GB1416043A - Electron microscope aperture system - Google Patents

Electron microscope aperture system

Info

Publication number
GB1416043A
GB1416043A GB194173A GB194173A GB1416043A GB 1416043 A GB1416043 A GB 1416043A GB 194173 A GB194173 A GB 194173A GB 194173 A GB194173 A GB 194173A GB 1416043 A GB1416043 A GB 1416043A
Authority
GB
United Kingdom
Prior art keywords
aperture
annular
objective
layer
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB194173A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Aeronautics and Space Administration NASA
Original Assignee
National Aeronautics and Space Administration NASA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Aeronautics and Space Administration NASA filed Critical National Aeronautics and Space Administration NASA
Publication of GB1416043A publication Critical patent/GB1416043A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

1416043 Electron microscopes NATIONAL AERONAUTICS & SPACE ADMINISTRATION 15 Jan 1973 [28 Jan 1972] 1941/73 Heading H1D In an electron microscope having an objective lens 18 for focusing the electrons passing through the specimen 16 on to an image plane 24, the lens includes an aperture plate 20, Figs. 1 and 2, having an annular aperture to reduce chromatic aberation. The aperture in the condenser lens aperture plate 14, for focusing the electron stream on to the specimen, may be either annular, as shown, or circular (Fig. 9, not shown). The objective aperture may be 50 Ám. in diameter and 3 Ám. in ring width, and may be fabricated (Figs. 4 to 8, not shown) by evaporating a first metal film, e.g. 300Š silver, on to a collodion film; mounting the composite structure on the objective aperture slide of an electron microscope having an annular condenser aperture; operating the microscope to form a contamination layer, caused by the decomposition of residual gas molecules, over the annular illuminated area; removing the structure from the microscope and galvanically depositing a second metal layer, e.g. 10,000Š Cu, over the non-contaminated area of the first metal film; and finally etching away, by ion bombardment from the rear surface, the collodion layer, the first metal film, and sufficient of the second metal layer to remove the contamination layer and leave the annular aperture. A third metal layer, e.g. 1000Š gold, may finally be evaporated on the structure surface, for stability and cleanliness. The size of the objective aperture formed may be adjusted by varying the objective lens current, and the method may be employed to produce a multi-aperture plate.
GB194173A 1972-01-28 1973-01-15 Electron microscope aperture system Expired GB1416043A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22167072A 1972-01-28 1972-01-28

Publications (1)

Publication Number Publication Date
GB1416043A true GB1416043A (en) 1975-12-03

Family

ID=22828815

Family Applications (1)

Application Number Title Priority Date Filing Date
GB194173A Expired GB1416043A (en) 1972-01-28 1973-01-15 Electron microscope aperture system

Country Status (6)

Country Link
JP (1) JPS4885069A (en)
CA (1) CA982705A (en)
DE (1) DE2302121A1 (en)
FR (1) FR2169232B1 (en)
GB (1) GB1416043A (en)
NL (1) NL7301164A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54143579U (en) * 1978-03-27 1979-10-05
JP3987276B2 (en) 2000-10-12 2007-10-03 株式会社日立製作所 Sample image forming method
NL1025500C2 (en) * 2004-02-17 2005-08-19 Fei Co Particle source with selectable beam current and energy distribution.
EP2128885A1 (en) 2008-05-26 2009-12-02 FEI Company Charged particle source with integrated energy filter
DE102009016861A1 (en) 2009-04-08 2010-10-21 Carl Zeiss Nts Gmbh particle beam

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL285301A (en) * 1961-11-15

Also Published As

Publication number Publication date
CA982705A (en) 1976-01-27
NL7301164A (en) 1973-07-31
FR2169232B1 (en) 1978-08-04
DE2302121A1 (en) 1973-08-09
FR2169232A1 (en) 1973-09-07
JPS4885069A (en) 1973-11-12

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee