FR1510796A - Masse de reproduction photosensible pour la reprographie et matériel de reproduction enduit de celle-ci - Google Patents

Masse de reproduction photosensible pour la reprographie et matériel de reproduction enduit de celle-ci

Info

Publication number
FR1510796A
FR1510796A FR94573A FR94573A FR1510796A FR 1510796 A FR1510796 A FR 1510796A FR 94573 A FR94573 A FR 94573A FR 94573 A FR94573 A FR 94573A FR 1510796 A FR1510796 A FR 1510796A
Authority
FR
France
Prior art keywords
reproduction
reprography
mass
material coated
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR94573A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Application granted granted Critical
Publication of FR1510796A publication Critical patent/FR1510796A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0223—Iminoquinonediazides; Para-quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
FR94573A 1966-02-12 1967-02-10 Masse de reproduction photosensible pour la reprographie et matériel de reproduction enduit de celle-ci Expired FR1510796A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0058406 1966-02-12

Publications (1)

Publication Number Publication Date
FR1510796A true FR1510796A (fr) 1968-01-19

Family

ID=7228676

Family Applications (1)

Application Number Title Priority Date Filing Date
FR94573A Expired FR1510796A (fr) 1966-02-12 1967-02-10 Masse de reproduction photosensible pour la reprographie et matériel de reproduction enduit de celle-ci

Country Status (9)

Country Link
AT (1) AT272380B (fr)
BE (1) BE693873A (fr)
CH (1) CH485256A (fr)
DE (1) DE1522496A1 (fr)
ES (1) ES336736A1 (fr)
FR (1) FR1510796A (fr)
GB (1) GB1170458A (fr)
NL (1) NL6701622A (fr)
SE (1) SE333098B (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
JPS5562444A (en) * 1978-11-02 1980-05-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
WO1981001756A1 (fr) * 1979-12-07 1981-06-25 Minnesota Mining & Mfg Systeme photographique au diazonium
ZA821588B (en) * 1981-03-24 1983-02-23 Sensitisers Ltd Photosensitive relief image-forming materials
AU557375B2 (en) * 1981-06-19 1986-12-18 Sericol Group Ltd. Photo sensitive compositions and their use
JPS58211141A (ja) * 1982-06-02 1983-12-08 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
GB2196143B (en) * 1986-10-08 1990-03-28 Canon Kk Recording medium and process for forming color image with use of the same

Also Published As

Publication number Publication date
SE333098B (fr) 1971-03-01
CH485256A (de) 1970-01-31
DE1522496A1 (de) 1969-09-11
BE693873A (fr) 1967-08-09
ES336736A1 (es) 1968-01-01
AT272380B (de) 1969-07-10
GB1170458A (en) 1969-11-12
NL6701622A (fr) 1967-08-14

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