FR3110607A1 - Hard chromium plating process from trivalent chromium - Google Patents

Hard chromium plating process from trivalent chromium Download PDF

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Publication number
FR3110607A1
FR3110607A1 FR2105244A FR2105244A FR3110607A1 FR 3110607 A1 FR3110607 A1 FR 3110607A1 FR 2105244 A FR2105244 A FR 2105244A FR 2105244 A FR2105244 A FR 2105244A FR 3110607 A1 FR3110607 A1 FR 3110607A1
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France
Prior art keywords
trivalent chromium
chromium
plating process
complexing agent
trivalent
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FR2105244A
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French (fr)
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FR3110607B1 (en
Inventor
Jérôme FRAYRET
Joffrey Tardelli
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Institut de Recherche Technologique Materiaux Metallurgie et Procedes IRT M2P
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Institut de Recherche Technologique Materiaux Metallurgie et Procedes IRT M2P
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

Un bain d'électrolyse à base de chrome trivalent comprend au moins un sel de chrome trivalent et au moins deux agents complexants inorganiques, dans lequel le premier agent complexant inorganique est un halogénure ; et le deuxième agent complexant inorganique est un autre halogénure ou est choisi parmi le sulfite, le thiosulfate, le phosphite, le phosphate, l’hexafluoroaluminate, l’hexafluorosilicate ou leurs mélanges. Le rapport molaire entre le premier agent complexant et le chrome trivalent est d'environ 0,8 à environ 2,5 ; et le rapport molaire entre le le deuxième agent complexant et le chrome trivalent est d'environ 0,01 à environ 2,2. Le pH se situe entre 1,5 et 3,5.A trivalent chromium-based electrolysis bath comprises at least one trivalent chromium salt and at least two inorganic complexing agents, wherein the first inorganic complexing agent is a halide; and the second inorganic complexing agent is another halide or is selected from sulfite, thiosulfate, phosphite, phosphate, hexafluoroaluminate, hexafluorosilicate, or mixtures thereof. The molar ratio of the first complexing agent to trivalent chromium is from about 0.8 to about 2.5; and the molar ratio of the second complexing agent to trivalent chromium is from about 0.01 to about 2.2. The pH is between 1.5 and 3.5.

FR2105244A 2020-05-20 2021-05-20 Hard chrome plating process from trivalent chromium Active FR3110607B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2005134 2020-05-20
FR2005134A FR3110606A1 (en) 2020-05-20 2020-05-20 Hard chromium plating process from trivalent chromium

Publications (2)

Publication Number Publication Date
FR3110607A1 true FR3110607A1 (en) 2021-11-26
FR3110607B1 FR3110607B1 (en) 2023-11-10

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FR2005134A Pending FR3110606A1 (en) 2020-05-20 2020-05-20 Hard chromium plating process from trivalent chromium
FR2105244A Active FR3110607B1 (en) 2020-05-20 2021-05-20 Hard chrome plating process from trivalent chromium

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Application Number Title Priority Date Filing Date
FR2005134A Pending FR3110606A1 (en) 2020-05-20 2020-05-20 Hard chromium plating process from trivalent chromium

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FR (2) FR3110606A1 (en)
WO (1) WO2021234075A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2305511A1 (en) * 1975-03-26 1976-10-22 Int Lead Zinc Res TRIVALENT CHROME BASED DEPOSIT BATHS
CN102443825A (en) * 2011-12-07 2012-05-09 黄石振华化工有限公司 High-concentration chromium sulfate-ammonium fluoride trivalent chromium electroplating solution and preparation method thereof
CN103938240A (en) * 2013-06-03 2014-07-23 无锡市锡山区鹅湖镇荡口青荡金属制品厂 Combined plating solution for electroplating chromium on surface of magnesium alloy die casting
US20170314153A1 (en) * 2016-05-02 2017-11-02 The Boeing Company Trivalent chromium plating formulations and processes
EP3382062A1 (en) * 2017-03-31 2018-10-03 COVENTYA S.p.A. Method for increasing the corrosion resistance of a chrome-plated substrate
WO2018209348A1 (en) * 2017-05-12 2018-11-15 Chemeon Surface Technology, Llc pH STABLE TRIVALENT CHROMIUM COATING SOLUTIONS

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2305511A1 (en) * 1975-03-26 1976-10-22 Int Lead Zinc Res TRIVALENT CHROME BASED DEPOSIT BATHS
CN102443825A (en) * 2011-12-07 2012-05-09 黄石振华化工有限公司 High-concentration chromium sulfate-ammonium fluoride trivalent chromium electroplating solution and preparation method thereof
CN103938240A (en) * 2013-06-03 2014-07-23 无锡市锡山区鹅湖镇荡口青荡金属制品厂 Combined plating solution for electroplating chromium on surface of magnesium alloy die casting
US20170314153A1 (en) * 2016-05-02 2017-11-02 The Boeing Company Trivalent chromium plating formulations and processes
EP3382062A1 (en) * 2017-03-31 2018-10-03 COVENTYA S.p.A. Method for increasing the corrosion resistance of a chrome-plated substrate
WO2018209348A1 (en) * 2017-05-12 2018-11-15 Chemeon Surface Technology, Llc pH STABLE TRIVALENT CHROMIUM COATING SOLUTIONS

Also Published As

Publication number Publication date
FR3110606A1 (en) 2021-11-26
FR3110607B1 (en) 2023-11-10
WO2021234075A1 (en) 2021-11-25

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