JPS5319764A - Mark detection system in electron beam exposure - Google Patents

Mark detection system in electron beam exposure

Info

Publication number
JPS5319764A
JPS5319764A JP9404776A JP9404776A JPS5319764A JP S5319764 A JPS5319764 A JP S5319764A JP 9404776 A JP9404776 A JP 9404776A JP 9404776 A JP9404776 A JP 9404776A JP S5319764 A JPS5319764 A JP S5319764A
Authority
JP
Japan
Prior art keywords
electron beam
detection system
beam exposure
mark detection
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9404776A
Other languages
Japanese (ja)
Other versions
JPS5346694B2 (en
Inventor
Korehito Matsuda
Shigeru Moriya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9404776A priority Critical patent/JPS5319764A/en
Publication of JPS5319764A publication Critical patent/JPS5319764A/en
Publication of JPS5346694B2 publication Critical patent/JPS5346694B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To precisely detect the central position of a mark by making use of a signal obtained from a mark providing a position standard, which is formed by selective etching of silicon, regardless of an increase or decrease in the width of the mark passed through the device process.
COPYRIGHT: (C)1978,JPO&Japio
JP9404776A 1976-08-09 1976-08-09 Mark detection system in electron beam exposure Granted JPS5319764A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9404776A JPS5319764A (en) 1976-08-09 1976-08-09 Mark detection system in electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9404776A JPS5319764A (en) 1976-08-09 1976-08-09 Mark detection system in electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5319764A true JPS5319764A (en) 1978-02-23
JPS5346694B2 JPS5346694B2 (en) 1978-12-15

Family

ID=14099638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9404776A Granted JPS5319764A (en) 1976-08-09 1976-08-09 Mark detection system in electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5319764A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56162837A (en) * 1980-05-20 1981-12-15 Nec Corp Electron beam exposure device
JPS5783175A (en) * 1980-11-12 1982-05-24 Mitsubishi Electric Corp Phase rotation change-over device for inverter

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023782A (en) * 1973-06-08 1975-03-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023782A (en) * 1973-06-08 1975-03-14

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56162837A (en) * 1980-05-20 1981-12-15 Nec Corp Electron beam exposure device
JPS5783175A (en) * 1980-11-12 1982-05-24 Mitsubishi Electric Corp Phase rotation change-over device for inverter

Also Published As

Publication number Publication date
JPS5346694B2 (en) 1978-12-15

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