FR2841648B1 - Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetre - Google Patents
Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetreInfo
- Publication number
- FR2841648B1 FR2841648B1 FR0307976A FR0307976A FR2841648B1 FR 2841648 B1 FR2841648 B1 FR 2841648B1 FR 0307976 A FR0307976 A FR 0307976A FR 0307976 A FR0307976 A FR 0307976A FR 2841648 B1 FR2841648 B1 FR 2841648B1
- Authority
- FR
- France
- Prior art keywords
- polarimeter
- deformation suppression
- measuring birefringence
- suppression apparatus
- birefringence
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000001629 suppression Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
- G01J4/04—Polarimeters using electric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/23—Bi-refringence
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002191706A JP2004037137A (ja) | 2002-07-01 | 2002-07-01 | 複屈折測定装置、除歪装置、偏光状態検出装置及び露光装置 |
JP2002380014A JP4058337B2 (ja) | 2002-12-27 | 2002-12-27 | 複屈折測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2841648A1 FR2841648A1 (fr) | 2004-01-02 |
FR2841648B1 true FR2841648B1 (fr) | 2012-08-03 |
Family
ID=29738460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0307976A Expired - Fee Related FR2841648B1 (fr) | 2002-07-01 | 2003-07-01 | Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetre |
Country Status (3)
Country | Link |
---|---|
US (1) | US7251029B2 (fr) |
DE (1) | DE10329360B4 (fr) |
FR (1) | FR2841648B1 (fr) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004526331A (ja) * | 2001-05-15 | 2004-08-26 | カール・ツアイス・エスエムテイ・アーゲー | フッ化物結晶レンズを含む対物レンズ |
US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
DE10123725A1 (de) * | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
DE10162796B4 (de) * | 2001-12-20 | 2007-10-31 | Carl Zeiss Smt Ag | Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren |
US7292388B2 (en) * | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
US7233395B2 (en) * | 2003-09-25 | 2007-06-19 | Georgia Tech Research Corporation | Performing retardation measurements |
JP4776891B2 (ja) * | 2004-04-23 | 2011-09-21 | キヤノン株式会社 | 照明光学系、露光装置、及びデバイス製造方法 |
US7375799B2 (en) * | 2005-02-25 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus |
EP1904897A2 (fr) * | 2005-06-13 | 2008-04-02 | ASML Netherlands B.V. | Outil a reticule actif, dispositif de lithographie et procede destine a la formation de motifs sur un dispositif dans un outil de lithographie |
JP2007198896A (ja) | 2006-01-26 | 2007-08-09 | Canon Inc | 計測方法 |
EP2013594B1 (fr) * | 2006-05-01 | 2016-11-16 | Hinds Instruments, Inc. | Mesure de diatténuation linéaire et circulaire dans des éléments optiques |
JP2009206373A (ja) * | 2008-02-28 | 2009-09-10 | Canon Inc | 露光装置及びデバイス製造方法 |
US8072599B2 (en) * | 2008-03-14 | 2011-12-06 | Teledyne Scientific & Imaging, Llc | Real-time, hybrid amplitude-time division polarimetric imaging camera |
DE102009015393B3 (de) * | 2009-03-20 | 2010-09-02 | Carl Zeiss Smt Ag | Messverfahren und Messsystem zur Messung der Doppelbrechung |
US8328417B2 (en) * | 2009-08-20 | 2012-12-11 | Corning Incorporated | Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples |
WO2011023765A1 (fr) * | 2009-08-26 | 2011-03-03 | Carl Zeiss Laser Optics Gmbh | Module de métrologie pour système laser |
TWI399529B (zh) * | 2009-09-10 | 2013-06-21 | Ind Tech Res Inst | 線掃瞄式量測系統 |
JP2013036792A (ja) * | 2011-08-05 | 2013-02-21 | Seiko Epson Corp | 偏光状態測定装置及び偏光状態測定方法 |
NL2009824A (en) | 2011-12-21 | 2013-06-24 | Asml Netherlands Bv | Lithographic apparatus with a deformation sensor. |
JP6084507B2 (ja) * | 2012-04-16 | 2017-02-22 | Hoya株式会社 | マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法 |
US9709696B2 (en) | 2013-10-16 | 2017-07-18 | Halliburton Energy Services, Inc. | Intensity-independent optical computing device |
US9835885B2 (en) * | 2014-09-05 | 2017-12-05 | Massachusetts Institute Of Technology | Systems, methods, and apparatus for sensitive thermal imaging |
US10732336B2 (en) | 2017-02-02 | 2020-08-04 | Corning Incorporated | Method of assembling optical systems and minimizing retardance distortions in optical assemblies |
JP6351893B1 (ja) * | 2018-02-26 | 2018-07-04 | 日本分光株式会社 | 位相差制御装置 |
CN109489938B (zh) * | 2018-11-15 | 2021-01-05 | 中国科学院光电技术研究所 | 一种基于自准直成像法光学镜头畸变的检测方法 |
CN110160965B (zh) * | 2019-06-10 | 2021-11-05 | 南京恒高光电研究院有限公司 | 一种检测bgo晶体的残余双折射的装置和方法 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
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US3463575A (en) * | 1966-12-09 | 1969-08-26 | Eg & G Inc | Light beam sampling apparatus |
US4252410A (en) * | 1978-10-19 | 1981-02-24 | Hewlett-Packard Company | Polarization rotation method and apparatus |
US4801798A (en) * | 1987-12-14 | 1989-01-31 | Eastman Kodak Company | Method and apparatus for measuring optical retardation in transparent materials |
EP0359554B1 (fr) * | 1988-09-16 | 1994-11-17 | Fujitsu Limited | Système d'objets biologiques et système de comparaison d'empreintes digitales utilisant ce système |
US5475491A (en) * | 1989-02-10 | 1995-12-12 | Canon Kabushiki Kaisha | Exposure apparatus |
JPH04102178A (ja) | 1990-08-22 | 1992-04-03 | Hitachi Ltd | 物体モデル入力装置 |
JP3174795B2 (ja) * | 1992-04-30 | 2001-06-11 | ホーヤ株式会社 | ガラス体の製造方法、ガラス体の除歪方法、ガラス体の熱処理装置及びガラス体の除歪装置 |
US5784202A (en) | 1993-07-08 | 1998-07-21 | Asahi Kogaku Kogyo Kabushika Kaisha | Apparatus for isometrically splitting beams |
US5719702A (en) * | 1993-08-03 | 1998-02-17 | The United States Of America As Represented By The United States Department Of Energy | Polarization-balanced beamsplitter |
US5398112A (en) * | 1993-10-04 | 1995-03-14 | Wyko Corporation | Method for testing an optical window with a small wedge angle |
WO1995030240A2 (fr) * | 1994-04-28 | 1995-11-09 | Semitool, Incorporated | Systemes de traitement de semi-conducteurs |
JPH07320090A (ja) | 1994-05-26 | 1995-12-08 | Hitachi Ltd | 画像生成装置 |
JP2736870B2 (ja) | 1995-02-10 | 1998-04-02 | 株式会社超高速ネットワーク・コンピュータ技術研究所 | 三次元図形データ削減方法 |
KR19980702629A (ko) * | 1995-09-27 | 1998-08-05 | 안자끼 사토루 | 레이저장치 |
US5825492A (en) * | 1996-04-26 | 1998-10-20 | Jaton Systems Incorporated | Method and apparatus for measuring retardation and birefringence |
JPH10229038A (ja) * | 1997-02-14 | 1998-08-25 | Nikon Corp | 露光量制御方法 |
JP3973273B2 (ja) | 1997-09-22 | 2007-09-12 | 三洋電機株式会社 | 画像生成装置および画像生成方法 |
EP1060369A4 (fr) * | 1998-02-20 | 2005-01-19 | Hinds Instruments Inc | Systeme de mesure de birefringence |
WO1999042796A1 (fr) | 1998-02-20 | 1999-08-26 | Hinds Instruments, Inc. | Systeme de mesure de birefringence |
JPH11328427A (ja) | 1998-05-08 | 1999-11-30 | Fujitsu Ltd | 多角形分割描画装置、多角形分割描画方法および記憶媒体 |
WO2000064826A1 (fr) * | 1999-04-21 | 2000-11-02 | Nikon Corporation | Element en verre de silice, procede de production et aligneur de projection l'utilisant |
JP4626117B2 (ja) * | 1999-07-05 | 2011-02-02 | 株式会社ニコン | 石英ガラス部材の製造方法 |
JP2001148344A (ja) * | 1999-09-09 | 2001-05-29 | Nikon Corp | 露光装置、エネルギ源の出力制御方法、該方法を用いるレーザ装置、及びデバイス製造方法 |
US6157448A (en) * | 1999-10-08 | 2000-12-05 | Uniopt Co., Ltd. | Birefringence measurement optical system and high spatial resolution polarimetric apparatus |
DE19953528B4 (de) * | 1999-11-05 | 2010-10-07 | Schott Ag | Vorrichtung und Verfahren zur automatischen Messung der Spannungsdoppelbrechung mit feststehendem Analysator |
EP1285245A4 (fr) * | 2000-03-31 | 2009-11-25 | Hinds Instruments Inc | Systeme destine a mesurer la birefringence circulaire et lineaire |
HU226937B1 (en) * | 2000-11-17 | 2010-03-29 | Mta Szegedi Biolog Koezpont | Method and apparatus for determining polarization amount of material by a laser scanning microscope |
-
2003
- 2003-06-30 DE DE10329360A patent/DE10329360B4/de not_active Expired - Fee Related
- 2003-06-30 US US10/610,986 patent/US7251029B2/en not_active Expired - Fee Related
- 2003-07-01 FR FR0307976A patent/FR2841648B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE10329360A1 (de) | 2004-02-26 |
FR2841648A1 (fr) | 2004-01-02 |
US20040008348A1 (en) | 2004-01-15 |
US7251029B2 (en) | 2007-07-31 |
DE10329360B4 (de) | 2008-08-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 14 |
|
PLFP | Fee payment |
Year of fee payment: 15 |
|
PLFP | Fee payment |
Year of fee payment: 16 |
|
ST | Notification of lapse |
Effective date: 20200306 |