FR2887866B1 - NANOSTRUCTURES WITH DIFFERENTIAL NEGATIVE RESISTANCE AND METHOD OF MANUFACTURING THESE NANOSTRUCTURES - Google Patents

NANOSTRUCTURES WITH DIFFERENTIAL NEGATIVE RESISTANCE AND METHOD OF MANUFACTURING THESE NANOSTRUCTURES

Info

Publication number
FR2887866B1
FR2887866B1 FR0551848A FR0551848A FR2887866B1 FR 2887866 B1 FR2887866 B1 FR 2887866B1 FR 0551848 A FR0551848 A FR 0551848A FR 0551848 A FR0551848 A FR 0551848A FR 2887866 B1 FR2887866 B1 FR 2887866B1
Authority
FR
France
Prior art keywords
nanostructures
manufacturing
negative resistance
differential negative
differential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0551848A
Other languages
French (fr)
Other versions
FR2887866A1 (en
Inventor
Patrick Soukiassian
Mathieu Silly
Fabrice Charra
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universite Paris Sud Paris 11
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Universite Paris Sud Paris 11
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA, Universite Paris Sud Paris 11 filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0551848A priority Critical patent/FR2887866B1/en
Priority to PCT/EP2006/063692 priority patent/WO2007003576A1/en
Priority to EP06777518A priority patent/EP1897145A1/en
Priority to US11/922,970 priority patent/US20100072472A1/en
Priority to JP2008518850A priority patent/JP2009500815A/en
Publication of FR2887866A1 publication Critical patent/FR2887866A1/en
Application granted granted Critical
Publication of FR2887866B1 publication Critical patent/FR2887866B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • H01L29/0665Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
    • H01L29/0669Nanowires or nanotubes
    • H01L29/0673Nanowires or nanotubes oriented parallel to a substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • H01L29/0665Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66083Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
    • H01L29/6609Diodes
    • H01L29/66151Tunnel diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/88Tunnel-effect diodes
    • H01L29/885Esaki diodes
FR0551848A 2005-06-30 2005-06-30 NANOSTRUCTURES WITH DIFFERENTIAL NEGATIVE RESISTANCE AND METHOD OF MANUFACTURING THESE NANOSTRUCTURES Expired - Fee Related FR2887866B1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0551848A FR2887866B1 (en) 2005-06-30 2005-06-30 NANOSTRUCTURES WITH DIFFERENTIAL NEGATIVE RESISTANCE AND METHOD OF MANUFACTURING THESE NANOSTRUCTURES
PCT/EP2006/063692 WO2007003576A1 (en) 2005-06-30 2006-06-29 Nanostructures with negative differential resistance and method for making same
EP06777518A EP1897145A1 (en) 2005-06-30 2006-06-29 Nanostructures with negative differential resistance and method for making same
US11/922,970 US20100072472A1 (en) 2005-06-30 2006-06-29 Nanostructures With 0, 1, 2, and 3 Dimensions, With Negative Differential Resistance and Method for Making These Nanostructures
JP2008518850A JP2009500815A (en) 2005-06-30 2006-06-29 0, 1, 2, and 3D nanostructures having negative differential resistance and methods for making same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0551848A FR2887866B1 (en) 2005-06-30 2005-06-30 NANOSTRUCTURES WITH DIFFERENTIAL NEGATIVE RESISTANCE AND METHOD OF MANUFACTURING THESE NANOSTRUCTURES

Publications (2)

Publication Number Publication Date
FR2887866A1 FR2887866A1 (en) 2007-01-05
FR2887866B1 true FR2887866B1 (en) 2007-08-17

Family

ID=35708938

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0551848A Expired - Fee Related FR2887866B1 (en) 2005-06-30 2005-06-30 NANOSTRUCTURES WITH DIFFERENTIAL NEGATIVE RESISTANCE AND METHOD OF MANUFACTURING THESE NANOSTRUCTURES

Country Status (1)

Country Link
FR (1) FR2887866B1 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2757183B1 (en) * 1996-12-16 1999-02-05 Commissariat Energie Atomique LONG LENGTH AND LONG STABILITY ATOMIC WIRES, PROCESS FOR PRODUCING THESE WIRES, APPLICATION IN NANO-ELECTRONICS
FR2823739B1 (en) * 2001-04-19 2003-05-16 Commissariat Energie Atomique PROCESS FOR MANUFACTURING UNIDIMENSIONAL NANOSTRUCTURES AND NANOSTRUCTURES OBTAINED THEREBY

Also Published As

Publication number Publication date
FR2887866A1 (en) 2007-01-05

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20120229