GB2012305A - Apparatus for anodic oxidation - Google Patents

Apparatus for anodic oxidation

Info

Publication number
GB2012305A
GB2012305A GB7847641A GB7847641A GB2012305A GB 2012305 A GB2012305 A GB 2012305A GB 7847641 A GB7847641 A GB 7847641A GB 7847641 A GB7847641 A GB 7847641A GB 2012305 A GB2012305 A GB 2012305A
Authority
GB
United Kingdom
Prior art keywords
web
cell
cathode plate
electrolytic
filled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7847641A
Other versions
GB2012305B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB2012305A publication Critical patent/GB2012305A/en
Application granted granted Critical
Publication of GB2012305B publication Critical patent/GB2012305B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/0029—Processes of manufacture
    • H01G9/0032—Processes of manufacture formation of the dielectric layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005—Apparatus specially adapted for electrolytic conversion coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electrochemical Coating By Surface Reaction (AREA)

Abstract

An apparatus for anodic oxidation wherein an aluminum web 1 continuously travels into and through an electrolytic cell 6 filled with an electrolytic solution 8 and electric current is passed therethrough to thereby form an oxidized layer on the surface of said aluminum web and a cathode plate 9 is disposed in said cell in planar parallel relationship to said web as it passes through the cell. The cathode plate is electrically connected to the negative terminal 10 of an electric power source at one or more positions in the vicinity of the centre line of the cathode plate in the travelling direction of the aluminum web. No electrolytic burning is observed with the oxidized layer thus- formed and no folding occurs upon unwinding. The web may pass first through a feeder cell 2 filled with the same or a different electrolyte 3 and provided with an an anode plates disposed parallel to the web. <IMAGE>
GB7847641A 1977-12-12 1978-12-07 Apparatus for anodic oxidation Expired GB2012305B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14904477A JPS5481133A (en) 1977-12-12 1977-12-12 Anodic oxidation device

Publications (2)

Publication Number Publication Date
GB2012305A true GB2012305A (en) 1979-07-25
GB2012305B GB2012305B (en) 1982-06-09

Family

ID=15466414

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7847641A Expired GB2012305B (en) 1977-12-12 1978-12-07 Apparatus for anodic oxidation

Country Status (3)

Country Link
JP (1) JPS5481133A (en)
DE (1) DE2853609A1 (en)
GB (1) GB2012305B (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4605480A (en) * 1983-06-13 1986-08-12 Hoechst Aktiengesellschaft Device for continuously anodically oxidizing aluminum strips on one surface thereof and use of these aluminum strips in the production of offset printing plates
WO1998049377A1 (en) * 1997-04-25 1998-11-05 Alcan International Limited Aluminium workpiece
EP2153454A1 (en) * 2007-05-16 2010-02-17 The Board Of Trustees Of The University Of Illinois Arrays of microcavity plasma devices and electrodes with reduced mechanical stress
GB2464378A (en) * 2008-10-16 2010-04-21 Internat Advanced Res Ct For P Apparatus and method of coating a metal using microarc oxidation
US8187432B2 (en) 2007-12-28 2012-05-29 Suzuki Motor Corporation Anodizing apparatus
US8362699B2 (en) 2007-10-25 2013-01-29 The Board Of Trustees Of The University Of Illinois Interwoven wire mesh microcavity plasma arrays
US8404558B2 (en) 2006-07-26 2013-03-26 The Board Of Trustees Of The University Of Illinois Method for making buried circumferential electrode microcavity plasma device arrays, and electrical interconnects
US8547004B2 (en) 2010-07-27 2013-10-01 The Board Of Trustees Of The University Of Illinois Encapsulated metal microtip microplasma devices, arrays and fabrication methods

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751289A (en) * 1980-09-10 1982-03-26 Fuji Photo Film Co Ltd Electrolytic treating device for belt-like metallic plate
CH655135A5 (en) * 1983-07-14 1986-03-27 Alusuisse PRE-TREATMENT OF AN ALUMINUM TAPE OR FILM BY ELECTROCHEMICAL OXIDATION.
JP4410714B2 (en) 2004-08-13 2010-02-03 富士フイルム株式会社 Method for producing support for lithographic printing plate
ATE395195T1 (en) 2005-04-13 2008-05-15 Fujifilm Corp METHOD FOR PRODUCING A PLATE PRINTING PLATE SUPPORT
JP2009208140A (en) 2008-03-06 2009-09-17 Fujifilm Corp Manufacturing method of aluminum alloy sheet for planographic printing plate, aluminum alloy sheet for planographic printing plate and support for planographic printing plate manufactured by the method
JP2011205051A (en) 2009-06-26 2011-10-13 Fujifilm Corp Light-reflecting substrate and process for manufacture thereof
CN105082725B (en) 2009-09-24 2018-05-04 富士胶片株式会社 Original edition of lithographic printing plate
US20120256224A1 (en) 2009-12-25 2012-10-11 Fujifilm Corporation Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element
JP2012033853A (en) 2010-04-28 2012-02-16 Fujifilm Corp Insulation light reflection substrate
KR20120022628A (en) 2010-08-16 2012-03-12 후지필름 가부시키가이샤 Radiation reflection plate for led
JP2013033956A (en) 2011-07-04 2013-02-14 Fujifilm Corp Insulating reflection substrate and manufacturing method thereof
US9573404B2 (en) 2011-10-28 2017-02-21 Fujifilm Corporation Manufacturing method and manufacturing apparatus of support for planographic printing plate
CN104419960A (en) * 2013-08-20 2015-03-18 谢彪 Anodic oxidation production line and production process thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD51177A (en) *
DE683169C (en) * 1937-10-04 1939-10-31 Hermann Papst Process for the electrical oxidation of aluminum wires and strips
NL129563C (en) * 1964-02-04
DD113024A1 (en) * 1974-08-14 1975-05-12

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4605480A (en) * 1983-06-13 1986-08-12 Hoechst Aktiengesellschaft Device for continuously anodically oxidizing aluminum strips on one surface thereof and use of these aluminum strips in the production of offset printing plates
WO1998049377A1 (en) * 1997-04-25 1998-11-05 Alcan International Limited Aluminium workpiece
US6368483B1 (en) 1997-04-25 2002-04-09 Alcan International Limited Aluminium workpiece
US8404558B2 (en) 2006-07-26 2013-03-26 The Board Of Trustees Of The University Of Illinois Method for making buried circumferential electrode microcavity plasma device arrays, and electrical interconnects
EP2153454A1 (en) * 2007-05-16 2010-02-17 The Board Of Trustees Of The University Of Illinois Arrays of microcavity plasma devices and electrodes with reduced mechanical stress
EP2153454A4 (en) * 2007-05-16 2011-02-23 Univ Illinois Arrays of microcavity plasma devices and electrodes with reduced mechanical stress
US8159134B2 (en) 2007-05-16 2012-04-17 The Board Of Trustees Of The University Of Illinois Arrays of microcavity plasma devices and electrodes with reduced mechanical stress
US8535110B2 (en) 2007-05-16 2013-09-17 The Board Of Trustees Of The University Of Illinois Method to manufacture reduced mechanical stress electrodes and microcavity plasma device arrays
US8362699B2 (en) 2007-10-25 2013-01-29 The Board Of Trustees Of The University Of Illinois Interwoven wire mesh microcavity plasma arrays
US8187432B2 (en) 2007-12-28 2012-05-29 Suzuki Motor Corporation Anodizing apparatus
GB2464378A (en) * 2008-10-16 2010-04-21 Internat Advanced Res Ct For P Apparatus and method of coating a metal using microarc oxidation
GB2464378B (en) * 2008-10-16 2013-05-15 Internat Advanced Res Ct For Powder Metallurg And New Materials Arci A process for continuous coating deposition and an apparatus for carrying out the process
US8547004B2 (en) 2010-07-27 2013-10-01 The Board Of Trustees Of The University Of Illinois Encapsulated metal microtip microplasma devices, arrays and fabrication methods
US8870618B2 (en) 2010-07-27 2014-10-28 The Board Of Trustees Of The University Of Illinois Encapsulated metal microtip microplasma device and array fabrication methods

Also Published As

Publication number Publication date
JPS5481133A (en) 1979-06-28
DE2853609C2 (en) 1991-09-26
GB2012305B (en) 1982-06-09
DE2853609A1 (en) 1979-06-13

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19941207