FR2885261B1 - Element integre de memoire dynamique a acces aleatoire - Google Patents

Element integre de memoire dynamique a acces aleatoire

Info

Publication number
FR2885261B1
FR2885261B1 FR0504317A FR0504317A FR2885261B1 FR 2885261 B1 FR2885261 B1 FR 2885261B1 FR 0504317 A FR0504317 A FR 0504317A FR 0504317 A FR0504317 A FR 0504317A FR 2885261 B1 FR2885261 B1 FR 2885261B1
Authority
FR
France
Prior art keywords
random access
memory element
dynamic memory
integrated dynamic
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0504317A
Other languages
English (en)
Other versions
FR2885261A1 (fr
Inventor
Pierre Malinge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
Original Assignee
STMicroelectronics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA filed Critical STMicroelectronics SA
Priority to FR0504317A priority Critical patent/FR2885261B1/fr
Priority to US11/398,855 priority patent/US20060261390A1/en
Publication of FR2885261A1 publication Critical patent/FR2885261A1/fr
Application granted granted Critical
Publication of FR2885261B1 publication Critical patent/FR2885261B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42372Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
    • H01L29/4238Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the surface lay-out
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0207Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • H10B12/02Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/05Making the transistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
FR0504317A 2005-04-28 2005-04-28 Element integre de memoire dynamique a acces aleatoire Expired - Fee Related FR2885261B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0504317A FR2885261B1 (fr) 2005-04-28 2005-04-28 Element integre de memoire dynamique a acces aleatoire
US11/398,855 US20060261390A1 (en) 2005-04-28 2006-04-06 Dynamic random access memory integrated element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0504317A FR2885261B1 (fr) 2005-04-28 2005-04-28 Element integre de memoire dynamique a acces aleatoire

Publications (2)

Publication Number Publication Date
FR2885261A1 FR2885261A1 (fr) 2006-11-03
FR2885261B1 true FR2885261B1 (fr) 2007-07-13

Family

ID=35432176

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0504317A Expired - Fee Related FR2885261B1 (fr) 2005-04-28 2005-04-28 Element integre de memoire dynamique a acces aleatoire

Country Status (2)

Country Link
US (1) US20060261390A1 (fr)
FR (1) FR2885261B1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6252275B1 (en) * 1999-01-07 2001-06-26 International Business Machines Corporation Silicon-on-insulator non-volatile random access memory device
TWI230392B (en) * 2001-06-18 2005-04-01 Innovative Silicon Sa Semiconductor device
FR2826180B1 (fr) * 2001-06-19 2003-09-19 St Microelectronics Sa Dispositif semiconducteur integre de memoire de type dram et procede de fabrication correspondant
US6917078B2 (en) * 2002-08-30 2005-07-12 Micron Technology Inc. One transistor SOI non-volatile random access memory cell
KR100539276B1 (ko) * 2003-04-02 2005-12-27 삼성전자주식회사 게이트 라인을 포함하는 반도체 장치 및 이의 제조 방법

Also Published As

Publication number Publication date
US20060261390A1 (en) 2006-11-23
FR2885261A1 (fr) 2006-11-03

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20091231