GB1455655A - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
GB1455655A
GB1455655A GB3468574A GB3468574A GB1455655A GB 1455655 A GB1455655 A GB 1455655A GB 3468574 A GB3468574 A GB 3468574A GB 3468574 A GB3468574 A GB 3468574A GB 1455655 A GB1455655 A GB 1455655A
Authority
GB
United Kingdom
Prior art keywords
optionally substituted
hydrocarbon radical
compositions
radical
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3468574A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Publication of GB1455655A publication Critical patent/GB1455655A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1455655 Photopolymerizable compositions TEIJIN Ltd 6 Aug 1974 [7 Aug 1973] 34685/74 Heading C3P [Also in Division G2] Photopolymerizable compositions comprise an ethylenically unsaturated photopolymerizable compound, a photopolymerization initiator and, as a thermal polymerization inhibitor, at least one N-nitroso compound of the formula wherein R<SP>1</SP> and R<SP>2</SP> which may be the same or different represent (a) an optionally substituted, monovalent hydrocarbon radical, (b) a radical of the formula -SO 2 -Q where Q is an optionally substituted hydrocarbon radical, or (c) a radical of the formula where X is an optionally substituted divalent hydrocarbon radical and R<SP>3</SP> is an optionally substituted monovalent hydrocarbon radical, or R<SP>1</SP> and R<SP>2</SP> together form an optionally substituted divalent hydrocarbon radical which may optionally contain an O or N atom in the chain, thereby forming a ring with the N atom to which they are attached. The unsaturated compound may be acrylic, methacrylic, ethacrylic or chloroacrylic acid, an ester or amide of (meth)-acrylic acid optionally having more than one double bond, a vinyl ester, styrene or a derivative thereof, an allyl ester, or a mixture of such compounds. The compositions may also contain a high molecular weight binder, e.g. an addition or condensation polymer or a cellulose derivative; such binder may have unsaturated groups therein, e.g. an unsaturated polyester or a methyl methacrylate/styrene/methacrylic acid copolymer modified by reaction with glycidyl methacrylate (see the examples). Examples of suitable initiators are benzoin and its substituted derivatives, benzoin ethers, disulphides, anthraquinone and its derivatives, 2-naphthalene-sulphonyl chloride, erosine, fluoresceine and indanthrene. Other optional components include conventional inhibitors, fillers and plasticizers. The compositions are useful for forming printing plates.
GB3468574A 1973-08-07 1974-08-06 Photopolymerisable compositions Expired GB1455655A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48087983A JPS5238761B2 (en) 1973-08-07 1973-08-07

Publications (1)

Publication Number Publication Date
GB1455655A true GB1455655A (en) 1976-11-17

Family

ID=13930039

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3468574A Expired GB1455655A (en) 1973-08-07 1974-08-06 Photopolymerisable compositions

Country Status (11)

Country Link
JP (1) JPS5238761B2 (en)
BE (1) BE818428A (en)
CH (1) CH599570A5 (en)
DD (1) DD113116A5 (en)
DE (1) DE2437632C3 (en)
DK (1) DK418474A (en)
FR (1) FR2240466A1 (en)
GB (1) GB1455655A (en)
IT (1) IT1017988B (en)
NL (1) NL7410611A (en)
SE (1) SE403524B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722896C3 (en) * 1977-05-20 1986-01-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Process for the edge joining of light-curable thermoplastic elastomer printing plates
JPH01182845A (en) * 1988-01-13 1989-07-20 Toyobo Co Ltd Photosensitive resin composition

Also Published As

Publication number Publication date
CH599570A5 (en) 1978-05-31
SE7410039L (en) 1975-02-10
AU7192374A (en) 1976-02-05
BE818428A (en) 1974-12-02
FR2240466A1 (en) 1975-03-07
DE2437632B2 (en) 1978-09-21
IT1017988B (en) 1977-08-10
DE2437632A1 (en) 1975-03-06
DK418474A (en) 1975-03-24
DE2437632C3 (en) 1979-05-23
NL7410611A (en) 1975-02-11
SE403524B (en) 1978-08-21
JPS5238761B2 (en) 1977-09-30
DD113116A5 (en) 1975-05-12
JPS5036208A (en) 1975-04-05

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee