JPS51115299A - Formation process of silicon oxide film - Google Patents
Formation process of silicon oxide filmInfo
- Publication number
- JPS51115299A JPS51115299A JP50040899A JP4089975A JPS51115299A JP S51115299 A JPS51115299 A JP S51115299A JP 50040899 A JP50040899 A JP 50040899A JP 4089975 A JP4089975 A JP 4089975A JP S51115299 A JPS51115299 A JP S51115299A
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- silicon oxide
- formation process
- plasma treatment
- gas plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Silicon Compounds (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50040899A JPS51115299A (en) | 1975-04-03 | 1975-04-03 | Formation process of silicon oxide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50040899A JPS51115299A (en) | 1975-04-03 | 1975-04-03 | Formation process of silicon oxide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51115299A true JPS51115299A (en) | 1976-10-09 |
Family
ID=12593346
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50040899A Pending JPS51115299A (en) | 1975-04-03 | 1975-04-03 | Formation process of silicon oxide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51115299A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61193456A (en) * | 1985-02-21 | 1986-08-27 | Toshiba Corp | Manufacture of semiconductor element |
-
1975
- 1975-04-03 JP JP50040899A patent/JPS51115299A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61193456A (en) * | 1985-02-21 | 1986-08-27 | Toshiba Corp | Manufacture of semiconductor element |
JPH0380338B2 (en) * | 1985-02-21 | 1991-12-24 | Toshiba Kk |
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