GB1280012A - Improvements in or relating to ion beam sources - Google Patents

Improvements in or relating to ion beam sources

Info

Publication number
GB1280012A
GB1280012A GB6289/69A GB628969A GB1280012A GB 1280012 A GB1280012 A GB 1280012A GB 6289/69 A GB6289/69 A GB 6289/69A GB 628969 A GB628969 A GB 628969A GB 1280012 A GB1280012 A GB 1280012A
Authority
GB
United Kingdom
Prior art keywords
enclosure
ion
vessel
passageway
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB6289/69A
Inventor
James Harry Freeman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Atomic Energy Authority
Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Atomic Energy Authority filed Critical UK Atomic Energy Authority
Priority to GB6288/69A priority Critical patent/GB1280011A/en
Priority to GB6289/69A priority patent/GB1280012A/en
Priority to US3958A priority patent/US3705320A/en
Priority to DE2003715A priority patent/DE2003715B2/en
Priority to DE19707002826 priority patent/DE7002826U/en
Priority to DE19702003970 priority patent/DE2003970A1/en
Priority to NL7001397A priority patent/NL7001397A/xx
Priority to NLAANVRAGE7001398,A priority patent/NL172286C/en
Priority to FR7003968A priority patent/FR2033958A5/fr
Priority to FR7003967A priority patent/FR2033957A5/fr
Publication of GB1280012A publication Critical patent/GB1280012A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/44—Separation by mass spectrography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/12—Ion sources; Ion guns using an arc discharge, e.g. of the duoplasmatron type

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1280012 Ion sources UNITED KINGDOM ATOMIC ENERGY AUTHORITY 19 Jan 1970 [5 Feb 1969] 6289/69 Heading HID An ion source, e.g. for the ion separator described in Specification 1,280,012, comprises. an evacuated enclosure 25 in which ions are generated and from which they are extracted in the form of a beam 12, the enclosure being attached in a vacuum-tight manner to an enclosed beam passageway in such a manner as to permit pivotal motion of the enclosure about the origin or apparent point of origin of the beam to adjust the relative inclination of the ejected ion beam to the passageway. As shown in Fig. 3, ion beam source 11 includes an outer cylindrical vessel 23, connected to the ion beam passageway, and an inner cylindrical vessel 24, supporting enclosure 25, which is connected to the outer vessel 23 by vacuum bellows 26. Spherically machined opposing surfaces 28, 29 on the outer vessel and 31, 32 on the inner vessel, whose centres of curvature coincide with the extraction slit 27, provide the necessary constraint to produce pivotal movement of the enclosure. The ion source may be of the type described in Specification 916,703 in which the source material is heated in an oven 33 behind the arc chamber 25. Electrons from heated filament 34 in applied magnetic field A ionize the gas entering chamber 25.
GB6289/69A 1969-02-05 1969-02-05 Improvements in or relating to ion beam sources Expired GB1280012A (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
GB6288/69A GB1280011A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam separators
GB6289/69A GB1280012A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam sources
US3958A US3705320A (en) 1969-02-05 1970-01-19 Ion beam sources with tiltable firing angle
DE2003715A DE2003715B2 (en) 1969-02-05 1970-01-28 Ion beam source
DE19707002826 DE7002826U (en) 1969-02-05 1970-01-28 ION BEAM SOURCE.
DE19702003970 DE2003970A1 (en) 1969-02-05 1970-01-29 Ion beam separator
NL7001397A NL7001397A (en) 1969-02-05 1970-01-30
NLAANVRAGE7001398,A NL172286C (en) 1969-02-05 1970-01-30 ION BUNDLE SOURCE INTENDED FOR AN ELECTROMAGNETIC SEPARATOR.
FR7003968A FR2033958A5 (en) 1969-02-05 1970-02-04
FR7003967A FR2033957A5 (en) 1969-02-05 1970-02-04

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB6288/69A GB1280011A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam separators
GB6289/69A GB1280012A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam sources

Publications (1)

Publication Number Publication Date
GB1280012A true GB1280012A (en) 1972-07-05

Family

ID=26240578

Family Applications (2)

Application Number Title Priority Date Filing Date
GB6289/69A Expired GB1280012A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam sources
GB6288/69A Expired GB1280011A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam separators

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB6288/69A Expired GB1280011A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam separators

Country Status (5)

Country Link
US (1) US3705320A (en)
DE (2) DE2003715B2 (en)
FR (2) FR2033957A5 (en)
GB (2) GB1280012A (en)
NL (2) NL7001397A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2223349A (en) * 1988-08-26 1990-04-04 Atomic Energy Authority Uk Charged particle beam intensity varying device

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4017403A (en) * 1974-07-31 1977-04-12 United Kingdom Atomic Energy Authority Ion beam separators
DE2621824C2 (en) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Microwave Discharge Ion Source
DE3150156C2 (en) * 1981-12-18 1986-04-30 Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt High current ion source
JPH0727766B2 (en) * 1983-08-15 1995-03-29 アプライド マテリアルズ インコーポレーテッド Ion implantation device and ion source device operating method
US4578589A (en) * 1983-08-15 1986-03-25 Applied Materials, Inc. Apparatus and methods for ion implantation
US4847504A (en) * 1983-08-15 1989-07-11 Applied Materials, Inc. Apparatus and methods for ion implantation
US4761553A (en) * 1983-10-06 1988-08-02 The United States Of America As Represented By The United States Department Of Energy Gaseous leak detector
US4855602A (en) * 1986-06-20 1989-08-08 Sharma Devendra N Beam deflector
US5262652A (en) * 1991-05-14 1993-11-16 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
US5723862A (en) * 1996-03-04 1998-03-03 Forman; Leon Mass spectrometer utilizing high energy product density permanent magnets
US6452338B1 (en) 1999-12-13 2002-09-17 Semequip, Inc. Electron beam ion source with integral low-temperature vaporizer
NL1021848C2 (en) 2002-11-06 2004-05-07 Nedap Nv Security system based on standard euro cylinder.
EP1830385A1 (en) * 2006-03-01 2007-09-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ion beam apparatus and method for aligning same
JPWO2010018639A1 (en) * 2008-08-15 2012-01-26 株式会社シンクロン Vapor deposition apparatus and thin film device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2223349A (en) * 1988-08-26 1990-04-04 Atomic Energy Authority Uk Charged particle beam intensity varying device
US5030885A (en) * 1988-08-26 1991-07-09 United Kingdom Atomic Energy Authority Charged particle control device

Also Published As

Publication number Publication date
DE2003715A1 (en) 1970-09-03
DE2003970A1 (en) 1970-08-20
FR2033957A5 (en) 1970-12-04
NL7001397A (en) 1970-08-07
DE2003715B2 (en) 1980-11-06
NL172286C (en) 1983-08-01
US3705320A (en) 1972-12-05
FR2033958A5 (en) 1970-12-04
NL7001398A (en) 1970-08-07
GB1280011A (en) 1972-07-05

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee