GB1170458A - Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material - Google Patents
Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said MaterialInfo
- Publication number
- GB1170458A GB1170458A GB653467A GB653467A GB1170458A GB 1170458 A GB1170458 A GB 1170458A GB 653467 A GB653467 A GB 653467A GB 653467 A GB653467 A GB 653467A GB 1170458 A GB1170458 A GB 1170458A
- Authority
- GB
- United Kingdom
- Prior art keywords
- composition
- support
- photoreprographic
- diazide
- naphthylamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0223—Iminoquinonediazides; Para-quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK0058406 | 1966-02-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1170458A true GB1170458A (en) | 1969-11-12 |
Family
ID=7228676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB653467A Expired GB1170458A (en) | 1966-02-12 | 1967-02-10 | Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material |
Country Status (9)
Country | Link |
---|---|
AT (1) | AT272380B (ko) |
BE (1) | BE693873A (ko) |
CH (1) | CH485256A (ko) |
DE (1) | DE1522496A1 (ko) |
ES (1) | ES336736A1 (ko) |
FR (1) | FR1510796A (ko) |
GB (1) | GB1170458A (ko) |
NL (1) | NL6701622A (ko) |
SE (1) | SE333098B (ko) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1981001756A1 (en) * | 1979-12-07 | 1981-06-25 | Minnesota Mining & Mfg | Diazonium imaging system |
US4394433A (en) | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
US4564581A (en) * | 1981-06-19 | 1986-01-14 | Sericol Group Limited | Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator |
US4578341A (en) * | 1981-03-24 | 1986-03-25 | Sensitisers (Research) Ltd. | Acidic photosensitive relief image-forming materials with indicator pigment or dye |
WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
JPS5562444A (en) * | 1978-11-02 | 1980-05-10 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
JPS58211141A (ja) * | 1982-06-02 | 1983-12-08 | Fuji Photo Film Co Ltd | ネガ型感光性平版印刷版 |
GB2196143B (en) * | 1986-10-08 | 1990-03-28 | Canon Kk | Recording medium and process for forming color image with use of the same |
-
1966
- 1966-02-12 DE DE19661522496 patent/DE1522496A1/de active Pending
-
1967
- 1967-02-02 NL NL6701622A patent/NL6701622A/xx unknown
- 1967-02-09 CH CH192367A patent/CH485256A/de not_active IP Right Cessation
- 1967-02-09 AT AT126167A patent/AT272380B/de active
- 1967-02-09 BE BE693873D patent/BE693873A/xx not_active IP Right Cessation
- 1967-02-10 SE SE190767A patent/SE333098B/xx unknown
- 1967-02-10 FR FR94573A patent/FR1510796A/fr not_active Expired
- 1967-02-10 GB GB653467A patent/GB1170458A/en not_active Expired
- 1967-02-11 ES ES336736A patent/ES336736A1/es not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1981001756A1 (en) * | 1979-12-07 | 1981-06-25 | Minnesota Mining & Mfg | Diazonium imaging system |
US4394433A (en) | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
US4578341A (en) * | 1981-03-24 | 1986-03-25 | Sensitisers (Research) Ltd. | Acidic photosensitive relief image-forming materials with indicator pigment or dye |
US4564581A (en) * | 1981-06-19 | 1986-01-14 | Sericol Group Limited | Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator |
US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
US4672021A (en) * | 1985-06-03 | 1987-06-09 | Fairmount Chemical Company | Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder |
Also Published As
Publication number | Publication date |
---|---|
SE333098B (ko) | 1971-03-01 |
FR1510796A (fr) | 1968-01-19 |
CH485256A (de) | 1970-01-31 |
DE1522496A1 (de) | 1969-09-11 |
BE693873A (ko) | 1967-08-09 |
ES336736A1 (es) | 1968-01-01 |
AT272380B (de) | 1969-07-10 |
NL6701622A (ko) | 1967-08-14 |
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