GB1153535A - Bath and Process for Electrolytically Etching Indium Arsenide - Google Patents

Bath and Process for Electrolytically Etching Indium Arsenide

Info

Publication number
GB1153535A
GB1153535A GB08724/67A GB1872467A GB1153535A GB 1153535 A GB1153535 A GB 1153535A GB 08724/67 A GB08724/67 A GB 08724/67A GB 1872467 A GB1872467 A GB 1872467A GB 1153535 A GB1153535 A GB 1153535A
Authority
GB
United Kingdom
Prior art keywords
bath
indium arsenide
electrolytically
electrolytically etching
etching indium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08724/67A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Publication of GB1153535A publication Critical patent/GB1153535A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/02Etching
    • C25F3/12Etching of semiconducting materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)

Abstract

1,153,535. Electrolytically etching indium arsenide. MATSUSHITA ELECTRONICS CORP. April 24, 1967 [May 9, 1966], No. 18724/67. Heading C7B. An indium arsenide crystal, e.g. mechanically lapped with Al a O 3 or SiC polishing material, is electrolytically etched by introducing it as an anode into a bath comprising by volume one part 98% concentrated nitric acid and 1 to 3 parts ethylene glycol to obtain a smooth mirror surface suitable for semi-conductor devices. The current density is preferably 1 - 5 A/cm<SP>2</SP> and the bath temperature 20 - 40‹ C. A Pt plate cathode is used. Prior art electrolytic etching uses a perchloric and acetic acid bath, and a potassium ferrocyanide and hydroxide bath.
GB08724/67A 1966-05-09 1967-04-24 Bath and Process for Electrolytically Etching Indium Arsenide Expired GB1153535A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2953166 1966-05-09

Publications (1)

Publication Number Publication Date
GB1153535A true GB1153535A (en) 1969-05-29

Family

ID=12278675

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08724/67A Expired GB1153535A (en) 1966-05-09 1967-04-24 Bath and Process for Electrolytically Etching Indium Arsenide

Country Status (4)

Country Link
US (1) US3485731A (en)
DE (1) DE1621110B1 (en)
GB (1) GB1153535A (en)
NL (1) NL141932B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3635805A (en) * 1968-02-29 1972-01-18 Atomic Energy Commission Israe Working of metal bodies
US3673063A (en) * 1971-03-31 1972-06-27 Avco Corp Production of lead-tin-telluride material for infrared detectors
US4169026A (en) * 1976-07-23 1979-09-25 Matsushita Electric Industrial Co., Ltd. Etchant for electrolytic etching of a ferrite for a magnetic head and method of producing a magnetic head

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA602880A (en) * 1960-08-02 Philco Corporation Electrolytic etching of semiconductors

Also Published As

Publication number Publication date
US3485731A (en) 1969-12-23
NL6706404A (en) 1967-11-10
NL141932B (en) 1974-04-16
DE1621110B1 (en) 1971-06-24

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