GB1507704A - Photopolymerisable compositions - Google Patents
Photopolymerisable compositionsInfo
- Publication number
- GB1507704A GB1507704A GB1641275A GB1641275A GB1507704A GB 1507704 A GB1507704 A GB 1507704A GB 1641275 A GB1641275 A GB 1641275A GB 1641275 A GB1641275 A GB 1641275A GB 1507704 A GB1507704 A GB 1507704A
- Authority
- GB
- United Kingdom
- Prior art keywords
- aqueous alkaline
- april
- insoluble
- vinyl acetate
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Abstract
1507704 Photopolymerizable compositions E I DU PONT DE NEMOURS & CO 21 April 1975 [23 April 1974] 16412/75 Heading C3V [Also in Division G2] Photopolymerizable compositions which, after exposure, are developable with aqueous alkaline solutions comprise (i) 7-5-35% of a polymerizable non-gaseous ethylenically unsaturated compound, (ii) 0À1-10% of a photoinitiator and (iii) 52-92À4% of a mixture of binders comprising (A) 15-60% of an acidic film-forming polymer which is adherent to copper and is soluble in aqueous alkaline solution but insoluble in water, (B) 60-15% of an acidic polymer which is insoluble both in water and aqueous alkaline solution and optionally (C) another polymeric binder component, e.g. polymethyl methacrylate, all percentages being based on the total weight of solvent-free composition. Binder component (A) may be a vinyl acetate or acrylic copolymer, or a cellulose derivative and component (B) may be a toluene sulphonamide-formaldehyde resin, or a methyl methacrylate, vinyl chloride, vinyl acetate or styrene copolymer.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US46331074A | 1974-04-23 | 1974-04-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1507704A true GB1507704A (en) | 1978-04-19 |
Family
ID=23839658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1641275A Expired GB1507704A (en) | 1974-04-23 | 1975-04-21 | Photopolymerisable compositions |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS556210B2 (en) |
BE (1) | BE828237A (en) |
CA (1) | CA1056189A (en) |
DE (1) | DE2517656B2 (en) |
FR (1) | FR2269108B1 (en) |
GB (1) | GB1507704A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4247623A (en) | 1979-06-18 | 1981-01-27 | Eastman Kodak Company | Blank beam leads for IC chip bonding |
US4342151A (en) | 1979-06-18 | 1982-08-03 | Eastman Kodak Company | Blank and process for the formation of beam leads for IC chip bonding |
EP0202690A2 (en) | 1981-06-08 | 1986-11-26 | E.I. Du Pont De Nemours And Company | Photoimaging compositions containing substituted cyclohexadienone compounds |
EP0339307A2 (en) * | 1988-04-29 | 1989-11-02 | Du Pont De Nemours (Deutschland) Gmbh | Process for production of plating and etching resists |
US7932016B2 (en) | 2005-11-08 | 2011-04-26 | Rohm And Haas Electronic Materials Llc | Photosensitive composition |
US10211409B2 (en) | 2014-02-02 | 2019-02-19 | Molecular Glasses, Inc. | Noncrystallizable sensitized layers for OLED and OEDs |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2361680A1 (en) * | 1976-08-11 | 1978-03-10 | Du Pont | Planographic printing block - consisting of carrier coated with polymer layer contg. image of hydrophilic or oleophilic zones |
DE2812016A1 (en) * | 1977-03-22 | 1978-09-28 | Du Pont | THERMAL FUSIBLE ACRYLIC PLASTISOL OR ORGANOSOL DISPERSIONS |
US4176028A (en) * | 1977-03-22 | 1979-11-27 | E. I. Du Pont De Nemours And Company | Plastisols made with polyelectrolyte binders |
DE2812015C3 (en) * | 1977-03-22 | 1984-05-24 | E.I. Du Pont De Nemours And Co., Wilmington, Del. | Thermally fusible acrylic resin organosol dispersions and their uses |
CA1127340A (en) * | 1977-12-30 | 1982-07-06 | Kohtaro Nagasawa | Photocurable light-sensitive composition and material |
JPS5619752A (en) * | 1979-07-27 | 1981-02-24 | Hitachi Chemical Co Ltd | Photosensitive resin composition laminate |
DD250593A1 (en) * | 1984-04-03 | 1987-10-14 | Wolfen Filmfab Veb | PHOTOPOLYMERIZABLE MATERIAL |
DE3621477A1 (en) * | 1985-06-26 | 1987-01-08 | Canon Kk | Resin mixture which can be cured by radiation of effective energy |
US5182187A (en) * | 1988-02-24 | 1993-01-26 | Hoechst Aktiengesellschaft | Radiation-polymerizable composition and recording material prepared from this composition |
JP2756623B2 (en) * | 1992-02-26 | 1998-05-25 | 富士写真フイルム株式会社 | Photopolymerizable composition |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL218803A (en) * | 1956-07-09 | |||
DE1296975B (en) * | 1967-11-09 | 1969-06-04 | Kalle Ag | Photosensitive mixture |
BE772251A (en) * | 1970-09-07 | Kalle Ag | PHOTOPOLYMERISABLE COMPOUNDS | |
DE2053363C3 (en) * | 1970-10-30 | 1980-09-18 | Hoechst Ag, 6000 Frankfurt | Photosensitive mixture |
DE2064080C3 (en) * | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Photosensitive mixture |
ZA72345B (en) * | 1971-02-04 | 1973-03-28 | Dynachem Corp | Polymerization compositions and processes |
DE2123702B2 (en) * | 1971-05-13 | 1979-11-08 | Hoechst Ag, 6000 Frankfurt | Method for producing a relief image |
GB1425423A (en) * | 1972-04-26 | 1976-02-18 | Eastman Kodak Co | Photopolymerisable compositions |
-
1975
- 1975-04-21 CA CA225,215A patent/CA1056189A/en not_active Expired
- 1975-04-21 GB GB1641275A patent/GB1507704A/en not_active Expired
- 1975-04-22 FR FR7512476A patent/FR2269108B1/fr not_active Expired
- 1975-04-22 BE BE155651A patent/BE828237A/en not_active IP Right Cessation
- 1975-04-22 DE DE19752517656 patent/DE2517656B2/en not_active Ceased
- 1975-04-23 JP JP4875075A patent/JPS556210B2/ja not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4247623A (en) | 1979-06-18 | 1981-01-27 | Eastman Kodak Company | Blank beam leads for IC chip bonding |
US4342151A (en) | 1979-06-18 | 1982-08-03 | Eastman Kodak Company | Blank and process for the formation of beam leads for IC chip bonding |
EP0202690A2 (en) | 1981-06-08 | 1986-11-26 | E.I. Du Pont De Nemours And Company | Photoimaging compositions containing substituted cyclohexadienone compounds |
EP0339307A2 (en) * | 1988-04-29 | 1989-11-02 | Du Pont De Nemours (Deutschland) Gmbh | Process for production of plating and etching resists |
EP0339307A3 (en) * | 1988-04-29 | 1991-03-13 | Du Pont De Nemours (Deutschland) Gmbh | Process for production of plating and etching resists |
US7932016B2 (en) | 2005-11-08 | 2011-04-26 | Rohm And Haas Electronic Materials Llc | Photosensitive composition |
US8455175B2 (en) | 2005-11-08 | 2013-06-04 | Rohm And Haas Electronic Materials Llc | Photosensitive composition |
US10211409B2 (en) | 2014-02-02 | 2019-02-19 | Molecular Glasses, Inc. | Noncrystallizable sensitized layers for OLED and OEDs |
Also Published As
Publication number | Publication date |
---|---|
FR2269108B1 (en) | 1981-10-30 |
DE2517656B2 (en) | 1980-11-13 |
DE2517656A1 (en) | 1975-10-30 |
JPS556210B2 (en) | 1980-02-14 |
JPS50147323A (en) | 1975-11-26 |
FR2269108A1 (en) | 1975-11-21 |
CA1056189A (en) | 1979-06-12 |
BE828237A (en) | 1975-10-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19940421 |