FR3059341B1 - Electrode pour installation de traitement de surface d'un substrat en mouvement, unite et installation correspondantes - Google Patents

Electrode pour installation de traitement de surface d'un substrat en mouvement, unite et installation correspondantes Download PDF

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Publication number
FR3059341B1
FR3059341B1 FR1661573A FR1661573A FR3059341B1 FR 3059341 B1 FR3059341 B1 FR 3059341B1 FR 1661573 A FR1661573 A FR 1661573A FR 1661573 A FR1661573 A FR 1661573A FR 3059341 B1 FR3059341 B1 FR 3059341B1
Authority
FR
France
Prior art keywords
installation
motion
electrode
substrate
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1661573A
Other languages
English (en)
Other versions
FR3059341A1 (fr
Inventor
Julien Vallade
Cedric Pfister
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coating Plasma Industrie SAS
Coating Plasma Innovation SAS
Original Assignee
Coating Plasma Industrie SAS
Coating Plasma Innovation SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coating Plasma Industrie SAS, Coating Plasma Innovation SAS filed Critical Coating Plasma Industrie SAS
Priority to FR1661573A priority Critical patent/FR3059341B1/fr
Priority to PCT/FR2017/053080 priority patent/WO2018096235A1/fr
Publication of FR3059341A1 publication Critical patent/FR3059341A1/fr
Application granted granted Critical
Publication of FR3059341B1 publication Critical patent/FR3059341B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32541Shape
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0227Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/3255Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32568Relative arrangement or disposition of electrodes; moving means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32605Removable or replaceable electrodes or electrode systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FR1661573A 2016-11-28 2016-11-28 Electrode pour installation de traitement de surface d'un substrat en mouvement, unite et installation correspondantes Active FR3059341B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR1661573A FR3059341B1 (fr) 2016-11-28 2016-11-28 Electrode pour installation de traitement de surface d'un substrat en mouvement, unite et installation correspondantes
PCT/FR2017/053080 WO2018096235A1 (fr) 2016-11-28 2017-11-13 Électrode pour installation de traitement de surface d'un substrat en mouvement, unité et installation de traitement correspondantes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1661573A FR3059341B1 (fr) 2016-11-28 2016-11-28 Electrode pour installation de traitement de surface d'un substrat en mouvement, unite et installation correspondantes
FR1661573 2016-11-28

Publications (2)

Publication Number Publication Date
FR3059341A1 FR3059341A1 (fr) 2018-06-01
FR3059341B1 true FR3059341B1 (fr) 2018-12-07

Family

ID=57963340

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1661573A Active FR3059341B1 (fr) 2016-11-28 2016-11-28 Electrode pour installation de traitement de surface d'un substrat en mouvement, unite et installation correspondantes

Country Status (2)

Country Link
FR (1) FR3059341B1 (fr)
WO (1) WO2018096235A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111501026A (zh) * 2020-04-28 2020-08-07 无锡思锐电子设备科技有限公司 一种提高太阳能电池片中氧化铝薄膜质量的方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997013266A2 (fr) * 1995-06-19 1997-04-10 The University Of Tennessee Research Corporation Procedes et electrodes de decharge pour la generation de plasmas sous pression d'une atmosphere et materiaux traites selon ces procedes
JPH10251843A (ja) * 1997-03-11 1998-09-22 Sony Corp 真空蒸着装置
US20080156266A1 (en) * 2006-12-07 2008-07-03 Sharp Kabushiki Kaisha Plasma processing apparatus
WO2008082297A1 (fr) 2006-12-28 2008-07-10 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Unité de plasma de décharge à barrière diélectrique de surface et procédé de génération de plasma de surface
US20120255492A1 (en) * 2011-04-06 2012-10-11 Atomic Energy Council-Institute Of Nuclear Enetgy Research Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus
EP2866318A1 (fr) 2013-10-24 2015-04-29 OCE-Technologies B.V. Électrode pour traitement de décharge à barrière diélectrique d'un substrat
EP2960358A1 (fr) * 2014-06-25 2015-12-30 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Source plasma et procédé de traitement de surface
JP6276670B2 (ja) 2014-09-19 2018-02-07 富士フイルム株式会社 大気圧プラズマ処理装置
EP3054032B1 (fr) 2015-02-09 2017-08-23 Coating Plasma Industrie Installation pour le dépôt de film sur et/ou modification de la surface d'un substrat en mouvement
CZ28677U1 (cs) 2015-05-27 2015-10-06 Masarykova Univerzita Zařízení pro povrchovou plazmovou úpravu materiálu ze skupiny fólie, papír, textilie, netkaná textilie

Also Published As

Publication number Publication date
WO2018096235A1 (fr) 2018-05-31
FR3059341A1 (fr) 2018-06-01

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