GB1249951A - Method and apparatus for producing a tantalum nitride film - Google Patents

Method and apparatus for producing a tantalum nitride film

Info

Publication number
GB1249951A
GB1249951A GB54540/69A GB5454069A GB1249951A GB 1249951 A GB1249951 A GB 1249951A GB 54540/69 A GB54540/69 A GB 54540/69A GB 5454069 A GB5454069 A GB 5454069A GB 1249951 A GB1249951 A GB 1249951A
Authority
GB
United Kingdom
Prior art keywords
torr
tantalum nitride
nitride film
sputtering
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB54540/69A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Publication of GB1249951A publication Critical patent/GB1249951A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Adjustable Resistors (AREA)

Abstract

1,249,951. Resistors. OKI ELECTRIC INDUSTRY CO. Ltd. 6 Nov., 1969 [25 June 1969], No. 54540/69. Heading H1S. [Also in Division C7] A tantalum nitride film resistor having a specific temperature coefficient which is low or zero and in which the tantalum nitride is mostly a hexagonal type crystal structure is made by reactive sputtering of tantalum with a sputtering current of more than 0À25 mA/cm.<SP>2</SP> and sputtering voltage of more than 4.5 kV in a nitrogen/argon gas atmosphere in which the total gas pressure of Ar and N 2 is 0À8 x 10<SP>-2</SP> Torr to 3 x 10<SP>-2</SP> Torr and the partial pressure of N 3 is 5 x 10<SP>-5</SP> Torr to 10<SP>-3</SP> Torr on to a substrate, e.g. of ceramic, which has been preheated to 500 to 700‹ C., the temperature of the preheating determining the temperature coefficient of the resistor. The substrate may be presputtered.
GB54540/69A 1969-06-25 1969-11-06 Method and apparatus for producing a tantalum nitride film Expired GB1249951A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4970069 1969-06-25

Publications (1)

Publication Number Publication Date
GB1249951A true GB1249951A (en) 1971-10-13

Family

ID=12838441

Family Applications (1)

Application Number Title Priority Date Filing Date
GB54540/69A Expired GB1249951A (en) 1969-06-25 1969-11-06 Method and apparatus for producing a tantalum nitride film

Country Status (2)

Country Link
US (1) US3664943A (en)
GB (1) GB1249951A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2174718A (en) * 1985-05-07 1986-11-12 Fuji Xerox Co Ltd Crystalline structure in a heating film of a thermal head
US6375312B1 (en) * 1993-06-28 2002-04-23 Canon Kabushiki Kaisha HEAT GENERATING RESISTOR CONTAINING TaN0.8, SUBSTRATE PROVIDED WITH SAID HEAT GENERATING RESISTOR FOR LIQUID JET HEAD, LIQUID JET HEAD PROVIDED WITH SAID SUBSTRATE, AND LIQUID JET APPARATUS PROVIDED WITH SAID LIQUID JET HEAD

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3847658A (en) * 1972-01-14 1974-11-12 Western Electric Co Article of manufacture having a film comprising nitrogen-doped beta tantalum
US3775278A (en) * 1972-03-22 1973-11-27 Bell Telephone Labor Inc Technique for the fabrication of thin film resistors
US5367285A (en) * 1993-02-26 1994-11-22 Lake Shore Cryotronics, Inc. Metal oxy-nitride resistance films and methods of making the same
US6174582B1 (en) 1998-02-06 2001-01-16 International Business Machines Corporation Thin film magnetic disk having reactive element doped refractory metal seed layer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE634012A (en) * 1961-10-03
US3391071A (en) * 1963-07-22 1968-07-02 Bell Telephone Labor Inc Method of sputtering highly pure refractory metals in an anodically biased chamber
US3432416A (en) * 1966-10-03 1969-03-11 Gen Electric High purity niobium films formed by glow discharge cathode sputtering

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2174718A (en) * 1985-05-07 1986-11-12 Fuji Xerox Co Ltd Crystalline structure in a heating film of a thermal head
US4734709A (en) * 1985-05-07 1988-03-29 Fuji Xerox Co., Ltd. Thermal head and method for fabricating
GB2174718B (en) * 1985-05-07 1989-06-28 Fuji Xerox Co Ltd Thermal head and method for fabricating the same
US6375312B1 (en) * 1993-06-28 2002-04-23 Canon Kabushiki Kaisha HEAT GENERATING RESISTOR CONTAINING TaN0.8, SUBSTRATE PROVIDED WITH SAID HEAT GENERATING RESISTOR FOR LIQUID JET HEAD, LIQUID JET HEAD PROVIDED WITH SAID SUBSTRATE, AND LIQUID JET APPARATUS PROVIDED WITH SAID LIQUID JET HEAD

Also Published As

Publication number Publication date
US3664943A (en) 1972-05-23

Similar Documents

Publication Publication Date Title
GB1522221A (en) Resistance element for a resistance thermometer and a process for its production
GB1514527A (en) High resistance cermet film and method of making the same
GB1485928A (en) Etching aluminium
IE36063L (en) Depositing a metal oxide film
GB1471820A (en) Light-permeable absorbing layers on substrates
Hall The effect of expansion mismatch on temperature coefficient of resistance of thin films
GB1249951A (en) Method and apparatus for producing a tantalum nitride film
GB1465931A (en) Electrical resistors
GB1464802A (en) Magnetic oxide film its preparation and uses
CS181054B1 (en) Equipment adapted for multistage vacuum and molecular distillation with wiped off film with single evaporating body
JPS5727079A (en) Manufacture of josephson element of oxide superconductor
GB1010575A (en) Thin film structures
GB1389326A (en) Method for producing thin film circuits
GB1379510A (en) Technique for adjusting the temperature coefficient of resistance of tantalum aluminium alloys
JPS55107774A (en) Manufacture of tantalum film
GB1354809A (en) Photomask
GB1131061A (en) Method of processing quartz
GB1466041A (en) Thermomagnetic recording medium
GB1384109A (en) Forming magnetic films on substrates
GB1523841A (en) Process for the production of a thin-film resistor
JPS51126384A (en) A method of forming a thin film by sputtering
JPS578921A (en) Magnetic recording body
JPS52127770A (en) Spatter etching method
JPS5772307A (en) Alloy film material for magneticstorage and manufacture of the same
JPS5234393A (en) Production method of resistance element with voltage non-linearity