GB1031833A - Process for treating tungsten - Google Patents
Process for treating tungstenInfo
- Publication number
- GB1031833A GB1031833A GB1927063A GB1927063A GB1031833A GB 1031833 A GB1031833 A GB 1031833A GB 1927063 A GB1927063 A GB 1927063A GB 1927063 A GB1927063 A GB 1927063A GB 1031833 A GB1031833 A GB 1031833A
- Authority
- GB
- United Kingdom
- Prior art keywords
- tungsten
- gas
- trichloro
- silane
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Silicon Compounds (AREA)
Abstract
Silicon carbide is deposited on tungsten by heating to a temperature of 1200 to 1500 DEG C. in an atmosphere including methyl-trichloro-silane at a pressure of 1 to 76 cms. Hg. A carrier gas, e.g. hydrogen, may be used. The rate of flow of gas may be 500 c.c. per minute.ALSO:Silicon carbide is deposited on tungsten by heating to a temperature of 1200 DEG to 1500 DEG C. in an atmosphere including methyl-trichloro-silane at a pressure of 1 to 76 cm. Hg. A carrier gas, e.g. hydrogen, may be used. The rate of flow of gas may be 500 c.c. per minute.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1927063A GB1031833A (en) | 1963-05-15 | 1963-05-15 | Process for treating tungsten |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1927063A GB1031833A (en) | 1963-05-15 | 1963-05-15 | Process for treating tungsten |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1031833A true GB1031833A (en) | 1966-06-02 |
Family
ID=10126607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1927063A Expired GB1031833A (en) | 1963-05-15 | 1963-05-15 | Process for treating tungsten |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1031833A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3642522A (en) * | 1969-07-15 | 1972-02-15 | Suisse Horlogerie Rech Lab | Method for producing hard coatings on a surface |
EP0599468A1 (en) * | 1992-11-23 | 1994-06-01 | Cvd Incorporated | Chemical-vapor-deposition-produced silicon carbide |
-
1963
- 1963-05-15 GB GB1927063A patent/GB1031833A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3642522A (en) * | 1969-07-15 | 1972-02-15 | Suisse Horlogerie Rech Lab | Method for producing hard coatings on a surface |
EP0599468A1 (en) * | 1992-11-23 | 1994-06-01 | Cvd Incorporated | Chemical-vapor-deposition-produced silicon carbide |
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