FR2929959B1 - Procede de preparation de polycristaux et de monocristaux d'oxyde de zinc (zno) sur un germe par sublimation activee chimiquement a haute temperature - Google Patents
Procede de preparation de polycristaux et de monocristaux d'oxyde de zinc (zno) sur un germe par sublimation activee chimiquement a haute temperatureInfo
- Publication number
- FR2929959B1 FR2929959B1 FR0852418A FR0852418A FR2929959B1 FR 2929959 B1 FR2929959 B1 FR 2929959B1 FR 0852418 A FR0852418 A FR 0852418A FR 0852418 A FR0852418 A FR 0852418A FR 2929959 B1 FR2929959 B1 FR 2929959B1
- Authority
- FR
- France
- Prior art keywords
- polycristals
- monocrystals
- germ
- zno
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
- C30B23/066—Heating of the material to be evaporated
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/002—Controlling or regulating
- C30B23/005—Controlling or regulating flux or flow of depositing species or vapour
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0852418A FR2929959B1 (fr) | 2008-04-10 | 2008-04-10 | Procede de preparation de polycristaux et de monocristaux d'oxyde de zinc (zno) sur un germe par sublimation activee chimiquement a haute temperature |
JP2011503457A JP2011516388A (ja) | 2008-04-10 | 2009-04-09 | 高温で化学的に活性化された昇華によりシード上に酸化亜鉛(ZnO)の多結晶および単結晶を調製する方法およびこの方法を行うためのデバイス |
PCT/EP2009/054334 WO2009125009A1 (fr) | 2008-04-10 | 2009-04-09 | Procede de preparation de polycristaux et de monocristaux d'oxyde de zinc (zno) sur un germe par sublimation activée chimiquement a haute température et dispositif pour sa mise en œuvre |
EP09730718A EP2262935A1 (fr) | 2008-04-10 | 2009-04-09 | Procede de preparation de polycristaux et de monocristaux d'oxyde de zinc (zno) sur un germe par sublimation activée chimiquement a haute température et dispositif pour sa mise en uvre |
US12/937,063 US20110030611A1 (en) | 2008-04-10 | 2009-04-09 | METHOD FOR PREPARING POLYCRYSTALS AND SINGLE CRYSTALS OF ZINC OXIDE (ZnO) ON A SEED BY CHEMICALLY ACTIVATED SUBLIMATION AT HIGH TEMPERATURE AND DEVICE FOR CARRYING OUT SAID METHOD |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0852418A FR2929959B1 (fr) | 2008-04-10 | 2008-04-10 | Procede de preparation de polycristaux et de monocristaux d'oxyde de zinc (zno) sur un germe par sublimation activee chimiquement a haute temperature |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2929959A1 FR2929959A1 (fr) | 2009-10-16 |
FR2929959B1 true FR2929959B1 (fr) | 2010-08-27 |
Family
ID=40032888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0852418A Expired - Fee Related FR2929959B1 (fr) | 2008-04-10 | 2008-04-10 | Procede de preparation de polycristaux et de monocristaux d'oxyde de zinc (zno) sur un germe par sublimation activee chimiquement a haute temperature |
Country Status (5)
Country | Link |
---|---|
US (1) | US20110030611A1 (fr) |
EP (1) | EP2262935A1 (fr) |
JP (1) | JP2011516388A (fr) |
FR (1) | FR2929959B1 (fr) |
WO (1) | WO2009125009A1 (fr) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8557628B2 (en) * | 2010-10-07 | 2013-10-15 | Fairfield Crystal Technology, Llc | Method for production of zinc oxide single crystals |
US8821634B2 (en) * | 2011-03-22 | 2014-09-02 | Gtat Corporation | High temperature furnace insulation |
JP2013035720A (ja) * | 2011-08-09 | 2013-02-21 | Fujikura Ltd | 窒化アルミニウム単結晶の製造装置及び製造方法 |
CN102703972A (zh) * | 2012-06-05 | 2012-10-03 | 西安理工大学 | 一种生长氧化锌晶体的装置 |
CN102703973B (zh) * | 2012-06-05 | 2015-03-25 | 西安理工大学 | 一种生长氧化锌晶体的方法 |
WO2014174803A1 (fr) * | 2013-04-22 | 2014-10-30 | パナソニック株式会社 | Procédé de production de dispositif d'affichage électroluminescent |
US10741724B2 (en) * | 2015-10-02 | 2020-08-11 | Seoul Viosys Co., Ltd. | Light emitting diode devices with zinc oxide layer |
CN106637411B (zh) * | 2016-12-22 | 2019-04-05 | 苏州奥趋光电技术有限公司 | 一种氮化铝单晶生长方法 |
WO2019098294A1 (fr) * | 2017-11-15 | 2019-05-23 | 株式会社Flosfia | Procédé de formation de film semi-conducteur d'oxyde de type p |
JP7274701B2 (ja) * | 2017-11-15 | 2023-05-17 | 株式会社Flosfia | p型酸化物半導体膜及びその形成方法 |
JP2023520827A (ja) | 2020-04-14 | 2023-05-19 | 眉山博雅新材料股▲ふん▼有限公司 | 結晶成長方法及び装置 |
CN113981528B (zh) * | 2020-07-27 | 2024-06-21 | 环球晶圆股份有限公司 | 碳化硅晶片的制造方法以及半导体结构 |
CN112011825B (zh) * | 2020-09-25 | 2021-06-15 | 武汉大学 | 生长氮化铝晶体的坩埚装置 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5158643A (en) * | 1988-12-16 | 1992-10-27 | Matsushita Electric Industrial Co., Ltd. | Method for manufacturing zinc oxide whiskers |
JPH03279214A (ja) * | 1990-03-29 | 1991-12-10 | Lion Corp | 透明酸化亜鉛の製造方法 |
US5900060A (en) * | 1996-07-03 | 1999-05-04 | Cermet, Inc. | Pressurized skull crucible apparatus for crystal growth and related system and methods |
US5750188A (en) * | 1996-08-29 | 1998-05-12 | Motorola, Inc. | Method for forming a thin film of a non-stoichiometric metal oxide |
JP2000031559A (ja) * | 1998-07-14 | 2000-01-28 | Sekisui Plastics Co Ltd | 酸化亜鉛圧電体およびその製造方法 |
WO2000022202A1 (fr) * | 1998-10-09 | 2000-04-20 | Rohm Co., Ltd. | MONOCRISTAL ZnO DE TYPE p ET PROCEDE DE FABRICATION |
KR100343949B1 (ko) * | 2000-01-26 | 2002-07-24 | 한국과학기술연구원 | 상온에서 작동하는 자외선 수광, 발광소자용 ZnO박막의 제조 방법 및 그를 위한 장치 |
JP3694736B2 (ja) * | 2001-06-12 | 2005-09-14 | 独立行政法人産業技術総合研究所 | 酸化亜鉛単結晶の製造方法 |
US6770135B2 (en) * | 2001-12-24 | 2004-08-03 | Crystal Is, Inc. | Method and apparatus for producing large, single-crystals of aluminum nitride |
US20060005763A1 (en) * | 2001-12-24 | 2006-01-12 | Crystal Is, Inc. | Method and apparatus for producing large, single-crystals of aluminum nitride |
US6624441B2 (en) * | 2002-02-07 | 2003-09-23 | Eagle-Picher Technologies, Llc | Homoepitaxial layers of p-type zinc oxide and the fabrication thereof |
US7049190B2 (en) * | 2002-03-15 | 2006-05-23 | Sanyo Electric Co., Ltd. | Method for forming ZnO film, method for forming ZnO semiconductor layer, method for fabricating semiconductor device, and semiconductor device |
US6936101B2 (en) * | 2002-06-24 | 2005-08-30 | Cermet, Inc. | Semi-insulating bulk zinc oxide single crystal |
ES2214139B2 (es) * | 2003-02-21 | 2005-03-16 | Universidade De Santiago De Compostela | Procedimiento de obtencion de recubrimientos superficiales de nitruro de silicio sobre piezas y componentes ceramicos. |
TW200502445A (en) * | 2003-04-03 | 2005-01-16 | Mitsubishi Chem Corp | The single crystal of zing oxide |
JP4366224B2 (ja) * | 2004-03-26 | 2009-11-18 | 実 一色 | 酸化亜鉛結晶の成長方法 |
JP5276769B2 (ja) * | 2004-10-01 | 2013-08-28 | 東京電波株式会社 | 六方晶系ウルツ鉱型単結晶、その製造方法、および六方晶系ウルツ鉱型単結晶基板 |
US7279040B1 (en) * | 2005-06-16 | 2007-10-09 | Fairfield Crystal Technology, Llc | Method and apparatus for zinc oxide single crystal boule growth |
JP5080043B2 (ja) * | 2006-08-31 | 2012-11-21 | 新電元工業株式会社 | 半導体装置の製造方法、半導体装置の製造用治具、および半導体装置の製造装置 |
-
2008
- 2008-04-10 FR FR0852418A patent/FR2929959B1/fr not_active Expired - Fee Related
-
2009
- 2009-04-09 JP JP2011503457A patent/JP2011516388A/ja active Pending
- 2009-04-09 WO PCT/EP2009/054334 patent/WO2009125009A1/fr active Application Filing
- 2009-04-09 US US12/937,063 patent/US20110030611A1/en not_active Abandoned
- 2009-04-09 EP EP09730718A patent/EP2262935A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
WO2009125009A1 (fr) | 2009-10-15 |
FR2929959A1 (fr) | 2009-10-16 |
JP2011516388A (ja) | 2011-05-26 |
EP2262935A1 (fr) | 2010-12-22 |
US20110030611A1 (en) | 2011-02-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 9 |
|
ST | Notification of lapse |
Effective date: 20171229 |