GB1001834A - Improvements in or relating to photopolymerisable compositions - Google Patents

Improvements in or relating to photopolymerisable compositions

Info

Publication number
GB1001834A
GB1001834A GB13867/63A GB1386763A GB1001834A GB 1001834 A GB1001834 A GB 1001834A GB 13867/63 A GB13867/63 A GB 13867/63A GB 1386763 A GB1386763 A GB 1386763A GB 1001834 A GB1001834 A GB 1001834A
Authority
GB
United Kingdom
Prior art keywords
attached
hydrogen
ring system
atom
nitrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB13867/63A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US186222A external-priority patent/US3203802A/en
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of GB1001834A publication Critical patent/GB1001834A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Dental Preparations (AREA)

Abstract

A photopolymerizable composition comprises (a) an addition polymerizable, non-gaseous, ethylenically unsaturated compound containing at least one terminal ethylenic group (CH2=C<) having a boiling point above 100 DEG C. at normal atmospheric pressure and being capable of forming a high polymer by free-radical initiated addition polymerization; (b) at least one sensitometric modifier containing an organic compound of the formula -N=C<, wherein the nitrogen atom is also linked to a single oxygen atom, said modifier being present in an amount from 0.001 to 3.0% by weight of constituent (a); (c) a free-radical generating addition polymerization photoinitiator activatable by actinic radiation, in an amount from 0.001 to 10 parts per 100 parts of the total photopolymerizable composition. The compositions preferably also contain (a) a viscosity modifying agent, preferably a thermoplastic compound which is solid at least at 50 DEG C., such agents include filler materials, both inorganic and polymeric, plasticizers and high boiling solvents, and (e) a thermal addition polymerization inhibitor. Preferably the sensitometric modifier (b) contains a compound of formula <FORM:1001834/C3/1> wherein the nitrogen atom is linked to a single oxygen atom and (1) the monovalent bond of the nitrogen atom may be attached to a hydrocarbon radical (R); when the carbon atom is attached to a hydrogen atom (R1), its remaining bond is attached to an aromatic ring system (R11) and when the carbon atom is not attached to hydrogen, it is part of a carbocyclic ring system (R1 and R11) and (2) the nitrogen atom may not carry a substituent R (R=zero) and R1 and R11 are a benzenoid ring system containing an amino group. Still more particularly the sensitometric modifier (6) may be represented by one of the following formula <FORM:1001834/C3/2> wherein R is hydrogen, alkyl, hydroxyalkyl, phenyl, R1 which may be the same or different to R, is alkyl, hydroxy alkyl, phenyl, acetamido, N1-alkyl, N1,N1-dialkyl substituted acetamido or p-sulphophenoxybutyl <FORM:1001834/C3/3> wherein the carbon atom is part of a carbocyclic ring system or is attached to hydrogen and an aromatic ring system, and the monovalent bond of the nitrogen atom is attached to a hydrogen or substituted hydrocarbon radical. Long lists of suitable monomers are supplied alkylene and polyalkylene glycol diacrylates being preferred. Specifications 741,441, 741,470, 807,948, 905,700, 935,627, 945,807, 1,001,831, 1,001,832 and 1,001,833 are referred to.
GB13867/63A 1962-04-09 1963-04-08 Improvements in or relating to photopolymerisable compositions Expired GB1001834A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US186221A US3203801A (en) 1962-04-09 1962-04-09 Photopolymerizable composition and element
US186222A US3203802A (en) 1962-04-09 1962-04-09 Photopolymerizable composition and element

Publications (1)

Publication Number Publication Date
GB1001834A true GB1001834A (en) 1965-08-18

Family

ID=26881883

Family Applications (1)

Application Number Title Priority Date Filing Date
GB13867/63A Expired GB1001834A (en) 1962-04-09 1963-04-08 Improvements in or relating to photopolymerisable compositions

Country Status (4)

Country Link
US (1) US3203801A (en)
BE (1) BE630740A (en)
DE (1) DE1291620B (en)
GB (1) GB1001834A (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3518081A (en) * 1964-02-17 1970-06-30 Xerox Corp Image formation and development
USRE29357E (en) * 1964-02-17 1977-08-16 Xerox Corporation Image formation and development
DE1522515C2 (en) * 1965-08-03 1980-10-09 Du Pont Process for the production of printed circuits
US4180403A (en) * 1973-01-18 1979-12-25 E. I. Du Pont De Nemours And Company Photohardenable films having high resolution containing nitroso dimers
US3914128A (en) * 1973-06-08 1975-10-21 Du Pont Photohardenable paste compositions having high resolution
GB1448047A (en) * 1973-08-01 1976-09-02 Du Pont Method of making positive polymeric images
US3901705A (en) * 1973-09-06 1975-08-26 Du Pont Method of using variable depth photopolymerization imaging systems
DE2511486C2 (en) * 1974-03-18 1983-11-03 E.I. du Pont de Nemours and Co., 19898 Wilmington, Del. Image forming method and photopolymerizable mixture
US3885964A (en) * 1974-05-31 1975-05-27 Du Pont Photoimaging process using nitroso dimer
JPS5729692B2 (en) * 1974-09-17 1982-06-24
DE2542151C2 (en) * 1975-01-20 1984-06-20 E.I. Du Pont De Nemours And Co., Wilmington, Del. Process for the production of positive images
US4029505A (en) * 1975-01-20 1977-06-14 E. I. Du Pont De Nemours And Company Method of producing positive polymer images
US4050942A (en) * 1975-03-21 1977-09-27 E. I. Du Pont De Nemours And Company Nitroso-dimer-containing compositions and photoimaging process
US4198242A (en) * 1976-03-17 1980-04-15 E. I. Du Pont De Nemours And Company Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor
US4168982A (en) * 1976-06-01 1979-09-25 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing nitroso dimers to selectively inhibit thermal polymerization
US4269933A (en) * 1978-06-08 1981-05-26 E. I. Du Pont De Nemours And Company Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor
US4289844A (en) * 1979-06-18 1981-09-15 Eastman Kodak Company Photopolymerizable compositions featuring novel co-initiators
US4247623A (en) * 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
US4366228A (en) * 1980-09-05 1982-12-28 Eastman Kodak Company Photopolymerizable compositions featuring novel co-initiators
US4743528A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Enhanced imaging composition containing an azinium activator

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2505068A (en) * 1947-09-29 1950-04-25 Alexander H Kerr & Co Catalytic photopolymerization process and compositions
NL287134A (en) * 1959-08-05
DE1099166B (en) * 1959-12-01 1961-02-09 Basf Ag Sensitizers for the photopolymerization of unsaturated organic compounds

Also Published As

Publication number Publication date
US3203801A (en) 1965-08-31
BE630740A (en)
DE1291620B (en) 1969-03-27

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