GB1448047A - Method of making positive polymeric images - Google Patents

Method of making positive polymeric images

Info

Publication number
GB1448047A
GB1448047A GB3342874A GB3342874A GB1448047A GB 1448047 A GB1448047 A GB 1448047A GB 3342874 A GB3342874 A GB 3342874A GB 3342874 A GB3342874 A GB 3342874A GB 1448047 A GB1448047 A GB 1448047A
Authority
GB
United Kingdom
Prior art keywords
radiation
dimer
nitroso
photodissociation
polymerization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3342874A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of GB1448047A publication Critical patent/GB1448047A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

1448047 Photopolymerization EI DU PONT DE NEMOURS & CO 29 July 1974 [1 Aug 1973] 33428/74 Heading G2C A positive polymeric image is made from an element comprising a substrate carrying a layer of a photopolymerizable composition containing a compound capable of addition polymerization by chain propagation initiated by free radicals, (2) a nitroso dimer which is photodissociable to nitroso monomer, and (3) an organic free radicalgenerating system activatable by actinic radiation which does not cause appreciable photodissociation of the dimer, the method comprising imagewise exposing the layer of photopolymerizable composition to radiation that causes dissociation of the nitroso dimer, exposing at least the unexposed portion of the layer to the said actinic radiation, and developing the resulting positive polymeric image. Photodissociation is intended to indicate that the imagewise exposure converts the dimer, which is not itself a polymerization inhibitor, into one or more inhibitors of free radical polymerization. The conversion is thought to be brought about as a result of photo-dissociation of nitroso dimer into nitroso-monomer. The photodissociation usually occurs on exposure to UV radiation, generally of wavelengths less than about 3400A and the actinic radiation exposure, to effect the polymerization is effected at wavelengths greater than about 3400A. Suitable unsaturated compounds include unsaturated esters of polyols, (including those of polyethylene glycols), amides especially of α-methylene carboxylic acids and α, w-diamines, vinyl esters, styrene, and unsaturated aldehydes such as hexadienal. The free radical generating system can furnish free radicals directly when activated by radiation or after having been caused to do so by a sensitizer which is activated by the radiation. Such compounds include aromatic ketones; benzoins; 2, 4, 5-triceryl-imidazole dimers, optionally with 2-mercaptobenzoxazole. Redox combinations e.g. Rose Bengal/2-dibutylaminoethanol can be used. The compositions can also contain polymer binders.
GB3342874A 1973-08-01 1974-07-29 Method of making positive polymeric images Expired GB1448047A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US38450173A 1973-08-01 1973-08-01

Publications (1)

Publication Number Publication Date
GB1448047A true GB1448047A (en) 1976-09-02

Family

ID=23517554

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3342874A Expired GB1448047A (en) 1973-08-01 1974-07-29 Method of making positive polymeric images

Country Status (6)

Country Link
JP (1) JPS5140454B2 (en)
BE (1) BE818371A (en)
DE (1) DE2436901C2 (en)
FR (1) FR2239701B1 (en)
GB (1) GB1448047A (en)
NL (1) NL174401C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1153770A (en) * 1978-07-20 1983-09-13 Salvatore J. Monte Cumylphenol derivatives

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE630740A (en) * 1962-04-09
US3380825A (en) * 1964-11-27 1968-04-30 Du Pont Process for producing images
DE1522444B2 (en) * 1967-03-10 1977-07-07 Basf Ag, 6700 Ludwigshafen POLYMERIZATION INHIBITOR CONTAINING LIGHT-NETWORKABLE MIXTURE

Also Published As

Publication number Publication date
FR2239701B1 (en) 1977-10-14
JPS5045623A (en) 1975-04-23
JPS5140454B2 (en) 1976-11-04
NL174401B (en) 1984-01-02
NL174401C (en) 1984-06-01
DE2436901A1 (en) 1975-02-13
DE2436901C2 (en) 1983-08-11
BE818371A (en) 1975-02-03
NL7410296A (en) 1975-02-04
FR2239701A1 (en) 1975-02-28

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19940728