GB0512347D0 - Maskless particle-beam system for exposing a pattern on a substrate - Google Patents
Maskless particle-beam system for exposing a pattern on a substrateInfo
- Publication number
- GB0512347D0 GB0512347D0 GBGB0512347.6A GB0512347A GB0512347D0 GB 0512347 D0 GB0512347 D0 GB 0512347D0 GB 0512347 A GB0512347 A GB 0512347A GB 0512347 D0 GB0512347 D0 GB 0512347D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- exposing
- pattern
- substrate
- beam system
- maskless particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31774—Multi-beam
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT762002 | 2002-01-17 | ||
AT4342002 | 2002-03-21 | ||
GB0300693A GB2389454B (en) | 2002-01-17 | 2003-01-13 | Maskless particle-beam system for exposing a pattern on a substrate |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0512347D0 true GB0512347D0 (en) | 2005-07-27 |
GB2412494A GB2412494A (en) | 2005-09-28 |
GB2412494B GB2412494B (en) | 2006-02-01 |
Family
ID=34915802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0512347A Expired - Lifetime GB2412494B (en) | 2002-01-17 | 2003-01-13 | Maskless particle-beam system for exposing a pattern on a substrate |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2412494B (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0508151B1 (en) * | 1991-03-13 | 1998-08-12 | Fujitsu Limited | Charged particle beam exposure system and charged particle beam exposure method |
JPH11195590A (en) * | 1998-01-05 | 1999-07-21 | Canon Inc | Multiple electron beam exposure method and its apparatus, and manufacture of device |
US6014200A (en) * | 1998-02-24 | 2000-01-11 | Nikon Corporation | High throughput electron beam lithography system |
JP2000223412A (en) * | 1999-02-03 | 2000-08-11 | Advantest Corp | Charged particle beam exposure system and exposure method |
JP2000252198A (en) * | 1999-03-02 | 2000-09-14 | Advantest Corp | Charged particle beam exposure system |
JP4947841B2 (en) * | 2000-03-31 | 2012-06-06 | キヤノン株式会社 | Charged particle beam exposure system |
-
2003
- 2003-01-13 GB GB0512347A patent/GB2412494B/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB2412494B (en) | 2006-02-01 |
GB2412494A (en) | 2005-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) |
Free format text: REGISTERED BETWEEN 20100325 AND 20100331 |
|
PE20 | Patent expired after termination of 20 years |
Expiry date: 20230112 |