GB1484463A - Method of aligning a protective mask - Google Patents

Method of aligning a protective mask

Info

Publication number
GB1484463A
GB1484463A GB1314974A GB1314974A GB1484463A GB 1484463 A GB1484463 A GB 1484463A GB 1314974 A GB1314974 A GB 1314974A GB 1314974 A GB1314974 A GB 1314974A GB 1484463 A GB1484463 A GB 1484463A
Authority
GB
United Kingdom
Prior art keywords
holder
mask
holes
reference edges
edges
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1314974A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BAE Systems Electronics Ltd
Original Assignee
Marconi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Marconi Co Ltd filed Critical Marconi Co Ltd
Priority to GB1314974A priority Critical patent/GB1484463A/en
Publication of GB1484463A publication Critical patent/GB1484463A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1484463 Positioning mask on workpiece MARCONI CO Ltd 28 Jan 1975 [23 March 1974] 13149/74 Heading B4X [Also in Division B6] A protective mask is aligned on a surface, e.g. of a quartz crystal 4, or thin film printed circuit arrangement by arranging the surface in a holder 1 and in a predetermined position in relation to two non-parallel reference edges of the holder 1, positioning a mask 7 (also provided with two non-parallel reference edges and at least one aperture 8 spaced in predetermined relation to the reference edges thereof) adjacent the holder, providing a reference member e.g. of a tensioning jig and urging the reference edges of the mask and the holder into contact with the member so that the aperture(s) 8 in the mask is/are aligned with the surface. As shown quartz crystals 4 are mounted in apertures 3 provided in the holder 1 positioned between two masks 7 in turn positioned between two rectangular clamping plates 9, 10, having holes 11 which overlay apertures 8. The whole is assembled as a sandwich by threaded studs 12 on lower plate 9 passing through aligned clearance holes 5 in holder 1, masks 7 and top plate 10, with nuts 13 not tightened. The edges of square holes 6 in the holder and masks provide the reference edges. The sandwich is mounted on a stepped bed (20, Fig. 2) of a tensioning jig carrying a fixed circularly sectioned elongate rod (21) and vertical limb (27) secured to a piston (25) for passing through the holes 6, to provide accurate alignment between apertures 8 and crystals 4. The mask alignment is necessary for the accurate vacuum deposition of metal electrodes on opposite faces of quartz crystals for an electrical circuit.
GB1314974A 1975-01-28 1975-01-28 Method of aligning a protective mask Expired GB1484463A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1314974A GB1484463A (en) 1975-01-28 1975-01-28 Method of aligning a protective mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1314974A GB1484463A (en) 1975-01-28 1975-01-28 Method of aligning a protective mask

Publications (1)

Publication Number Publication Date
GB1484463A true GB1484463A (en) 1977-09-01

Family

ID=10017775

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1314974A Expired GB1484463A (en) 1975-01-28 1975-01-28 Method of aligning a protective mask

Country Status (1)

Country Link
GB (1) GB1484463A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1318541A2 (en) * 2001-12-10 2003-06-11 Eastman Kodak Company Aligning mask segments to provide an assembled mask for producing oled devices
EP2239769A1 (en) * 2008-01-25 2010-10-13 Consejo Superior De Investigaciones Científicas Self-aligned metal mask assembly for selectively depositing thin films on microelectronic substrates and devices, and method of use
CN103668054A (en) * 2013-11-26 2014-03-26 北京遥测技术研究所 Masking tool for evaporation of electrodes of micro-mechanical quartz sensor
CN110450082A (en) * 2018-05-08 2019-11-15 中冶宝钢技术服务有限公司 A kind of diaphragm group assembling tool and its application method
CN113862668A (en) * 2021-09-11 2021-12-31 南京中电熊猫晶体科技有限公司 Coating clamp with adjustable electrode size and eccentricity and method thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1318541A2 (en) * 2001-12-10 2003-06-11 Eastman Kodak Company Aligning mask segments to provide an assembled mask for producing oled devices
EP1318541A3 (en) * 2001-12-10 2004-12-15 Eastman Kodak Company Aligning mask segments to provide an assembled mask for producing oled devices
EP2239769A1 (en) * 2008-01-25 2010-10-13 Consejo Superior De Investigaciones Científicas Self-aligned metal mask assembly for selectively depositing thin films on microelectronic substrates and devices, and method of use
JP2011510179A (en) * 2008-01-25 2011-03-31 コンセホ・スペリオール・デ・インベスティガシオネス・シエンティフィカス Self-aligned metal mask assembly for selective deposition of thin films on microelectronic substrates and methods of use thereof
EP2239769A4 (en) * 2008-01-25 2011-07-20 Consejo Superior Investigacion Self-aligned metal mask assembly for selectively depositing thin films on microelectronic substrates and devices, and method of use
CN103668054A (en) * 2013-11-26 2014-03-26 北京遥测技术研究所 Masking tool for evaporation of electrodes of micro-mechanical quartz sensor
CN103668054B (en) * 2013-11-26 2015-10-21 北京遥测技术研究所 A kind of mask frock of quartz micro mechanical sensor electrode evaporation
CN110450082A (en) * 2018-05-08 2019-11-15 中冶宝钢技术服务有限公司 A kind of diaphragm group assembling tool and its application method
CN110450082B (en) * 2018-05-08 2021-04-13 中冶宝钢技术服务有限公司 Diaphragm set assembling tool and using method thereof
CN113862668A (en) * 2021-09-11 2021-12-31 南京中电熊猫晶体科技有限公司 Coating clamp with adjustable electrode size and eccentricity and method thereof
CN113862668B (en) * 2021-09-11 2024-03-12 南京中电熊猫晶体科技有限公司 Electrode size and eccentricity adjustable coating clamp and method thereof

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee