GB1040620A - Processing head for photographic mechanism - Google Patents
Processing head for photographic mechanismInfo
- Publication number
- GB1040620A GB1040620A GB4594963A GB4594963A GB1040620A GB 1040620 A GB1040620 A GB 1040620A GB 4594963 A GB4594963 A GB 4594963A GB 4594963 A GB4594963 A GB 4594963A GB 1040620 A GB1040620 A GB 1040620A
- Authority
- GB
- United Kingdom
- Prior art keywords
- film
- processing
- ridges
- pedestal
- stations
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B17/00—Details of cameras or camera bodies; Accessories therefor
- G03B17/48—Details of cameras or camera bodies; Accessories therefor adapted for combination with other photographic or optical apparatus
- G03B17/50—Details of cameras or camera bodies; Accessories therefor adapted for combination with other photographic or optical apparatus with both developing and finishing apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
Abstract
1,040,620. Photographic processing apparatus. OPTOMECHANISMS Inc. Nov. 21, 1963, No. 45949/63. Heading G2A. A photographic processing apparatus comprises at least two treatment stations, each having an inlet and outlet passage for processing fluid, a cover plate for the apparatus having an opening at each station into which openings respective pedestals project, a sealing gasket round each opening and standing slightly higher than the top surface of the pedestal, so that when a film is pressed face downwards against the gasket, the space between the film face and the pedestal forms a channel through which the processing fluid can be passed to act on the film. As shown, the film F receives a photographic exposure at A, and is then conveyed by sprockets S<SP>1</SP>, S<SP>2</SP> over the processing head 10, in intermittent frame-by-frame movement. The form shown has three processing stations 12, 13, 14 for developing, fixing, and washing respectively, formed as cavities in a base member 11. In each cavity is a pedestal (17, 18, 19) together with inlet means 22 and outlet means 23 for the respective fluids. Secured to the top surface of base 11 is a cover plate 39, having openings 41, 42, 43 therein, corresponding to the three processing stations. Each opening is provided with a gasket 50, which seals all joints between the cover plate and the base, and between the base and the pedestals. Each gasket also has two upstanding V-section ridges in rectangular configuration (51a, 51b), one within the other, surrounding the openings 41, 42, 43. The film F is traversed across the tops of these ridges, and is pressed against them by a spring-urged presser plate 65. The space between the underside of the film and the tops of the pedestals, determined by the height of the ridges 51a, 51b, forms an enclosure which is filled by the processing fluid as it flows from the inlet 22 to the outlet 23. At the first two stations, the fluid flows longitudinally of the film, and in a direction opposite to the film movement or feed, the ridges 51c, 51b also having a wiping effect on the film as it moves forward. At the third (washing) station, the fluid flows cross-wise of the film. The third pedestal 19 is of transparent material, with a lamp L below and a projection lens 63 above so that the image on the film may be visually inspected at this stage. If the times for developing and fixing are different, this may be allowed for by suitably proportioning the lengths of the processing stations, as in Figs. 9 and 10, (not shown) in which the developing station is 1<SP>1</SP>/ 2 times the length of the fixing station (the relative processing times being 3 seconds and 2 seconds).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4594963A GB1040620A (en) | 1963-11-21 | 1963-11-21 | Processing head for photographic mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4594963A GB1040620A (en) | 1963-11-21 | 1963-11-21 | Processing head for photographic mechanism |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1040620A true GB1040620A (en) | 1966-09-01 |
Family
ID=10439209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4594963A Expired GB1040620A (en) | 1963-11-21 | 1963-11-21 | Processing head for photographic mechanism |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1040620A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4462668A (en) * | 1980-10-06 | 1984-07-31 | Laser Technology, Inc. | Hologram apparatus for detecting flaws with developing chamber |
US4506945A (en) * | 1981-07-20 | 1985-03-26 | Laser Technology, Inc. | Hologram apparatus for detecting flaws with developing chamber |
GB2346708A (en) * | 1999-02-11 | 2000-08-16 | Mitel Semiconductor Ltd | Mounting for mask and method of developing mask therein |
-
1963
- 1963-11-21 GB GB4594963A patent/GB1040620A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4462668A (en) * | 1980-10-06 | 1984-07-31 | Laser Technology, Inc. | Hologram apparatus for detecting flaws with developing chamber |
US4506945A (en) * | 1981-07-20 | 1985-03-26 | Laser Technology, Inc. | Hologram apparatus for detecting flaws with developing chamber |
GB2346708A (en) * | 1999-02-11 | 2000-08-16 | Mitel Semiconductor Ltd | Mounting for mask and method of developing mask therein |
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