound of the formula X according to claim 8, wherein A is -(CH2)r or-(CH2)2-, R1 is hydrogen or methyl, each of R, R3 and R4 is methyl and z is an integer from 1 to 20.
11. A compound of formula X according to claim 8 substantially as described with reference to Example 5 or 6.
12. A process for the preparation of a compound of the formula X as claimed in claim 6, which process comprises
A) equilibrating a compound oftheformula X, in which x is at least 1, with a cyclotetrasiloxane of the formula Vllb
B) reacting a compound of the formula Xl
with a compound of the formula Vl
in the molar ratio of 1:2; C) hydrolysing a compound of the formula XII
to the corresponding disiloxane and, if desired, equilibrating the reaction product with a suitable cyclosiloxane, or reacting said compound of the formula (XII) with a compound of the formula XIII
in the molar ratio of 2:1, or
D) reacting a compound of the formula XIV
with an anhydride ofthe formula IX, in the molar ratio of 1: :2, in which formulae (Vllb), (Xl), (VI), (XII), (XIII) and (XIV) above, z, A, R1, R2, R3 and R4 are as defined in claim 6, A1 is a UpH2p~1- radical, in which p p is is 2 to 10, the main chain of which radical may be interrupted by -0,-NH- or -NH-C1-C4- alkyl, and R1 is hydrogen, methyl or phenyl.
13. A process according to claim 12 substantially as described with reference to Example 5 or 6.
14. A compound of formula X when prepared by a process claimed in claim 12 or 13.
15. A method of making moulded articles, films, finishes and coatings, which comprises the use of a crosslinkable polysiloxane as claimed in either of claims 1 to 7.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH6351/81A CH649772A5 (en) | 1981-10-01 | 1981-10-01 | LIGHT CROSSLINKABLE POLYSILOXANES, METHOD FOR THE PRODUCTION AND THEIR USE. |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2109390A true GB2109390A (en) | 1983-06-02 |
GB2109390B GB2109390B (en) | 1985-08-14 |
Family
ID=4308213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08227636A Expired GB2109390B (en) | 1981-10-01 | 1982-09-28 | Light-crosslinkable polysiloxanes |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS5869229A (en) |
CA (1) | CA1192204A (en) |
CH (1) | CH649772A5 (en) |
DE (1) | DE3235663A1 (en) |
FR (1) | FR2514013A1 (en) |
GB (1) | GB2109390B (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1989009240A1 (en) * | 1988-03-22 | 1989-10-05 | Lucky, Ltd. | Imide-containing polysiloxanes and a process for preparing them |
US5264278A (en) * | 1991-03-20 | 1993-11-23 | Minnesota Mining And Manufacturing Company | Radiation-curable acrylate/silicone pressure-sensitive adhesive coated tapes adherable to paint coated substrates |
US5527578A (en) * | 1991-03-20 | 1996-06-18 | Minnesota Mining And Manufacturing Company | Radiation curable vinyl/silicone release coating |
CN102286113A (en) * | 2011-06-17 | 2011-12-21 | 北京化工大学常州先进材料研究院 | Silicon-containing polymeric photoinitiator and preparation method thereof |
EP3421477A4 (en) * | 2016-02-25 | 2019-10-30 | Shin-Etsu Chemical Co., Ltd. | Organopolysiloxane and production method therefor, and curable composition |
US20220177651A1 (en) * | 2019-03-08 | 2022-06-09 | Merck Patent Gmbh | Crosslinkable siloxane compounds for the preparation of dielectric materials |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2553780B1 (en) * | 1983-10-25 | 1986-01-17 | Rhone Poulenc Spec Chim | THERMOSETTING COMPOSITIONS BASED ON PREPOLYMER WITH IMIDE GROUPS STABLE IN STORAGE AND PREPARATION METHOD |
US5114794A (en) * | 1987-06-23 | 1992-05-19 | Daikyo Gomu Seiko Ltd. | Modified polysiloxane-coated sanitary rubber article and a process for the production of the same |
JPH06508862A (en) | 1991-03-20 | 1994-10-06 | ミネソタ マイニング アンド マニュファクチャリング カンパニー | Radiation-curable acrylate/silicone pressure-sensitive adhesive formulations |
US5464659A (en) | 1991-05-23 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Silicone/acrylate vibration dampers |
FR2810328B1 (en) * | 2000-06-16 | 2003-07-25 | Rhodia Chimie Sa | NOVEL ORGANOSILICIC COMPOUNDS COMPRISING A MULTIFUNCTIONAL POLYORGANOSILOXANE, CARRIING AT LEAST ONE DOUBLE ACTIVATED IMIDE-LIKE LINK AND METHODS OF PREPARING THE SAME |
FR2810327B1 (en) * | 2000-06-16 | 2002-12-06 | Rhodia Chimie Sa | NOVEL MULTIFUNCTIONALIZED POLYORGANOSILOXANES COMPRISING GROUPS DERIVED FROM MALEIC ACID AND / OR FUMARIC ACID AND THEIR PREPARATION METHODS |
EP2237985B1 (en) | 2007-12-26 | 2012-11-28 | Renault Trucks | Method for managing fuel consumption of a hybrid vehicle and vehicle adapted to such a method |
JP6583050B2 (en) * | 2016-02-25 | 2019-10-02 | 信越化学工業株式会社 | Method for producing organopolysiloxane |
JP6583049B2 (en) * | 2016-02-25 | 2019-10-02 | 信越化学工業株式会社 | Organopolysiloxane, curable composition and method for producing cured product |
CN111324010A (en) * | 2018-12-17 | 2020-06-23 | 固安鼎材科技有限公司 | Photosensitive resin composition, application thereof and color filter |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3558741A (en) * | 1969-05-05 | 1971-01-26 | Gen Electric | Imido-substituted organopolysiloxane compositions |
JPS51125277A (en) * | 1974-12-28 | 1976-11-01 | Shin Etsu Chem Co Ltd | Aprocess for preparing organosilane compounds |
JPS51120804A (en) * | 1975-04-14 | 1976-10-22 | Dainippon Printing Co Ltd | Plate for lithographic printing |
-
1981
- 1981-10-01 CH CH6351/81A patent/CH649772A5/en not_active IP Right Cessation
-
1982
- 1982-09-27 DE DE19823235663 patent/DE3235663A1/en not_active Withdrawn
- 1982-09-28 GB GB08227636A patent/GB2109390B/en not_active Expired
- 1982-09-29 JP JP57168688A patent/JPS5869229A/en active Pending
- 1982-09-29 CA CA000412495A patent/CA1192204A/en not_active Expired
- 1982-09-30 FR FR8216442A patent/FR2514013A1/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1989009240A1 (en) * | 1988-03-22 | 1989-10-05 | Lucky, Ltd. | Imide-containing polysiloxanes and a process for preparing them |
US5061774A (en) * | 1988-03-22 | 1991-10-29 | Lucky, Ltd. | Imide-containing polysiloxanes and a process for preparing them |
US5264278A (en) * | 1991-03-20 | 1993-11-23 | Minnesota Mining And Manufacturing Company | Radiation-curable acrylate/silicone pressure-sensitive adhesive coated tapes adherable to paint coated substrates |
US5527578A (en) * | 1991-03-20 | 1996-06-18 | Minnesota Mining And Manufacturing Company | Radiation curable vinyl/silicone release coating |
US5907018A (en) * | 1991-03-20 | 1999-05-25 | Minnesota Mining And Manufacturing Company | Radiation-curable acrylate/silicone pressure-sensitive adhesive coated tapes adherable to paint coated substrates |
CN102286113A (en) * | 2011-06-17 | 2011-12-21 | 北京化工大学常州先进材料研究院 | Silicon-containing polymeric photoinitiator and preparation method thereof |
EP3421477A4 (en) * | 2016-02-25 | 2019-10-30 | Shin-Etsu Chemical Co., Ltd. | Organopolysiloxane and production method therefor, and curable composition |
US20220177651A1 (en) * | 2019-03-08 | 2022-06-09 | Merck Patent Gmbh | Crosslinkable siloxane compounds for the preparation of dielectric materials |
Also Published As
Publication number | Publication date |
---|---|
FR2514013A1 (en) | 1983-04-08 |
CA1192204A (en) | 1985-08-20 |
GB2109390B (en) | 1985-08-14 |
CH649772A5 (en) | 1985-06-14 |
DE3235663A1 (en) | 1983-04-21 |
JPS5869229A (en) | 1983-04-25 |
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