GB1318818A - Method of producing a non-porous thin surface film on a substrate by vapour deposition in a vacuum - Google Patents

Method of producing a non-porous thin surface film on a substrate by vapour deposition in a vacuum

Info

Publication number
GB1318818A
GB1318818A GB2252871A GB2252871A GB1318818A GB 1318818 A GB1318818 A GB 1318818A GB 2252871 A GB2252871 A GB 2252871A GB 2252871 A GB2252871 A GB 2252871A GB 1318818 A GB1318818 A GB 1318818A
Authority
GB
United Kingdom
Prior art keywords
substrate
film
vapour
axis
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2252871A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Magyar Tudomanyos Akademia
Magyar Tudomanyos Akademia Muszaki Fizikai Kutato Intezete
Original Assignee
Magyar Tudomanyos Akademia
Magyar Tudomanyos Akademia Muszaki Fizikai Kutato Intezete
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Magyar Tudomanyos Akademia, Magyar Tudomanyos Akademia Muszaki Fizikai Kutato Intezete filed Critical Magyar Tudomanyos Akademia
Publication of GB1318818A publication Critical patent/GB1318818A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5886—Mechanical treatment

Abstract

1318818 Vacuum depositing thin films MAGYAR TUDOM‡NYOS AKAD•MIA MœSZAKI FIZAKAI KUTATË INT•ZET 19 April 1971 [27 Feb 1970] 22528/71 Heading C7F A non porous vacuum deposited film is produced by depositing a first film from a vapour point source which impinges on the substrate at a constant angle, mechanically treating the film to remove loosely adhering particles and then depositing a second film from single or multiple vapour sources so that the vapour impinges on the substrate over a hemispherical solid angle. The first film e. g. Cr 300-800A‹ thick is deposited from a vapour jet impinging at 20-80 degrees to a normal to the substrate and mechanical treatment involves ultrasonic vibration, rubbing or wiping. The second film e.g. Cr 500A‹ thick is deposited either from a series of vapour sources disposed in a semicircle and rotating the substrate about an axis bisecting the diameter of the semicircle or from a single source located on the axis of rotation of the substrate and simultaneously tilting the substrate about an axis perpendicular to the rotation axis. The glass substrate may be pickled in an aqueous solution containing 5%HF and 35%HNO 3
GB2252871A 1970-02-27 1971-04-19 Method of producing a non-porous thin surface film on a substrate by vapour deposition in a vacuum Expired GB1318818A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
HUMA002073 1970-02-27

Publications (1)

Publication Number Publication Date
GB1318818A true GB1318818A (en) 1973-05-31

Family

ID=10998450

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2252871A Expired GB1318818A (en) 1970-02-27 1971-04-19 Method of producing a non-porous thin surface film on a substrate by vapour deposition in a vacuum

Country Status (4)

Country Link
AT (1) AT303485B (en)
CH (1) CH539130A (en)
DE (1) DE2106049A1 (en)
GB (1) GB1318818A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2303084A1 (en) * 1975-03-06 1976-10-01 Secr Defence Brit PERFECTED PROCESS AND DEVICES FOR THE PRODUCTION OF MASS ALLOYS
GB2218111A (en) * 1988-03-18 1989-11-08 Lpw Chemie Gmbh Coating metallic substrates by the PVD process
EP0854024A2 (en) * 1997-01-20 1998-07-22 Agency of Industrial Science and Technology of Ministry of International Trade and Industry Thin-film fabrication method and apparatus
US6368583B1 (en) 1995-11-06 2002-04-09 Basf Aktiengesellschaft Hair treatment composition
US20180081250A1 (en) * 2009-03-31 2018-03-22 View, Inc. Fabrication of low defectivity electrochromic devices
US10831077B2 (en) 2011-09-30 2020-11-10 View, Inc. Fabrication of electrochromic devices

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA991735A (en) * 1972-04-10 1976-06-22 Ncr Corporation Alignment film for a liquid crystal display cell and method of making same
US5792327A (en) * 1994-07-19 1998-08-11 Corning Incorporated Adhering metal to glass

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2303084A1 (en) * 1975-03-06 1976-10-01 Secr Defence Brit PERFECTED PROCESS AND DEVICES FOR THE PRODUCTION OF MASS ALLOYS
GB2218111A (en) * 1988-03-18 1989-11-08 Lpw Chemie Gmbh Coating metallic substrates by the PVD process
US6368583B1 (en) 1995-11-06 2002-04-09 Basf Aktiengesellschaft Hair treatment composition
EP0854024A2 (en) * 1997-01-20 1998-07-22 Agency of Industrial Science and Technology of Ministry of International Trade and Industry Thin-film fabrication method and apparatus
EP0854024A3 (en) * 1997-01-20 1998-10-28 Agency of Industrial Science and Technology of Ministry of International Trade and Industry Thin-film fabrication method and apparatus
US6319321B1 (en) 1997-01-20 2001-11-20 Agency Of Industrial Science & Technology Ministry Of International Trade & Industry Thin-film fabrication method and apparatus
US20180081250A1 (en) * 2009-03-31 2018-03-22 View, Inc. Fabrication of low defectivity electrochromic devices
US11079648B2 (en) 2009-03-31 2021-08-03 View, Inc. Fabrication of electrochromic devices
US10831077B2 (en) 2011-09-30 2020-11-10 View, Inc. Fabrication of electrochromic devices

Also Published As

Publication number Publication date
DE2106049A1 (en) 1971-09-09
AT303485B (en) 1972-10-15
CH539130A (en) 1973-08-31

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees