GB1064388A - Depilatory composition - Google Patents

Abstract

Depilatory compositions comprise, dispersed in a water-in-oil emulsified base, a replaced thiol in which a hydrogen of H2S is replaced by a C7 to C4 organic residue and a solid basic material. More specifically, the ingredients are as follows: (a) An emollient base of melting point 65 DEG to 100 DEG C., comprising, by weight, (i) 30 to 70% of at least one monoamide derived from a primary or secondary alkanolamine having only C1 to C6 alkyl groups, when present, and C1 to C6 hydroxyalkyl groups, (ii) 15 to 30% of at least one Kritchevsky condensate, having an acid number of 40 to 60 and an alkali number of 70 to 200, of at least one C6 to C22 carboxylic acid and an alkanolamine as defined in (i) above, (iii) 15 to 50% of a non-ionic water-in-oil emulsifier which is a fatty acid polyol ester or a polyalkenoxy surface-active agent, (b) Sufficient water emulsified with this base to provide a cream-like consistency, (c) Sufficient solid basic material, which is guanidine, or alkaline earth or alkali metal hydroxides, carbonates, silicates of tribasic phosphates, to provide a pH of 10.5 to 12.5 in the final composition and (d) A thiol wherein the H of hydrogen sulphide is substituted by a C2 to C4 organic residue which contains at least one of the groups hydroxyl, ketone, aldehyde, ether, amine, sulphonic acid, carboxylic acid, or carboxylic acid salt. Further ingredients which may be present are colouring agents, perfumes, bateriostats such as bithionol, hexetidine, or hexachlorophene, antoxidants such as sodium sulphite, and zinc oxide, urea, and solvents such as propylene glycol and glycerine.