GB1427695A - Signal processing system - Google Patents
Signal processing systemInfo
- Publication number
- GB1427695A GB1427695A GB1945374A GB1945374A GB1427695A GB 1427695 A GB1427695 A GB 1427695A GB 1945374 A GB1945374 A GB 1945374A GB 1945374 A GB1945374 A GB 1945374A GB 1427695 A GB1427695 A GB 1427695A
- Authority
- GB
- United Kingdom
- Prior art keywords
- semi
- signal
- patterns
- crosscorrelation
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Radar Systems Or Details Thereof (AREA)
Abstract
1427695 Alignment of semi-conductor subtrates INTERNATIONAL BUSINESS MACHINES CORP 3 May 1974 [8 June 1973] 19453/74 Heading H4D In the manufacture of semi-conductors, minute and very accurate patterns must be formed in the photoresist, on the surface of the semi-conductor wafer. If each of a plurality of chips formed on the surface of the semi-conductor wafer is to have the same characteristics and pattern it is necessary that an electron beam or beam of charged particles used to expose photoresist material be moved in such a fashion that any point within the field to which the beam is applied is always reached by the same history. This requires that patterns produced by a beam be properly registered with respect to previously generated patterns. This registration is accomplished by scanning previously placed registration marks on the chip with a beam of electrons and monitoring the reflected or back-scattered electrons to determine where the beam crosses said registration marks. The signal/noise ratio of the signal is first improved by adding corresponding samples of successive scans, followed by a rapid crosscorrelation between the averaged signal and reference signal having certain specific and especially desirable characteristics for example an ideal noiseless signal. The final step utilizes a least squares curve fitting procedure tuned up to extract for example the centre of the crosscorrelation, with a minimum of on-line computation.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US368384A US3924113A (en) | 1973-06-08 | 1973-06-08 | Electron beam registration system |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1427695A true GB1427695A (en) | 1976-03-10 |
Family
ID=23450995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1945374A Expired GB1427695A (en) | 1973-06-08 | 1974-05-03 | Signal processing system |
Country Status (7)
Country | Link |
---|---|
US (1) | US3924113A (en) |
JP (1) | JPS5248060B2 (en) |
CA (1) | CA1009766A (en) |
DE (1) | DE2424313C2 (en) |
FR (1) | FR2240484B1 (en) |
GB (1) | GB1427695A (en) |
IT (1) | IT1010161B (en) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2320665A1 (en) * | 1975-08-04 | 1977-03-04 | Telecommunications Sa | IMPROVEMENTS TO ELECTROMECHANICAL FREQUENCY BAND PASS FILTERS |
JPS5315076A (en) * | 1976-07-28 | 1978-02-10 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam position detection method |
JPS5319764A (en) * | 1976-08-09 | 1978-02-23 | Nippon Telegr & Teleph Corp <Ntt> | Mark detection system in electron beam exposure |
DE2702448C2 (en) * | 1977-01-20 | 1982-12-16 | Siemens AG, 1000 Berlin und 8000 München | Method for positioning a workpiece provided with a mark relative to a scanning field or to a mask |
DE2846316A1 (en) * | 1978-10-24 | 1980-06-04 | Siemens Ag | Automatic mask aligning system for semiconductor prodn. - uses opto-electronic scanner for grids on mask and silicon wafer, with results integrated and averaged as to intensity distributions |
JPS6058793B2 (en) * | 1980-03-24 | 1985-12-21 | 日電アネルバ株式会社 | Plasma spectroscopic monitoring device |
JPS57106130A (en) * | 1980-12-24 | 1982-07-01 | Jeol Ltd | Detecting method for mark |
US4387433A (en) * | 1980-12-24 | 1983-06-07 | International Business Machines Corporation | High speed data interface buffer for digitally controlled electron beam exposure system |
JPS57122517A (en) * | 1981-01-22 | 1982-07-30 | Nippon Telegr & Teleph Corp <Ntt> | Alignment mark detector for electron beam exposure |
JPS58122725A (en) * | 1982-01-14 | 1983-07-21 | Nippon Telegr & Teleph Corp <Ntt> | Beam shape measuring apparatus |
US4546260A (en) * | 1983-06-30 | 1985-10-08 | International Business Machines Corporation | Alignment technique |
FR2586506B1 (en) * | 1985-08-20 | 1988-01-29 | Primat Didier | OPTICAL AND ELECTRONIC METHOD AND DEVICE FOR PROVIDING AUTOMATIC CUTTING OF PLATES |
US4803644A (en) * | 1985-09-20 | 1989-02-07 | Hughes Aircraft Company | Alignment mark detector for electron beam lithography |
DE3735154C2 (en) * | 1986-10-17 | 1994-10-20 | Canon Kk | Method for detecting the position of a mark provided on an object |
JPH0724256B2 (en) * | 1987-08-13 | 1995-03-15 | 日本電子株式会社 | Size measuring device |
US10991545B2 (en) | 2008-06-30 | 2021-04-27 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
US10566169B1 (en) | 2008-06-30 | 2020-02-18 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
DE102015117693A1 (en) * | 2015-10-16 | 2017-04-20 | Ald Vacuum Technologies Gmbh | Method for determining the changing position of the impact point of an energetic beam on a limited area |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3328795A (en) * | 1959-11-18 | 1967-06-27 | Ling Temco Vought Inc | Fixtaking means and method |
US3329813A (en) * | 1964-08-25 | 1967-07-04 | Jeol Ltd | Backscatter electron analysis apparatus to determine elemental content or surface topography of a specimen |
US3535516A (en) * | 1966-10-17 | 1970-10-20 | Hitachi Ltd | Electron microscope employing a modulated scanning beam and a phase sensitive detector to improve the signal to noise ratio |
US3614736A (en) * | 1968-05-21 | 1971-10-19 | Ibm | Pattern recognition apparatus and methods invariant to translation, scale change and rotation |
US3646333A (en) * | 1969-12-12 | 1972-02-29 | Us Navy | Digital correlator and integrator |
US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
US3745317A (en) * | 1970-05-04 | 1973-07-10 | Commissariat Energie Atomique | System for generating the fourier transform of a function |
US3644899A (en) * | 1970-07-29 | 1972-02-22 | Cogar Corp | Method for determining partial memory chip categories |
US3717756A (en) * | 1970-10-30 | 1973-02-20 | Electronic Communications | High precision circulating digital correlator |
US3777133A (en) * | 1971-01-26 | 1973-12-04 | C Wormald | Cross correlator |
CA953010A (en) * | 1971-12-03 | 1974-08-13 | Her Majesty In Right Of Canada As Represented By The Minister Of Transpo Rt | Radar cross correlator |
US3718813A (en) * | 1972-01-19 | 1973-02-27 | O Williams | Technique for correlation method of determining system impulse response |
-
1973
- 1973-06-08 US US368384A patent/US3924113A/en not_active Expired - Lifetime
-
1974
- 1974-04-12 FR FR7414309A patent/FR2240484B1/fr not_active Expired
- 1974-04-19 CA CA198,075A patent/CA1009766A/en not_active Expired
- 1974-04-29 IT IT21992/74A patent/IT1010161B/en active
- 1974-05-03 GB GB1945374A patent/GB1427695A/en not_active Expired
- 1974-05-18 DE DE2424313A patent/DE2424313C2/en not_active Expired
- 1974-05-22 JP JP49056794A patent/JPS5248060B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2240484A1 (en) | 1975-03-07 |
JPS5248060B2 (en) | 1977-12-07 |
DE2424313C2 (en) | 1984-03-01 |
FR2240484B1 (en) | 1976-06-25 |
US3924113A (en) | 1975-12-02 |
IT1010161B (en) | 1977-01-10 |
JPS5023782A (en) | 1975-03-14 |
CA1009766A (en) | 1977-05-03 |
DE2424313A1 (en) | 1975-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |