FR2869324A1 - Procede de depot sous vide - Google Patents

Procede de depot sous vide

Info

Publication number
FR2869324A1
FR2869324A1 FR0404204A FR0404204A FR2869324A1 FR 2869324 A1 FR2869324 A1 FR 2869324A1 FR 0404204 A FR0404204 A FR 0404204A FR 0404204 A FR0404204 A FR 0404204A FR 2869324 A1 FR2869324 A1 FR 2869324A1
Authority
FR
France
Prior art keywords
sprayed
target
species
vacuum deposition
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR0404204A
Other languages
English (en)
Other versions
FR2869324B1 (fr
Inventor
Nicolas Nadaud
Eric Mattman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0404204A priority Critical patent/FR2869324B1/fr
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Priority to US11/578,938 priority patent/US20090226735A1/en
Priority to RU2006141003/02A priority patent/RU2006141003A/ru
Priority to EP05746900A priority patent/EP1743048A2/fr
Priority to KR1020067021550A priority patent/KR20070004042A/ko
Priority to CNA2005800125256A priority patent/CN1950540A/zh
Priority to JP2007508949A priority patent/JP2007533856A/ja
Priority to PCT/FR2005/050250 priority patent/WO2005106070A2/fr
Priority to ARP050101584A priority patent/AR049884A1/es
Publication of FR2869324A1 publication Critical patent/FR2869324A1/fr
Application granted granted Critical
Publication of FR2869324B1 publication Critical patent/FR2869324B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • C23C14/0047Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0052Bombardment of substrates by reactive ion beams
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/46Sputtering by ion beam produced by an external ion source
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/73Anti-reflective coatings with specific characteristics
    • C03C2217/734Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Procédé de dépôt sous vide d'au moins une couche mince sur une portion de surface d'un substrat, caractérisé en ce que :- on choisit au moins une espèce de pulvérisation chimiquement inactive ou active à l'égard d'un matériau à pulvériser,- on génère, à l'aide d'au moins une source ionique linéaire positionnée au sein d'une installation ayant une taille industrielle, un faisceau collimaté d'ions comprenant majoritairement ladite espèce de pulvérisation,- on dirige ledit faisceau vers au moins une cible à base du matériau à pulvériser,- on positionne au moins une portion de surface dudit substrat en regard de ladite cible de telle sorte que ledit matériau pulvérisé par le bombardement ionique de la cible ou un matériau résultant de la réaction dudit matériau pulvérisé avec au moins une des espèces de pulvérisation se dépose sur ladite portion de surface.
FR0404204A 2004-04-21 2004-04-21 Procede de depot sous vide Expired - Fee Related FR2869324B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR0404204A FR2869324B1 (fr) 2004-04-21 2004-04-21 Procede de depot sous vide
RU2006141003/02A RU2006141003A (ru) 2004-04-21 2005-04-15 Способ вакуумного напыления
EP05746900A EP1743048A2 (fr) 2004-04-21 2005-04-15 Procede de depot sous vide
KR1020067021550A KR20070004042A (ko) 2004-04-21 2005-04-15 진공 증착 방법
US11/578,938 US20090226735A1 (en) 2004-04-21 2005-04-15 Vacuum deposition method
CNA2005800125256A CN1950540A (zh) 2004-04-21 2005-04-15 真空沉积方法
JP2007508949A JP2007533856A (ja) 2004-04-21 2005-04-15 真空蒸着方法
PCT/FR2005/050250 WO2005106070A2 (fr) 2004-04-21 2005-04-15 Procede de depot sous vide
ARP050101584A AR049884A1 (es) 2004-04-21 2005-04-21 Procedimiento de deposito al vacio y el sustrato obtenido

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0404204A FR2869324B1 (fr) 2004-04-21 2004-04-21 Procede de depot sous vide

Publications (2)

Publication Number Publication Date
FR2869324A1 true FR2869324A1 (fr) 2005-10-28
FR2869324B1 FR2869324B1 (fr) 2007-08-10

Family

ID=34944951

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0404204A Expired - Fee Related FR2869324B1 (fr) 2004-04-21 2004-04-21 Procede de depot sous vide

Country Status (9)

Country Link
US (1) US20090226735A1 (fr)
EP (1) EP1743048A2 (fr)
JP (1) JP2007533856A (fr)
KR (1) KR20070004042A (fr)
CN (1) CN1950540A (fr)
AR (1) AR049884A1 (fr)
FR (1) FR2869324B1 (fr)
RU (1) RU2006141003A (fr)
WO (1) WO2005106070A2 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2950878B1 (fr) 2009-10-01 2011-10-21 Saint Gobain Procede de depot de couche mince
JP2011100111A (ja) * 2009-10-09 2011-05-19 Seiko Epson Corp 光学物品、光学物品の製造方法、電子機器
US8758580B2 (en) * 2010-08-23 2014-06-24 Vaeco Inc. Deposition system with a rotating drum
US9365450B2 (en) * 2012-12-27 2016-06-14 Intermolecular, Inc. Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
US20150364626A1 (en) * 2014-06-11 2015-12-17 Electronics And Telecommunications Research Institute Transparent electrode and solar cell including the same
US10544499B1 (en) * 2018-08-13 2020-01-28 Valeo North America, Inc. Reflector for vehicle lighting
CN112745038B (zh) * 2019-10-30 2022-12-06 传奇视界有限公司 电控变色玻璃制备方法
FR3133057B1 (fr) * 2022-02-25 2024-05-24 Saint Gobain Matériau comprenant un revêtement contrôle solaire

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4250009A (en) * 1979-05-18 1981-02-10 International Business Machines Corporation Energetic particle beam deposition system
EP0357824A1 (fr) * 1988-09-08 1990-03-14 Joshin Uramoto Méthode de pulvérisation par flux de plasma en ruban et appareil pour la mise en oeuvre de cette méthode
US4933065A (en) * 1988-10-08 1990-06-12 Leybold Aktiengesellschaft Apparatus for applying dielectric or metallic materials
DE3904991A1 (de) * 1989-02-18 1990-08-23 Leybold Ag Kathodenzerstaeubungsvorrichtung
EP0636587A2 (fr) * 1993-07-22 1995-02-01 Saint Gobain Vitrage International Procédé de fabrication d'un vitrage revêtu à couches multiples
US5607781A (en) * 1989-07-27 1997-03-04 Kabushiki Kaisha Toshiba Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium
US6214183B1 (en) * 1999-01-30 2001-04-10 Advanced Ion Technology, Inc. Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials
US6416880B1 (en) * 1993-12-09 2002-07-09 Seagate Technology, Llc Amorphous permalloy films and method of preparing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0626877B2 (ja) * 1988-06-14 1994-04-13 旭硝子株式会社 熱線遮断ガラス
AU616736B2 (en) * 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
JPH08127869A (ja) * 1994-10-27 1996-05-21 Japan Aviation Electron Ind Ltd イオンビームスパッタリング装置
JP4370650B2 (ja) * 1998-12-28 2009-11-25 旭硝子株式会社 積層体およびその製造方法
WO2000040402A1 (fr) * 1998-12-28 2000-07-13 Asahi Glass Company, Limited Produit en couches

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4250009A (en) * 1979-05-18 1981-02-10 International Business Machines Corporation Energetic particle beam deposition system
EP0357824A1 (fr) * 1988-09-08 1990-03-14 Joshin Uramoto Méthode de pulvérisation par flux de plasma en ruban et appareil pour la mise en oeuvre de cette méthode
US4933065A (en) * 1988-10-08 1990-06-12 Leybold Aktiengesellschaft Apparatus for applying dielectric or metallic materials
DE3904991A1 (de) * 1989-02-18 1990-08-23 Leybold Ag Kathodenzerstaeubungsvorrichtung
US5607781A (en) * 1989-07-27 1997-03-04 Kabushiki Kaisha Toshiba Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium
EP0636587A2 (fr) * 1993-07-22 1995-02-01 Saint Gobain Vitrage International Procédé de fabrication d'un vitrage revêtu à couches multiples
US6416880B1 (en) * 1993-12-09 2002-07-09 Seagate Technology, Llc Amorphous permalloy films and method of preparing the same
US6214183B1 (en) * 1999-01-30 2001-04-10 Advanced Ion Technology, Inc. Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials

Also Published As

Publication number Publication date
AR049884A1 (es) 2006-09-13
RU2006141003A (ru) 2008-05-27
FR2869324B1 (fr) 2007-08-10
US20090226735A1 (en) 2009-09-10
KR20070004042A (ko) 2007-01-05
CN1950540A (zh) 2007-04-18
WO2005106070A3 (fr) 2005-12-29
WO2005106070A2 (fr) 2005-11-10
EP1743048A2 (fr) 2007-01-17
JP2007533856A (ja) 2007-11-22

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